KR100723627B1 - Evaporator for organic thin film vapor deposition - Google Patents

Evaporator for organic thin film vapor deposition Download PDF

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KR100723627B1
KR100723627B1 KR1020060072778A KR20060072778A KR100723627B1 KR 100723627 B1 KR100723627 B1 KR 100723627B1 KR 1020060072778 A KR1020060072778 A KR 1020060072778A KR 20060072778 A KR20060072778 A KR 20060072778A KR 100723627 B1 KR100723627 B1 KR 100723627B1
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crucible
guide portion
thin film
evaporation
heating device
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KR1020060072778A
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Korean (ko)
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장정원
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세메스 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An evaporating source for depositing an organic thin film is provided to prevent a deposition material from being spread by using a pressure of the deposition material and a direction of a side injection nozzle, not an injection angle of a nozzle. An evaporating source for depositing an organic thin film includes a crucible(100) to receive a deposition material, a heating device(90) to heat the crucible(100), and a guide unit(10) to divide a region through which the evaporated deposition material flows. The crucible(100) is formed in a shape of a long tube in which a top surface is opened and side and bottom surfaces are closed. The crucible(100) includes an inner space for storing an organic material(50) for deposition. The heating device(90) heats the crucible(100) by being installed in the crucible(100) or an outer wall of the crucible(100). The organic material(50) for deposition in the crucible(100) is evaporated by the temperature rise. The heating device(90) is installed by winding a hot wire around the crucible(100). The guide unit(10) is formed in a shape of a long plate at both sides of the crucible(100) in a lengthwise direction.

Description

유기 박막 증착 장치의 증발원{Evaporator for organic thin film vapor deposition}[0002] Evaporators for organic thin film vapor deposition

도 1은 종래의 노즐에 분사각을 형성하여 증착 물질을 분사시키는 증발원의 단면도이다. 1 is a cross-sectional view of an evaporation source for spraying a deposition material by forming a spray angle on a conventional nozzle.

도 2는 본 발명의 일 실시예에 따른 유기 박막 증착 장치의 증발원의 단면도이다.2 is a cross-sectional view of an evaporation source of an organic film deposition apparatus according to an embodiment of the present invention.

도 3은 본 발명의 일 실시예에 따른 유기 박막 증착 장치의 증발원의 사시도이다.3 is a perspective view of an evaporation source of an organic film deposition apparatus according to an embodiment of the present invention.

도 4는 본 발명의 다른 일 실시예에 따른 유기 박막 증착 장치의 증발원의 단면도이다. 4 is a cross-sectional view of an evaporation source of an organic film deposition apparatus according to another embodiment of the present invention.

도 5는 본 발명의 일 실시예에 따른 사이드 분사구의 방향을 조절하는 유기 박막 증착 장치의 증발원의 단면도이다. 5 is a cross-sectional view of an evaporation source of an organic film deposition apparatus for adjusting the direction of a side injection hole according to an embodiment of the present invention.

도 6은 본 발명의 다른 일 실시예에 따른 사이드 분사구의 방향을 조절하는 유기 박막 증착 장치의 단면도이다. 6 is a cross-sectional view of an organic film deposition apparatus for adjusting the direction of a side injection hole according to another embodiment of the present invention.

<도면의 주요 부분에 대한 부호의 설명>Description of the Related Art

10: 가이드부 20: 보조가이드부10: guide part 20: auxiliary guide part

30: 중앙 유입구 35: 사이드 유입구30: central inlet 35: side inlet

40: 중앙 분사구 45: 사이드 분사구40: central jetting port 45: side jetting port

50: 증착 물질 90: 가열장치50: deposition material 90: heating device

100: 도가니100: Crucible

본 발명은 유기 박막 증착 장치의 증발원에 관한 것으로, 보다 상세하게는 증발된 증착 물질이 분사되는 압력을 달리하도록 분사구를 형성하여 증착 물질의 사용 효율을 높이는 증발원에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an evaporation source of an organic thin film deposition apparatus, and more particularly, to an evaporation source that improves the use efficiency of a deposition material by forming an injection hole so that a vaporized evaporation material is injected at a different pressure.

