KR101112546B1 - Switching panel for 3d display and 3d display apparatus - Google Patents

Abstract

The present invention provides a switching panel and a three-dimensional display device for a three-dimensional display device having a touch screen function on the switching panel.

The sensing transistor may be formed on the switching panel of the 3D display device to include a touch screen function, and the reduction of the aperture ratio may be minimized by forming the sensing transistor on the wiring and the thin film transistor.

Switching panel, 3d display, stereoscopic

Description

Switching panel and 3D display device for 3D display device {SWITCHING PANEL FOR 3D DISPLAY AND 3D DISPLAY APPARATUS}

1 is a cross-sectional view of a three-dimensional display device according to an embodiment of the present invention.

2 is a layout view of a switching panel for a 3D display device according to an exemplary embodiment of the present invention.

3 is a cross-sectional view taken along the line III-III ′ of FIG. 2.

4 is a circuit diagram of the sensing TFT of FIG. 2.

5 is a layout view of a switching panel for a 3D display device according to another exemplary embodiment of the present invention.

FIG. 6 is a cross-sectional view taken along line VI-VI ′ of FIG. 5.

FIG. 7 is a circuit diagram of the sensing TFT of FIG. 5.

<Explanation of symbols for the main parts of the drawings>

12: lower polarizer 22: upper polarizer

121: gate line 124: connecting projection

123: gate off line 125: gate off electrode

126: gate electrode 140: gate insulating film

154: semiconductor layer 163, 165: ohmic contact layer                 

171: lead-out line 173: source electrode

175: drain electrode 180: protective film

187: organic insulating layer 190: lower electrode of switching panel

182 and 183: contact hole 199 opening

200: backlight unit 300: display panel

310: thin film transistor substrate 320: upper substrate

330: liquid crystal 340: color filter

400: lenticular lens substrate 410: lenticular lens

420: polymer 430: lenticular lens substrate lower substrate

440: lenticular lens substrate upper substrate

500: switching panel 510: switching panel lower substrate

520: switching panel upper substrate 530: switching panel liquid crystal

590: switching panel upper electrode 600: adhesive

The present invention relates to a switching panel and a three-dimensional display device for a three-dimensional display device.

The services to be realized for the high speed of information based on the high-speed information communication network today are the multimedia service centering on the digital terminal which processes text, voice, and video at high speed from the simple listening and speaking service such as the current telephone. It is expected to develop into a super-spatial 3D stereoscopic information communication service that ultimately transcends time and space, and experiences, sees, feels and enjoys realistic and three-dimensionally.

In general, three-dimensional images representing three-dimensional image is made by the principle of stereo vision through two eyes. The parallax of two eyes, that is, binocular disparity that appears because two eyes are about 65mm apart, is the most important factor of three-dimensional effect. This can be called. In other words, the left and right eyes each look at different two-dimensional images, and when these two images are transmitted to the brain through the retina, the brain accurately fuses each other to reproduce the depth and reality of the original three-dimensional image. This ability is commonly referred to as stereography.

The stereoscopic image display device uses binocular disparity, and according to whether the viewer wears separate glasses, stereoscopic polarization and time division, autostereoscopic parallax-barrier, lenticular lens, and blyne There is a king light (blinking light).

While the former can enjoy stereoscopic images, a large number of people should wear separate polarized glasses or liquid crystal shutter glasses, and the latter have an image splitter, a cylindrical lens array, a lenticular lens, Or it is a structure that combines parallax barriers, and the observation range is fixed to a small number of people, but it is preferred because it does not need to wear extra glasses. That is, the spectacle stereoscopic image display device causes inconvenience and unnaturalness because the viewer must wear special glasses. On the other hand, many studies have been conducted on the non-glass type stereoscopic image display apparatus because the observer can observe the stereoscopic image simply by staring at the screen, thereby eliminating the disadvantages described above.

A non-stereoscopic 3D image display device displays a 3D image by arranging a 3D image forming apparatus on an image panel. The three-dimensional image forming apparatus is typically a lenticular lens or parallax barrier. In some cases, the three-dimensional image forming apparatus may combine or add a switching means to not only form a three-dimensional image but also display a two-dimensional image. For example, switching panels may be added to lenticular lenses with refractive anisotropy (see WO 03 / 015424-A2), switching panels and retarders (see US 6046849, US 6055103, US 6437915), Switching panels (see US 4717949, US 6157424) can be combined to form a three-dimensional image forming apparatus capable of converting an image to two or three dimensions.

