KR101231731B1 - Multifunction x-ray analysis system - Google Patents

Abstract

The apparatus for analyzing a sample includes a radiation source adapted to direct the first converging beam of X-rays towards the surface of the sample and to direct a second collimated beam of X-rays toward the surface of the sample. The motion assembly moves the radiation source between a first source location where the X-rays are directed towards the surface of the sample at a grazing angle and a second source location where the X-rays are directed towards the surface near the Bragg angle of the sample. The detector assembly detects X-rays scattered from the sample as a function of angle while the radiation source is in either of the first and second source configurations and is in either of the first and second source locations. The signal processor receives and processes the output signal from the detector assembly to determine the characteristics of the sample.

X-ray, radiation source, motion assembly, detector assembly, signal processor, converging beam, collimated beam, grazing angle, Bragg angle

Description

Multi-Function X-Ray Analysis System {MULTIFUNCTION X-RAY ANALYSIS SYSTEM}

1 is a schematic side view of an X-ray metrology system, in accordance with an embodiment of the invention.

2 is a schematic plan view of an X-ray metrology system, in accordance with an embodiment of the invention.

3A and 3B are schematic front views of detector arrays constituting XRR and SAXS, respectively, in accordance with an embodiment of the invention.

4 is a schematic plan view of a system for SAXS measurement, in accordance with an embodiment of the present invention.

5 is a schematic, detailed view of a knife edge used to reduce the focus of an X-ray beam incident on a surface, in accordance with an embodiment of the present invention.

6 is a flow diagram schematically illustrating a method for SAXS measurement, in accordance with an embodiment of the present invention.

The present invention relates generally to analytical instruments, and in particular, to analytical instruments and methods using X-rays.

X-ray reflection analysis (XRR) is a well-known technique for analyzing the thickness, density and surface properties of thin film layers deposited on a substrate. Such reflection assays generally operate by irradiating a sample with an X-ray beam at a grazing angle, ie, a small angle, near the entire external reflection angle of the sample material with respect to the sample surface. By measuring the intensity of the X-rays reflected from the sample as a function of the angle, a pattern of interference fringes is analyzed to determine the properties of the film layer that is responsible for fringe pattern generation. Typical systems and methods for XRR are disclosed in US Pat. Nos. 5, 619, 548, 5,923,720, 6,512,814, 6,639,968, and 6,771,735.

Incineration X-ray scattering (SAXS) is another method for the characterization of surface layers. The method is disclosed, for example, in "GISAXS-Glancing Incidence Small Angle X-ray Scattering," Journal de Physique IV 3 (1993. 12), pages 411-417 by Parrill et al. In this method, the incident X-rays are entirely reflected from the surface to the outside. The evanescent wave in the surface area is scattered by the microstructure in that area. Information about these structures can be obtained by measuring scattered evanescent waves. For example, SAXS can be used in a manner to determine the properties of voids in the surface layer of low-k dielectric materials formed on silicon wafers.

US Patent No. 6,895,075 discloses a method and system for performing combined XRR and SAXS measurements on a sample. Although complementary to the information provided by XRR and SAXS, there are inherent difficulties in performing both types of measurements using a single system. In terms of irradiating the sample, a collimated beam is advantageous for accurate measurement of SAXS. On the other hand, XRR can advantageously use a converging beam with a large convergence angle and thus measure the reflectance simultaneously over a range of angles. In the embodiment disclosed in US Pat. No. 6,895,075, the X-ray inspection apparatus includes a radiation source configured to irradiate a small area on the sample surface. X-ray optics control the irradiation beam to adjust the angular width and height of the beam appropriate for XRR or SAXS.

On the detection side, SAXS generally observes scattering within the sample surface as a function of azimuth, while XRR is based on measuring reflected X-rays perpendicular to the surface as a function of elevation. In the embodiment disclosed in US Pat. No. 6,895,075, the detection assembly comprises an array of detector elements positioned to receive reflected or scattered radiation from the emitted area. This arrangement has two operational configurations: an operating configuration in which the array element decomposes the emitted light along an axis perpendicular to the sample plane, and an operating configuration in which the array element decomposes the emission light along an axis parallel to the sample plane. The appropriate configuration is selected electronically or mechanically for the type of measurement to be performed.

X-ray diffraction analysis (XRD) is a well-known technique for studying the crystal structure of a sample. In XRD, the sample is irradiated with monochromatic X-rays and the position and intensity of the diffraction peaks are measured. The characteristic scattering angle and the intensity of the scattered light depend on the lattice plane of the sample under study and the atoms that occupy that lattice plane. Diffraction peaks when the X-rays enter the lattice plane at an angle θ satisfying Bragg condition: nλ = 2dsinθ with respect to the predetermined wavelength λ and the spacing d of the lattice plane (where n is the scattering order) Is observed. The angle θ that satisfies the Bragg condition is known as the Bragg angle. Variations in the grating plane due to stress, solid solution, or other effects result in changes in the observable XRD spectrum.

XRD was used in particular to characterize the crystal layers formed on semiconductor wafers. For example, Bowen et al., "X-Ray metrology by Diffraction and Reflectivity," Characterization and Metrology for ULSI Technology, 2000 International Conference (American Physics Society, 2001), describe a method for measuring the concentration of germanium in SiGe structures using high resolution XRD. It is describing.

XRD can also be used to observe the structure on the sample surface at grazing incidence. See, eg, "Grazing Incidence In-plane Diffraction Measurement of In-plane Mosaic with Microfocus X-ray Tubes," by Goorsky et al., Crystal Research and Technology 37: 7 (200), pp. 645-653. It describes the use of grazing incidence XRD to analyze. The authors apply this technique to determine the in-plane lattice constant and lattice orientation of very thin surfaces and embedded semiconductor layers.

In the context of the present patent application and claims, the terms “scatter” and “scatter” are used to refer to any and all processes that cause X-rays to be emitted from a sample by irradiating the sample with X-rays. Thus, in this context, "scattering" includes scattering phenomena in XRR, XRD and SAXS as well as scattering phenomena in the prior art such as X-ray fluorescence. On the other hand, the abbreviation "incineration X-ray scattering method," the specific term, SAXS refers to the specific phenomenon of grazing incidence scattering on the sample surface as described above.

An object of the present invention is directed to a radiation source adapted to direct a first, converging beam of X-rays toward a surface of a sample and a second, collimated beam of X-rays toward a surface of a sample; The radiation source between a first source location where X-rays are directed at a grazing angle from the radiation source towards the surface of the sample and a second source location where X-rays are directed near the Bragg angle of the sample from the radiation source toward the surface of the sample A motion assembly operative to move the movement; Detect the scattered X-rays from the sample as a function of angle while the radiation source is in either of the first and second configurations and at either of the first and second source locations A detector assembly arranged to generate an output signal in response; And a signal processor coupled to receive and process an output signal to determine a characteristic of the sample.

U.S. Patent Application No. 10 / 946,426 described above describes a system for analysis of samples based on high speed XRR- and XRD-. The radiation source directs the converging beam of X-rays towards the surface of the sample, such as a semiconductor wafer. The detector array simultaneously detects X-rays scattered from the sample as a function of the elevation angle in the range of elevation angles. The system has XRR and XRD configurations. In an XRR configuration, the radiation source and detector array are positioned so that the array senses X-rays reflected from the surface of the sample at grazing angles. In an XRD configuration, the radiation source and detector array are positioned so that the array senses X-rays diffracted from the surface in the vicinity of the Bragg angle of the sample. Motion assemblies may be provided to move the radiation source and detector array between XRR and XRD configurations.

