JPWO2021028691A5 - - Google Patents

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JPWO2021028691A5
JPWO2021028691A5 JP2022507495A JP2022507495A JPWO2021028691A5 JP WO2021028691 A5 JPWO2021028691 A5 JP WO2021028691A5 JP 2022507495 A JP2022507495 A JP 2022507495A JP 2022507495 A JP2022507495 A JP 2022507495A JP WO2021028691 A5 JPWO2021028691 A5 JP WO2021028691A5
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filter
dry powder
reservoir
optionally
gas flow
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JP2022544370A (en
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Priority claimed from GBGB1911704.3A external-priority patent/GB201911704D0/en
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排気ガスから微粒子状物質を濾過するためのフィルタを処理する方法であって、
a)リザーバに乾燥粉末を収容するステップと、
b)フィルタホルダ内にフィルタを配置するステップであって、前記フィルタは、入口面及び出口面を有する多孔質基材を備え、前記入口面と前記出口面とは、多孔質構造によって隔てられている、配置するステップと、
c)前記フィルタの前記出口面に圧力低下を適用することにより、前記フィルタの前記多孔質構造を通る一次ガス流を確立するステップと、
d)前記乾燥粉末を前記リザーバから前記フィルタの前記入口面の上流に配置された噴霧デバイスに移送するステップと、
e)前記乾燥粉末が前記一次ガス流に同伴され、前記フィルタの前記入口面を通過して前記多孔質構造に接触するように、前記噴霧デバイスを使用して、前記フィルタの前記入口面に向けて前記乾燥粉末を噴霧するステップと、を含む、方法。
A method of treating a filter for filtering particulate matter from an exhaust gas comprising:
a) placing the dry powder in a reservoir;
b) placing a filter in a filter holder, said filter comprising a porous substrate having an inlet surface and an outlet surface, said inlet surface and said outlet surface being separated by a porous structure; a step of placing,
c) establishing a primary gas flow through said porous structure of said filter by applying a pressure drop to said outlet face of said filter;
d) transferring said dry powder from said reservoir to a spray device located upstream of said inlet face of said filter;
e) directing the dry powder, using the atomizing device, toward the inlet face of the filter so that it is entrained in the primary gas stream, passes through the inlet face of the filter and contacts the porous structure; and spraying said dry powder with a.
前記リザーバから前記噴霧デバイスへの前記乾燥粉末の移送は、前記一次ガス流を確立及び制御することとは独立して制御可能であり、任意選択により、前記フィルタの前記入口面に向けた前記乾燥粉末の噴霧は、前記一次ガス流を確立及び制御することとは独立して制御可能である、請求項1に記載の方法。 The transfer of said dry powder from said reservoir to said atomization device is controllable independently of establishing and controlling said primary gas flow, optionally said drying powder towards said inlet face of said filter. 2. The method of claim 1, wherein powder atomization is controllable independently of establishing and controlling the primary gas flow. 前記一次ガス流は、前記乾燥粉末が前記噴霧デバイスに移送され、前記入口面に向けて噴霧される前に確立される、請求項1又は2に記載の方法。 3. A method according to claim 1 or 2, wherein the primary gas flow is established before the dry powder is transferred to the atomization device and atomized towards the inlet face. ステップd)において、前記一次ガス流とは別の二次ガス流が、前記乾燥粉末を前記リザーバから前記噴霧デバイスに移送するために使用され、任意選択により、前記二次ガス流は、前記一次ガス流とは独立して制御可能である、請求項1~3のいずれか一項に記載の方法。 In step d) a secondary gas stream separate from said primary gas stream is used to transport said dry powder from said reservoir to said atomization device, optionally said secondary gas stream is A method according to any one of claims 1 to 3, which is controllable independently of the gas flow. 前記二次ガス流は、圧縮ガス、好ましくは空気の流れを含む、請求項4に記載の方法。 5. A method according to claim 4, wherein said secondary gas stream comprises a stream of compressed gas, preferably air. 前記フィルタの前記多孔質構造を通る前記一次ガス流を確立するために真空発生器を使用することを含む、請求項1~5のいずれか一項に記載の方法。 A method according to any preceding claim, comprising using a vacuum generator to establish the primary gas flow through the porous structure of the filter. 前記真空発生器によって発生された前記圧力低下のレベルは、前記リザーバから前記噴霧デバイスへの前記乾燥粉末の前記移送の速度又は質量流量とは独立して制御可能である請求項6に記載の方法。 