In the case of the non-glass type, a stereoscopic display device using a lenticular lens is most appropriately developed in consideration of the thickness and aperture ratio of the display device among various methods. That is, when the lenticular lens is used, the thickness of the display device may be thin, and the use of the lens does not cover the display device.

On the other hand, a touch screen panel has been invented in which an electronic device applies an input signal by touching the surface of the display device instead of an input device such as a mouse or a keyboard. Such a touch screen function has an advantage in that an input signal of an electronic device can be easily input. However, in order to use the display device, a separate wiring must be formed, and the opening ratio of the display device is drastically reduced due to such wiring.

SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a switching panel and a three-dimensional display device for a three-dimensional display device in which an aperture ratio is not reduced and a touch screen function is possible.

In order to solve this problem, the present invention provides a switching panel and a three-dimensional display device for a three-dimensional display device having a touch screen function on the switching panel.

Specifically, the present invention relates to a three-dimensional display device including a display panel, a lenticular lens substrate formed on the display panel and including a lenticular lens, and a switching panel formed on the lenticular lens substrate and having a touch screen function. ,

A first substrate, a sensing thin film transistor formed on the first substrate, a lower electrode formed on the sensing thin film transistor, a second substrate facing the first substrate, and an upper electrode formed on the second substrate. The switching panel for a three-dimensional display device.

DETAILED DESCRIPTION Embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.                     

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a part of a layer, film, region, plate, etc. is said to be "on" another part, this includes not only the other part being "right over" but also another part in the middle. On the contrary, when a part is "just above" another part, there is no other part in the middle.

Now, a switching panel and a 3D display device for a 3D display device according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view of a 3D display device capable of displaying a 3D stereoscopic image.

The 3D display device manufactured according to an exemplary embodiment of the present invention includes the display panel 300, the lenticular lens substrate 400, the switching panel 500, as well as the upper and lower polarizers 12 and 22. The display panel 300 and the lenticular lens substrate 400 are coupled by the adhesive 600, and the lenticular lens substrate 400 and the switching panel 500 are also coupled by the adhesive 600. The upper and lower polarizing plates 12 and 22 are disposed above the switching panel 500 and below the display panel 300, respectively.

Next, the display panel 300 which is an image panel will be described in detail.

The display panel 300 includes a thin film transistor substrate 310, an upper substrate 320, and a liquid crystal 330.

First, the thin film transistor substrate 310 includes signal lines such as a gate line and a data line, and a thin film transistor (not shown) and a pixel electrode (not shown) are formed in each pixel region defined by the gate line and the data line crossing each other. It is. In this case, the thin film transistor switches an image signal transmitted along the data line according to a scan signal transmitted along the gate line and applies or cuts off the pixel electrode.

The display panel 300 is classified into a transmissive display panel, a reflective display panel, and a semi-transmissive display panel in which both forms are possible according to the shape of the pixel electrode. Applicable to the dimensional display device. In the present embodiment, the transmission type will be described.

Next, the upper substrate 320 faces the thin film transistor substrate 310 at a predetermined interval. The color filter 340 is formed on the upper substrate 320, and although not illustrated, a black matrix, a common electrode, and the like are formed.

The color filter 340 is generally arranged to have red, green, and blue color filters so that they appear along the same color filter pixel row, but various other arrangements are possible. The pixel row is formed of pixels lined up along the data line.

A liquid crystal material is injected between the thin film transistor substrate 310 and the upper substrate 320 to form the liquid crystal layer 330. The liquid crystal alignment state of the liquid crystal layer 330 may be a twisted nematic (TN) mode, an electrically controlled birefringence (ECB) mode, a vertically aligned (VA) mode, and the like. The liquid crystal layer 330 has a retardation that causes the rotation of the polarization axis of 90 degrees without an electric field applied thereto.

 Next, the lenticular lens substrate 400, which is a key part for forming a stereoscopic image, will be described in detail.

The lenticular lens substrate 400 serves to form a three-dimensional image by refracting light emitted from the display panel 300 and distributing it to both eyes.

