KR101140664B1 - Digital lithography apparatus and method thereof - Google Patents

Abstract

In the digital lithography apparatus according to the embodiment of the present invention, the substrate is arranged such that the unit structure of the image address structure, which is a regular array structure formed by accumulation of virtual circles corresponding to the center of the digital micromirror element, is aligned in a delta form. And a moving pitch determining unit for determining a moving pitch p, which is a distance moving during one on / off operation of the digital micromirror element.
In addition, in the digital lithography method according to another embodiment of the present invention, the unit structure of the image address structure, which is a regular array structure formed by accumulation of virtual circles corresponding to the center of the digital micromirror element, in the unit step number determination unit is delta. Determining a unit step number (D) so as to be aligned in a shape, calculating a length (h) of the base side using the unit step number (D) in the interval calculating unit of the digital lithography apparatus, and the moving pitch The determining unit may include the step of determining the moving pitch (p) to be an integer multiple of the length (h) of the base.

Description

Digital lithography apparatus and method thereof

The present invention relates to a digital lithographic apparatus and method thereof. More specifically, the present invention relates to a digital lithography apparatus and method having an image address structure whose unit structure is arranged in delta form.

Digital lithography devices, which utilize spatial light modulators or digital micromirror devices, can be used on the substrate surface where the micromirrors that make up the micromirror array of spatial light modulators move over time. The light beam from the light source is selectively reflected to expose the pattern. The total set of selective reflection of the light beam by the micromirror arrays corresponding to each substrate movement serves as a mask. Therefore, digital lithography using a spatial light modulator is a process of generating digital masks suitable for patterns and respective substrate movements and transferring them to the control unit of the micromirror according to the substrate movements, respectively. Determines the patterning precision of the pattern to be exposed.

In addition, in a digital lithography apparatus using a spatial light modulator, the micromirror array of the spatial light modulator is left tilted at an angle with respect to the moving direction of the substrate, and the micromirrors are selectively applied to the surface of the substrate moving with time. Since the pattern is exposed by the reflecting light beam, the degree of the pattern resulting from the exposure depends on the rotation angle of the micromirror array and the moving pitch of the substrate in a state where the arrangement and illuminance distribution of the light beam reflected by the micromirror are determined. .

The digital lithography apparatus forms an image address structure, which is a virtual regular array structure, by accumulation of a virtual circle corresponding to the center of the micromirror on a substrate. The image address structure of the digital lithography apparatus has a rectangular unit structure and may be arranged in a lattice form as a whole. Thus, it is possible to have excellent line edge roughness (LER) and line width roughness (LWR) for patterns including vertical and horizontal components. However, the image address structure in which the unit structure is rectangular has difficulty in patterning precisely for patterns including diagonal lines or circular components.

The present invention provides a digital lithographic apparatus and method thereof. More specifically, the present invention provides a digital lithography apparatus and method having an image address structure whose unit structure is arranged in delta form.

Digital lithographic apparatus according to an embodiment of the present invention

A light source unit;

An optical modulator reflecting light incident from the light source unit and including a plurality of digital micromirror devices (DMDs);

A controller for controlling on / off operations of the plurality of digital micromirror elements;

A projection optical unit disposed between the light modulator and the substrate and configured to project light reflected from the plurality of digital micromirror elements onto the substrate;

A substrate moving unit on which the substrate is disposed and which moves the substrate in a direction opposite to a scanning direction; And

One on / off of the digital micromirror element such that the unit structure of the image address structure, which is a regular array structure formed by accumulation of a virtual circle corresponding to the center of the digital micromirror element, is aligned in a delta form And a moving pitch determiner configured to determine a moving pitch p, which is a distance moving during the operation.

The moving pitch determination unit may include a unit step number determination unit to determine a unit step number D such that the unit structure is aligned in a delta form; And

 And an interval calculator configured to calculate an interval in a scan direction of the image address structure, that is, a length h of the base side of the unit structure, based on the unit step number D.

The moving pitch p may be determined to be an integer multiple of the length h of the base.

