KR100755235B1 - Imprinting device - Google Patents

Abstract

An imprinting apparatus is provided to minimize air bubble trapping upon imprinting and to realize large volume accurate imprint by removing air bubble in a vacuum condition and realizing an accurate position alignment and uniform compression between a stamp and a substrate. A substrate receiving unit(10) receives a substrate. A stamp receiving unit(20) is arranged at an external side of the substrate receiving unit and receives a stamp. A supporting unit(30) supports the substrate receiving unit and the stamp receiving unit. A first pressurizing unit(50) is arranged on an upper portion of the substrate receiving unit and the stamp receiving unit. The first pressurizing unit pressurizes a base substrate and the stamp to a vertical direction. A hardening unit(55) is included in the first pressurizing unit and irradiates ultraviolet rays. A second pressurizing unit(70) pressurizes the substrate and the stamp by a rolling method.

Description

Imprinting Device {IMPRINTING DEVICE}

1 is a perspective view of an imprinting apparatus according to the present invention,

2 is an internal cross-sectional view of the imprinting apparatus according to the present invention;

3 is a perspective view of a state in which the first pressurizing unit and the second pressurizing unit are removed from the imprinting apparatus shown in FIG. 1;

4 is a perspective view of a support unit of an imprinting apparatus according to the present invention;

5 is a perspective view of a first pressing unit and a second pressing unit of the imprinting apparatus according to the present invention,

Figure 6 is a perspective view showing the installed state of the second pressing unit according to another embodiment of the present invention,

7 is a partially enlarged view showing a tilt compensation unit according to the present invention;

8 is a plan view illustrating an alignment process of a substrate and a stamp according to the present invention.

Explanation of symbols on the main parts of the drawings

10: substrate mounting unit 12: first pressure application opening

14: alignment inspection opening 20: stamp seating unit

22: second pressure application opening 30: support unit

32: first lifting control unit 34: second lifting control unit

36: fixed chuck 40: guide unit

50: first pressurizing unit 53: pressurizing panel

54: O-ring 55: lamp housing

56: third pressure application opening 70: second pressurizing unit

72: roller portion 74: first roller support portion

76: second roller support portion 80: upper cover

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an imprinting apparatus for uniformly and precisely imprinting a fine pattern on a substrate, and in particular, an imprinting for imprinting a pattern having a nanometer or micrometer unit size. Relates to a device.

The technology for forming nanometer-sized patterns is commonly referred to as Nano Technology (NT), which refers to the technology for producing and utilizing nanometer-sized materials, structures, machines, devices, etc. .

In general, materials and devices having a size of 100 nm or less fall into the category of nanotechnology. Nanotechnology is a basic technology for realizing information technology (IT) and biotechnology (BT). Most production, processing and application technologies are closely related to nanotechnology.

The core technology for such nanotechnology is nanoprocessing technology that enables the production and utilization of nanometer-sized materials and devices.

Lithography (Lithography) technology that forms nanometer-sized ultra-fine pattern is a core technology, and optical lithography is mainly used as a lithography technology to form fine patterns.

However, optical lithography techniques have reached technical limitations in terms of resolution, and require very short wavelength light sources for nanoprocessing. Since most materials are not optically transparent, typical optical lithography equipment has very complex reflection optics. It requires a light source with sufficient output intensity.

Such exposure equipment is very expensive for initial investment, has complex equipment structures and configurations, is difficult to process, and has productivity that is not suitable for industrial applications.

In contrast, imprinting lithography technology can easily and easily form high resolution patterns on a substrate using a mold having a fine pattern on the surface, as well as an uncomplicated device structure and low cost of construction. It has advantages such as high productivity suitable for mass production.

Imprint lithography is an excellent alternative to conventional optical lithography in the manufacture of microelectronic devices, optical devices, MEMS, patterned media, biochips, etc., but most of these currently developed imprint lithography apparatuses. These are atmospheric atmospheric devices, which are not free of particles and process gases, and have limited production of high quality repetitive imprint lithography substrates due to bubble formation or pattern damage during mold removal.

In addition, there is a problem that does not have a high productivity suitable for industrial applications because it is not possible to precise and uniform high-speed large-area imprint.

Accordingly, an object of the present invention is to provide an imprinting apparatus capable of minimizing process time and manufacturing cost by treating a high-quality, high-efficiency imprint process under vacuum and atmospheric pressure in a single module without a separate additional process or opening and closing operation.