Some embodiments of the present invention also take a system where one step is further combined to provide SAXS measurement capability. For this purpose, the X-ray optics associated with the radiation source are configurable to generate either a converging beam or a collimated beam. The converging beam is used for XRR and high resolution XRD measurements by a detector array arranged to resolve scattered radiation along an axis perpendicular to the plane of the sample. The collimated beam can be used to perform high speed low resolution XRD measurements as well as SAXS measurements. For the purpose of SAXS, the detector array is arranged to resolve scattered radiation along an axis parallel to the sample plane.

Additionally or alternatively, the system is configurable to perform grazing-incident XRD measurements too.

Thus, a single X-ray source can be used to perform a plurality of different (and complementary) X-ray scattering measurements on a given sample. This combined ability is particularly useful for X-ray metrology of thin films to determine the density, thickness, crystal structure, porosity and other properties of the thin film layer. Alternatively or additionally, the principles of the present invention can be applied to other fields of X-ray analysis and metrology. Alternatively, the aspects of the embodiments described below can be used in systems dedicated to only one type of scattering measurement, such as SAXS, without necessarily providing multifunctional capabilities.

Thus, according to one embodiment of the present invention,

A radiation source adapted to direct a first, converging beam of X-rays towards the surface of the sample and to direct a second, collimated beam of X-rays towards the surface of the sample;

The radiation source between a first source location where X-rays are directed at a grazing angle from the radiation source towards the surface of the sample and a second source location where X-rays are directed near the Bragg angle of the sample from the radiation source toward the surface of the sample A motion assembly operative to move the movement;

Detect the scattered X-rays from the sample as a function of angle while the radiation source is in either of the first and second configurations and at either of the first and second source locations A detector assembly arranged to generate an output signal in response; And

An apparatus is provided for analyzing a sample comprising; a signal processor coupled to receive and process an output signal to determine a characteristic of the sample.

In the disclosed embodiment, the radiation source comprises an X-ray tube operative to emit X-rays; A first mirror arranged to receive X-rays and focus into a converging beam; And a second mirror arranged to receive X-rays and focus into a collimated beam. Usually, the first mirror and the second mirror comprise a double curved structure.

In some embodiments, the motion assembly comprises a first detector elevation in which the detection assembly detects X-rays scattered from the sample at a grazing angle and a second detector in which the detector assembly senses X-rays scattered from the surface near the Bragg angle. Operate to move the detector assembly between elevations. The motion assembly comprises a first detector elevation between a first azimuth angle at which the detector assembly detects incineration scattering of X-rays and a second high azimuth angle at which the detector assembly detects X-rays diffracted from the in-plane structure on the surface of the sample. And move the detector assembly.

In the disclosed embodiment, the detector assembly comprises a first detector configuration for resolving scattered X-rays along a first axis perpendicular to the surface of the sample and a second detector for resolving scattered X-rays along a second axis parallel to the surface It includes a detector array having a configuration. Typically, the signal processor processes the output signal from the detector assembly of the first detector configuration to determine the reflection angle of the surface as a function of the elevation angle to the surface, and determines the scattering profile of the surface as a function of the azimuth angle in the plane of the surface. A two detector configuration is adapted to process the output signal from the detector assembly.

In some embodiments, the signal processor processes the output signal from the detector assembly while the radiation source emits the first beam and is at the first source location to obtain an X-ray reflection (XRR) spectrum of the surface, Output signals from the detector assembly while the radiation source emits a second beam and is within the first source location to obtain at least one of an incineration X-ray scattering (SAXS) spectrum and a grazing-incident X-ray diffraction (XRD) spectrum And to process the output signal from the detector assembly while the radiation source is at the second source location to obtain a high angle XRD spectrum of the surface.

In one embodiment, the signal processor acquires a high resolution XRD spectrum while the radiation source is at the second source position and emits the first beam and low resolution while the radiation source is at the second source position and emits the second beam. It is applied to acquire the XRD spectrum. Usually, the motion sensor locates the detector assembly at a first distance from the surface of the sample for acquisition of a high resolution XRD spectrum, and moves the detector assembly at a second distance from the surface, which is shorter than the first distance for acquisition of a low resolution XRD spectrum. Applied to position.

Additionally or alternatively, when the sample comprises at least one surface layer, the signal processor may be arranged to analyze two or more of the XRR, SAXS, and XRD spectra together to determine the properties of the at least one surface layer. Usually, such properties include at least one of thickness, density, surface quality, porosity, and crystal structure.

In the disclosed embodiment, the apparatus includes a knife edge arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and to block a portion of the beam that does not pass through the gap. . The apparatus includes a beam block arranged to block X-rays that pass through the gap and continue to propagate along the beam axis, without blocking scattered X-rays within the angular range of interest.

According to one embodiment of the invention,

A radiation source operative to direct a collimated beam of X-rays along the beam axis towards a selected area of the sample at a grazing angle, such that a portion of the X-rays are scattered from the area in the azimuth range;

A knife edge arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and block a portion of the beam that does not pass through the gap;

A beam block arranged to block the X-rays passing through the gap and subsequently propagating along the beam axis, without blocking the scattered X-rays in at least a portion of the azimuth range;

A detector assembly arranged to sense scattered X-rays as a function of azimuth and to generate an output signal in response to the scattered X-rays; And

A signal processor coupled to receive and process an output signal to determine a characteristic of a sample is provided.

In the disclosed embodiment, the device comprises at least one slit perpendicular to the surface of the sample located between the radiation source and the knife edge to pass at least a portion of the collimated beam while blocking the scattered X-rays. The at least one slit includes a first slit positioned proximate the radiation source and a second slit positioned adjacent the knife edge.

Alternatively or additionally, the detector assembly comprises an array of detector elements having an array length; And an evacuable enclosure having a front side and a rear side separated by at least a distance equal to the length of the array, wherein the array is located at the rear side of the enclosure, the enclosure being radiated to strike the array. Includes a window adapted to pass through at the front side of the enclosure.

Further, according to one embodiment of the present invention,

A radiation source operative to direct a beam of X-rays toward a selected region of the sample, such that a portion of the X-ray is scattered from the region;

A knife edge comprising a cylinder of X-ray absorbers arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the cylinder and block a portion of the beam that does not pass through the gap;

A detector assembly arranged to sense scattered X-rays as a function of angle and generate an output signal in response to the scattered X-rays; And

An apparatus is provided for analyzing a sample comprising; a signal processor coupled to receive and process an output signal to determine a characteristic of the sample.

In the disclosed embodiment, the cylinder of X-ray absorber comprises a metal wire.

According to one embodiment of the invention,

A mounting assembly for receiving and adjusting the orientation of the sample during analysis;

A radiation source operative to direct a collimated beam of X-rays toward a selected area on the surface of the sample on the mounting assembly such that a portion of the X-ray is scattered from the area in the azimuth range;

A detector assembly arranged to sense scattered X-rays as a function of azimuth and to generate an output signal in response to the scattered X-rays; And

A signal processor adapted to receive a tilt map indicative of a characteristic tilt angle of the surface, determine a tilt angle of the selected area based on the tilt map, and allow the mounting assembly to adjust the orientation of the sample in response to the estimated tilt angle A signal processor coupled to receive and process an output signal after adjustment of orientation to determine a characteristic of a sample is provided.

