JPS6435437A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6435437A
JPS6435437A JP19098187A JP19098187A JPS6435437A JP S6435437 A JPS6435437 A JP S6435437A JP 19098187 A JP19098187 A JP 19098187A JP 19098187 A JP19098187 A JP 19098187A JP S6435437 A JPS6435437 A JP S6435437A
Authority
JP
Japan
Prior art keywords
compsn
cresol
meta
chemical resistance
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19098187A
Other languages
Japanese (ja)
Inventor
Hiroshi Tomiyasu
Yoshiko Kobayashi
Sei Goto
Takeshi Yamamoto
Norihito Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Konica Minolta Inc
Original Assignee
Mitsubishi Kasei Corp
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Konica Minolta Inc filed Critical Mitsubishi Kasei Corp
Priority to JP19098187A priority Critical patent/JPS6435437A/en
Publication of JPS6435437A publication Critical patent/JPS6435437A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain a compsn. which obviates dye remaining and has excellent chemical resistance by forming a photosensitive compsn. into which an orthoquinonediazide compd., novolak resin contg. a specific ratio of meta-cresol and specific org. acid are incorporated. CONSTITUTION:The photosensitive compsn. contg. the orthoquinonediazide compd., the novolak resin contg. 30-90mol.% structural unit formed of the meta-cresol and the org. acid expressed by formulas I, II (X, Y are a hydrogen atom, alkyl group, alkoxyl group, halogen atom; n is 1 or 2) is formed. Curing efficiency is poor if the content ratio of the meta-cresol is too low. The chemical resistance is deteriorated if the ratio is too high. This compsn. is coated on an aluminum substrate to form a photosensitive layer and a positive type film is exposes and printed thereto, by which a printing plate is formed. The photosensitive compsn. having a high sensitivity is thereby obtd. without having the dye remaining and without impairing the chemical resistance.
JP19098187A 1987-07-30 1987-07-30 Photosensitive composition Pending JPS6435437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19098187A JPS6435437A (en) 1987-07-30 1987-07-30 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19098187A JPS6435437A (en) 1987-07-30 1987-07-30 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS6435437A true JPS6435437A (en) 1989-02-06

Family

ID=16266878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19098187A Pending JPS6435437A (en) 1987-07-30 1987-07-30 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS6435437A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03210564A (en) * 1990-01-16 1991-09-13 Tokyo Ohka Kogyo Co Ltd Positive type electron beam resist composition
US5130930A (en) * 1988-10-14 1992-07-14 Mitsubishi Denki Kabushiki Kaisha Diagnostic device for vehicle engine analysis

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS62150354A (en) * 1985-12-25 1987-07-04 Konishiroku Photo Ind Co Ltd Photosensitive lithographic form plate
JPS62163055A (en) * 1986-01-14 1987-07-18 Mitsubishi Chem Ind Ltd Positive type photosensitive lithographic plate
JPS63276047A (en) * 1987-05-07 1988-11-14 Konica Corp Photosensitive composition and photosensitive planographic printing plate
JPS6432256A (en) * 1987-07-28 1989-02-02 Mitsubishi Chem Ind Photosensitive composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6088942A (en) * 1983-10-21 1985-05-18 Fuji Photo Film Co Ltd Photosensitive composition
JPS62150354A (en) * 1985-12-25 1987-07-04 Konishiroku Photo Ind Co Ltd Photosensitive lithographic form plate
JPS62163055A (en) * 1986-01-14 1987-07-18 Mitsubishi Chem Ind Ltd Positive type photosensitive lithographic plate
JPS63276047A (en) * 1987-05-07 1988-11-14 Konica Corp Photosensitive composition and photosensitive planographic printing plate
JPS6432256A (en) * 1987-07-28 1989-02-02 Mitsubishi Chem Ind Photosensitive composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5130930A (en) * 1988-10-14 1992-07-14 Mitsubishi Denki Kabushiki Kaisha Diagnostic device for vehicle engine analysis
JPH03210564A (en) * 1990-01-16 1991-09-13 Tokyo Ohka Kogyo Co Ltd Positive type electron beam resist composition

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