In addition, particle generation is reduced, and bubbles are removed in a vacuum state, thereby minimizing bubble filling during imprinting, enabling precise positioning and uniform pressing between the stamp and the substrate, thereby achieving high productivity due to continuous curing. It is to provide an apparatus capable of precise imprint of an area.

In order to achieve the object of the present invention, the imprinting apparatus according to the present invention is disposed on the substrate seating unit and the substrate seating unit for seating the substrate and the stamp seating unit for seating the stamp and the substrate seating unit And a support unit for supporting the stamp seating unit, the substrate seating unit and the stamp seating unit, and included in the first pressurizing unit and the first pressurizing unit for pressurizing the substrate and the stamp in a vertical direction and irradiating ultraviolet rays. And a second pressurizing unit for pressurizing the curing unit for heating and the substrate and the stamp in a rolling manner.

Preferably, the stamp seating unit is spaced apart from each other while maintaining a predetermined interval with respect to the substrate seating unit.

Preferably, the support unit further includes a substrate lift control unit for lifting the substrate.

Preferably, the support unit further includes a second lift control unit for lifting the stamp.

In addition, it may further include a stamp alignment adjusting unit for adjusting the alignment of the stamp.

The apparatus may further include a substrate alignment inspection unit for inspecting the alignment between the substrate and the stamp.

Preferably, the apparatus further includes a pressure applying unit for applying pressure to the substrate seating unit and the stamp seating unit.

The support unit may further include a clamp for fixing the stamp to the stamp seating unit.

In addition, the support unit may further include a stage unit for supporting the substrate seating unit.

Preferably, the stage unit is configured to displaceably support the substrate mounting unit.

Preferably, the first pressurizing unit includes a bellows contracting / elongating as the first pressurizing unit moves up and down, and the bellows is disposed outside the upper cover of the imprinting apparatus.

In addition, the first pressurizing unit may include a pressure applying opening for additionally actuating the air pressure in the pressurized state of the stamp.

Preferably, the second pressing unit is disposed on the side of the substrate seating unit and the stamp seating unit.

On the other hand, the second pressing unit may be fixedly supported by the first pressing unit.

Preferably, the second pressing unit includes a roller portion for pressing the substrate and the stamp and a roller support portion for supporting the present roller portion.

Here, the roller portion may be configured to be capable of lifting up and down relative to the roller support portion.

Preferably, the roller support portion includes elastic means for elastically supporting the roller portion.

In addition, the first pressurization unit may further include a tilt compensation unit for tilt compensation of the first subscription unit.

Preferably, the first pressing unit or the substrate seating unit may further include a heat curing unit for curing the thermoplastic polymer.

Hereinafter, an imprinting apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

1 is a perspective view of an imprinting apparatus according to the present invention, FIG. 2 is an internal cross-sectional view of the imprinting apparatus according to the present invention, and FIG. 3 is a first pressurizing unit and a second pressurization in the imprinting apparatus shown in FIG. 4 is a perspective view of the unit is removed, Figure 4 is a perspective view of the support unit 30 of the imprinting apparatus according to the present invention. 1 to 4, an imprinting apparatus according to the present invention is disposed on the substrate seating unit 10 and the substrate seating unit 10 outside to seat the substrate and a stamp seating unit for seating the stamp ( 20) and the support unit 30 for supporting the substrate seating unit 10 and the stamp seating unit 20, the substrate seating unit 10 and the stamp seating unit 20 is disposed on the pressurized substrate and stamp The first pressurizing unit 50 and the first pressurizing unit 50 to be included in the curing unit 55 for irradiating or heating ultraviolet rays and the second pressurizing unit for pressing the substrate and the stamp in a rolling manner ( 70).

The substrate seating unit 10 is configured to mount a substrate coated with a photocurable resin or a thermoplastic polymer, and has a substantially rectangular shape as a whole.

The substrate seating unit 10 passes the light irradiated from the first pressure applying opening 12 for transmitting the pressure provided from the pressure applying unit (not shown) to the substrate and the substrate alignment inspection unit 60 to be described later. It includes a second position identification opening 14 for.

On the outside of the substrate seating unit 10, a stamp seating unit 20 on which a stamp for forming a pattern on a photocurable resin or a thermoplastic polymer applied to a substrate is seated is disposed.

Since the stamp seating unit 20 is disposed adjacent to the outer surface of the substrate seating unit 10 at a predetermined interval, the stamp seating unit 20 has an approximately square shape as a whole, and the pressure provided from the pressure applying unit (not shown) is applied to the stamp. And a second pressure application opening 22 for delivery.