Typically, the radiation source is adapted to direct the X-ray converging beam towards each of a plurality of locations on the surface, and the detector assembly is adapted to sense the X-ray reflected from the surface as a function of the elevation angle to the surface. The signal processor is adapted to measure the X-ray reflection (XRR) spectrum of each location in response to the reflected X-rays and determine the tilt angle at each location based on the XRR spectrum.

According to one embodiment of the invention,

Directing the first converging beam of X-rays towards the surface of the sample and operating the radiation source to direct a second collimated beam of X-rays towards the surface of the sample;

Moving the radiation source between a first source location where the X-rays are directed from the radiation source towards the surface of the sample at a grazing angle and a second source location directed from the radiation source towards the surface of the sample near the Bragg angle of the sample; ; And

Detecting X-rays scattered from the sample as a function of angle while the radiation source is in the first and second source configurations to determine the properties of the sample and is at the first and second source locations; A method for analyzing is provided.

Further, according to one embodiment of the present invention,

Directing the collimated beam of X-rays along the beam axis toward the selected area of the sample at a grazing angle such that a portion of the X-rays are scattered from the selected area in the range of the azimuth angle;

Positioning the knife edge adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and to block a portion of the beam that does not pass through the gap;

Positioning the beam block arranged to block the X-rays passing through the gap and subsequently propagating along the beam axis, without blocking the scattered X-rays in at least a portion of the azimuth range; And

Sensing the scattered X-rays as a function of azimuth to determine the properties of the sample; a method for analyzing a sample is provided.

Further, according to one embodiment of the present invention,

Directing a beam of X-rays toward the selected area such that a portion of the X-ray is scattered from the selected area of the sample;

Positioning a cylinder of X-ray absorber adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the cylinder and block a portion of the beam that does not pass through the gap; And

There is provided a method for analyzing a sample comprising; detecting the scattered X-rays as a function of angle to determine the characteristics of the sample.

Further, according to one embodiment of the present invention,

Generating a tilt map of the sample;

Directing the collimated beam of X-rays along the beam axis toward the selected area of the sample at a grazing angle such that a portion of the X-rays are scattered from the selected area of the sample in the range of the azimuth angle;

Determining a tilt angle of the selected area based on the tilt map;

Adjusting the orientation of the sample to compensate for the tilt angle; And

Sensing scattered X-rays as a function of azimuth after adjusting the orientation to determine a characteristic of the sample; a method for analyzing a sample is provided. The invention can be better understood by reading the detailed description of the invention and the accompanying drawings.

Example  details

1 is a schematic side view of a system 20 for measurement and analysis of X-rays scattering from a sample 22, in accordance with an embodiment of the present invention. System 20 may perform X-ray reflectometry (XRR), small angle X-ray scattering (SAXS) and X-ray diffraction (XRD) in high-resolution and low-resolution modes. Sample 22 is mounted on a mounting assembly, such as moving stage 24, which allows for precise adjustment of the position and orientation of the sample. X-ray source 26 illuminates small area 50 on sample 22. X-rays scattered from the sample are collected by the detector assembly 32.

Source motion assembly 28 moves source 26 between an upper source position and a lower source position for different types of measurements, as described below. Similarly, detector motion assembly 34 moves detector assembly 32 between an upper detector position and a lower detector position. Lower positions of the source assembly and detector assembly are typically used for XRR, SAXS, and optionally Grazing-incident XRD (GIXRD), while their upper positions are used for high-angle XRD, as described below. do. For GIXRD, the detector assembly is also shifted transversely, as described below and shown in FIG. 2.

In the embodiment shown in FIG. 1, the motion assembly comprises curved tracks 30 and 36, along which the source assembly 26 and the detector assembly 32 are translated, respectively, while the source assembly and The detector assembly is kept at a distance from the area 50. Alternatively or in addition, the detector motion assembly 34 can change the distance between the detector assembly and the area 50, thereby changing the angle resolution and effective capture angle for detection. The source motion assembly can also make this kind of axial movement (ie, movement along the axis of the X-ray beam, in addition to the transverse vertical movement provided by the tracks 30 and 36). Additionally or alternatively, the detector motion assembly may rotate and / or shift the detector assembly in a horizontal direction as described below.

Curved tracks 30 and 36 are just one example of a motion assembly that can be used in system 20, and other suitable types of motion assemblies for this purpose will be apparent to those skilled in the art. For example, an X-ray source and detector assembly may be mounted to each plate, which may be inclined, raised or lowered to be in the position shown in FIG. 1. All such types of motion assemblies are considered to be within the scope of the present invention. When the term "motion assembly" is used in this patent application and is used in the claims without further further detail, it should refer to either or both of the source and detector motion assemblies, depending on the context in which the term is used.

Alternatively, a plurality of X-ray sources and / or a plurality of detector assemblies can be used for XRR and XRD measurements. In this case, a motion assembly may not be needed. Alternatively, a single X-ray tube can be shifted between the lower position and the upper position, while each position has stationary optics.

The X-ray source 26 is configured to produce either a collimated beam or a converging X-ray beam, as described below with reference to FIG. 3. FIG. 1 shows the converging-beam configuration used for XRR and high-resolution XRD measurements, while FIG. 2 shows SAXS, GIXRD and conventional XRD measurements (here high-resolution XRD mode using collimated beams). And collimating-beams used for " low-resolution " XRD). In the context of this patent application and claims, the beam is considered "collimated" if its divergence (full angular width-FWHM at half maximum power) is less than 0.5 °. This collimation angle is sufficient for the type of SAXS and low-resolution XRD measurements made in system 20, although good collimation (e.g., divergence of 0.3 °) generally results in good results.

The table below summarizes the alternative configurations of the system 20.

Table 1-Configuration Options

System measurement
 Configuration Source and
Detector  location Incident beam
 Configuration  XRR  Low angle  Converging  High Resolution XRD  High angle  Converging  SAXS  Low angle  Collimated  Low Resolution XRD  High angle  Collimated  GIXRD  Low angle  Collimated

Looking now at the details of the system 20, the X-ray source 26 typically includes an X-ray tube 38, mounted on the source mounting assembly 40. The tube 38 typically has a small radiating area so that accurate focusing can be done on the surface of the sample 22. For example, tube 38 includes an XTF5011 X-ray tube, manufactured by Oxford Instruments (Scotts Valley, California). Typical X-ray energy for reflectometry and scattering measurements in system 20 is about 8.05 keV (CuKal). Alternatively, other energy may be used, such as 5.4 keV (CrKal).

In the XRR configuration shown in FIG. 1, the focusing optics 42 focus the beam emitted by the tube 38 into a converging beam 44 that converges to focus in the region 50. Typically, optics 42 comprise double-curved crystals, which monochromatizes beam 44. Optical systems that can be used in the system 20 for this purpose are described, for example, in US Pat. No. 6,381,303, which is incorporated herein by reference. The optics may include curved crystal monochromators such as Doubly-Bent Focusing Crystal Optics produced by XOS Inc. of Albany, NY. Other suitable optics are described in US Pat. Nos. 5,619,548 and 5,923,720, above. The double-curved focusing decision causes the beam 44 to converge in both the horizontal and vertical directions to properly focus at one point in the area 50. Alternatively, cylindrical optics can be used to focus the beam 34 such that the beam converges to one line on the sample surface. Other possible optical configurations will be apparent to those skilled in the art.

