JPS6482440A - Illuminating angle setting method for focusing ion beam device - Google Patents
Illuminating angle setting method for focusing ion beam deviceInfo
- Publication number
- JPS6482440A JPS6482440A JP24046687A JP24046687A JPS6482440A JP S6482440 A JPS6482440 A JP S6482440A JP 24046687 A JP24046687 A JP 24046687A JP 24046687 A JP24046687 A JP 24046687A JP S6482440 A JPS6482440 A JP S6482440A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- mark
- illuminating angle
- stage
- moved
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To correctly set the illuminating angle by moving a stage to largely move a mark, detecting the mark positions before and after the shift, and determining the illuminating angle of an ion beam based on the result. CONSTITUTION:A stage 26 is moved so that the center of a mark M and the optical axis of an ion beam coincide while the ion beam is not deflected, then the stage 26 is x-moved in the direction X. The mark position is x-moved in the direction X from a point A to a point A' by the shift of the stage 26. When the ion beam is deflected so as to be illuminated to the center of the mark M at the point A', the illuminating angle at that time is determined, when the desired illuminating angle is determined, the shift distance (x) of the stage can be obtained by calculation. When a deflector 25 is adjusted so that the ion beam is illuminated to the center of the mark after the mark position is correctly moved, the ion beam can be correctly set at the desired angle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24046687A JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24046687A JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6482440A true JPS6482440A (en) | 1989-03-28 |
Family
ID=17059928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24046687A Pending JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6482440A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008298797A (en) * | 2008-09-01 | 2008-12-11 | Hitachi Ltd | Sample preparing device |
| JP2009031339A (en) * | 2007-07-24 | 2009-02-12 | Nissin Ion Equipment Co Ltd | Alignment processing apparatus |
| US8796651B2 (en) | 2000-11-06 | 2014-08-05 | Hitachi, Ltd. | Method and apparatus for specimen fabrication |
-
1987
- 1987-09-24 JP JP24046687A patent/JPS6482440A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8796651B2 (en) | 2000-11-06 | 2014-08-05 | Hitachi, Ltd. | Method and apparatus for specimen fabrication |
| JP2009031339A (en) * | 2007-07-24 | 2009-02-12 | Nissin Ion Equipment Co Ltd | Alignment processing apparatus |
| JP2008298797A (en) * | 2008-09-01 | 2008-12-11 | Hitachi Ltd | Sample preparing device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6482440A (en) | Illuminating angle setting method for focusing ion beam device | |
| EP0246018A3 (en) | Distance measuring method and means | |
| JPS5745406A (en) | Three-dimensional coordinate measuring device | |
| JPS5740927A (en) | Exposing method of electron beam | |
| JPS53122369A (en) | Automatic alignment unit for wafer | |
| JPS5668921A (en) | Control method for slider inclination of magnetic head | |
| JPS5745477A (en) | Target acquisition system | |
| JPS5327449A (en) | Thickness measuring system for running body | |
| JPS5726434A (en) | Wafer target pattern for alignment | |
| JPS5759326A (en) | Method for detection of image-forming position and device thereof | |
| JPS53117463A (en) | Position detection method | |
| JPS57111936A (en) | Astigmatism correcting device for electron microscope | |
| JPS5526552A (en) | Supporting table of microscope | |
| JPS56104211A (en) | Destination range finding device | |
| JPS562010A (en) | Direction-position searching and running method for traveling body | |
| JPS5720972A (en) | Positioning device for extremely close interval of information retrieval device | |
| JPS52117570A (en) | Position detecting method | |
| JPS56107555A (en) | Detection of position of electron beam | |
| JPS56137319A (en) | Focusing device | |
| JPS57198628A (en) | Inspecting device for pattern | |
| JPS6482444A (en) | Focal point automatic adjusting device for beam | |
| JPS51150330A (en) | Automatic focusing adjustable device | |
| JPS5754319A (en) | Electron-beam exposing device | |
| JPS53128975A (en) | Automatic focus control device for scanning type electron beam device and others | |
| JPS6478696A (en) | Laser beam machine |