The substrate seating unit 10 has a dimension spaced apart from the inner surface of the stamp seating unit 20 by a predetermined distance such that the substrate seating unit 10 can be displaced relative to a predetermined angle within the installation plane of the stamp seating unit 20.

In the case of the first pressure applying opening 12 included in the substrate seating unit 10 and the second pressure applying opening 22 included in the stamp seating unit 20, the two pressure applying openings when the substrate and the stamp are seated. By generating a negative pressure at (12, 22), the mounting of the substrate and the stamp can be performed more easily and reliably.

In addition, the substrate seating unit 10 and the stamp seating unit 20 is the substrate lift control unit 33 and the stamp lift control unit 33-1 included in the support unit 30 to be described later, the substrate lift control Each of the pins 31 and the stamp raising and lowering adjustment pins 37 includes openings 13 and 23, respectively.

The substrate seating unit 10 and the stamp seating unit 20 are mounted on a support unit 30 for supporting them.

The support unit 30 may include a substrate raising and lowering unit 33 for raising and lowering the substrate, a stamp raising and lowering control unit 33-1 for raising and lowering the stamp seating unit 20, and the substrate seating unit 10. A stage unit 38 for supporting and a fixing clamp 36 for fixing the stamp seating unit 20 are included.

The substrate lift control unit 33 is a configuration for lifting the substrate, and includes a substrate lift control pins 31 for supporting the substrate side.

The stamp lifting control unit 33-1 is configured to lift the stamp, and includes stamp lifting control pins 37 for supporting the side of the stamp.

The substrate lifting control unit 33 is guided up and down along the substrate lifting guide 32 when raising and lowering the substrate.

In addition, the stamp lifting control unit 33-1 is guided up and down along the stamp lifting guide 34 to raise and lower the stamp when lifting the stamp.

The stage unit 38 is a structure for supporting the substrate seating unit 10, and is capable of proceeding in the x and y directions shown in the plane in which the stage unit 38 is mounted, and also capable of rotating at an angle. It is composed.

As described above, the substrate seating unit 10 is installed at a predetermined distance apart from the inner surface of the stamp seating unit 20, and the stage unit 38 supports the substrate seating unit 10 in the x and y directions. By rotating a certain angle while proceeding to, it is possible to implement a more accurate position alignment between the substrate and the stamp.

The fixing clamp 36 is configured to temporarily fix the substrate seating unit 10 and the stamp seating unit 20, and the substrate and the stamp seated thereon to the support unit 30, wherein the stamp seating unit ( It is configured to be rotatable in accordance with the elevation of 20).

That is, when the stamp lift adjustment unit 33-1 is raised to seat the stamp, the fixed clamp 36 is rotated in the direction to be opened in conjunction with it, and the stamp lift adjustment unit 33-1 is lowered. If possible, the fixing clamp 36 is rotated in the opposite direction to stably support the elements to the support unit 30.

The support unit 30 is provided with a substrate alignment inspection unit 60 for inspecting whether the substrate is correctly aligned with respect to the stamp.

Referring to FIG. 8, a method for checking whether the substrate is correctly aligned with respect to the stamp is described below.

That is, the circular marks 3 and 7 are displayed on the substrate 1 and the stamp 5, respectively, and the first and second positions of the circular marks 3 and 7 are included in the support unit 30. It is read by the substrate alignment inspection unit 60 through the identification opening 35 and the second position identification opening 14 included in the substrate mounting unit 10, and the two marks are aligned in the same position. It can be implemented by displacing the substrate mounting unit 10.

In addition, the support unit 30 may further include a stamp alignment control unit 62 to adjust the position of the stamp relative to the substrate.

The stamp alignment control unit 62 is a configuration for roughly aligning the position of the stamp disposed on the substrate, it is possible to align the position of the seated stamp by displacing the left and right predetermined angle from the position where the stamp is seated.

5 is a perspective view of the first pressing unit 50 and the second pressing unit 70 of the imprinting apparatus according to the present invention.

Referring to FIG. 5, the first pressurizing unit 50 moves up and down the curing unit 55 and the curing unit 55 incorporating a transparent contact panel 53 and an ultraviolet irradiation lamp for contacting and pressing the substrate. It includes a bellows (57) is stretched according to, the second pressing unit 70 is installed on one side of the first pressurizing unit (50).

In this case, the guide unit 40 and the support unit 70 for guiding the second pressing unit 70 are both installed in the upper cover 80, the roller 73 and the main support unit 70 along the The roller shaft 71 is lowered to the position of the stamp.

