KR101427995B1 - Touch sensing electrode - Google Patents

Abstract

The present invention relates to a touch sensing electrode. More specifically, the touch sensing electrode includes: a sensing pattern with a first pattern formed in a first direction and a second pattern formed in a second direction; a metal bridge electrode electrically connecting unit patterns of the second pattern which are spaced apart from each other; an insulation layer disposed between the sensing pattern and the metal bridge electrode; and a light blocking metal oxide layer formed on a visible side surface of the metal bridge electrode. Accordingly, the touch sensing electrode can minimize the visibility of the pattern in accordance to the location-specific differences in the reflection ratio.

Description

[0001] The present invention relates to a touch sensing electrode,

The present invention relates to a touch sensing electrode.

Typically, the touch screen panel is a screen panel equipped with a special input device for inputting its position when touching by hand. Such a touch screen panel can receive input data directly from the screen so that the user can grasp the position of the touch screen or touch a specific position of the displayed character on the screen without using a keyboard, Which are stacked in layers.

In order to recognize the touched portion without lowering the visibility of the image displayed on the screen, it is necessary to use a transparent touch sensing electrode. Normally, a sensing pattern formed in a predetermined pattern is used.

Such a sensing pattern may be generally formed of a first pattern and a second pattern. The first and second patterns are arranged in different directions to provide information about the X and Y coordinates of the touched point. Specifically, when a human hand or an object is brought into contact with the cover window substrate, a change in capacitance according to the contact position is transmitted to the drive circuit via the first pattern, the second pattern, and the position detection line. Then, the contact position is grasped by the change of the electrostatic capacity by the X and Y input processing circuit or the like into the electrical signal.

In this regard, the first pattern and the second pattern are formed on the same substrate, and each pattern must be electrically connected in order to sense a touched point. However, the second patterns are connected to each other, but the first pattern has an island shape. Therefore, a separate bridge electrode is required to electrically connect the first sensing patterns.

There is a problem that the pattern can be visually recognized due to the difference in reflectance between the bridge electrode and the sensing pattern.

On the other hand, when the bridge electrode is formed with a very narrow width as a metal, the visibility can be improved and the process can be simplified by forming the metal electrode together with the position detecting line. However, There is a problem that it takes time for the formation of elaborate patterns.

Japanese Patent Application Laid-Open No. 2008-98169 proposes a transparent conductive film in which an undercoat layer composed of two layers having different refractive indices is formed between a transparent substrate and a transparent conductive layer.

Japanese Patent Laid-Open No. 2008-98169

It is an object of the present invention to provide a touch sensing electrode having low visibility due to a difference in reflectance at each position.

It is another object of the present invention to provide a touch sensing electrode which can be produced with a high yield even with a low-precision facility.

It is another object of the present invention to provide a touch screen panel having the touch sensing electrode.

1. A sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; A metal bridge electrode electrically connecting the spaced apart unit patterns of the second pattern; An insulating layer interposed between the sensing pattern and the metal bridge electrode; And a light blocking metal oxide layer formed on one side of the visible side of the metal bridge electrode.

2. The method of claim 1 wherein the sensing pattern is selected from the group consisting of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) 3,4-ethylenedioxythiophene), carbon nanotubes (CNT), graphene, and metal wires.

3. The touch sensing electrode of 1 above, wherein the metal bridge electrode is formed of at least one metal selected from the group consisting of molybdenum, silver, aluminum, copper and chromium.

4. The touch sensing electrode of claim 1, wherein the width of the unit bridge electrode is 2 to 30 占 퐉.

5. The touch sensing electrode according to item 1 above, wherein the light-shielding metal oxide layer is formed of an oxide of molybdenum, silver, aluminum, copper, chromium, or an alloy thereof.

6. The touch sensing electrode of 1 above, wherein the light-shielding metal oxide layer has a transmittance of 70% or less.

7. The touch sensing electrode of claim 1, formed on one side of a cover window substrate or display panel of the touch screen panel.

8. A method for fabricating a touch sensing electrode, comprising: forming a metal bridge electrode electrically connecting spaced unit sensing patterns; and forming a light blocking metal oxide layer on the metal bridge electrode.

9. A method of manufacturing a touch sensing electrode, comprising: forming a light blocking metal oxide layer on one side of a cover window substrate; and forming a metal bridge electrode on the light blocking metal oxide layer.

10. The method of manufacturing a touch sensing electrode according to the above 8 or 9, wherein the metal bridge electrode is formed by photolithography, vapor deposition or printing.