일반적으로, 유기발광소자를 제조하는 방법은 저분자 물질을 진공 중에 증발시켜 제조하는 방법과, 고분자 물질을 용제에 녹여서 스핀 코팅(spin coating)하는 방법이 알려져 있다. 2. Description of the Related Art Generally, a method of manufacturing an organic light emitting device is known in which a low molecular material is evaporated in a vacuum and a method in which a high molecular material is dissolved in a solvent to spin coat.

이 같은 방법 중에서, 고진공에서 박막을 제작하는 저분자 유기발광소자 제조 방법의 경우 임의의 형상의 개구부를 가지는 쉐도우 마스크를 기판의 앞에 정렬하여 이 기판에 유기물질을 증착하여 박막을 제작하게 된다. Among such methods, in the case of a method of manufacturing a low molecular weight organic light emitting device in which a thin film is fabricated in a high vacuum, a shadow mask having openings of arbitrary shape is aligned in front of the substrate and an organic material is deposited on the substrate to produce a thin film.

이와 같은 박막 제작에는 증발원이 이용된다. 증발원은 증착 물질을 담는 도가니와 도가니를 가열하는 가열 장치를 포함하여 구성되는데, 가열 장치에 의해 도가니 안의 증착 물질이 가열되어 증발하여 상단에 있는 기판에 증착하여 박막을 형성하게 된다. 생산성 향상을 위해 대면적 기판을 사용할 경우, 대면적 박막의 균일도가 확보되도록 선형증발원이 필요하게 된다. 이때, 대면적 기판 또는 선형증발원 이 움직이면서 기판의 전면적에 대해서 증착이 이루어진다.An evaporation source is used for producing such a thin film. The evaporation source includes a crucible for containing the evaporation material and a heating device for heating the crucible. The evaporation material in the crucible is heated and evaporated by the heating device to be deposited on the upper substrate to form a thin film. When a large-area substrate is used to improve productivity, a linear evaporation source is required to ensure uniformity of the large-area thin film. At this time, deposition is performed on the entire surface of the substrate as the large area substrate or the linear evaporation source moves.

도 1은 종래의 노즐에 분사각을 형성하여 증착 물질을 분사시키는 증발원의 단면도이다. 1 is a cross-sectional view of an evaporation source for spraying a deposition material by forming a spray angle on a conventional nozzle.

증착 물질을 담는 도가니(100), 도가니(100)를 가열하는 가열 장치(90), 도가니(100)를 덮고 노즐(210)이 형성된 덮개부(200)를 포함하여 구성된다. 증착 물질이 가열되어 증발원 바깥으로 분사되는 경우 일반적으로 비스코스 플로우(viscos flow) 상태에서 몰러큘러 플로우(molecular flow) 상태로 바뀌게 된다. 따라서, 증발원으로부터 분사된 증착 물질이 퍼지는 각도를 최소화하는 것이 중요하다. 종래에는 도면에서와 같이 덮개부(200)의 노즐(210)에 분사각을 형성하여 증착 물질이 퍼지는 각도를 최소화하려고 하였다. 그러나, 이러한 방법을 사용할 때에도 증착 물질이 퍼지는 것을 막을 수 없었고, 이는 증착 물질의 사용 효율을 나쁘게 하는 원인이 된다. A crucible 100 for containing the evaporation material, a heating device 90 for heating the crucible 100, and a lid 200 covering the crucible 100 and having the nozzle 210 formed thereon. When the evaporation material is heated and injected outside the evaporation source, it generally changes from a viscos flow state to a molecular flow state. Therefore, it is important to minimize the angle of spreading of the evaporation material sprayed from the evaporation source. In the prior art, as shown in the drawing, a spray angle is formed in the nozzle 210 of the lid 200 to minimize the angle at which the evaporation material spreads. However, even when such a method is used, the spread of the evaporation material can not be prevented, which causes the use efficiency of the evaporation material to deteriorate.