The unit step number determining unit has an aspect ratio (v / h) that is a ratio of the length (v) of the height of the delta unit structure and the length (h) of the base, satisfying 0.81 ≤ aspect ratio (v / h) ≤ 0.91, The aspect ratio h '/ h, which is the ratio of the length h' from the one vertex of the base side to the foot of the waterline at the bottom side and the length h of the base side at the other vertex facing the base side, is 0.45? The unit step number D may be determined to satisfy (h '/ h) ≤ 0.55.

을 만족하고, 상기 형상비(h'/h)는 1/2을 만족할 수 있다.The aspect ratio (v / h) is

To satisfy the shape ratio (h '/ h) may satisfy 1/2.

(단, B는 디지털 마이크로미서 소자에 의해서 기판에 투영된 투영 구조의 행의 수, A는 상기 투영 구조의 열의 수, C는 상기 투영 구조의 각 셀의 행 방향의 길이, Z는 상기 투영 구조의 각 셀의 행 방향의 길이와 열 방향의 길이의 비)에 적용하여 상기 밑변의 길이(h)를 산출할 수 있다.The interval calculator receives the determined unit number of steps (D),

(Where B is the number of rows of the projection structure projected on the substrate by the digital micromirror element, A is the number of columns of the projection structure, C is the length of the row direction of each cell of the projection structure, Z is the projection structure The length h of the base can be calculated by applying the ratio of the length in the row direction to the length in the column direction of each cell.

(단, k는 1보다 큰 정수)에 적용하여 이동 피치(p)를 결정할 수 있다.The moving pitch determination unit receives the length (h) of the base side

(Where k is an integer greater than 1), the moving pitch p can be determined.

Digital lithography method according to another embodiment of the present invention

In the unit step number determination unit of the digital lithography apparatus, the unit step number of the image address structure, which is a regular array structure formed by accumulation of a virtual circle corresponding to the center of the digital micromirror element, is aligned in a delta form (D Determining);

Calculating an interval in a scan direction of the image address structure, that is, a length h of the base side of the unit structure, by receiving the unit step number D from an interval calculating unit of the digital lithography apparatus; And

And determining, by the moving pitch determining unit of the digital lithography apparatus, the moving pitch p to be an integer multiple of the length h of the base.

Determining the unit step number (D) is an aspect ratio (v / h) is a ratio of the length (v) of the height of the delta unit structure and the length (h) of the base side is 0.81 ≤ aspect ratio (v / h) ≤ 0.91, a shape ratio (h '/) that is the ratio of the length (h') from the one vertex of the base to the foot of the waterline at the base and the length (h) of the base The unit step number D can be determined such that h) satisfies 0.45 ≦ shape ratio h ′ / h ≦ 0.55.

을 만족하고, 상기 형상비(h'/h)는 1/2을 만족할 수 있다.The aspect ratio (v / h) is

To satisfy the shape ratio (h '/ h) may satisfy 1/2.

(단, B는 디지털 마이크로미서 소자에 의해서 기판에 투영된 투영 구조의 행의 수, A는 상기 투영 구조의 열의 수, C는 상기 투영 구조의 각 셀의 행 방향의 길이, Z는 상기 투영 구조의 각 셀의 행 방향의 길이와 열 방향의 길이의 비)를 만족할 수 있다.The length (h) of the base side

(Where B is the number of rows of the projection structure projected on the substrate by the digital micromirror element, A is the number of columns of the projection structure, C is the length of the row direction of each cell of the projection structure, Z is the projection structure The ratio of the length of each cell in the row direction to the length of the column direction can be satisfied.

(단, k는 1보다 큰 정수)를 만족할 수 있다.The moving pitch p is

(Where k is an integer greater than 1).

The digital lithography apparatus and method according to the present invention align the unit structure of an image address structure in a delta form, and not only a pattern including vertical and horizontal components, such as a straight line or a square, but also a pattern including diagonal lines, curved or circular components, and the like. It may have excellent line edge roughness (LER) and line width roughness (LWR). That is, more precise patterning can be performed on patterns including diagonal, curved or circular components than conventional digital lithography apparatus.