11. The method of claim 8 or 9, wherein the metal bridge electrode is formed with a metal wiring and a position detection line.

12. The method of claim 8 or 9, wherein the light-blocking metal oxide layer is formed in the same manner as the metal bridge electrode.

13. The method of claim 8, wherein the light-blocking metal oxide layer is formed by oxidizing the visible side surface of the metal bridge electrode.

14. A touch screen panel comprising the touch sensitive electrode of any one of claims 1 to 7.

15. An image display device comprising the touch screen panel of 14 above.

The present invention can minimize the visibility of the pattern according to the difference in reflectance by position.

The present invention can be produced at a high yield even with a low-precision facility.

1 is a schematic front view of a touch sensing electrode according to an embodiment of the present invention.
2 is a schematic vertical cross-sectional view of a touch sensing electrode according to an embodiment of the present invention.
3 is a schematic vertical cross-sectional view of a touch sensing electrode according to an embodiment of the present invention.
4 is a schematic vertical cross-sectional view of a touch sensing electrode according to an embodiment of the present invention.
5 is a schematic vertical cross-sectional view of a touch sensing electrode according to an embodiment of the present invention.

The present invention provides a sensing device comprising: a sensing pattern having a first pattern formed in a first direction and a second pattern formed in a second direction; A metal bridge electrode electrically connecting the spaced apart unit patterns of the second pattern; An insulating layer interposed between the sensing pattern and the metal bridge electrode; And a light shielding metal oxide layer formed on one side of the metal bridge electrode on the viewing side, thereby minimizing the visibility of the pattern due to the difference in reflectance by position.

1 to 5 schematically show a front or vertical cross section of the touch sensing electrode according to an embodiment of the present invention. Hereinafter, the present invention will be described in more detail with reference to the drawings.

<Detection pattern>

The sensing pattern may include a first pattern 10 formed in a first direction and a second pattern 20 formed in a second direction.

The first pattern 10 and the second pattern 20 are arranged in different directions. For example, they may be arranged in the same row or column, but are not limited thereto.

The first pattern 10 and the second pattern 20 provide information on the X and Y coordinates of the touched point. Specifically, when a human hand or an object is brought into contact with the cover window substrate, the first pattern 10, the second pattern 20, and the position detection line (not shown) The change of the electrostatic capacity is transmitted. Then, the contact position is grasped by the change of the electrostatic capacitance by the X and Y input processing circuit (not shown) or the like and converted into an electrical signal.

In this regard, the first pattern 10 and the second pattern 20 are formed on the same layer, and respective patterns must be electrically connected to detect a touched point. Since the first patterns 10 are connected to each other but the second patterns 20 are separated from each other in an island shape, a separate bridge electrode (not shown) may be used to electrically connect the second pattern 20 30) is required. The bridge electrode 30 will be described later.

The thickness of the detection pattern is not particularly limited, and may be, for example, 20 to 200 nm, respectively. When the thickness of the sensing pattern is less than 20 nm, the electrical resistance increases and the touch sensitivity may be deteriorated. When the sensing pattern has a thickness exceeding 200 nm, the reflectance increases and visibility may be a problem.

The sensing pattern can be applied to the transparent electrode material known in the art without limitation. For example, indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO), poly (3,4-ethylenedioxythiophene) , Carbon nanotubes (CNT), graphene, and metal wires. These may be used alone or in combination of two or more. Preferably, indium tin oxide (ITO) may be used. The metal used for the metal wire is not particularly limited, and examples thereof include silver (Ag), gold, aluminum, copper, iron, nickel, titanium, tellurium, chromium and the like. These may be used alone or in combination of two or more.

< bridge  Electrodes>

The bridge electrode 30 electrically connects the separated unit patterns of the second pattern 20.

At this time, since the bridge electrode 30 is electrically disconnected from the first pattern 10 of the sensing pattern, the insulation layer 40 is formed for this purpose. This will be described later.

The bridge electrode 30 according to the present invention is formed of a metal material, and preferably formed of the same material as the metal wiring and the position detecting line. In such a case, the bridge electrode 30 can be formed at the time of forming the metal wiring and the position detecting line, so that the process can be further simplified.

The metal is not particularly limited as long as it has excellent electrical conductivity and low resistance, and examples thereof include molybdenum, silver, aluminum, copper, and chromium. These may be used alone or in combination of two or more.

The width of the unit bridge electrode 30 is not particularly limited and may be, for example, 2 to 30 탆, preferably 2 to 20 탆, but is not limited thereto. When the width of the bridge is 2 to 30 占 퐉, the visibility of the pattern can be reduced and an appropriate electrical resistance can be obtained.