The lenticular lens substrate 400 is made of a lenticular lens 410 and a polymer 420, and includes an upper substrate 440 and a lower substrate 430 for supporting the lenticular lens substrate 410. The lenticular lens 410 has refractive index anisotropy, and the polymer 420 has refractive index isotropy. The refractive index in the minor axis direction and the major axis direction of the lenticular lens 410 are different from each other, and any one of the refractive index in the minor axis direction and the major axis direction is formed to be the same as the refractive index of the polymer 420. That is, the lenticular lens 410 vibrates in the axial direction of the polymer 420 (hereinafter referred to as the “Y-axis direction”). The boundary between the lenticular lens 410 and the polymer 420 is regarded as having the same refractive index. Although not refracted at, the light vibrating in the direction perpendicular to the axis of the polymer 420 (hereinafter referred to as the "X-axis direction") is different from the refractive index of the lenticular lens 410 and the polymer 420 at the boundary thereof. Refracted. By using these characteristics, the 2D image and the 3D image can be selectively displayed.

The switching panel 500 will be described in detail.

The switching panel 500 selects whether to display a 2D image or a 3D image.

The switching panel 500 includes an upper electrode 590 and a lower electrode 190 formed on the upper and lower substrates 520 and 510 and upper and lower substrates 520 and 510, respectively, and a liquid crystal layer 530 injected therebetween. And a wiring and a sensing transistor configured to perform a touch screen function between the lower substrate 510 and the lower electrode 190. Wiring and sensing transistors that perform a touch screen function will be described later. The liquid crystal layer 530 may have a TN mode, an ECB mode, or a VA mode. In this embodiment, a case in which the alignment is performed in the TN mode is shown as an example, and the liquid crystal layer 530 has a retardation value capable of rotating the polarization of light by 90 degrees.

The upper polarizing plate 22 disposed on the switching panel 500 is arranged to absorb polarization parallel to the axis of the lens resin. That is, the absorption axis of the upper polarizing plate 22 is formed in the Y-axis direction and the transmission axis is formed in the X-axis direction. The direction of the absorption axis of the upper polarizer 22 may cause the 3D display device to display a 2D image in a basic mode (without voltage applied to the two electrodes of the switching panel 500) or to display a 3D image. In this embodiment, the 2D image is displayed in a basic mode.

The transmission axis of the lower polarizing plate 12 disposed below the display panel 300 is also perpendicular to the axis of the lens resin. That is, the transmission axis is the X axis. The transmission axis direction of the lower polarizer 12 also sets the two-dimensional image to normally white (white display without an electric field applied to the liquid crystal layer 330) or normally black (to apply the electric field to the liquid crystal layer 330). Black display in the non-volatile state]. Here, an example of displaying a two-dimensional image in normally white will be described.

In FIG. 1, the adhesive 600 is used to attach each part. However, the upper substrate 320 of the display panel 300 and the lower substrate of the lenticular lens substrate 400 are different from each other. The 430 may be formed as one substrate, and the upper substrate 440 of the lenticular lens substrate 400 and the lower substrate 510 of the switching panel 500 may be formed as one substrate.

Next, the operation of the three-dimensional display device will be briefly described.

First, a case of displaying a two-dimensional image will be described. In this case, no voltage is applied to the switching panel 500 (Vs = 0).

When white of the 2D image is displayed, no electric field is applied to the liquid crystal layer 330 of the display panel 300. Therefore, the light from the light source is left only in the X-axis linear polarization by the lower polarizer 12, and the light is converted into the Y-axis linear polarized light while passing through the liquid crystal layer 330. The Y-axis linearly polarized light does not recognize the boundary between the lenticular lens 410 and the polymer 420, passes through the liquid crystal layer 530 of the switching panel 500, and passes through the liquid crystal layer 530 of the switching panel 500. It is not blocked by) and passes through it to display white color.

Next, when the black of the 2D image is displayed, light passing through the liquid crystal layer 330 is applied to the liquid crystal layer 330 of the display panel 300 to change the alignment of the liquid crystal to the vertical alignment. Do not feel it. In this case, light from the light source is left by the lower polarizer 12 only in the X-axis linear polarization, and the light passes through the light without being affected by the liquid crystal layer 330 and is refracted by the lenticular lens substrate 400 so as to be directed to both eyes. Is dispersed. Since the scattered light is still X-axis linearly polarized light, it is converted into Y-axis linearly polarized light while passing through the liquid crystal layer 530 of the switching panel 500. This light is all blocked by the upper polarizer 22 to display black.