)의 함수로 수직 방향으로의 각도 범위에 걸쳐 반사된 X-레이의 발산 빔(52)을 수집한다. 이러한 범위는 전 외부 반사(Φc)에 대하여 샘플의 임계각 아래와 위 둘다의 각을 포함한다. 예시의 명확성을 위하여, XRR 구성에 있어서 샘플(22)의 평면 위 검출기 어셈블리(38)와 소스(26)의 엘리베이션처럼, 도면에 도시된 각도 범위는 과장되어 있다. 이러한 도면과 그에 따르는 설명에서의 편의와 명확성을 위해, 샘플 평면은 임의로 X-Y 평면이도록 취해지는데, Y축은 샘플 표면상으로의 X-선 빔 축의 투영과 평행하다. Z축은 샘플 평면에 직교하여 수직 방향으로 있다.For XRR measurements, the converging beam 44 impinges on the region 50 typically at a grazing angle over a range of incidence angles of approximately 0 ° to 4.5 °, although larger or smaller ranges may be used. In this configuration, the detector assembly 32 has an elevation angle between approximately 0 ° and at least 2 °, typically up to 3 °.

Collect divergent beams 52 of reflected X-rays over an angular range in the vertical direction as a function of This range includes both below and above the critical angle of the sample with respect to the total external reflection [phi] c. For clarity of illustration, the angular range shown in the figures is exaggerated, such as elevation of the detector assembly 38 and the source 26 on the plane of the sample 22 in the XRR configuration. For convenience and clarity in this figure and the accompanying description, the sample plane is optionally taken to be the XY plane, with the Y axis parallel to the projection of the X-ray beam axis onto the sample surface. The Z axis is perpendicular to the sample plane.

The dynamic knife edge 48 and the shutter 46 can be used to limit the angular limit of the incident beam 44 of the X-ray in the vertical direction, ie, orthogonal to the plane of the sample 22. These beam-limiting optics in the XRR configuration are described in US Pat. No. 6,512,814, above. In addition, knife edges 48, together with beam blocks and beam-limiting slits (shown in FIG. 4 but omitted in FIG. 1 for simplicity), are used to reduce background scattering in SAXS configurations. The height of the knife edge and shutter relative to the sample surface is adjustable depending on the type of measurement performed and the range of measurement angles of interest.

Detector assembly 32 includes a detector array 54, such as a CCD array. Although only one row of detector elements with a relatively small number of detector elements is shown in the figure for simplicity of illustration, generally array 54 is a large number of arrays arranged in a linear array or a matrix (two-dimensional) array. Contains an element. Other forms of detector assembly 32 and array 54 are described below with reference to FIG. 4.

Signal processor 56 receives and analyzes the output of detector assembly 32 to determine the distribution 58 of the flux of X-ray photons scattered from sample 22 as a function of angle over a range of energies or at a given energy. Is determined. Typically, the sample 22 has one or more thin surface layers, such as thin films, in the region 50 and the distribution 58 as a function of angle is characterized by interference, diffraction and / or other scattering effects due to the interface and surface layers between the layers. The structure made into is shown. The processor 56 analyzes the properties of the angular distribution to determine the properties of one or more of the surface layers of the sample, such as layer thickness, density, porosity, composition, and surface quality, using the assays described in the patents and patent applications. do. The processor 56 or other computer may serve as a system controller to set and adjust the location and configuration of other system components.

The high resolution XRD configuration of the system 20 is particularly useful for evaluating the properties of the monocrystalline film on the sample 22. As noted in the table above, in this configuration, both the source 26 and the detector assembly 32 are shifted at a relatively high angle near the Bragg angle of the sample 22. The source 26 irradiates the area 50 with the converging beam 60 near the Bragg angle, and the detector assembly 32 receives the diverging beam 62 over an angular range near the Bragg angle. For this example, it is assumed that the grating plane producing the diffraction pattern is approximately parallel to the surface of the sample 22, so that the incident and takeoff angles defined by the beams 60 and 62 relative to the surface are both equal to the Bragg angle. do. This assumption is usually true for semiconductor substrates such as silicon wafers and monocrystalline thin film layers grown on such substrates. Alternatively, source 26 and detector assembly 32 may be positioned at different incidence and takeoff angles to measure diffraction from a grating plane that is not parallel to the surface of sample 22.

2 is a schematic top view of a system 20 according to an embodiment of the present invention. This figure shows the X-rays from the tube 38 impinging on both the collimated optics 72 and the focusing optics 42 (omitted in FIG. 1 for clarity of example). The source mounting assembly 40 positions the tube 38 such that the beam from the tube impinges the optics 42 at an appropriate angle to cause the beam 44 to converge on the area 50. In addition, the beam from the X-ray tube 38 strikes the collimated optics 72 at an appropriate angle, generating a collimated beam 74 that likewise impinges on the area 50. Optics 72 may include, for example, a double-curved mirror with a multiplayer coating that reflects radiation at 8 keV to produce a beam having a divergence less than 0.3 ° and a spot size less than 100 μm. do. Optical systems of this kind are available from various manufacturers, such as Applied X-ray Optics (AXO, Dresden, Germany). This optical system also monochromatizes the X-ray beam. For the focusing and collimating optics of the type described above, the X-ray tube and the optics are directed to the optics 72 at an angle of approximately 14 ° and the X-rays from the tube at an angle of approximately 14 °. Typically positioned to collide.

As a result of the optical arrangement of the X-ray tube 38 and the optics 42 and 72, the converging beam 44 and the collimated beam 74 are offset in azimuth, ie the beam axis is not collinear. The aperture generated by the apertures of the optics 42 and 72 and the X-ray tube 38 can be wide enough so that the beams collide simultaneously with both optics 42 and 72 without moving the tube or optics. Alternatively, if narrower beams and / or narrower apertures are used, the X-ray tube can be translated vertically between the XRR and SAXS positions. In any case, only one of the beams 44 and 74 is typically used for the measurement at any given time. Thus, the movable source beam block 75 may be arranged to block a portion of the beam from the X-ray tube such that only one of the beams 44 and 74 impinges on the sample 22. Alternatively, in some applications, two beams may be generated simultaneously. Because of the azimuth offset, the diverging beam 52 generated in the XRR mode is offset in the X-direction from the scattered beam 70 generated in the SAXS mode. To compensate for this offset, the detector assembly 32 can be shifted in the X-direction depending on the mode of operation of the system 20. Alternatively, the detector assembly may include two detector arrays each positioned and oriented to capture the beams 52 and 70.

With the source and detector assemblies at their high angular positions and the source assemblies in a collimated beam configuration, the system 20 is well suited for low resolution XRD measurements. This kind of measurement is particularly useful in evaluating the phases and textures of polycrystallin structures such as polycrystals of metal films on semiconductor wafers. Because of the uncontrolled orientation of these crystals, the XRD patterns they produce are characterized by deby rings. This phenomenon is described, for example, by Kozaczek et al. At "X-ray Diffraction Metrology for 200 mm Process Qualification and Stability Assessment," Advanced Metallization Conference (Montreal, Canada, October 8-11, 2001), which is incorporated herein by reference. It is explained.

In this case, the angle range in which the XRD pattern extends is typically about 10-20 °. To cover this range, it may be desirable to advance the detector assembly 32 closer to the area 50 on the sample 22 so that the detector array 54 covers a relatively larger range than in a high resolution configuration. . In addition, moving the array closer to the sample degrades the angular resolution, but a resolution of approximately 0.3 ° is sufficient to distinguish between polycrystal phases. For this purpose, the optical system 72 is preferably selected and adjusted such that the beam 74 has divergence not greater than approximately 0.3 degrees.

