JPS648670A - Mos field-effect transistor - Google Patents
Mos field-effect transistorInfo
- Publication number
- JPS648670A JPS648670A JP16228987A JP16228987A JPS648670A JP S648670 A JPS648670 A JP S648670A JP 16228987 A JP16228987 A JP 16228987A JP 16228987 A JP16228987 A JP 16228987A JP S648670 A JPS648670 A JP S648670A
- Authority
- JP
- Japan
- Prior art keywords
- section
- plane
- substrate
- width
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To enhance a gain constant beta value by forming the semiconductor section of source, drain and channel regions of a MOSFET in a rectangular parallelepiped having a side face substantially perpendicular to the plane of a wafer substrate, forming the height of the semiconductor section larger than its width, and extending a gate electrode perpendicularly to the plane of the substrate. CONSTITUTION:Part of an n-type silicon (Si) wafer substrate 11 is formed in a rectangular parallelepiped semiconductor section 12 having its height larger than its width. This section is formed with source, drain and channel regions, and a gate electrode 14 is formed on an insulating film 13 corresponding to the channel region. The side face of the section 12 is substantially perpendicular to the plane of the substrate 1, and the electrode 14 is also perpendicular to the plane of the substrate 11. Since the electrode 14 is extended at both sides over the top of the section 12, the gate electrode which operates as a gate is longer than a conventional case, and a channel width W corresponds to twice as large as the height (h) in the drawing. Then, the width l of the electrode 14 corresponds to the channel length L.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16228987A JPS648670A (en) | 1987-07-01 | 1987-07-01 | Mos field-effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16228987A JPS648670A (en) | 1987-07-01 | 1987-07-01 | Mos field-effect transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS648670A true JPS648670A (en) | 1989-01-12 |
Family
ID=15751654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16228987A Pending JPS648670A (en) | 1987-07-01 | 1987-07-01 | Mos field-effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS648670A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6442176A (en) * | 1987-08-10 | 1989-02-14 | Toshiba Corp | Semiconductor device and manufacture thereof |
JPH02263473A (en) * | 1988-11-21 | 1990-10-26 | Hitachi Ltd | Semiconductor device and semiconductor storage device |
WO1990013918A1 (en) * | 1989-05-12 | 1990-11-15 | Oki Electric Industry Co., Ltd. | Field effect transistor |
US8076203B2 (en) | 2007-10-30 | 2011-12-13 | Elpida Memory, Inc. | Semiconductor device and method of manufacturing the same |
US8124976B2 (en) | 2005-12-02 | 2012-02-28 | Nec Corporation | Semiconductor device and method of manufacturing the same |
US8247294B2 (en) | 2005-06-07 | 2012-08-21 | Nec Corporation | Manufacturing process of fin-type field effect transistor and semiconductor |
KR20140137343A (en) * | 2011-12-29 | 2014-12-02 | 로베르트 보쉬 게엠베하 | Speaker verification in a health monitoring system |
-
1987
- 1987-07-01 JP JP16228987A patent/JPS648670A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6442176A (en) * | 1987-08-10 | 1989-02-14 | Toshiba Corp | Semiconductor device and manufacture thereof |
JPH02263473A (en) * | 1988-11-21 | 1990-10-26 | Hitachi Ltd | Semiconductor device and semiconductor storage device |
WO1990013918A1 (en) * | 1989-05-12 | 1990-11-15 | Oki Electric Industry Co., Ltd. | Field effect transistor |
US5281547A (en) * | 1989-05-12 | 1994-01-25 | Oki Electric Industry Co., Ltd. | Method for manufacturing a field effect transistor |
US8247294B2 (en) | 2005-06-07 | 2012-08-21 | Nec Corporation | Manufacturing process of fin-type field effect transistor and semiconductor |
US8124976B2 (en) | 2005-12-02 | 2012-02-28 | Nec Corporation | Semiconductor device and method of manufacturing the same |
US8076203B2 (en) | 2007-10-30 | 2011-12-13 | Elpida Memory, Inc. | Semiconductor device and method of manufacturing the same |
KR20140137343A (en) * | 2011-12-29 | 2014-12-02 | 로베르트 보쉬 게엠베하 | Speaker verification in a health monitoring system |
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