Next, the case where a 3D image is displayed is demonstrated. In this case, a voltage is applied to the switching panel 500 (Vs = V) so that the liquid crystal is vertically aligned so that light passing through the liquid crystal layer 530 does not feel retardation.

When displaying the white of the 3D image, an electric field is also applied to the liquid crystal layer 330 of the display panel 300 to change the alignment of the liquid crystal to a vertical alignment so that light passing through the liquid crystal layer 330 does not feel retardation. do. In this case, light from the light source is left by the lower polarizer 12 only in the X-axis linear polarization, and the light passes through the light without being affected by the liquid crystal layer 330 and is refracted by the lenticular lens substrate 400 so as to be directed to both eyes. Is dispersed. The scattered light is still X-axis linearly polarized light, and passes through the liquid crystal layer 530 of the switching panel 500 without being blocked by the upper polarizer 22 to display white color.

When the black of the 3D image is displayed, no electric field is applied to the liquid crystal layer 330 of the display panel 300. Therefore, the light from the light source is left only in the X-axis linear polarization by the lower polarizer 12, and the light is converted into the Y-axis linear polarized light while passing through the liquid crystal layer 330. The Y-axis linearly polarized light does not recognize the boundary between the lenticular lens 410 and the polymer 420, and passes through the liquid crystal layer 530 of the switching panel 500 to maintain the Y-axis linearly polarized light. Therefore, all are blocked by the upper polarizer 22 to display black.

2 to 4 illustrate one embodiment of a switching panel for a 3D display device.

2 is a layout view of a switching panel for a 3D display device according to an exemplary embodiment of the present invention, FIG. 3 is a cross-sectional view taken along line III-III ′ of FIG. 2, and FIG. 4 is a circuit diagram of the sensing TFT of FIG. 2.

The switching panel according to the exemplary embodiment of the present invention includes a lower substrate 510, an upper substrate 520 facing the upper substrate 520, upper and lower electrodes 590 and lower electrodes 190 formed on upper and lower substrates 510 and 520, and A liquid crystal 530 interposed therebetween, and a wiring and a sensing thin film diode are formed between the lower substrate 510 and the lower electrode 190.

First, as illustrated in FIGS. 2 and 3, a plurality of scan lines 121 and gate electrodes 126 are formed on the lower substrate 510.

The scan line 121 mainly extends in the horizontal direction and transmits an image scan signal, and includes a plurality of connection protrusions 124. The gate electrode 126 is formed long in the vertical direction with a predetermined distance from the scan line 121 and is formed in the upper right direction of the connection protrusion 124. A sensing thin film diode is formed on the gate electrode 126.

The scan line 121 and the gate electrode 126 are made of aluminum-based metals such as aluminum and aluminum alloys, silver-based metals such as silver and silver alloys, copper-based metals such as copper and copper alloys, and molybdenum-based metals such as molybdenum and molybdenum alloys. , Chromium, titanium, tantalum or the like is preferable. The scan line 121 and the gate electrode 126 may include two layers having different physical properties, that is, a lower layer (not shown) and an upper layer (not shown) thereon.                     

Side surfaces of the scan line 121 and the gate electrode 126 are inclined with respect to the surface of the substrate 510, and the inclination angle is about 30-80 ° with respect to the surface of the substrate 510.

An insulating layer 140 made of silicon nitride (SiNx) is formed on the scan line 121 and the gate electrode 126.

A plurality of island semiconductors 154 made of hydrogenated amorphous silicon (amorphous silicon is abbreviated a-Si) and the like are formed on the insulating layer 140.

The island-like semiconductor 154 is formed on the lower end of the gate electrode 126 and is formed to have a wider width than the gate electrode 126. The semiconductor 154 may be formed so as not to overlap the connection protrusion 124. The island semiconductor 154 becomes a channel of the sensing thin film diode.

A plurality of island-like ohmic contacts 163 and 165 formed of a material such as n + hydrogenated amorphous silicon in which silicide or n-type impurities are heavily doped is formed on the semiconductor 154. The islands of ohmic contact 163 and 165 face each other and are positioned over semiconductor 154.