1 schematically illustrates a digital lithographic apparatus according to an embodiment of the present invention.
2 shows an example of a projection structure and an image address structure.
3 is an enlarged view of an image address structure and a unit structure thereof of a digital lithography apparatus according to a comparative example.
4 is an enlarged view of an image address structure and a unit structure thereof of a digital lithography apparatus according to an embodiment of the present invention.
5 illustrates a part of an image address structure according to an embodiment of the present invention.
6 illustrates aspect ratios and shape ratios according to the unit step number D of the digital lithography apparatus according to the embodiment of the present invention.

With reference to the accompanying drawings will be described embodiments of the present invention; Like reference numerals in the drawings refer to like elements, and the size or thickness of each element may be exaggerated for clarity.

1 schematically illustrates a digital lithographic apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the digital lithography apparatus 100 according to an exemplary embodiment of the present invention may include a light source unit 10, a light modulator 20, a control unit 30, a projection optical unit 40, and a substrate moving unit 50. And a moving pitch determiner 70. Light emitted from the light source unit 10 may be reflected by the light modulator 20 and may be incident to the projection optical unit 40. The optical modulator 20 may include a plurality of digital micromirror devices (DMDs). The controller 30 may control the optical element of the light modulator 20. For example, the controller 30 turns on / off each digital micromirror element of the light modulator 20 to selectively irradiate light incident from the light source unit 10 onto the substrate 60. can do. The projection optical unit 40 may be disposed between the light modulator 20 and the substrate 60, and may receive light reflected from the plurality of digital micromirror elements and project the light onto the substrate 60. The projection optical unit 40 may include, for example, at least one of a cylindrical lens, a toric lens, and a prism.

The substrate moving unit 50 may move the substrate 60 disposed thereon in a direction opposite to the scan direction. The light modulator 20 is fixed and the substrate is not irradiated while the light modulator 20 moves in the scanning direction on the substrate 60, that is, the direction in which the light modulator 20 proceeds while irradiating light on the substrate. By moving the substrate 60 in the direction opposite to the scan direction through the moving part 50, the optical modulator 20 may appear to move on the substrate 60 in the scan direction relatively.

The movement pitch determiner 70 may determine a movement pitch p, which is a distance that the substrate moves during the on / off operation of the digital micromirror elements. The movement pitch determiner 70 according to the present exemplary embodiment may determine the movement pitch p such that the unit structure of the image address structure is aligned in a delta form, that is, in a triangle. Here, the image address structure is a virtual regular array structure formed by accumulation of imaginary circles disposed at positions corresponding to the centers of the micromirrors of the plurality of digital micromirror elements. An example of the image address structure is shown in FIGS. 2 to 4, and the moving pitch determination unit 70 determines the moving pitch p in detail in the description of the drawings.

The moving pitch determination unit 70 may include a unit step number determination unit 80 and an interval calculation unit 85. The unit step number determination unit 80 determines the unit step number D such that the unit structure of the image address structure is aligned in a delta form. For the unit step number D, refer to the description of FIG. 2. The interval calculator 85 determines the interval in the scan direction of the image address structure, that is, the base of the unit structure of the image address structure, based on the unit step number D determined by the unit step number determiner 80. The length (see h in FIG. 5) can be calculated. A method of determining the unit step number D and calculating the interval of the image address will be described in detail with reference to FIGS. 2 to 6.

2 illustrates one example of a projection structure and an image address structure formed by a digital lithography apparatus.

1 and 2, the projection structure 90 is a structure in which light reflected from the light modulator 20 is projected onto the substrate 60 by passing through the projection optical unit 40, and includes a plurality of digital micromirrors. It is a virtual structure which shows the position which light is projected on the board | substrate 60 corresponding to an element. The projection structure 90 is tilted with respect to the substrate 60 by a predetermined angle θ and travels in the scanning direction on the substrate 60. Projection structure 90 may be a B × A matrix (B, A is a natural number), which may correspond to a B × A matrix of a plurality of digital micromirror elements included in light modulator 20. The projection structure 90 may include B × A cells, wherein the length of each cell may be referred to as C, and the length of the column may be referred to as C to Z. Here, Z means the ratio of the length in the row direction of the cell to the length in the column direction. In addition, a circle is shown at the center of each cell of the projection structure 90, which corresponds to a region where the intensity of light projected onto the substrate 60 by each micromirror is the greatest. The cumulative traces of the circles of the projection structure 90, left as the projection structure 90 progresses on the substrate 60, form an image address structure that is a virtually regular array structure.