For SAXS, source assembly 26 and detector assembly 32 are arranged at their lower positions. Optionally, for SAXS, the source motion assembly 28 is somewhat closer to the XY plane than for the XRR, such that the collimated beam 74 impinges on the region 50 at a moderately low grazing angle. It is operated to lower. Alternatively, optics 72 may be held by assembly 40 at a lower elevation than optics 42 such that beam 74 is emitted from assembly 26 along a lower beam axis than beams 44. have. The orientation of the detector array 54 can be rotated relative to SAXS, as described below, to collect and resolve scattered X-rays over an angular range in the horizontal (azimuth angle -θ) direction. Typically, the scatter spectrum is measured over a range between approximately 0 ° and 3 °. In order to improve the angular resolution in SAXS, the detector assembly 32 is generally kept relatively far from the area 50.

For GIXRD, source assembly 26 is approximately positioned as for SAXS. However, the detector assembly 32 is typically shifted laterally by the detector motion assembly, in the plane of the sample 22, at a higher azimuth to capture the diffracted beam 75. The azimuth angle of diffracted beam 75 relative to incident collimated beam 74 is determined by the Bragg angle of the in-plane structure on the sample surface responsible for diffraction. Stage 24 (FIG. 1) may be configured to rotate sample 22 within the X-Y plane to align the in-plane grating with respect to the incident beam angle.

3A and 3B are schematic front views of detector array 54 of the first and second operating configurations, respectively, in accordance with one embodiment of the present invention. The first configuration shown in FIG. 3A is used for XRR and elevation XRD, and the second configuration shown in FIG. 3B is used for SAXS and GIXRD measurements. In this figure, the array 54 is shown as having a single array of detector elements 76 with array axes that can be aligned to resolve incident radiation along one of two axes: sample 22 for XRR and high angle XRD. Z axis perpendicular to the plane of the plane or X axis parallel to the sample plane for SAXS and GIXRD.

Detector elements 76 have a high aspect ratio, that is, their width in the transverse direction of the array axis is substantially greater than the pitch along the axis. The high aspect ratio is useful for improving the signal / noise ratio of the system 20 because the array 54 can collect X-ray photons over a relatively large area for each angular increment along the array axis. The size of element 76 is shown by way of example only in the drawings, and the principles of the present invention may be applied using elements of smaller or larger aspect ratios depending on the applicability and application needs of a suitable detector device.

Detector array 54 may be configured as a linear array or a matrix array. In the latter case, the array will operate in line-binning mode so that multiple detector elements in each column of the array can function efficiently as a single element with a high aspect ratio. In this case, although the array 54 physically comprises detector elements of a two-dimensional matrix, functionally, the array depends on the direction of binning and thus takes the form of a single line of detector elements as shown in FIGS. 4A and 4B. Take it. Alternatively, array 54 may comprise an array of PIN diodes with appropriate readout circuitry, including integrated processing electronics, as disclosed in US Pat. No. 6,389,102, which is incorporated herein by reference. Details of the types of arrays of detectors that may be used in system 20 and the application of such arrays for use in XRR and SAXS are disclosed in the aforementioned US Pat. No. 6,895,075.

Detector motion assembly 34 may be configured to mechanically rotate detector assembly 32 between the directions of FIGS. 3A and 3B. Alternatively, detector assembly 32 may itself include an array motion device (not shown) for rotating detector array 54 between the directions of FIGS. 3A and 3B. In either case, such hardware rotates the array 90 ° between the vertical and horizontal axes depending on the type being measured. If the point of rotation is near the center of the array 54, it will also be necessary to move the array downwards (close to the plane of sample 22) for SAXS measurements and upwards for XRR. Alternatively, the point of rotation can be fixed near the plane of the sample, eliminating the need for vertical movement of the array. Typically, in a SAXS configuration, the array 54 does not concentrate on the axis of the incident beam 74. Since SAXS is generally symmetrical about the incident beam axis, there is no substantial loss of information, and the angular range of scattering measurements can be increased by positioning the array 54 to measure the scattered radiation on one side of the axis rather than on both sides. will be.

4 is a schematic top view of a system 20 showing details of the system configuration used to measure SAXS, according to one embodiment of the invention. Since the SAXS signal is generally weak, the system 20 uses Novell beam-controlled optics to reduce background scattering that can cause pseudo X-rays to the detector array 54 and obscure the actual SAXS signal. More specifically, as shown in this figure, the system includes an anti-scattering slit 80 and an anti-diffraction slit 82 as well as a knife edge 48 and a beam block 84. The purpose of each of these components will be described later.

The collimated optics 72 have an exit aperture, labeled "A" in FIG. 4, where the X-rays are diffracted and / or scattered by the detector array 54. (For example, in the case of the Xenocs mirror described above, the exit aperture is 1.2 x 1.2 mm and the collimated output beam has a divergence angle of about 0.3 °. The center of aperture A is near the sample plane. And typically less than about 1 mm.) Slit 82 prevents radiation scattered from the aperture from directing to the detector array 54 or reaching the sample 22 to be reflected back into the detector array. In a preferred embodiment, the slit 84 is about 0.4 mm wide and is disposed near (typically <20 mm) above the sample 22 in front of the knife edge 48. For better results, the bottom of the slit 82 is disposed as close as possible to the surface of the sample and is typically about 80 μm or less above the surface.

The slit 80 is disposed close to the exit aperture of the optical system 72 and blocks the X-rays diffracted from this aperture. In a preferred embodiment, the slit 80 is about 1 mm wide and is located about 10 mm or less from the opening A, about 160 mm from the focal region 50. The slit 80 typically extends above and below the plane of the sample 22.

The knife edge 48 is located near the sample 22. The knife edge is scattered from the aperture of the optical system 72 as well as from the slit 80, 82 itself or from radiation scattered from air molecules between the optical system 72 and the region 50, but by the slit 82 Prevent unblocked radiation. One configuration of the knife edge is described below with reference to FIG. 5.

X-rays properly collimated from the optics 72 pass under the slits 80, 82 and the knife edges 48 and reach the region 50 on the sample 22. Most incident X-rays either specularly reflect from the sample along the Y axis or pass directly below the knife edge 48 without reflection. These X-rays are then scattered from the air molecules and, as a result, reach the detector array 54 at various angles. In order to reduce this undesirable scattering, the beam block 84 is located close behind the knife edge 48 and over the sample 22. In a preferred embodiment, the beam block is located behind the about 30 mm knife edge and less than about 70 μm on the surface of the sample. The beam block is located off center, as shown, and extends near (eg, about 250 μm) across the beam axis to prevent direct and specularly reflected beams. As a result, detector array 54 receives substantially the entire flux of X-rays scattered from region 50 horizontally away from the Y axis, while most parasitic scattering from air molecules is blocked.

For better isolation from parasitic scattering, the detector assembly 32 may include a window 86 made of a suitable X-ray transmissive material, such as beryllium, in front of the detector array 54. The window forms an empty enclosure 88 close to the detector array 54. Typically, the distance from the array 54 to the window 86 is at least equal to the length of the array (measured along the array axis, ie, in the X direction in FIG. 3B), and is two to three times, or greater than, the length of the array. Can be. The enclosure is emptied during operation. Along the window away from the array, removal of air from the area immediately before the detector array is useful to reduce parasitic scattering of X-rays in the vicinity of the array. More details on this kind of window structure are disclosed in the above-mentioned US Pat. No. 6,512,814.