7. The method of claim 6, wherein the level of pressure drop generated by the vacuum generator is controllable independently of the rate or mass flow rate of the transfer of the dry powder from the reservoir to the atomization device. . 少なくともステップe)の間、前記フィルタの背圧を監視することを更に含む、請求項1~7のいずれか一項に記載の方法。 A method according to any one of the preceding claims, further comprising monitoring the backpressure of the filter during at least step e). 前記フィルタの所定の背圧が達せられたときに、前記フィルタの前記入口面に向けた前記乾燥粉末の前記噴霧を停止するステップを更に含み、任意選択により、前記所定の背圧は絶対背圧である、請求項8に記載の方法。 further comprising stopping said spraying of said dry powder towards said inlet face of said filter when a predetermined back pressure of said filter is reached, optionally said predetermined back pressure being an absolute back pressure 9. The method of claim 8, wherein 少なくともステップc)及びステップe)の間、好ましくは少なくともステップc)、d)及びe)の間、前記フィルタの背圧を監視することを更に含む、請求項1~7のいずれか一項に記載の方法。 8. The method of any one of claims 1 to 7, further comprising monitoring the back pressure of the filter during at least steps c) and e), preferably during at least steps c), d) and e). described method. 前記フィルタの所定の背圧が達せられたときに、前記フィルタの前記入口面に向けた前記乾燥粉末の前記噴霧を停止するステップを更に含む、請求項10に記載の方法。 11. The method of claim 10, further comprising stopping the spraying of the dry powder toward the inlet face of the filter when a predetermined back pressure of the filter is reached. 前記所定の背圧は相対背圧であり、任意選択により、前記フィルタの第1の背圧は、前記乾燥粉末が前記多孔質構造に堆積される前にステップc)で測定され、前記フィルタの第2の背圧は、前記乾燥粉末が前記多孔質構造内に堆積する間にステップe)で測定され、前記乾燥粉末の前記噴霧は、前記第2の背圧が前記第1の背圧の所定のパーセンテージに達したときに停止される、請求項11に記載の方法。 Said predetermined back pressure is a relative back pressure, optionally a first back pressure of said filter is measured in step c) before said dry powder is deposited on said porous structure, A second back pressure is measured in step e) while the dry powder is deposited within the porous structure, wherein the atomization of the dry powder is such that the second back pressure is less than the first back pressure. 12. The method of claim 11, stopped when a predetermined percentage is reached. ステップd)において、前記リザーバから前記乾燥粉末を注入することを更に含み、任意選択により、注入デバイスに前記乾燥粉末を重量測定的に供給することを含み、任意選択により、前記注入することは、ロスインウェイトフィーダーを使用する、請求項1~12のいずれか一項に記載の方法。 In step d), further comprising injecting said dry powder from said reservoir, optionally comprising gravimetrically feeding said dry powder to an injection device, optionally said injecting comprising: A method according to any one of claims 1 to 12, wherein a loss-in-weight feeder is used. 排気ガスから微粒子状物質を濾過するためのフィルタを処理する装置であって、
i)乾燥粉末を収容するためのリザーバと、
ii)フィルタを保持するためのフィルタホルダであって、前記フィルタは、入口面及び出口面を有する多孔質基材を含むタイプであり、前記入口面と前記出口面とは、多孔質構造によって隔てられている、フィルタホルダと、
iii)前記フィルタの前記出口面に圧力低下を適用することにより、使用中に前記フィルタの前記多孔質構造を通る一次ガス流を確立するための真空発生器と、
iv)前記リザーバから前記フィルタに向けて前記乾燥粉末を輸送するための輸送デバイスと、
iv)前記輸送デバイスから前記乾燥粉末を受け取り、前記フィルタの前記入口面に向けて前記乾燥粉末を噴霧するための噴霧デバイスと、
v)少なくとも前記真空発生器及び前記噴霧デバイスの動作を制御するように構成されたコントローラと、を備える、装置。
An apparatus for treating a filter for filtering particulate matter from an exhaust gas, comprising:
i) a reservoir for containing dry powder;
ii) a filter holder for holding a filter, said filter being of the type comprising a porous substrate having an inlet surface and an outlet surface, said inlet surface and said outlet surface being separated by a porous structure; a filter holder;
iii) a vacuum generator for establishing a primary gas flow through said porous structure of said filter during use by applying a pressure drop to said exit face of said filter;
iv) a transport device for transporting the dry powder from the reservoir towards the filter;
iv) a spray device for receiving the dry powder from the transport device and spraying the dry powder towards the inlet face of the filter;
v) a controller configured to control operation of at least said vacuum generator and said atomizing device.