In the lowered state as described above, the roller 73-1 is transferred along the guide unit 40 to pressurize the entire surface of the stamp while rolling.

The curing unit 55 is lowered by the air pressure provided from the second pressure applying unit (not shown) to pressurize the stamp, and is also raised by the negative pressure provided from the second pressure applying unit.

Alternatively, the curing unit 55 is lowered to a height near the stamp by the linear driving means 59 including a threaded rod 58, to pressurize the stamp by the air pressure provided from the pressure applying unit. It may be configured.

The contact panel 53 is mounted on a lower surface of the curing unit 55, and an O-ring 54 for sealing at a portion where the contact panel 53 is mounted on the curing unit 55. ) Is provided.

In addition, the curing unit 55 is formed with a third pressure applying opening 56 for acting on the stamp the air pressure provided from the pressure applying unit (not shown) along the inner edge of the O-ring 54.

By the air pressure provided by the pressure applying unit, the curing unit 55 including the contact panel 53 descends to press the stamp, and then the third pressure is applied while the O-ring 54 is pressed against the substrate. The air pressure is additionally applied to the edge portion of the substrate through the opening 56.

Thus, a more uniform pressing force can be applied to all surfaces including the edge of the substrate.

The second pressing unit 70 includes a roller portion 72 for contacting and pressing the stamp and roller support portions 74 and 76 for supporting the present roller portion 72.

The roller support portions 74 and 76 include a first roller support portion 74 for supporting the roller portion 72 and a second roller support portion 76 for supporting the first roller support portion 74.

The roller portion 72 is lowered to the surface of the stamp to apply a pressure, a circular roller for contacting and pressurizing the rotating shaft 71 constituting the center of the roller portion 72 and the surface of the spam ( 73).

The rotation shaft 71 is supported by the first roller support portion 74, wherein the rotation shaft 71 is configured to be vertically displaceable by a predetermined distance with respect to the first roller support portion 74.

In addition, the first roller support portion 74 includes an elastic member (not shown) for elastically supporting the rotation shaft 71, so that the roller portion 72 contacts the surface of the stamp to apply pressure. When acting, the stamp surface is elastically pressurized while being displaceable up and down by a predetermined distance, thereby preventing the impact load from being applied.

The second roller support portion 76 is supported on the guide unit 40 and is configured to be capable of moving forward and backward in the longitudinal direction of the guide unit 40.

Referring to the operation of the second pressing unit 70 as described above are as follows.

First, in a state where the interior of the imprinting apparatus according to the present invention is in a vacuum state, the substrate and the stamp to which the photocurable resin or the thermoplastic polymer is applied are seated and aligned on the substrate seating unit 10 and the stamp seating unit 20. Next, the roller portion 72 included in the second pressing unit 70 is lowered.

As the roller portion 72 is lowered as described above, the second roller support portion 76 is moved along the length direction on the guide unit 40, thereby pressing and rolling the entire surface of the stamp.

In this way, by pressing the pressure from one side of the stamp to the other side through the roller portion 72 in a vacuum state, bubbles in the polymer or resin applied to the substrate can be discharged to the outside to achieve a more complete compression.

On the other hand, since the roller portion 72 is elastically supported on the first roller support portion 74, even when the impact force is generated during the rolling motion as described above it can provide a buffering effect.

6 is a perspective view illustrating a state in which the second pressing unit is disposed on the side of the support unit 30 according to another embodiment of the present invention.

Referring to FIG. 6, a guide for guiding the roller part 72 and the first and second roller support parts 74 and 76 and the second roller support part 76 for supporting the roller part 72. The unit 40 is arranged at the side of the support unit 30.

7 is a partially enlarged view showing the tilt compensation unit 83 according to the present invention.

Referring to FIG. 7, in the pressing process of the first pressing unit 50 as described above, the curing unit 55 included in the first pressing unit 50 may need to be inclined according to the mounting plane of the stamp.

In this case, both the end portion 82 connected to the curing unit 55 and the connection portion 84 to which the main end 82 is connected are formed in a curved surface, and there is a predetermined gap between the two curved surfaces. Between the end 82 and the connecting portion 84 is configured to allow a certain angle rotation.

Thus, when the stamp mounting plane has a predetermined inclination, the inclination of the curing unit 55 can be compensated by the inclination compensation unit 83.

On the other hand, after the contact panel 53 pressurizes the stamp, by operating the ultraviolet irradiation lamp built in the curing unit 55, the light through the transparent transparent contact panel 53 is applied to the substrate is a photocurable It will cure the resin.