The distance traveled in the projection structure 90 until the cell (i, j) proceeds in the scanning direction and reaches the position of the cell (i + B, j + A) is referred to as the scan distance L. The number of times the digital micromirror element operates while moving the scan distance L is referred to as the unit step number D. FIG. For example, in FIG. 2, in the projection structure 90 where B = 1, A = 4 and Z = 1, the distance until the (1, 1) cell moves to the position of the (2, 5) cell is scanned Corresponds to the distance (L). Since the digital micromirror element has been operated 20 times while moving the scan distance L, the unit step number D becomes 20. FIG.

3 is an enlarged view of an image address structure 110 and a unit structure 115 formed by a digital lithography apparatus according to a comparative example.

Referring to FIG. 3, the image address structure 110 according to the comparative example is arranged in a square shape. That is, when a part of the image address structure 110 is enlarged, the basic unit structure 115 is arranged in a square shape. Digital lithography apparatus and method using an image address structure 110 arranged in a square form according to a comparative example provides excellent line edge roughness (LER) and linewidth roughness for patterns containing vertical and horizontal components. width roughness, LWR). However, it is difficult to precisely pattern a pattern including diagonal lines, curved lines, or circular components through a digital lithography process using an image address structure having a rectangular unit structure.

4 is an enlarged view of an image address structure 120 and a unit structure 125 formed by a digital lithography apparatus according to an embodiment of the present invention.

Referring to FIG. 4, the image address structure 120 according to the present embodiment is arranged in delta form. That is, when a part of the image address structure 120 is enlarged, the basic unit structure 125 is arranged in a delta form, that is, in a triangular form. The digital lithography apparatus and method using the image address structure 120 arranged in delta form according to the present embodiment is excellent for not only patterns including vertical and horizontal components but also patterns including curved or circular components. Line edge roughness (LER) and line width roughness (LWR) can be obtained. That is, the digital lithography apparatus according to the present embodiment may perform patterning more precisely than the digital lithography apparatus according to the comparative example with respect to a pattern including diagonal lines, curved lines, or circular components. For example, in the case of implementing a circular pattern, it is more smooth to implement a circle with a delta-type unit structure and a circle closer to an ideal circle than to implement a circle with a rectangular unit structure. That is, in order to implement a circular pattern, filling a circular pattern with a regular triangular unit structure having a side length equal to a length of one side of the square may fill more unit structures than a circular pattern with a square unit structure. Therefore, the margin of the circular pattern is smaller, and as a result, a more precise circular pattern can be realized.

5 is an enlarged view of a part of an image address structure according to an embodiment of the present invention.

Referring to FIG. 5, the unit structure 125 of the image address structure is arranged in a delta form. The unit structure 125 may be arranged in a delta form, that is, a triangular form when the following equations are satisfied. The triangular shape may include, for example, an equilateral triangle, an isosceles triangle, and the like, but is not limited thereto. The height v of the unit structure 125 is the distance between the third vertex 133 and the base side of the unit structure 125 (that is, the line segment connecting the first and second vertices 131 and 132), Equation 1 is satisfied.

In Equation 1, B and A denote rows and columns of the projection structure (see 90 in FIG. 4) forming the image address structure, and C is the length in the row direction of each cell of the projection structure 90, Z Denotes the ratio of the length in the row direction and the length in the column direction of the cell (hereinafter, also in other equations). The length h of the base of the unit structure 125 corresponding to the interval of the image address structure satisfies Equation 2 below.

In Equation 2, D denotes the number of unit steps, which is the number of times the digital micromirror element is operated while the scan distance L is moved. An interval calculator 85 of FIG. 1 calculates an interval h of an image address structure that satisfies Equation 2 above. The distance h 'between the first and second vertices 131 of the unit structure 125 and the foot of the waterline lowered from the third vertex 133 satisfies Equation 3 below.