본 발명은 상기한 문제점을 개선하기 위해 고안된 것으로, 본 발명이 이루고자 하는 기술적 과제는 증발된 증착 물질이 분사되는 압력을 달리하도록 분사구를 형성함으로써 증착 물질의 사용 효율을 높이는 유기 박막 증착을 위한 증발원을 제공하는 것이다.It is an object of the present invention to provide an evaporation source for depositing an organic thin film which improves the use efficiency of a deposition material by forming an injection hole so that the evaporated deposition material is injected at a different pressure, .

본 발명의 목적들은 이상에서 언급한 목적들로 제한되지 않으며, 언급되지 않은 또 다른 목적들은 아래의 기재로부터 당업자에게 명확하게 이해될 수 있을 것이다.The objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

상기 목적을 달성하기 위하여, 본 발명의 실시예에 따른 유기 박막 증착 장치의 증발원은 내부에 증착용 물질을 담는 것으로 긴 통모양의 도가니, 상기 도가니를 가열하는 가열장치 및 상기 도가니 내부에서 긴 판 형상으로 양측에 구비되며, 상부로 갈수록 상기 도가니의 측면과 가까워지도록 경사가 져, 증발된 증착 물질이 관통하는 영역을 나누는 가이드부를 포함하여 구성된다. In order to achieve the above object, an evaporation source of an organic thin film deposition apparatus according to an embodiment of the present invention includes a crucible having a long tubular shape for containing evaporation material therein, a heating device for heating the crucible, And a guide part that is inclined to approach the side of the crucible toward the upper part and divides a region through which evaporated evaporation material passes.

기타 실시예들의 구체적인 사항들은 상세한 설명 및 도면들에 포함되어 있다.The details of other embodiments are included in the detailed description and drawings.

본 발명의 이점 및 특징, 그리고 그것들을 달성하는 방법은 첨부되는 도면과 함께 상세하게 후술되어 있는 실시예들을 참조하면 명확해질 것이다. 그러나 본 발명은 이하에서 개시되는 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 구현될 수 있으며, 단지 본 실시예들은 본 발명의 개시가 완전하도록 하고, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에게 발명의 범주를 완전하게 알려주기 위해 제공되는 것이며, 본 발명은 청구항의 범주에 의해 정의될 뿐이다. 명세서 전체에 걸쳐 동일 참조 부호는 동일 구성 요소를 지칭한다 BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and the manner of achieving them, will be apparent from and elucidated with reference to the embodiments described hereinafter in conjunction with the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification.

이하, 본 발명의 실시예들에 의하여 유기 박막 증착 장치의 증발원을 설명하기 위한 도면들을 참고하여 본 발명에 대해 설명하도록 한다.Hereinafter, the present invention will be described with reference to the drawings for explaining an evaporation source of an organic film deposition apparatus according to embodiments of the present invention.

도 2는 본 발명의 일 실시예에 따른 유기 박막 증착 장치의 증발원의 단면도이고, 도 3은 본 발명의 일 실시예에 따른 유기 박막 증착 장치의 증발원의 사시도이다.FIG. 2 is a sectional view of an evaporation source of an organic film deposition apparatus according to an embodiment of the present invention, and FIG. 3 is a perspective view of an evaporation source of an organic film deposition apparatus according to an embodiment of the present invention.

본 발명의 일 실시예에 따른 유기 박막 증착 장치의 증발원은 증착 물질(50)을 담는 도가니(100), 도가니(100)를 가열하는 가열 장치(90), 증발된 증착 물질(50)이 관통하여 흐르는 영역을 나누는 가이드부(10)를 포함하여 구성된다. The evaporation source of the organic film deposition apparatus according to an embodiment of the present invention includes a crucible 100 for containing an evaporation material 50, a heating device 90 for heating the crucible 100, and a vaporized evaporation material 50 And a guide portion 10 for dividing the flowing region.

도가니(100)는 상면은 개방되어 있고 측면과 하면은 닫혀진 긴 통모양의 형상으로 도가니(100)의 내부에 증착용 유기물질(50)이 저장 또는 유지될 수 있도록 내부 공간을 구비한다. The crucible 100 is provided with an internal space so that the vapor-deposited organic material 50 can be stored or maintained in the crucible 100 in the shape of a long, tubular shape having an open top and closed side and bottom surfaces.