5 is a detailed diagram of a knife edge 48 in accordance with one embodiment of the present invention. In this embodiment, the lower edge of the knife, close to the surface of the sample 22, consists of a cylindrical X-ray absorber such as a metal wire 90. For example, for an X-ray beam with photon energy of 8 keV, wire 90 may comprise tantalum wire having a diameter of 200 μm. This arrangement allows the lower edge of the knife to be positioned very close to the surface of the sample by about 3 μm above the surface without fear of damaging the sample.

The wire 90 can be precisely aligned to the surface, thus providing a small gap whose effective height is typically over 0-4 ° over the entire angular range of interest. This alignment does not change with the rotation of the wire about the axis, unlike when a flat-edge knife is used. Generally speaking, the size and uniformity of the gap between the knife edge and the surface define the size and uniformity of the X-ray focus on the surface. The small uniform gap provided by the wire 90 thus improves the spatial resolution and angular accuracy of the scattering measurements measured in the system 20. Based on this embodiment, the term "knife edge" in the specification and claims of the present invention refers to any type of straight line located near the surface of the sample to form this kind of gap and to block X-rays outside of this gap. It will be understood that it points to an edge (not necessarily very sharp).

6 is a flow diagram that schematically illustrates a method of performing SAXS measurements in system 20 in accordance with an embodiment of the present invention. The intensity of the SAXS signal strongly depends on the average angle of incidence of the beam 74 (FIG. 4) on the surface of the region 50. That is, the angle of incidence is directly affected by the sample tilt. In a typical SAXS application, the beam 74 is intended to impinge about 0.4 ° on the surface of the sample. If the SAXS measurement is made at different points on the surface of the sample 22, the tilt will change by ± 0.1 °, such as the angle of incidence will vary between 0.3 ° and 0.5 ° on the surface. This angular change will cause a large spurious change in the strength of the SAXS spectra measured at different points.

For example, in an application of a typical system 20, the sample 22 is a semiconductor wafer, which is held on the stage 24 by a suction force acting through a vacuum port (not shown) at the surface of the stage. Under these circumstances, the wafer will match the shape of the stage with deformation due to attraction forces. As a result, the local tilt angle of the wafer will be different for each point on the wafer surface.

The method of FIG. 6 presents a solution to the problem of sample tilt in SAXS by using the XRR measurement capability of system 20. For this purpose, the system 20 is operated in XRR mode to map the tilt of the sample 22 in the tilt mapping step 100. An exemplary method of tilt mapping that can be used for this purpose is described in US patent application Ser. No. 11 / 000,044, which is assigned to the assignee of this patent application and the disclosures of which are incorporated herein by reference. To make the map, the surface of the sample is divided into regions, and the surface tilt is measured for each zone to yield a tilt value. (The map can be made using the SAXS sample itself or using a reference sample such as a bare silicon wafer or the like.) Any suitable method can be used to determine the surface tilt. Exemplary methods for measuring tilt using XRR are described in the aforementioned U.S. Patent Nos. 6,895,075 as well as in U.S. Patent Application Publication Nos. 2004/0109531 A1 and 2004/0131151 A1, the disclosures of which are described herein. Reference is made. Additionally or alternatively, optical methods may be used for tilt measurement, such as described in US Pat. No. 6,643,354, the disclosure of which is hereby incorporated by reference. The tilt map is stored by the system controller (role that can be fulfilled by the processor 56 as mentioned above).

After the tilt map is generated, the source assembly 26 and detector assembly 32 are set up for SAXS measurements in the mode setting step 102 as described above. The stage 24 then operates to move the sample 22 such that the X-ray beam 74 impinges on the predetermined test site in the site selection step 104. Typically, multiple sites on sample 22 are preselected for this purpose, and stage 24 moves the sample so that each site is located in area 50 in turn. In the tilt determination step 106, the system controller finds the stored tilt value for this site on the tilt map. Alternatively, if there is no stored tilt value for this exact site, the system controller may find the tilt value of the neighboring point on the tilt map and obtain an approximate tilt value of the test site by interpolation. If the XRR and SAXS beam axes are mutually offset, rotation transformation may be applied to the tilt value to account for the angular offset on the X-Y plane, as shown in FIG.

The system controller may then instruct the stage 24 to adjust the orientation angle of the sample 22 to compensate for the tilt at the current test site, in the tilt correction step 108. In other words, if it was found from the tilt map that the current test site was tilted + 0.1 ° with respect to the X axis, stage 24 would apply a tilt of -0.1 °. Alternatively, the X-ray beam axis of the source assembly 26 can be adjusted to compensate for sample tilt. Once the tilt is properly adjusted, the source and detector assembly is activated, and at data collection step 110, the processor 56 collects and analyzes the SAXS spectrum of the test site. This process is then repeated for the remaining test sites.

Although the embodiments described above deal primarily with determining the surface layer properties of a semiconductor wafer, the principles of the present invention are not only used for radiation-based analysis, but also for X-ray based analysis, using other ionizing radiation bands as well as X-rays. Similar applications can be used for other applications. Moreover, the system 20 can be modified to combine with other methods of radiation-based analysis, such as X-ray fluorescence measurements, eg, as disclosed in US Pat. No. 6,381,303, the disclosure of which is incorporated herein by reference. have. Alternatively or additionally, system 20 is described in US patent application Ser. No. 10 / 902,177, filed on July 30, 2004, assigned to the assignee of this patent application and whose disclosure is referenced herein. As may be configured, it may be configured to perform a diffuse XRR measurement.

Moreover, while features of the present invention have been described with respect to a system 20 that combines a number of different modes of X-ray analysis, some of these features can alternatively be described, for example, by SAXS, XRD (high angle and grazing incidence ( grazing incidence) and / or XRR, etc. may be implemented in a system that provides only one or two modes of operation.

The principles of the present invention can also be applied to measurement systems and tools for use in a manufacturing environment. For example, in an alternative embodiment of the invention (not shown in the figures), the components of system 20 are integrally integrated with a semiconductor wafer fabrication tool to provide in situ inspection. Typically, as is known in the art, fabrication tools include a vacuum chamber that includes a deposition apparatus for forming a thin film on a wafer. The chamber includes, for example, an X-ray window as described in US Patent Publication 2001/0043668 A1, the disclosure of which is incorporated herein by reference. X-ray source assembly 26 may irradiate region 50 on the wafer through one of the windows, with detector assembly 32 scattered in one or more of an XRR, XRD, or SAXS configuration as described above. Receive the line through another window. In another alternative embodiment, system 20 may be configured as a station in a cluster tool along with other stations used to perform manufacturing steps.

Accordingly, it will be understood that the above described embodiments are mentioned by way of example and that the invention is not limited to only those specifically shown and described herein. Instead, the scope of the present invention includes combinations and subcombinations of the various features described herein, as well as variations or modifications of those not disclosed in the prior art that those skilled in the art will read when reading the specification.