< Insulating layer >

The insulating layer 40 is formed between the sensing pattern and the metal bridge electrode 30 to prevent electrical connection between the first pattern 10 and the second pattern 20.

In the case where the touch sensing electrode of the present invention is formed on one side of the display panel (which will be described later), the insulating layer 40 is formed as a layer structure covering the sensing pattern on one surface of the display panel.

However, since the metal bridge electrode 30 is electrically connected to the adjacent second pattern 20 as shown in FIG. 2, a portion where the insulating layer 40 is not formed is required. As described above, a portion where the insulating layer 40 is not formed in the insulating layer 40 is referred to as a contact hole 60. Therefore, electrical connection is made between the second pattern 20 and the metal bridge electrode 30 in the contact hole 60.

According to another embodiment, as shown in Fig. 4, the insulating layer 40 is not formed in the structure of the layer but may be formed only under the metal bridge electrode 30. Fig. In this case, the formation of the contact hole is unnecessary. Therefore, since no separate process or equipment for forming the contact hole is required, the touch sensing electrode can be formed more simply and easily.

In the case where the touch sensing electrode of the present invention is formed on one side of the cover window substrate (which will be described later), the insulating layer 40 is formed in a structure of a layer covering the metal bridge electrode 30 on one side of the cover window substrate do.

As shown in FIG. 3, the second pattern 20 and the metal bridge electrode 30 are electrically connected to each other in the contact hole 60 in this case as well.

According to another embodiment, the insulating layer 40 is not formed as a layer structure as shown in Fig. 5, but may be formed only on the upper portion of the metal bridge electrode 30. Fig. In this case, the formation of the contact hole is unnecessary.

The insulating layer 40 according to the present invention can be applied without limitation to transparent insulating materials known in the art. For example, may be used an organic insulating layer or inorganic insulating layer, the organic insulating layer is a photo-curing or heat-curing the insulating resin used in the art may be used without particular limitation, the inorganic insulating layer is SiO _2, etc. Metal oxides may be used.

< Block light  Metal oxide layer &gt;

In the case where the bridge electrode 30 is formed of a metal, the metal can be visually recognized because the reflectance is much higher than that of a typical sensing electrode material. Therefore, the unit bridge electrode 30 must be formed to have a narrow width in order to reduce visibility. It requires a production facility, and there is a time-consuming problem to form a precise pattern.

However, since the touch sensing electrode of the present invention includes the light shielding metal oxide layer 50 formed on the viewer's side of the bridge electrode 30, the visibility of the metal bridge electrode 30 is lowered, It is possible to prevent the bridge electrode 30 from being visibly formed even if the bridge electrode 30 is formed.

The light-shielding metal oxide is not particularly limited as long as it can block light and reduce the visibility of the bridge electrode 30. For example, it may be an oxide of molybdenum, silver, aluminum, copper, chromium or an alloy thereof, May be an oxide of the same metal as the metal bridge electrode. In such a case, it may be formed simultaneously with the metal bridge electrode, or may be formed by oxidizing a part of the metal bridge electrode.

The transmittance of the light-shielding metal oxide layer 50 is not particularly limited and can be appropriately selected so as to reduce the visibility of the bridge electrode 30 by blocking light while minimizing a decrease in transmittance when applied to a touch screen panel , For example up to 70%, and preferably from 20 to 60%.

<Substrate>

The touch sensing electrode of the present invention is formed on a substrate (1).

The substrate 1 can be made of any material conventionally used in the art without limitation, and examples thereof include glass, polyethersulphone (PES), polyacrylate (PAR), polyether imide (PEI, polyetherimide, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetheretherketone, polyetherimide, polyethylene naphthalate, PC, polycarbonate), cellulose triacetate (TAC), and cellulose acetate propionate (CAP).

The substrate 1 may be a cover window substrate or a display panel which forms the outermost surface of the touch screen panel.

The touch sensing electrode of the present invention may further include a transparent dielectric layer as needed.

The transparent dielectric layer may be formed between the substrate 1 and the sensing pattern when the substrate 1 is a cover window substrate and between the cover window substrate and the sensing pattern when the substrate 1 is a display panel.

The transparent dielectric layer improves the optical uniformity of the touch screen panel by reducing the difference in optical properties due to structural differences in position according to the detection pattern structure.

The transparent dielectric layer may be formed of SiO ₂ , an organic insulating film, or the like. A vacuum deposition method, a sputtering method, a coating method, or the like can be used as the forming method, and the method can be easily manufactured in the form of a thin film through the above-described method.