가열 장치(90)는 도가니(100)에 또는 도가니(100)의 외벽에 형성되어 도가니(100)를 가열한다. 도가니(100)의 가열에 의해 도가니(100) 내부에 놓여진 증착 물질(50)은 온도가 상승하여 증발하게 된다. 가열 장치(90)는 열선으로 도가니(100) 주변을 감아 형성될 수 있다. The heating device 90 is formed on the crucible 100 or on the outer wall of the crucible 100 to heat the crucible 100. The evaporation material 50 placed in the crucible 100 by the heating of the crucible 100 is evaporated due to its temperature rising. The heating device 90 may be formed by winding the crucible 100 around a hot wire.

가이드부(10)는 도가니(100) 안에 형성되어 증착 물질(50)이 증발하여 관통하여 흐르는 영역을 나눈다. 가이드부(10)는 도가니(100) 안에서 도가니(100)의 길이 방향으로 양측에 긴 판 형상으로 형성된다. 따라서, 가이드부(10)를 형성하는 두 판 사이에 증발된 물질(50)이 관통하여 흐르는 하나의 영역을 형성하게 된다. 이때, 아래에 증발된 증착 물질(50)이 증발되어 들어가는 부분을 중앙 유입구(30)라 하고 증발원으로부터 분사되어 퍼져나가는 상부를 중앙 분사구(40)라 칭하기로 한다. 또한, 가이드부(10)의 각 판과 도가니(100)의 측면 벽에 의해 증발된 물질(50)이 관통하여 흐르도록 하는 영역이 양측에 형성된다. 증발 물질(50)이 들어가고 분사되는 부분을 각각 사이드 유입구(35)와 사이드 분사구(45)라고 칭하기로 한다.The guide portion 10 is formed in the crucible 100 to divide the region through which the evaporation material 50 evaporates and flows. The guide portion 10 is formed in the crucible 100 in the shape of a long plate on both sides in the longitudinal direction of the crucible 100. Accordingly, a region through which the evaporated material 50 flows is formed between the two plates forming the guide portion 10. At this time, a portion where the vaporized evaporated material 50 evaporates is referred to as a central inlet 30, and an upper portion, which is sprayed from the evaporation source and spreads, is referred to as a central jet opening 40. In addition, regions on both sides of the plate 50 of the guide portion 10 and the side walls of the crucible 100 to allow the evaporated material 50 to pass therethrough are formed. The portions into which the evaporation material 50 is injected and injected are referred to as a side inlet port 35 and a side jet port 45, respectively.

후술할 내용이지만 사이드 유입구(35)와 사이드 분사구(45)는 도가니(100)의 측면 벽 대신에 도 4와 같이 보조 가이드부(20)를 형성하여 만들어질 수도 있다. The side inlet port 35 and the side jet port 45 may be formed by forming the auxiliary guide portion 20 as shown in FIG. 4 instead of the side wall of the crucible 100. FIG.

이때, 가이드부(10)를 형성하는 각 판은 도가니(100) 상단의 분사구(40, 45)로 갈수록 도가니(100) 벽면을 향하여 기울어지도록 형성됨이 바람직하다. 기울어지는 각도가 너무 커 가이드부(10)의 상단이 도가니(100)의 측면 벽에 닿아서는 안 된다. 왜냐하면, 사이드 분사구(45)를 형성할 수 없기 때문이다. 바람직하게는 중앙 유입구(30)의 폭보다 사이드 유입구(35)의 폭이 더 크게 형성되도록 한다. At this time, it is preferable that each plate forming the guide portion 10 is formed so as to be inclined toward the crucible 100 wall surface toward the jetting ports 40, 45 at the upper end of the crucible 100. The inclined angle is too large and the upper end of the guide portion 10 should not touch the side wall of the crucible 100. This is because the side injection port 45 can not be formed. Preferably, the width of the side inlet 35 is greater than the width of the central inlet 30.