Alternatively, the thermoplastic polymer may be cured by heating the substrate through the heating unit built in the curing unit 55 or the substrate seating unit 10.

On the other hand, the bellows 57 that is stretched as the hardening unit 55 is raised and lowered is disposed outside the upper cover 80 of the imprinting apparatus according to the present invention, thereby making it possible to form a more compact imprinting apparatus.

In the case of the first pressurizing unit 50 acts as a pressing force by the surface contact to the surface of the stamp, the second pressurizing unit 70 proceeds from one side to the other side in a line contact with the surface of the stamp and acting pressure Let's go.

Therefore, there is no problem of an increase in air pressure due to sudden compression between the photocurable resin applied to the substrate and the pattern formed on the stamp, and thereby a working pressure nonuniformity.

Therefore, prior to the surface contact pressing step by the first pressing unit 50, by performing the line contact pressing step by the second pressing unit 50, it is possible to implement a more reliable compression between the substrate and the stamp. Can be.

According to the present invention, the process time and manufacturing cost can be minimized by continuously processing the imprint process of high quality and high efficiency in vacuum and atmospheric pressure in a single module without any additional process or opening and closing operation.

In addition, there is no particle generation, bubbles are minimized during imprinting by removing bubbles in a vacuum state, and a large area precision imprint is possible by implementing precise positioning and uniform compression between the stamp and the substrate.

Claims (21)

A substrate mounting unit for mounting a substrate; A stamp seating unit disposed on the outside of the board seating unit to seat a stamp; A support unit for supporting the substrate seating unit and the stamp seating unit; A first pressurizing unit disposed above the substrate seating unit and the stamp seating unit and configured to press the base substrate and the stamp in a vertical direction; A curing unit included in the first pressing unit and configured to irradiate ultraviolet rays; Imprinting apparatus comprising a second pressing unit for pressing the substrate and the stamp in a rolling manner. The method of claim 1, The stamp seating unit is an imprinting apparatus, characterized in that spaced apart to maintain a predetermined interval with respect to the substrate seating unit. The method of claim 1, The support unit is an imprinting apparatus, characterized in that further comprises a substrate lifting control unit for lifting the substrate. The method according to claim 1 or 2, The support unit is an imprinting apparatus, characterized in that it further comprises a stamp lifting control unit for lifting the stamp. The method of claim 4, wherein Imprinting apparatus further comprises a stamp alignment adjusting unit for adjusting the alignment of the stamp. The method of claim 5, Imprinting apparatus further comprises a substrate alignment inspection unit for inspecting the alignment of the substrate and the stamp. The method of claim 6, And a pressure applying unit for applying pressure to the substrate seating unit and the stamp seating unit. The method of claim 7, wherein The support unit is an imprinting apparatus, characterized in that further comprises a clamp (Clamp) for fixing the stamp to the stamp seating unit. The method of claim 3, wherein The support unit is an imprinting apparatus, characterized in that further comprises a stage unit (Stage Unit) for supporting the substrate seating unit. The method of claim 9, And the stage unit is configured to displaceably support the substrate seating unit. The method of claim 4, wherein The first pressurizing unit comprises a bellows to shrink / expand according to the lifting of the first pressurizing unit, the bellows is an imprinting apparatus, characterized in that disposed on the outside of the upper cover of the imprinting apparatus. The method of claim 4, wherein The first pressing unit is an imprinting apparatus, characterized in that it comprises a pressure applying opening for additionally acting the air pressure in the pressurized state of the stamp. The method of claim 1, The second pressing unit is an imprinting apparatus, characterized in that disposed on the side of the substrate seating unit and the stamp seating unit. The method of claim 1, The second pressing unit is an imprinting apparatus, characterized in that fixed to the first pressing unit. The method of claim 13, And the second pressing unit includes a roller portion for pressing the substrate and the stamp and a roller support portion for supporting the roller portion. The method of claim 14, And the second pressing unit includes a roller portion for pressing the substrate and the stamp and a roller support portion for supporting the roller portion. The method according to claim 15 or 16, And the roller portion is configured to be movable up and down relative to the roller support portion. The method of claim 17, And the roller support portion includes elastic means for elastically supporting the roller portion. The method of claim 18, The first pressing unit is an imprinting apparatus, characterized in that further comprises a tilt compensation unit for the tilt compensation of the first subscription unit. The method of claim 19, The first pressing unit is an imprinting apparatus, characterized in that further comprises a heat curing unit for curing the thermoplastic polymer. The method of claim 19, The substrate mounting unit further comprises a heat curing unit for curing the thermoplastic polymer.

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