이며, h는 단위 구조(125)의 밑변의 길이이다. 그리고, θ는 투영 구조(90)가 기판(60)에 대해서 틸팅(tilting)된 소정 각도이며, v는 단위 구조(125)의 높이이다.In Equation 3,

H is the length of the base of the unit structure 125. Θ is a predetermined angle at which the projection structure 90 is tilted with respect to the substrate 60, and v is the height of the unit structure 125.

The movement pitch determiner 70 of FIG. 1 may control an aspect ratio (AR) and a configuration ratio (CR) in the unit structure 125 so that the unit structure 125 may be arranged in a delta form. have. Here, the aspect ratio AR is the ratio (v / h) of the length v of the height of the unit structure 125 to the length h of the base, and the aspect ratio CR is the first vertex of the unit structure 125. It is the ratio (h '/ h) of the length h' between the foot of the waterline lowered to the base at 131 and the third vertex 133 and the length h of the base of the unit structure 125.

및 1/2을 만족하도록 결정된다. 오차 범위를 고려하면, 종횡비(AR)는 부등식 0.81≤종횡비(v/h)≤0.91을 만족하고, 형상비(CR)는 부등식 0.45≤형상비(h'/h)≤0.55를 만족할 수 있다.The unit step number determination unit (see 80 of FIG. 1) may determine the unit step number D such that the unit structure 125 is arranged in a delta form, that is, in a triangular form. For example, the unit step number determination unit (see 80 of FIG. 1) may determine the unit step number D such that the unit structure 125 is arranged in an equilateral triangle. In this case, the unit step number D has an aspect ratio AR and a shape ratio CR, respectively.

And 1/2 to be satisfied. In consideration of the error range, the aspect ratio AR may satisfy an inequality 0.81 ≦ aspect ratio v / h ≦ 0.91, and the aspect ratio CR may satisfy an inequality 0.45 ≦ shape ratio h ′ / h ≦ 0.55.

The interval calculating unit (see 85 in FIG. 1) applies the unit step number D determined by the unit step number determining unit 80 to Equation 2, that is, the length h of the base side of the unit structure 125, that is, The spacing of the image address structure can be calculated. The movement pitch determination unit (see 70 of FIG. 1) may determine the movement pitch p to be an integer multiple of the interval h of the image address structure calculated by the interval calculation unit 85. That is, the moving pitch determination unit 70 may determine the moving pitch p through the following equation (4).

In Equation 4, p denotes a moving pitch, h denotes an interval of an image address structure, and k denotes an integer greater than one. By the shift pitch p thus determined, the image address structure may be aligned in a delta form.

, 1/2이 된다.6 illustrates an aspect ratio AR and a shape ratio CR according to the unit step number D of the digital lithography apparatus according to the exemplary embodiment of the present invention. In a digital lithography apparatus satisfying A = 4, B = 1 and Z = 1, the aspect ratio AR and the shape ratio CR are determined according to the unit step number D corresponding to the design variable. If the unit structure of the image address structure is aligned with an equilateral triangle, the aspect ratio and aspect ratio

, 1/2.

을 만족하기 위해서는, 단위 스텝수(D)는 15가 된다. 즉, 단위 스텝수(D)가 15일 때의 종횡비(AR)는 0.88로서,

에 가장 근접하게 된다. 그리고, 형상비(CR)가 1/2을 만족하기 위해서는, 단위 스텝수(D)는 15 또는 19가 된다. 즉, 단위 스텝수(D)가 15일 때의 형상비(CR)는 0.53이며, 단위 스텝수(D)가 19일 때의 형상비(CR)는 0.47로서, 1/2에 가장 근접하게 된다. 따라서, 단위 구조(125)의 종횡비(AR)가

에 근접한 값을 갖고, 동시에 형상비(CR)가 1/2에 근접한 값을 갖기 위해서는 단위 스텝수(D)는 15로 결정될 수 있다. 단위 스텝수(D) 15를 상기 수학식 2에 적용하면, 이미지 주소 구조의 간격 즉, 단위 구조(125)의 밑변의 길이(h)는

(C는 투영 구조의 한 셀의 행 방향의 길이)로 산출될 수 있다. 최종적으로 밑변의 길이(h)를 상기 수학식 4에 적용하면 우리가 원하는 이동 피치(p)가

(k는 1보다 큰 정수)로 결정될 수 있다.Referring to FIG. 6, the aspect ratio AR is

In order to satisfy, the unit step number D is 15. That is, the aspect ratio AR when the unit step number D is 15 is 0.88.