따라서, 가이드부(10)에 의해 형성되는 중앙 유입구(30)와 중앙 분사구(40)를 비교해보면 중앙 유입구(30)에 비해 중앙 분사구(40)의 폭이 더 크게 된다. 또한, 사이드 유입구(35)는 사이드 분사구(45)보다 그 폭이 더 크게 된다. The width of the central injection port 40 is larger than that of the central injection port 30 in comparison with the central injection port 30 formed by the guide portion 10 and the central injection port 40. Further, the width of the side inlet 35 is larger than that of the side injection port 45. [

가열 장치(90)에 의해 가열된 증착 물질(50)이 증발하여 상승하게 되는데, 상대적으로 작은 입구를 가진 중앙 유입구(30)에는 적은 양의 증발 물질(50)이 유입되게 되고, 상대적으로 큰 입구를 가진 사이드 유입구(35)에는 많은 양의 증발 물질(50)이 유입되게 된다. 각 입구를 통해 유입된 증발 물질(50)은 계속 상승하게 되는데, 중앙 유입구(30)로 유입된 물질은 가이드부(10)에 의해 안내되는 폭이 점점 커져 압력이 낮아지게 된다. 이와 반대로, 사이드 유입구(35)로 유입된 증발 물질(50)은 점점 폭이 작아지도록 안내되어 사이드 분사구(45)를 통하여 분사할 때까지 압력이 점점 높아지게 된다.The evaporation material 50 heated by the heating device 90 evaporates and rises because a small amount of the evaporation material 50 flows into the central inlet 30 having a relatively small inlet, A large amount of the evaporation material 50 is introduced into the side inlet 35 having the opening. The evaporated material 50 flowing through each inlet continues to rise, and the material introduced into the central inlet 30 is gradually increased in width guided by the guide portion 10, so that the pressure is lowered. On the other hand, the pressure of the evaporation material 50 flowing into the side inlet 35 is gradually reduced until the width of the evaporation material 50 is gradually reduced and is sprayed through the side injection port 45.

따라서, 중앙에는 적은 양의 물질(50)이 유입되어 유입될 때보다 압력이 더 낮아진 상태로 분사하게 되고, 양 사이드에서는 중앙에 비해 더 많은 양의 물 질(50)이 유입되어 유입될 때보다 압력이 더 높아진 상태로 분사하게 된다. 사이드 분사구(45)에서 더 높은 압력으로 분사되는 증발 물질(50)은 중앙 분사구(40)에서 분사되는 증발 물질(50)의 분사를 안내하는 역할을 할 수 있으며, 전체적으로 증착 물질(50)이 분사구를 통하여 뻗어나가는 직진성을 향상시킬 수 있다. 따라서, 퍼져나가는 증착 물질(50)의 양을 줄일 수 있으므로 증착 물질(50)의 사용 효율을 높일 수 있다. Accordingly, a small amount of material 50 is injected at a central portion in a state where the pressure is lower than that at the time of inflow, and at both sides, a larger amount of material 50 than the central portion is injected So that the pressure is higher. The evaporation material 50 injected at a higher pressure in the side injection port 45 may serve to guide the injection of the evaporation material 50 injected from the central injection port 40. The evaporation material 50, So that it is possible to improve the straightness extending through the through hole. Accordingly, since the amount of the evaporation material 50 to be spread can be reduced, the use efficiency of the evaporation material 50 can be increased.

도 4는 본 발명의 다른 일 실시예에 따른 유기 박막 증착 장치의 증발원의 단면도이다. 4 is a cross-sectional view of an evaporation source of an organic film deposition apparatus according to another embodiment of the present invention.

본 발명의 다른 실시예에 따른 유기 박막 증착 장치의 증발원은 증착 물질(50)을 담는 도가니(100), 도가니(100)를 가열하는 가열 장치(90), 증발된 증착 물질(50)이 관통하여 흐르는 영역을 나누는 가이드부(10)를 포함하여 구성되는데, 이러한 구성요소는 전술한 실시예와 동일하므로 생략하기로 한다. The evaporation source of the organic thin film deposition apparatus according to another embodiment of the present invention includes a crucible 100 for containing an evaporation material 50, a heating device 90 for heating a crucible 100, and a vaporized evaporation material 50 And a guide unit 10 for dividing the flowing region. These components are the same as those in the above-described embodiment, and thus will not be described.