Claims (50)

In the apparatus for analyzing a sample, A radiation source adapted to direct a first, converging beam of X-rays toward the surface of the sample and a second, collimated beam of X-rays toward the surface of the sample, the radiation source being An X-ray tube operative to emit X-rays; A first mirror arranged to receive X-rays and focus into a converging beam; And A second mirror arranged to receive X-rays and to focus into a collimated beam; wherein the first mirror and the second mirror are adapted to cause a converging beam and a collimating beam to collide with the same area on the sample. Is a radiation source positioned to face each other; The radiation source between a first source location where X-rays are directed at a grazing angle from the radiation source towards the surface of the sample and a second source location where X-rays are directed near the Bragg angle of the sample from the radiation source toward the surface of the sample A motion assembly operative to move the movement; At either of the first and second source positions in response to either the converging beam and the collimated beam, detecting X-rays scattered from the sample as a function of angle and outputting in response to the scattered X-rays A detector assembly arranged to generate a signal; And A signal processor coupled to receive and process an output signal to determine a characteristic of the sample. The apparatus of claim 1, wherein the first mirror and the second mirror comprise a double curved structure. The apparatus of claim 1, wherein the first mirror and the second mirror are offset in azimuth and are configured to receive and simultaneously focus X-rays. 4. The method of claim 3, wherein the radiation source comprises a beam block, the beam block intercepting a portion of the X-ray emitted from the X-ray tube so that only one of the converging beam and the collimated beam is movable to impinge on the sample. Apparatus for analyzing a sample characterized by the above. The method of claim 1, wherein the motion assembly comprises a first detector elevation in which the detector assembly detects X-rays scattered from the sample at a grazing angle and a second in which the detector assembly senses X-rays scattered from the surface near the Bragg angle. And move the detector assembly between the detector elevations.  The method of claim 5, wherein the motion assembly comprises a first azimuth angle at which the detector assembly detects small angle scattering of the X-rays and a second high azimuth angle at which the detector assembly detects X-ray diffracted from the in-plane structure on the surface of the sample. And move the detector assembly to a first detector elevation therebetween. The detector assembly of claim 1, wherein the detector assembly comprises a first detector configuration for resolving scattered X-rays along a first axis perpendicular to the surface of the sample and a second for resolving scattered X-rays along a second axis parallel to the surface. Apparatus for analyzing a sample comprising a detector array having a detector configuration. 8. The scattering profile of the surface of claim 7, wherein the signal processor processes the output signal from the detector assembly of the first detector configuration to determine the reflection angle of the surface as a function of the elevation angle to the surface, and the surface scattering profile as a function of the azimuth in the plane of the surface. Adapted to process the output signal from the detector assembly of the second detector configuration to determine a. The signal processor of claim 1, wherein the signal processor processes the output signal from the detector assembly while the radiation source emits the first beam and is at the first source location to obtain an X-ray reflection (XRR) spectrum of the surface, and the surface An output signal from the detector assembly while the radiation source emits a second beam and is within the first source location to obtain at least one of an incineration X-ray scattering (SAXS) spectrum and a grazing-incident X-ray diffraction (XRD) spectrum And process the output signal from the detector assembly while the radiation source is at the second source location to obtain a high angle XRD spectrum of the surface. 10. The XRD of claim 9, wherein the signal processor acquires a high resolution XRD spectrum while the radiation is in the second position and emits the first beam and a low resolution XRD while the radiation source is in the second source position and emits the second beam. Apparatus for analyzing a sample, characterized in that it is adapted to obtain a spectrum. The method of claim 10, wherein the motion assembly positions the detector assembly at a first distance from the surface of the sample for acquisition of a high resolution XRD spectrum, and a second from the surface, which is shorter than the first distance for acquisition of a low resolution XRD spectrum. Apparatus for analyzing a sample, characterized in that applied to position the detector assembly at a distance. 10. The method of claim 9, wherein the sample comprises at least one surface layer, and the signal processor is arranged to analyze two or more of the XRR, SAXS, and XRD spectra together to determine the properties of the at least one surface layer. Device for analyzing a sample to be made. The apparatus of claim 12, wherein the property comprises at least one of thickness, density, surface quality, porosity, and crystal structure. The method of claim 1, comprising a knife edge arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and block a portion of the beam that does not pass through the gap. Device for analyzing a sample to be made. 15. The sample of claim 14, comprising a beam block arranged to block X-rays that pass through the gap and continue to propagate along the beam axis, without blocking scattered X-rays within the angular range of interest. Device for analyzing. The apparatus of claim 14, wherein the knife edge comprises a cylinder of X-ray absorbers. The apparatus of claim 1, comprising a mounting assembly for receiving and adjusting the azimuth angle of the sample during analysis, wherein the radiation source is adapted to direct the X-ray beam towards a selected area on the surface of the sample and the signal processor Receive a tilt map indicative of a characteristic tilt angle and determine, based on the tilt map, the tilt angle of the selected area, and allow the mounting assembly to adjust the azimuth angle of the sample to compensate for the determined tilt angle. Device for analyzing a sample. In the apparatus for analyzing a sample, A radiation source operative to direct a collimated beam of X-rays along the beam axis towards a selected area of the sample at a grazing angle, such that a portion of the X-rays are scattered from the area in the azimuth range; A knife edge arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and block a portion of the beam that does not pass through the gap; A beam block arranged to block the X-rays passing through the gap and subsequently propagating along the beam axis, without blocking the scattered X-rays in at least a portion of the azimuth range; First and second slits perpendicular to the surface of the sample and positioned between the radiation source and the knife edge to pass at least a portion of the collimated beam while blocking the scattered X-rays, the first slit being in the radiation source First and second slits positioned proximately and the second slit positioned adjacent to the knife edge; A detector assembly arranged to sense scattered X-rays as a function of azimuth and to generate an output signal in response to the scattered X-rays; And And a signal processor coupled to receive and process the output signal to determine a characteristic of the sample. 19. The apparatus of claim 18, wherein the detector assembly is An array of detector elements having an array length; And An empty enclosure having a front side and a rear side separated by at least a distance equal to the length of the array, wherein the array is located at the rear side of the enclosure, the enclosure allowing radiation to pass through the array Apparatus for analyzing a sample comprising an applied window at the front side of the enclosure. 19. The apparatus of claim 18, wherein the knife edge comprises a cylinder of X-ray absorbers. In the apparatus for analyzing a sample, A radiation source operative to direct a beam of X-rays toward a selected region of the sample, such that a portion of the X-ray is scattered from the region; A knife edge comprising a cylinder of X-ray absorbers arranged adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the cylinder and block a portion of the beam that does not pass through the gap; A detector assembly arranged to sense scattered X-rays as a function of angle and generate an output signal in response to the scattered X-rays; And A signal processor coupled to receive and process an output signal to determine a characteristic of the sample; And said cylinder of said X-ray absorber comprises a metal wire. In the apparatus for analyzing a sample, A mounting assembly for receiving and adjusting the orientation of the sample during analysis; A radiation source operative to direct a collimated beam of X-rays toward a selected area on the surface of the sample on the mounting assembly such that a portion of the X-ray is scattered from the area in the azimuth range; A detector assembly arranged to sense scattered X-rays as a function of azimuth and to generate an output signal in response to the scattered X-rays; And A signal processor adapted to receive a tilt map indicative of a characteristic tilt angle of the surface, determine a tilt angle of the selected area based on the tilt map, and allow the mounting assembly to adjust the orientation of the sample in response to the estimated tilt angle And a signal processor