Closest to. And in order for the aspect ratio CR to satisfy 1/2, the unit step number D is 15 or 19. FIG. That is, the shape ratio CR when the unit step number D is 15 is 0.53, and the shape ratio CR when the unit step number D is 19 is 0.47, which is closest to 1/2. Thus, the aspect ratio AR of the unit structure 125 is

In order to have a value close to and the shape ratio CR to have a value close to 1/2, the number of unit steps D may be determined to be 15. When the unit step number D 15 is applied to Equation 2, the interval h of the image address structure, that is, the length h of the base side of the unit structure 125 is

(C may be calculated as the length in the row direction of one cell of the projection structure). Finally, when the length h of the base is applied to Equation 4, the desired moving pitch p is

(k is an integer greater than 1).

For convenience of explanation of the present invention, a digital lithography apparatus that satisfies A = 4, B = 1 and Z = 1 has been described as an example. However, the values are not limited thereto and may have, for example, the values shown in Table 1, and accordingly, the unit step number D may also have a value in the range shown in Table 1.

Z B A D One One 4 15≤D≤19 One One 8 53≤D≤61 One One 16 217≤D≤233 One 3 8 50≤D≤77 One 3 10 92≤D≤114 One 5 8 62≤D≤94

Next, a digital lithography method according to another embodiment of the present invention will be described.

In the digital lithography method according to the present embodiment, first, the unit step number D, which represents the number of times the digital micromirror element has been operated while moving the scan distance L, is determined by the unit step number determination unit 80 of the digital lithography apparatus. Decide The unit step number D may be determined such that the unit structure of the image address structure, which is a regular array structure formed by accumulation of virtual circles corresponding to the center of the digital micromirror element, is aligned in a delta form, that is, in a triangular form.

을 만족하고, 형상비(h'/h)는 1/2을 만족하도록 단위 스텝수(D)를 결정할 수 있다.Referring to FIG. 5, in determining the unit step number D, an aspect ratio AR, which is a ratio of the length v of the height of the delta-shaped unit structure to the length h of the base, is 0.81 ≦ aspect ratio v. / h) satisfying ≤ 0.91 and being the ratio of the length (h ') from the one vertex of the base to the foot of the waterline at the base at the other vertex facing the base and the length (h) of the base (h) The unit step number D may be determined such that CR) satisfies 0.45 ≦ shape ratio h ′ / h ≦ 0.55. For example, when the unit structure is arranged in an equilateral triangle shape, the aspect ratio (v / h) is

The unit step number (D) can be determined so that, and the aspect ratio h '/ h satisfies 1/2.

The digital lithography method according to the present embodiment next receives the unit step number D from the interval calculation unit 85 of the digital lithography apparatus, and thus the interval in the scan direction of the image address structure, that is, the length of the base side of the unit structure. (h) is calculated. The length h of the base may satisfy Equation 2.

Finally, in the digital lithography method according to the present exemplary embodiment, the moving pitch p may be determined by the moving pitch determining unit 70 of the digital lithography apparatus to be an integer multiple of the length h of the base. The movement pitch p may satisfy Equation 4. By the shift pitch p thus determined, the image address structure may be aligned in a delta form. For a detailed description of the digital lithography method according to the present embodiment, refer to the description of FIGS. 1 to 6 above.

The digital lithography method using the image address structure arranged in the delta form according to the present embodiment has excellent line edge roughness not only for patterns including vertical and horizontal components but also for patterns including curved or circular components. roughness, LER) and line width roughness (LWR) can be obtained. That is, the digital lithography method according to the present embodiment can perform more precise patterning on a pattern including diagonal lines, curved lines, or circular components.