前記コントローラは、前記真空発生器によって生成された前記一次ガス流を制御することとは独立して、前記輸送デバイスによって前記リザーバから前記噴霧デバイスへの前記乾燥粉末の前記移送を制御するように構成され、任意選択により、前記コントローラは、前記一次ガス流を制御することとは独立して、前記フィルタの前記入口面に向けた前記乾燥粉末の噴霧を制御するように構成されている、請求項14に記載の装置。 The controller is configured to control the transfer of the dry powder from the reservoir to the atomization device by the transport device independently of controlling the primary gas flow generated by the vacuum generator. and optionally, the controller is configured to control the spray of the dry powder towards the inlet face of the filter independently of controlling the primary gas flow. 15. The device according to 14. 前記コントローラは、前記乾燥粉末が前記噴霧デバイスに移送され、前記入口面に向けて噴霧される前に、前記真空発生器を操作して前記一次ガス流を確立するように構成されている、請求項14又は15に記載の装置。 4. The controller is configured to operate the vacuum generator to establish the primary gas flow before the dry powder is transferred to the atomization device and atomized toward the inlet surface. 16. Apparatus according to Item 14 or 15. 前記輸送デバイス及び/又は前記噴霧デバイスは、前記乾燥粉末を前記リザーバから前記噴霧デバイスに移送するために、前記真空発生器とは別の二次ガス流発生器を備え、任意選択により、前記コントローラは、前記真空発生器とは独立して前記二次ガス流発生器を制御するように構成されている、請求項14~16のいずれか一項に記載の装置。 said transport device and/or said atomizing device comprises a secondary gas flow generator separate from said vacuum generator for transferring said dry powder from said reservoir to said atomizing device; is arranged to control the secondary gas flow generator independently of the vacuum generator. 前記二次ガス流発生器は、圧縮ガス発生器、好ましくは圧縮空気発生器を含み、任意選択により、前記噴霧デバイスは圧縮空気ガンである、請求項17に記載の装置。 18. Apparatus according to claim 17, wherein said secondary gas flow generator comprises a compressed gas generator, preferably a compressed air generator, and optionally said atomizing device is a compressed air gun. 前記コントローラは、前記フィルタの前記入口面に向けて噴霧される前記乾燥粉末の速度又は質量流量を制御するために、前記輸送デバイス及び/又は前記噴霧デバイスを制御することとは独立して、前記真空発生器を制御して、前記フィルタの前記出口面に適用される前記圧力低下のレベルを制御するように構成されている、請求項14~18のいずれか一項に記載の装置。 independently of controlling the transport device and/or the spray device to control the velocity or mass flow rate of the dry powder sprayed toward the inlet face of the filter; Apparatus according to any one of claims 14 to 18, configured to control a vacuum generator to control the level of the pressure drop applied to the outlet face of the filter. 前記フィルタの背圧を監視するための圧力センサ、好ましくは単一の圧力センサを更に備え、前記コントローラは、前記圧力センサから出力を受信するように構成され、任意選択により、前記圧力センサ、好ましくは前記単一の圧力センサは、前記真空発生器内に、好ましくは前記真空発生器の真空コーン内に配置されている、請求項14~19のいずれか一項に記載の装置。 Further comprising a pressure sensor, preferably a single pressure sensor, for monitoring the back pressure of said filter, said controller being arranged to receive an output from said pressure sensor, optionally said pressure sensor, preferably a single pressure sensor, The device according to any one of claims 14 to 19, wherein said single pressure sensor is arranged in said vacuum generator, preferably in a vacuum cone of said vacuum generator. 