다만, 전술한 도가니(100)의 측면 벽과 가이드부(10)의 판에 의해 형성되는 사이드 유입구(35)와 사이드 분사구(45)는, 도 4와 같이 가이드부(10)와 상기 도가니(100)의 벽면 사이에 형성되어 도가니(100)의 길이 방향으로 긴 판 형상의 보조 가이드부(20)를 이용하여 만들어질 수 있다. 보조 가이드부(20)는 도가니(100) 상단의 분사구(40, 45)로 갈수록 상기 도가니(100) 벽면에 멀어지도록 기울어지면서 형성되어 사이드 분사구(45)의 폭을 작게 하도록 함이 바람직하다. 보조 가이드부(20)와 가이드부(10)에 의해 형성되는 사이드 유입구(35)와 사이드 분사구(45)는 역시 사이드 유입구(35)로 유입된 증발 물질(50)이 점차 좁아지는 경로로 안내되어 압력이 점점 높아지게 되어 분사하게 된다. The side inlet port 35 and the side inlet port 45 formed by the side wall of the crucible 100 and the plate of the guide portion 10 described above are connected to the guide portion 10 and the crucible 100 Shaped auxiliary guide portion 20 formed between the wall surfaces of the crucible 100 and the crucible 100 in the longitudinal direction thereof. It is preferable that the auxiliary guide portion 20 is formed so as to be tilted away from the wall of the crucible 100 toward the jetting ports 40 and 45 at the upper end of the crucible 100 so as to reduce the width of the side jetting ports 45. The side inlet port 35 and the side jet port 45 formed by the auxiliary guide portion 20 and the guide portion 10 are guided to the gradually narrowing path of the evaporation material 50 flowing into the side inlet port 35 So that the pressure becomes higher and higher.

도 5는 본 발명의 일 실시예에 따른 사이드 분사구의 방향을 조절하는 유기 박막 증착 장치의 증발원의 단면도이고, 도 6은 본 발명의 다른 일 실시예에 따른 사이드 분사구의 방향을 조절하는 유기 박막 증착 장치의 단면도이다. FIG. 5 is a cross-sectional view of an evaporation source of an organic film deposition apparatus for adjusting a direction of a side injection hole according to an embodiment of the present invention. FIG. 6 is a cross- Fig.

도 5와 같이, 가이드부(10)의 분사구 부분의 높이를 도가니(100)의 측벽보다 낮게 하여 사이드 분사구(45)에서 분사되는 증발 물질(50)의 방향이 중앙을 향하도록 할 수 있다. 양측의 사이드 분사구(45)에서 더 높은 압력을 가진 증발 물질(50)이 중앙을 향하여 각도를 가지며 상승하므로 퍼져나가는 증발 물질(50)의 양을 더욱 줄일 수 있다. The height of the jetting port portion of the guide portion 10 may be made lower than the sidewall of the crucible 100 so that the direction of the evaporation material 50 ejected from the side jetting ports 45 may be directed to the center as shown in FIG. The amount of the evaporation material 50 spreading out can be further reduced because the evaporation material 50 having higher pressure is raised at an angle toward the center at the side injection port 45 on both sides.

전술한 바와 같이 사이드 유입구(35)와 사이드 분사구(45)는 보조 가이드부(20)와 가이드부(10)에 의해서 형성될 수도 있는데, 도 6과 같이, 가이드부(10)의 분사구 부분을 보조 가이드부(20)의 분사구 부분의 높이보다 낮게 하여 사이드 분사구(45)에서 분사되는 증발 물질(50)의 방향이 중앙을 향하도록 할 수 있다. The side inlet port 35 and the side injection port 45 may be formed by the auxiliary guide portion 20 and the guide portion 10 as described above. The height of the jetting port portion of the guide portion 20 may be lower than the height of the jetting port portion of the guide portion 20 so that the direction of the evaporation material 50 ejected from the side jetting port 45 may be directed to the center.