Side surfaces of the semiconductor 154 and the ohmic contacts 163 and 165 are also inclined with respect to the surface of the substrate 510 and have an inclination angle of 30-80 °.

A plurality of read-out lines 171 and a plurality of input terminal electrodes 175 are formed on the ohmic contacts 163 and 165 and the insulating layer 140.

The lead out line 171 mainly extends in the vertical direction to cross the scan line 121 and transmit a sensing signal.

Each output terminal electrode 173 protrudes from the lead-out line 171 and is formed to cover a portion of the gate electrode 126 and the ohmic contact 163. The output terminal electrode 173 is electrically connected to the gate electrode 126 through the contact hole 183, and serves as an output side electrode on the ohmic contact 163.

The input terminal electrode 175 is formed to face the output terminal electrode 173 formed on the ohmic contact 163. One end of the input terminal electrode 175 is formed on the ohmic contact member 165, and the other end thereof extends to an upper portion of the connection protrusion 124 and is electrically connected to the connection protrusion 124 through the contact hole 182. It is.

The lead-out line 171, the output terminal electrode 173, and the input terminal electrode 175 may be made of a refractory metal such as chromium or molybdenum-based metal, tantalum, and titanium, and may include molybdenum (Mo), molybdenum alloy, and chromium ( It may have a multilayer film structure consisting of a lower film such as Cr) and an upper film (not shown) which is an aluminum-based metal disposed thereon.

The lead-out line 171, the output terminal electrode 173, and the input terminal electrode 175 are also inclined at an angle of about 30 to 80 °, similarly to the scan line 121.

The ohmic contacts 163 and 165 exist only between the semiconductor 154 below and the output terminal electrode 173 and the input terminal electrode 175 thereon, and serve to lower the contact resistance.

A passivation layer 180 made of silicon nitride or silicon oxide, which is an inorganic material, is disposed on the lead-out line 171, the output terminal electrode 173, the input terminal electrode 175, and the exposed semiconductor 154. The organic insulating layer 187 formed of an organic material having excellent planarization characteristics and photosensitivity is formed on the passivation layer 180.

The lower electrode 190 is formed on the organic insulating layer 187. The lower electrode 190 is made of ITO or IZO, which is a transparent conductive material.

An opening 199 is formed on the semiconductor 154 to expose the semiconductor 154 to external light by removing the organic insulating layer 187 and the lower electrode 190. Therefore, the lower electrode 190 is formed on the entire surface of the lower substrate 510 except for the opening 199.

The upper electrode 590 is formed on the upper substrate 520 of the switching panel 500, and the liquid crystal 530 is injected between the upper electrode 590 and the lower electrode 190. The upper electrode 590 and the lower electrode 190 are connected to a voltage applying unit outside the switching panel 500 to apply a voltage, and the liquid crystal 530 rotates according to whether the voltage is applied, and thus the 2D or 3D image. Is displayed.

Referring to FIG. 4, only a diode part is independently separated from a layout and a layer structure of an upper substrate 520 and a lower substrate 510 of the switching panel 500 described above.

As illustrated in FIG. 4, the sensing thin film diode is connected to a gate electrode side and an output side. The sensing thin film diode operates in such a manner that the semiconductor 154 exposed to the outside through the opening 199 senses light to change an amount of transmitting an input signal.

That is, the scan line 121 is connected to the gate line of the display panel 300 to transmit a gate signal, and the gate signal is periodically transmitted to the readout line 171 through the sensing diode. However, when the amount of light detected by the semiconductor 154 of the sensing diode is reduced, the size of the gate signal transmitted to the lead-out line 171 is changed, and the change is detected to recognize that the corresponding part is touched.

Hereinafter, a look at another embodiment according to the present invention.

FIG. 5 is a layout view of a switching panel for a 3D display device according to still another exemplary embodiment, FIG. 6 is a cross-sectional view taken along line VI-VI ′ of FIG. 5, and FIG. 7 is a circuit diagram of the sensing TFT of FIG. 5. .

