JPS6468926A - Measurement of image distortion in projection optical system - Google Patents
Measurement of image distortion in projection optical systemInfo
- Publication number
- JPS6468926A JPS6468926A JP62226186A JP22618687A JPS6468926A JP S6468926 A JPS6468926 A JP S6468926A JP 62226186 A JP62226186 A JP 62226186A JP 22618687 A JP22618687 A JP 22618687A JP S6468926 A JPS6468926 A JP S6468926A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- patterns
- latent images
- test reticle
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
Abstract
PURPOSE:To check performance of a device during its operation and to maintain high accuracy, by using a test reticle, exposing a plurality of first patterns on a resist layer, thereafter exposing only a second pattern, overlapping the second pattern on the latent images of the first patterns, and performing exposure measurement. CONSTITUTION:The pattern image of a test reticle TR is exposed at a specified region on a wafer. The shape of an opening is determined so that only a second pattern 17 of the test reticle TR is lighted. Then, the projected image of the light transmitting edge part of the second pattern is made to agree with the transferred images of rectangular patterns 14, which were exposed before. Then exposure is performed. Thereafter, the second pattern 17 is overlapped on latent images 15a, 16a, 18a and 19a corresponding to mark patterns 15, 16, 18 and 19, and exposure is performed. When one-dimensional position devaition between the latent images 16a and 17a and the like are detected, the amount of distortion at an aligning position within a projected field of view can be measured.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62226186A JPS6468926A (en) | 1987-09-09 | 1987-09-09 | Measurement of image distortion in projection optical system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62226186A JPS6468926A (en) | 1987-09-09 | 1987-09-09 | Measurement of image distortion in projection optical system |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6468926A true JPS6468926A (en) | 1989-03-15 |
Family
ID=16841236
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62226186A Pending JPS6468926A (en) | 1987-09-09 | 1987-09-09 | Measurement of image distortion in projection optical system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6468926A (en) |
Cited By (9)
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---|---|---|---|---|
WO2006104011A1 (en) | 2005-03-25 | 2006-10-05 | Nikon Corporation | Shot shape measuring method, mask |
US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
-
1987
- 1987-09-09 JP JP62226186A patent/JPS6468926A/en active Pending
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
US9885959B2 (en) | 2003-04-09 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator |
US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US9760014B2 (en) | 2003-10-28 | 2017-09-12 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
US10281632B2 (en) | 2003-11-20 | 2019-05-07 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction |
US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
US10241417B2 (en) | 2004-02-06 | 2019-03-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10234770B2 (en) | 2004-02-06 | 2019-03-19 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
US10007194B2 (en) | 2004-02-06 | 2018-06-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
EP3159738A2 (en) | 2005-03-25 | 2017-04-26 | Nikon Corporation | Method of measuring shot shape and mask |
WO2006104011A1 (en) | 2005-03-25 | 2006-10-05 | Nikon Corporation | Shot shape measuring method, mask |
US8339614B2 (en) | 2005-03-25 | 2012-12-25 | Nikon Corporation | Method of measuring shot shape and mask |
JP4770833B2 (en) * | 2005-03-25 | 2011-09-14 | 株式会社ニコン | Shot shape measurement method, mask |
US9429851B2 (en) | 2005-05-12 | 2016-08-30 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9360763B2 (en) | 2005-05-12 | 2016-06-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9891539B2 (en) | 2005-05-12 | 2018-02-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US9310696B2 (en) | 2005-05-12 | 2016-04-12 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US8854601B2 (en) | 2005-05-12 | 2014-10-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9857599B2 (en) | 2007-10-24 | 2018-01-02 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
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