본 발명이 속하는 기술분야의 통상의 지식을 가진 자는 본 발명이 그 기술적 사상이나 필수적인 특징을 변경하지 않고서 다른 구체적인 형태로 실시될 수 있다는 것을 이해할 수 있을 것이다. 그러므로 이상에서 기술한 실시예들은 모든 면에서 예시적인 것이며 한정적이 아닌 것으로 이해해야만 한다. 본 발명의 범위는 상기 상세한 설명보다는 후술하는 특허청구의 범위에 의하여 나타내어지며, 특허청구의 범위의 의미 및 범위 그리고 그 균등 개념으로부터 도출되는 모든 변경 또는 변형된 형태가 본 발명의 범위에 포함되는 것으로 해석되어야 한다.It will be understood by those skilled in the art that the present invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive. The scope of the present invention is defined by the appended claims rather than the foregoing detailed description, and all changes or modifications derived from the meaning and scope of the claims and the equivalents thereof are included in the scope of the present invention Should be interpreted.

상기한 바와 같은 본 발명의 유기 박막 증착 장치의 증발원에 따르면 다음과 같은 효과가 하나 혹은 그 이상 있다. According to the evaporation source of the organic film deposition apparatus of the present invention as described above, one or more of the following effects can be obtained.

첫째,　노즐의 분사각이 아닌 증발 물질의 자체 압력과 사이드 분사구의 방향을 이용하여 증착 물질이 퍼져나가는 것을 막을 수 있다는 장점이 있다. First, there is an advantage that evaporation material can be prevented from spreading by using the self-pressure of the evaporation material and the direction of the side injection port, not the spray angle of the nozzle.

둘째, 증착 물질의 직진성을 향상시켜 증착 물질의 사용효율을 높일 수 있다는 장점도 있다. Second, there is an advantage that the efficiency of use of the deposition material can be improved by improving the straightness of the deposition material.

Claims (4)

내부에 증착용 물질을 담는 것으로 긴 통모양의 도가니; A long tubular crucible containing an evaporation material therein; 상기 도가니를 가열하는 가열장치; 및A heating device for heating the crucible; And 상기 도가니 내부에서 긴 판 형상으로 양측에 구비되며, 상부로 갈수록 상기 도가니의 측면과 가까워지도록 경사가 져, 증발된 증착 물질이 관통하는 영역을 나누는 가이드부를 포함하는, 유기 박막 증착 장치의 증발원.And a guiding part provided on both sides of the crucible in a long plate shape and dividing a region through which the vaporized evaporated material passes by being inclined so as to approach the side of the crucible toward the upper part. 제 1 항에 있어서,The method according to claim 1, 상기 가이드부와 상기 도가니의 측면 사이에 긴 판 형상으로 구비되며, 상부로 갈수록 상기 도가니의 측면과 멀어지도록 경사가 진 보조 가이드부를 더 포함하는, 유기 박막 증착 장치의 증발원.Further comprising an auxiliary guide portion provided in a shape of a long plate between the guide portion and the side surface of the crucible and inclined so as to be further away from the side of the crucible toward the upper portion. 제 1 항에 있어서,The method according to claim 1, 상기 가이드 부는 그 높이를 상기 도가니의 측면보다 낮게 하여 상기 가이드부에 의해 형성되는 사이드 분사구의 방향이 중앙으로 기울어지도록 한, 유기 박막 증착 장치의 증발원.Wherein the guide portion has a height lower than that of the crucible so that the direction of the side injection opening formed by the guide portion is inclined to the center. 제 2 항에 있어서,3. The method of claim 2, 상기 가이드부는 그 높이를 상기 보조 가이드부의 높이보다 낮게하여 상기 가이드부와 상기 보조가이드부에 의해 형성되는 사이드 분사구의 방향이 중앙으로 기울어지도록 한, 유기 박막 증착 장치의 증발원.The height of the guide portion is lower than the height of the auxiliary guide portion so that the direction of the side injection port formed by the guide portion and the auxiliary guide portion is inclined to the center.
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