KR100292002B1 - Manufacturing method of field emission display device - Google Patents

Abstract

The present invention discloses a method of manufacturing a field emission display device capable of forming a phosphor or a black matrix without misalignment. According to the present invention, a method of forming a sphere by etching a predetermined portion of an upper substrate to a predetermined depth, forming an anode electrode on the upper substrate surface and the sphere surface, and applying a phosphor on the anode electrode inside the sphere And forming a black matrix on top of the anode electrode on the upper substrate surface.

Description

Manufacturing method of field emission display device

The present invention relates to a method for manufacturing a field emission display device, and more particularly, to a method for manufacturing a field emission display device that can be easily aligned and formed when forming a phosphor and a black matrix.

Field emission display devices are typically used as display panels in devices such as electron guns, microwave tubes, ion sources, scanning tunneling microscopes, and the like. Is used.

In the conventional field emission display device, as illustrated in FIG. 1, the cathode electrode 2 is formed on the lower substrate 1 in a stripe state, and a conical tip 3 is formed on the cathode electrode 2. do.

An anode electrode 11 is formed of an ITO material in a stripe shape on the inner surface of the upper substrate 10 facing the lower substrate 1, and R, G, and B phosphors are formed on the anode electrode 11 by a predetermined rule. 12) is printed. In addition, a black matrix 13 is formed between the phosphors 12 to prevent color mixing between the phosphors 12.

A spacer 15 is interposed between the lower substrate 1 and the upper substrate 10 to maintain a gap between the two substrates 1 and 10.

In the field emission device having such a configuration, electrons accelerated from the tip 4 of the cathode electrode 2 excite the phosphor 12 to generate light.

The field emission display device first forms a black matrix, and then fills a phosphor in a space surrounded by the black matrix, or forms a phosphor first, and then forms a black matrix outside the phosphor.

However, when forming the phosphor or black matrix, accurate alignment is difficult during the post-processing, so that misalignment occurs.

Accordingly, an object of the present invention is to solve the above-mentioned problems and to provide a method of manufacturing a field emission display device capable of forming a phosphor or a black matrix without misalignment.

1 is a cross-sectional view of a conventional field emission display device.

2A to 2D are cross-sectional views of a field emission display device according to an embodiment of the present invention.

3 is a cross-sectional view of a field emission display device for explaining another embodiment of the present invention.

4 is a cross-sectional view of a field emission display device for explaining another embodiment of the present invention.

(Explanation of symbols for the main parts of the drawing)

20,30,40-Substrate 21,31,41-Anode Electrode

22,32,43-Phosphor 23,33,42-Black Matrix

In order to achieve the above object of the present invention, the present invention comprises the steps of forming a sphere by etching a predetermined portion of the upper substrate to a predetermined depth, forming an anode electrode on the upper substrate surface and the sphere surface, the sphere Applying a phosphor on an internal anode electrode, and forming a black matrix on the anode electrode of the upper substrate surface.

In addition, the present invention includes depositing an insulating film containing a black dye on the upper substrate, forming a hole by etching a portion of the insulating film containing the black dye, and forming an anode on the bottom of the hole And forming a phosphor on the anode electrode.

The present invention also provides a method of forming a sphere by etching a predetermined portion of an upper substrate to a predetermined depth, forming an anode electrode on the upper substrate surface and the sphere surface, and forming a black matrix on the anode electrode inside the sphere. And forming a phosphor on the anode electrode on the upper substrate surface.

At this time, the sphere and the hole is characterized in that formed in the reverse mesa shape.

According to the present invention, the black matrix and the phosphor are formed on different surfaces, so that the black matrix and the phosphor are formed without misalignment.

In addition, as the black matrix and the phosphor are formed on different surfaces, no influence is applied to the adjacent phosphor upon electron emission from the lower substrate.

(Example)

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2A to 2D are cross-sectional views of a field emission display device according to an embodiment of the present invention, FIG. 3 is a cross-sectional view of a field emission display device for explaining another embodiment of the present invention, and FIG. A cross-sectional view of a field emission display device for explaining another embodiment of the invention. For reference, only the upper substrate structure is described in the above drawings, and the lower substrate is the same as the electrode arrangement of a conventional or general field emission display device.

Referring to FIG. 2A, the upper substrate 20 made of glass is a wet etching solution, for example, an etching solution for etching a silicon oxide film, a silicon nitride oxide film, or the like, and a predetermined portion is etched by a predetermined depth to reverse mesa. Form a sphere (溝: H). At this time, the portion where the sphere (H) is formed is a portion where the phosphor is to be formed.

Thereafter, as illustrated in FIG. 2B, an ITO layer is deposited on the upper surface of the upper substrate 20 and the bottom of the sphere H by an electron beam deposition method or a sputtering method to form an anode electrode 21.

Then, as shown in FIG. 2C, R, G, and B phosphors 22 are formed on the surface of the anode electrode 21 in the sphere H in accordance with a predetermined rule by using electrophoresis.

Subsequently, as illustrated in FIG. 2D, a black matrix 23 is formed on the surface of the anode electrode 21 on the upper substrate 20 using a roller deposition equipment.

Accordingly, when the black matrix 23 is formed, misalignment does not occur and can be easily formed.

3 is a view for explaining another embodiment of the present invention. After depositing an insulating film 31 including a black dye on the upper substrate 30 to a predetermined thickness, the insulating film 31 including the black dye is deposited. Patterned in inverse mesa form to form hole H1. Next, an anode electrode 32 is formed of an ITO material on the substrate 30 on the bottom of the hole H1 by electron beam deposition, and a phosphor 33 is formed on the anode electrode 32 by electrophoresis. Accordingly, the phosphor and the black matrix can be formed without misalignment.

4, in the same manner as in the above embodiment, the upper substrate 40 is patterned in a reverse mesa shape by a predetermined depth to form a sphere H2. Then, the anode electrode 41 is formed on the top of the upper substrate 40 and on the bottom of the sphere H2 in the same manner as described above. Then, the black matrix 42 is formed on the anode electrode 41 in the sphere H3, and the phosphor 43 is formed on the anode electrode 41 on the upper substrate 40.

As described in detail above, according to the present invention, the black matrix and the phosphor are formed on different surfaces, so that the black matrix and the phosphor are formed without misalignment.

In addition, as the black matrix and the phosphor are formed on different surfaces, no influence is applied to the adjacent phosphor upon electron emission from the lower substrate.

In addition, this invention can be implemented in various changes within the range which does not deviate from the summary.

Claims (7)

Etching a predetermined portion of the upper substrate to a predetermined depth to form a sphere; Forming an anode electrode on the upper substrate surface and the sphere surface; Applying a phosphor on an anode electrode inside the sphere; And And forming a black matrix on the anode of the upper substrate surface. The method of claim 1, wherein the sphere is formed in an inverted mesa shape. The method of manufacturing a field emission display device according to claim 1, wherein the anode electrode is formed of an ITO metal film. Depositing an insulating film including a black dye on the upper substrate; Etching a predetermined portion of the insulating film including the black dye to form a hole; Forming an anode on the bottom of the hole; And And forming a phosphor on the anode electrode. The method of claim 4, wherein the forming of the hole by etching a portion of the insulating layer including the black dye is performed by etching the sidewalls of the hole to form an inverted mesa shape. Etching a predetermined portion of the upper substrate to a predetermined depth to form a sphere; Forming an anode electrode on the upper substrate surface and the sphere surface; Forming a black matrix on an anode electrode inside the sphere; And And forming a phosphor on the anode electrode on the surface of the upper substrate. 7. The method of claim 6, wherein the sphere is formed in an inverted mesa shape.