前記コントローラは、前記フィルタの所定の背圧が達せられたときに、前記フィルタの前記入口面に向けた前記乾燥粉末の前記噴霧を停止するように構成されている、請求項20に記載の装置。 21. The apparatus of claim 20, wherein the controller is configured to stop the spraying of the dry powder toward the inlet face of the filter when a predetermined back pressure of the filter is reached. . 前記輸送デバイスは、前記リザーバから前記噴霧デバイスへと少なくとも部分的に延びる導管を備え、前記噴霧デバイスは、前記導管の少なくとも一部分において前記乾燥粉末を流動化するように構成された圧縮空気ガンの圧縮空気供給を備える、請求項14~21のいずれか一項に記載の装置。 The transport device comprises a conduit extending at least partially from the reservoir to the atomizing device, the atomizing device being a compressed air gun configured to fluidize the dry powder in at least a portion of the conduit. Apparatus according to any one of claims 14 to 21, comprising a compressed air supply. 前記リザーバから前記乾燥粉末を注入するための注入デバイスを更に備え、任意選択により、前記注入デバイスは重量測定式のデバイスであり、任意選択により、前記注入デバイスはロスインウェイトフィーダーである、請求項14~22のいずれか一項に記載の装置。 11. The claim further comprising an injection device for injecting said dry powder from said reservoir, optionally said injection device being a gravimetric device, optionally said injection device being a loss-in-weight feeder. A device according to any one of claims 14-22. 前記フィルタは、前記入口面を最上方にして、垂直配向に前記ホルダー内に配置され、任意選択により、前記噴霧デバイスは前記入口面の垂直方向上方に配置され、好ましくは、前記噴霧デバイスの噴霧方向は前記フィルタの長手方向軸線と同軸をなし、好ましくは、前記噴霧方向と前記長手方向軸線とは一致する、請求項14~23のいずれか一項に記載の装置。 Said filter is arranged in said holder in a vertical orientation with said inlet face uppermost, optionally said spraying device is arranged vertically above said inlet face, preferably said spraying device A device according to any one of claims 14 to 23, wherein the direction is coaxial with the longitudinal axis of the filter, preferably the spray direction and the longitudinal axis coincide. 請求項1~13のいずれか一項に記載の方法によって取得可能な処理済みのフィルタ。 A processed filter obtainable by the method of any one of claims 1-13.
JP2022507495A 2019-08-15 2020-08-13 Particulate filter treatment Pending JP2022544370A (en)

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GB1911704.3 2019-08-15
GBGB1911704.3A GB201911704D0 (en) 2019-08-15 2019-08-15 Treatment of particulate filters
PCT/GB2020/051936 WO2021028691A1 (en) 2019-08-15 2020-08-13 Treatment of particulate filters

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JP2022544370A JP2022544370A (en) 2022-10-18
JPWO2021028691A5 true JPWO2021028691A5 (en) 2023-08-23

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JP (1) JP2022544370A (en)
KR (1) KR20220047573A (en)
CN (1) CN114207260B (en)
BR (1) BR112022001409A2 (en)
CA (1) CA3145968A1 (en)
GB (3) GB201911704D0 (en)
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ZA (1) ZA202200264B (en)

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