In the present invention, if necessary, the transparent dielectric layer may be formed of a plurality of layers. In this case, the respective layers may be formed of different materials and may have different refractive indices and thicknesses.

< The passivation layer >

The present invention may further include a passivation layer covering the sensing pattern and the sensing pattern as necessary in order to prevent the sensing pattern and the bridge electrode 30 from being contaminated by the external environment (moisture, air, etc.).

The passivation layer may be formed in a necessary pattern using a metal oxide such as silicon oxide, a transparent photosensitive resin composition containing an acrylic resin, a thermosetting resin composition, or the like.

The passivation layer according to the present invention may have an appropriate thickness, for example, 2,000 nm or less. Thus, for example, it can be from 0 to 2,000 nm. The effect of reducing the reflectance of the touch sensing electrode according to the present invention can be further improved.

The passivation layer may be provided with a contact hole for connection between the sensing pattern and the driving circuit.

<Adhesive Layer>

When the touch sensing electrode of the present invention is formed on one side of the cover window substrate, the touch sensing electrode is bonded to the display panel unit through the adhesive layer.

In addition, when formed on one surface of the display panel, the touch sensing electrode is bonded to the cover window substrate through the adhesive layer.

The adhesive layer may be formed by applying a transparent curable resin composition and then curing (OCR), or may be formed by pressing (OCA) already in the form of a film.

<Touch Screen Panel and Image Display Device>

Also, the present invention provides a touch screen panel including the touch sensing electrode.

The touch screen panel of the present invention further includes a structure commonly used in the art in addition to the touch sensing electrode.

The present invention also provides an image display apparatus including the touch screen panel.

&Lt; Method of manufacturing touch sensing electrode >

Also, the present invention provides a method of manufacturing the touch sensing electrode.

According to an embodiment of the present invention, when the touch sensing electrode of the present invention is formed on one surface of a display panel, first, a metal bridge electrode 30 electrically connecting the unit sensing patterns is formed.

The method of manufacturing the metal bridge electrode 30 is not particularly limited and may be formed by, for example, photolithography, vapor deposition, or printing.

The metal bridge electrode 30 can be formed simultaneously with the metal wiring and the position detection line. In this case, the process can be further simplified and the process efficiency can be improved.

Thereafter, a light-blocking metal oxide layer 50 is formed on the metal bridge electrode 30.

The method of forming the light-blocking metal oxide layer 50 is not particularly limited and may be formed by, for example, photolithography, vapor deposition, or printing, preferably by the same method as the metal bridge electrode 30 . In such a case, the metal bridge electrode 30 can be formed immediately after the formation of the metal bridge electrode 30, so that no additional equipment is required and the process efficiency is improved.

In addition, the light-blocking metal oxide layer 50 may be formed by oxidizing the visible side surface of the metal bridge electrode.

The method of manufacturing a touch sensing electrode of the present invention further includes forming a sensing pattern and an insulating layer 40 on the substrate before forming the metal bridge electrode 30 and the light blocking metal oxide layer 50 .

In the case of a sensing pattern, a first pattern 10 formed in a first direction and a second pattern 20 formed in a second direction are formed on a substrate.

The method of forming the detection pattern is not particularly limited and can be appropriately selected depending on the material of the pattern. For example, if a metal oxide such as indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), indium zinc tin oxide (IZTO), cadmium tin oxide (CTO) A deposition method or a photolithography method can be used. If a PEDOT (poly (3,4-ethylenedioxythiophene)), a carbon nanotube (CNT), a graphene, a metal nanowire or the like is used, a printing method, a photolithography, have. Examples of printing methods include offset printing and screen printing.

Thereafter, an insulating layer 40 is formed on the surface of the substrate 1 on which the sensing pattern is formed.

The insulating layer 40 may be formed in a structure of a layer covering the sensing pattern on the substrate 1, as illustrated in Fig.

In this case, the contact hole 60 may be formed by forming the insulating layer 40 as a whole and then forming a hole (hole pattern), and the insulating layer 40 may be formed by a sensing pattern and a metal bridge electrode (Island type) may be formed in such a manner that the insulating film 30 is formed except for the portion to be electrically connected.

Further, the insulating layer may be formed only at a lower portion of a predetermined portion where a metal bridge electrode 30 to be described later is to be formed, as illustrated in Fig. In this case, the creation of the contact hole is not required.