According to another exemplary embodiment of the present invention, the switching panel 500 includes a lower substrate 510, an upper substrate 520 facing the upper substrate 520, and upper and lower electrodes 590 and lower electrodes formed on upper and lower substrates 510 and 520. And a liquid crystal 530 interposed therebetween, and a wiring and a sensing thin film transistor are formed between the lower substrate 510 and the lower electrode 190.

First, as illustrated in FIG. 5, a plurality of scan lines 121 and gate off lines 123 are formed on the lower substrate 510.

The scan line 121 mainly extends in the horizontal direction and transmits an image scan signal, and includes a plurality of connection protrusions 124. In addition, the gate off line 123 extends in a horizontal direction, and a voltage applied to turn off the sensing thin film transistor is applied, and includes a plurality of gate off electrodes 125. The gate off line 123 is formed to be separated from the scan line 121 by a predetermined distance so as not to be connected to each other. In addition, the connection protrusion 124 and the gate-off electrode 125 are also formed so as not to overlap each other, and are formed to be spaced apart by a predetermined distance in the horizontal direction. The sensing thin film transistor is formed on the gate off electrode 125.

The scan line 121 and the gate off line 123 may be formed of aluminum-based metals such as aluminum and aluminum alloys, silver-based metals such as silver and silver alloys, copper-based metals such as copper and copper alloys, and molybdenum-based alloys such as molybdenum and molybdenum alloys. It is preferable that the metal, chromium, titanium, tantalum and the like. The scan line 121 and the gate off line 123 may include two layers having different physical properties, that is, a lower layer (not shown) and an upper layer (not shown) thereon.

Sides of the scan line 121 and the gate off line 123 are inclined with respect to the surface of the substrate 510, and the inclination angle is about 30-80 ° with respect to the surface of the substrate 510.

An insulating layer 140 made of silicon nitride (SiNx) is formed on the scan line 121 and the gate off line 123.

A plurality of island semiconductors 154 made of hydrogenated amorphous silicon (amorphous silicon is abbreviated a-Si) and the like are formed on the insulating layer 140.

The island type semiconductor 154 is formed on the gate off electrode 125 and has a wider width than the gate off electrode 125. The semiconductor 154 may be formed so as not to overlap the connection protrusion 124. The island semiconductor 154 becomes a channel of the sensing thin film transistor.

A plurality of island-like ohmic contacts 163 and 165 formed of a material such as n + hydrogenated amorphous silicon in which silicide or n-type impurities are heavily doped is formed on the semiconductor 154. The islands of ohmic contact 163 and 165 face each other and are positioned over semiconductor 154.

Side surfaces of the semiconductor 154 and the ohmic contacts 163 and 165 are also inclined with respect to the surface of the substrate 510 and have an inclination angle of 30-80 °.

A plurality of read-out lines 171 and a plurality of input terminal electrodes 175 are formed on the ohmic contacts 163 and 165 and the insulating layer 140.

The lead-out line 171 mainly extends in the vertical direction, insulates and crosses the scan line 121 and the gate off line 123, and transmits a sensing signal.

Each output terminal electrode 173 protrudes from the lead-out line 171, is formed to cover the ohmic contact member 163, and functions as an output side electrode on the ohmic contact member 163.

An input terminal electrode 175 is formed to face the output terminal electrode 173. One end of the input terminal electrode 175 is formed on the ohmic contact member 165, and the other end thereof extends to an upper portion of the connection protrusion 124 and is electrically connected to the connection protrusion 124 through the contact hole 182. It is.

The lead-out line 171, the output terminal electrode 173, and the input terminal electrode 175 are preferably made of a refractory metal such as chromium or molybdenum-based metal, tantalum and titanium, and molybdenum (Mo), molybdenum alloy, and chromium. (Cr) may have a multi-layered film structure consisting of a lower film (not shown) and an upper film (not shown), which is an aluminum-based metal disposed thereon.

Like the scan line 121 and the gate off line 123, the lead-out line 171, the output terminal electrode 173, and the input terminal electrode 175 are inclined at an angle of about 30-80 °, respectively.

The ohmic contacts 163 and 165 exist only between the semiconductor 154 below and the output terminal electrode 173 and the input terminal electrode 175 thereon, and serve to lower the contact resistance.