coupled to receive and process the output signal after adjustment of orientation to determine a characteristic of the sample. The method of claim 22, wherein the radiation source is adapted to direct the X-ray converging beam towards each of a plurality of locations on the surface, the detector assembly reflecting X- reflected from the surface as a function of elevation angle to the surface. Applied to detect the line, and the signal processor is adapted to measure the X-ray reflection (XRR) spectrum of each position in response to the reflected X-rays and determine the tilt angle at each position based on the XRR spectrum. Apparatus for analyzing a sample characterized by the above. In the method for analyzing a sample, By positioning the first mirror to focus the X-ray from the X-ray source into the converging beam and by positioning the second mirror to focus the X-ray from the X-ray source into the collimated beam, Operating a radiation source to direct a first converging beam of X-rays toward a surface and to direct a second collimated beam of X-rays to a surface of the sample, wherein the converging beam and the collimating beam Positioning the first mirror and the second mirror to face each other so as to collide the same area of the image; Moving the radiation source between a first source location where the X-rays are directed from the radiation source towards the surface of the sample at a grazing angle and a second source location directed from the radiation source towards the surface of the sample near the Bragg angle of the sample; ; And Detecting the X-rays scattered from the sample as a function of angle in response to either the converging beam and the collimated beam while the radiation source is at either of the first and second source locations to determine the characteristics of the sample. Step; method for analyzing a sample comprising a. 25. The method of claim 24, wherein the first and second mirrors comprise a double curved structure. 25. The method of claim 24, wherein the first mirror and the second mirror are offset in azimuth and are configured to receive and simultaneously focus X-rays. 27. The method of claim 26, wherein operating the radiation source comprises: Blocking a portion of the X-ray radiated from the X-ray tube to move the beam block such that only one of the converging beam and the collimated beam impinges on the sample. 25. The method of claim 24, wherein sensing the X-rays comprises: capturing scattered X-rays using a detector, and X-rays scattered from the sample at grazing angles while the radiation source is at the first source location. Moving the detector between a first detector elevation at which the detector senses and a second detector elevation at which the detector senses X-rays scattered from the surface near the Bragg angle while the radiation source is at the second source location. Method for analyzing a sample, characterized in that. 29. The method of claim 28, wherein moving the detector comprises: a first azimuth angle at which the detector assembly detects incineration scattering of the X-rays, and a X-ray diffraction from the in-plane structure on the surface of the sample; Moving the detector in the first detector elevation between two high azimuth angles. 25. The method of claim 24, wherein sensing X-rays comprises scattering along a first axis perpendicular to the surface of a sample, along a first detector configuration for resolving scattered X-rays and along a second axis parallel to the surface. Placing the detector array in a second detector configuration for resolving the X-rays. 31. The method of claim 30, wherein sensing the X-rays comprises processing the output of the detector array of the first detector configuration to determine the reflectance of the surface as a function of the elevation angle to the surface, and the azimuth angle in the plane of the surface. Processing the output of the detector array of the second detector configuration to determine a scattering profile of the surface as a function of the method. 25. The method of claim 24, wherein sensing the X-rays comprises: obtaining an X-ray reflection (XRR) spectrum of the surface while the radiation source is at the first source location and directs the first beam towards the surface; Acquiring at least one of a small angle X-ray scattering (SAXS) spectrum and a grazing-incident X-ray diffraction (XRD) spectrum while the radiation source is at the first source location and directs the second beam towards the surface, and the radiation Obtaining a high-angle XRD spectrum of the surface while the source is at the second source location. 33. The method of claim 32, wherein acquiring the XRD spectrum comprises acquiring a high resolution XRD spectrum while the radiation source is at the second source position and directing the first beam towards the surface and wherein the radiation source is at the second source position Acquiring a low resolution XRD spectrum while directing the second beam towards the surface. 34. The method of claim 33, wherein sensing the X-rays comprises positioning the detector to receive scattered X-rays at a first distance from the surface of the sample for obtaining a high-resolution XRD spectrum and obtaining a low-resolution XRD spectrum Positioning the detector to receive scattered X-rays at a second distance from the surface, the first distance being shorter than the first distance for the purpose of analyzing the sample. 33. The method of claim 32, wherein the sample comprises at least one surface layer and comprises analyzing two or more of the XRR, SAXS and XRD spectra together to determine the properties of the at least one surface layer. Method for Analyzing Samples. 36. The method of claim 35, wherein said property comprises at least one of thickness, density, surface quality, porosity, and crystal structure. 25. The method of claim 24, comprising positioning a knife edge adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and block a portion of the beam that does not pass through the gap. A method for analyzing a sample, characterized in that the. 38. The method of claim 37, comprising positioning the beam block to block X-rays that pass through the gap and continue to propagate along the beam axis, without blocking scattered X-rays within the angular range of interest. Method for analyzing a sample. 38. The method of claim 37, wherein the knife edge comprises a cylinder of X-ray absorbers. The method of claim 24, wherein operating the radiation source comprises directing an X-ray beam towards a selected area on a surface of a sample, wherein the method comprises: Providing a tilt map representative of the characteristic tilt angle of the surface; Determining a tilt angle of a selected area based on the tilt map; And Adjusting the orientation of the sample to compensate for the estimated tilt angle. In the method for analyzing a sample, Directing the collimated beam of X-rays along the beam axis toward the selected area of the sample at a grazing angle such that a portion of the X-rays are scattered from the selected area in the range of the azimuth angle; Positioning the knife edge adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the knife edge and block a portion of the beam that does not pass through the gap; Positioning the beam block to block the X-rays passing through the gap and subsequently propagating along the beam axis, without blocking the scattered X-rays in at least a portion of the azimuth range; Source and knife of the collimated beam of X-rays so that the first and second slits pass at least a portion of the collimated beam while blocking the scattered X-rays of the first and second slits perpendicular to the surface of the sample. Positioning between the edges, wherein the first slit is positioned proximate the radiation source and the second slit is positioned adjacent the knife edge; And Sensing the scattered X-rays as a function of azimuth to determine a characteristic of the sample. 42. The method of claim 41, wherein the knife edge comprises a cylinder of X-ray absorbers. In the method for analyzing a sample, Directing a beam of X-rays toward the selected area such that a portion of the X-ray is scattered from the selected area of the sample; Positioning a cylinder of X-ray absorber adjacent to the selected area and parallel to the surface of the sample to define a gap between the surface and the cylinder and block a portion of the beam that does not pass through the gap; And Detecting the scattered X-rays as a function of angle to determine a characteristic of the sample; And said cylinder of said X-ray absorber comprises a metal wire. In the method for analyzing a sample, Generating a tilt map of the sample; Directing the collimated beam of X-rays along the beam axis toward the selected area of the sample at a grazing angle such that a portion of the X-rays are scattered from the selected area of the sample in the range of the azimuth angle; Determining a tilt angle of the selected area based on the tilt map; Adjusting the orientation of the sample to compensate for the tilt angle; And Sensing scattered X-rays as a function of azimuth after adjusting the orientation to determine a characteristic of the sample. 45. The method of claim 44, wherein generating the tilt map comprises measuring an X-ray reflection (XRR) spectrum from each of the plurality of locations on the surface, and generating a tilt angle at each of the plurality of locations based on the XRR spectrum. And determining the sample. 46. The method of claim 45, wherein measuring the XRR spectrum comprises directing a converging beam of X-rays towards each of the plurality of locations, detecting the X-rays reflected from the surface as a function of the elevation angle to the surface. A method for analyzing a sample, characterized in that it comprises a step. delete delete delete delete

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