The predetermined portion is not particularly limited as long as it is a portion capable of connecting the unit second patterns spaced apart.

The method of forming the insulating layer 40 may be appropriately selected depending on the material of the pattern. For example, in the case of an organic insulating layer, photolithography or printing may be used. In the case of an inorganic insulating layer, photolithography or vapor deposition may be used.

According to another embodiment of the present invention, when the touch sensing electrode of the present invention is formed on one side of the cover window substrate, a light blocking metal oxide layer 50 is formed on one side of the cover window substrate.

The method of producing the light-shielding metal oxide layer 50 is not particularly limited and may be formed by, for example, photolithography, vapor deposition, or printing.

Thereafter, a metal bridge electrode 30 is formed on the light-blocking metal oxide layer 50.

The method of manufacturing the metal bridge electrode 30 is not particularly limited and may be formed by, for example, photolithography, vapor deposition, or printing, and may be preferably formed in the same manner as the light-blocking metal oxide layer 50 . In such a case, the light-shielding metal oxide layer 50 can be formed together at the time of forming the light-shielding metal oxide layer 50, and no separate step is required, thereby improving the process efficiency.

Further, the metal bridge electrode 30 may be formed together with the metal wiring and the position detection line. In such a case, the process can be simplified and the process efficiency can be improved.

The method of manufacturing a touch sensing electrode of the present invention further includes forming an insulating layer (40) and a sensing pattern after formation of the metal bridge electrode (30).

The insulating layer 40 may be formed on the cover window substrate on which the metal bridge electrode 30 is formed and a structure of a layer covering the metal bridge electrode 30. [

In this case, the contact hole 60 may be formed by forming the insulating layer 40 as a whole and then forming a hole (hole pattern), and the insulating layer 40 may be formed by a sensing pattern and a metal bridge electrode (Island type) may be formed in such a manner that the insulating film 30 is formed except for the portion to be electrically connected.

Further, the insulating layer may be formed only on one side of the unvisual side of the metal bridge electrode 30, as illustrated in Fig. In this case, the creation of the contact hole is not required.

The insulating layer 40 may be formed by the insulating layer forming method described above.

Thereafter, a sensing pattern having a first pattern 10 formed in a first direction and a second pattern 20 formed in a second direction is formed.

The sensing pattern may be formed on the insulating layer 40 when the insulating layer 40 is formed in a layer structure.

When the insulating layer 40 is formed only on one surface of the metal bridge electrode 30, the metal bridge electrode 30 may be formed on one surface of the substrate.

The sensing pattern may be formed by the above-described method of forming the sensing pattern.

Example  And Comparative Example

The touch sensing electrodes were fabricated as follows, and the reflectance of the light-shielding metal oxide layer of the example and the metal bridge electrode of the comparative example were measured and shown in Table 1 below.

The reflectance means an average of reflectance at 400 nm to 700 nm.

As the substrate, glass (refractive index: 1.51)

As the first and second patterns, ITO (refractive index: 1.8)

As the insulating layer, an acrylic insulating material (refractive index: 1.51) was used.

In the case of the embodiment, chromium was used as the metal bridge electrode, and the light-shielding metal oxide layer was formed of chromium oxide on one side of the viewer side. In Comparative Examples 1 to 4, chromium, molybdenum, silver and aluminum were used as metal bridge electrodes, respectively, and no light-shielding metal oxide layer was formed.

The refractive index and extinction coefficient are described based on light having a wavelength of 550 nm.

division Reflectance of metal part (%) Example One Comparative Example 1 35 Comparative Example 2 56 Comparative Example 3 96 Comparative Example 4 92

Referring to Table 1, the metal bridge electrode was not recognized since the light-shielding metal oxide layer having a reflectance of only 1% was formed on the metal bridge electrode.

However, in the touch sensing electrodes of Comparative Examples 1 to 4, the reflectance of the metal bridge electrode was as high as 35 to 96%, and the corresponding region reflected the light and was recognized.

1: substrate 10: first pattern
20: second pattern 30: bridge electrode
40: insulating layer 50: light blocking metal oxide layer

Claims (15)

delete delete delete delete delete delete delete delete Forming a light-shielding metal oxide layer on one surface of the cover window substrate, forming a metal bridge electrode on the light-shielding metal oxide layer, and forming the metal bridge electrode together with the position detection line.
10. The method of claim 9, wherein the metal bridge electrode is formed by photolithography, vapor deposition, or printing.
delete 10. The method of claim 9, wherein the light-blocking metal oxide layer is formed in the same manner as the metal bridge electrode. delete delete delete

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