A passivation layer 180 made of silicon nitride or silicon oxide, which is an inorganic material, is disposed on the lead-out line 171, the output terminal electrode 173, the input terminal electrode 175, and the exposed semiconductor 154. An organic insulating layer 187 formed of an organic material having excellent planarization characteristics and photosensitivity is formed on the passivation layer 180. At this time, the surface of the organic insulating film 187 is formed flat.

The lower electrode 190 is formed on the organic insulating layer 187. The lower electrode 190 is made of ITO or IZO, which is a transparent conductive material.

An opening 199 is formed on the semiconductor 154 to expose the semiconductor 154 to external light by removing the organic insulating layer 187 and the lower electrode 190. Therefore, the lower electrode 190 is formed in the entire area of the lower substrate 510 except for the opening 199.                     

The upper electrode 590 is formed on the upper substrate 520 of the switching panel 500, and the liquid crystal 530 is injected between the upper electrode 590 and the lower electrode 190. The upper electrode 590 and the lower electrode 190 are connected to a voltage applying unit outside the switching panel 500 to apply a voltage, and the liquid crystal 530 rotates according to whether the voltage is applied, and thus the 2D or 3D image. Is displayed.

Referring to FIG. 7, only the transistor part is separated from the arrangement and layer structure of the upper substrate 520 and the lower substrate 510 of the switching panel 500 described above.

As illustrated in FIG. 7, the sensing thin film transistor operates by sensing that the amount of transfer of the input side signal is changed by the semiconductor 154 exposed to the outside through the opening 199.

That is, the scan line 121 is connected to the gate line of the display panel 300 to transmit the gate signal, and the gate off line 123 applies the turn-off voltage of the sensing transistor. The gate signal is periodically transmitted to the input electrode 175 of the sensing transistor, leaks from the channel, and is transmitted to the lead-out line 171 through the output electrode 173. However, when the amount of light sensed by the semiconductor 154 of the sensing transistor is reduced, the size of the gate signal transmitted to the lead-out line 171 is changed, and it is recognized that the corresponding part is touched.

By forming the switching panel 500 as described above, the switching panel that was switched only to the two-dimensional image and the three-dimensional image also includes the function of the touch screen.                     

In addition, the scan line 121 and the lead-out line 171 of the switching panel 500 are formed on the gate line and the data line of the display panel 300, and the sensing thin film transistor is also formed on the thin film transistor of the display panel 300. Formation can minimize the reduction of aperture ratio.

In the present invention, an embodiment of performing a touch screen function using only a sensing thin film diode or a sensing thin film transistor is provided. Alternatively, the sensing thin film transistor and the switching thin film transistor may be formed to perform a touch screen function.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

As described above, the sensing transistor is formed on the switching panel of the 3D display device to include a touch screen function, and the reduction of the aperture ratio can be minimized by forming the sensing transistor on the wiring and the thin film transistor.

Claims (9)

Display panel, A lenticular lens substrate formed on the display panel and including a lenticular lens; And a switching panel formed on the lenticular lens substrate and having a touch screen function to select whether to display a 2D image or a 3D image. In claim 1, The touch screen function of the switching panel is a three-dimensional display device using a sensing thin film transistor. 3. The method of claim 2, The switching panel further includes upper and lower electrodes that are not connected to the sensing thin film transistor. In claim 1, The touch screen function of the switching panel uses a sensing thin film diode. In claim 4, The switching panel further includes upper and lower electrodes that are not connected to the sensing thin film diode. First substrate, A sensing thin film transistor formed on the first substrate, A lower electrode formed on the sensing thin film transistor, A second substrate facing the first substrate, And an upper electrode formed on the second substrate, and selecting whether to display a 2D image or a 3D image. In claim 6, An organic insulating layer is formed between the sensing thin film transistor and the lower electrode. The organic insulating layer is a switching panel for a three-dimensional display device having an opening that exposes the semiconductor of the sensing thin film transistor. First substrate, A sensing thin film diode formed on the first substrate, A lower electrode formed on the sensing thin film transistor, A second substrate facing the first substrate, And an upper electrode formed on the second substrate, and selecting whether to display a 2D image or a 3D image. In claim 8, An organic insulating layer is formed between the sensing thin film diode and the lower electrode, The organic insulating layer is a switching panel for a three-dimensional display device having an opening that exposes the semiconductor of the sensing thin film transistor.

Images