Although the present invention has been described with reference to the embodiments shown in the drawings for the sake of understanding, the digital lithography apparatus and method thereof are merely exemplary, and various modifications and equivalents thereof may be obtained by those skilled in the art. It will be appreciated that embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the appended claims.

10: light source 20: light modulator
30: control unit 40: projection optical unit
50: substrate moving part 60: substrate
70: moving pitch determining unit 90: projection structure
100: digital lithography apparatus 110, 120: image address structure
115, 125: unit structure

Claims (11)

delete A light source unit;
An optical modulator reflecting light incident from the light source unit and including a plurality of digital micromirror devices (DMDs);
A controller for controlling on / off operations of the plurality of digital micromirror elements;
A projection optical unit disposed between the light modulator and the substrate and configured to project light reflected from the plurality of digital micromirror elements onto the substrate;
A substrate moving unit on which the substrate is disposed and which moves the substrate in a direction opposite to a scanning direction; And
One on / off of the digital micromirror element such that the unit structure of the image address structure, which is a regular array structure formed by accumulation of a virtual circle corresponding to the center of the digital micromirror element, is aligned in a delta form And a moving pitch determining unit determining a moving pitch p, which is a distance moving during the operation.
The moving pitch determination unit may include: a unit step number determination unit determining a unit step number D which is a number of times the digital micromirror element is operated while moving an arbitrary scan distance L such that the unit structure is aligned in a delta form; And
And an interval calculator configured to calculate an interval in a scan direction of the image address structure, that is, a length h of the base side of the unit structure, based on the unit step number D.
And a moving pitch p to be an integer multiple of the length h of the base. The method of claim 2,
The unit step number determining unit has an aspect ratio (v / h) that is a ratio of the length (v) of the height of the delta unit structure and the length (h) of the base, satisfying 0.81 ≤ aspect ratio (v / h) ≤ 0.91, The aspect ratio h '/ h, which is the ratio of the length h' from the one vertex of the base side to the foot of the waterline at the bottom side and the length h of the base side at the other vertex facing the base side, is 0.45? and (h '/ h) < = 0.55 to determine the unit step number (D). The method of claim 3, wherein
The aspect ratio (v / h) is

And the aspect ratio (h '/ h) satisfies 1/2. The method of claim 3, wherein
The interval calculator receives the determined unit number of steps (D),

(Where B is the number of rows of the projection structure projected on the substrate by the digital micromirror element, A is the number of columns of the projection structure, C is the length of the row direction of each cell of the projection structure, Z is the projection structure And calculating the length h of the base side by applying the ratio of the length in the row direction to the length in the column direction of each cell. The method of claim 5, wherein
The moving pitch determination unit receives the length (h) of the base side

(Wherein k is an integer greater than 1) to determine the moving pitch p. In the unit step number determination unit of the digital lithography apparatus, any scan distance ( Determining a unit step number D, which is the number of times the digital micromirror element is operated while moving L);
Calculating an interval in a scan direction of the image address structure, that is, a length h of the base side of the unit structure, by receiving the unit step number D from an interval calculating unit of the digital lithography apparatus; And
And determining a moving pitch (p) in the moving pitch determining unit of the digital lithography apparatus to be an integer multiple of the length (h) of the base. The method of claim 7, wherein
Determining the unit step number (D) is an aspect ratio (v / h) is a ratio of the length (v) of the height of the delta unit structure and the length (h) of the base side is 0.81 ≤ aspect ratio (v / h) ≤ 0.91, a shape ratio (h '/) that is the ratio of the length (h') from the one vertex of the base to the foot of the waterline at the base and the length (h) of the base and the unit step number (D) is determined such that h) satisfies 0.45 < aspect ratio (h '/ h) < 0.55. The method of claim 8,
The aspect ratio (v / h) is

And the aspect ratio (h '/ h) satisfies 1/2. The method of claim 8,
The length (h) of the base side

(Where B is the number of rows of the projection structure projected on the substrate by the digital micromirror element, A is the number of columns of the projection structure, C is the length of the row direction of each cell of the projection structure, Z is the projection structure And a ratio of the length in the row direction and the length in the column direction of each cell. The method of claim 10,
The moving pitch p is

(Wherein k is an integer greater than 1).

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