JPS63314224A - Optical photopolymer composition - Google Patents
Optical photopolymer compositionInfo
- Publication number
- JPS63314224A JPS63314224A JP14979787A JP14979787A JPS63314224A JP S63314224 A JPS63314224 A JP S63314224A JP 14979787 A JP14979787 A JP 14979787A JP 14979787 A JP14979787 A JP 14979787A JP S63314224 A JPS63314224 A JP S63314224A
- Authority
- JP
- Japan
- Prior art keywords
- polyfunctional
- methacrylate
- optical
- polymeric substance
- acrylate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 30
- 239000000203 mixture Substances 0.000 title claims abstract description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims abstract description 23
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 20
- 239000000126 substance Substances 0.000 claims abstract description 16
- 239000011342 resin composition Substances 0.000 claims abstract description 14
- 239000003999 initiator Substances 0.000 claims abstract description 6
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 6
- 229920000642 polymer Polymers 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 abstract description 2
- -1 benzyl dimethyl ketal Chemical compound 0.000 description 11
- 150000001875 compounds Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 230000001588 bifunctional effect Effects 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- LBHPSYROQDMVBS-UHFFFAOYSA-N (1-methylcyclohexyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1(C)CCCCC1 LBHPSYROQDMVBS-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- ILZXXGLGJZQLTR-UHFFFAOYSA-N 2-phenylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=CC=C1 ILZXXGLGJZQLTR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 239000007870 radical polymerization initiator Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、広い温度範囲にわたって光の吸収・散乱損失
の小さな光学用感光性樹脂組成物に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an optical photosensitive resin composition that exhibits low light absorption and scattering loss over a wide temperature range.
本発明において光学用感光性樹脂組成物とは、光導波路
、ホログラフィックレンズ、微小プリズム、回折格子等
の光学素子をリングラフインクに形成し得る材料であり
、かつ、形成された上記素子の光の伝播損失が小さいも
のを言う。In the present invention, the optical photosensitive resin composition is a material that can form optical elements such as optical waveguides, holographic lenses, microprisms, and diffraction gratings into phosphor graph ink, and that allows the formation of optical elements such as optical waveguides, holographic lenses, microprisms, diffraction gratings, etc. means that the propagation loss is small.
感光性樹脂を用いて光導波路を形成する方法としては、
例えば、オプティクス・コミュニケーションズ（Ｏｐｔ
ｉｃｓ Ｃｏｍｍｕｎｉｃａｔｉｏｎｓ ） ＋１７
（ｔｌ、１２９゜１９７６、アプライド・フィジックス
・レターズ（Ａｐｐｌｉｅｄ Ｐｈｙｓｉｃｓ Ｌｅｔ
ｔｅｒｓ ） 、２４ （２１，７２，１９７４、沖電
気研究開発４Ｂ （３）、７３．１９８１、電子通信学
会論文誌Ｊ６５−Ｃ（１υ、８６０．１９Ｂ２ 、アプ
ライド・オブティクス（Ａｐｐｌｉｅｄ ０ｐｔｉｃｓ
） 、１７ （４）、６４６．１９７８等に開示された
ものがある。As a method of forming an optical waveguide using photosensitive resin,
For example, Optics Communications (Opt
icsCommunications) +17
(tl, 129° 1976, Applied Physics Letters
ters), 24 (21,72,1974, Oki Electric Research and Development 4B (3), 73.1981, Journal of the Institute of Electronics and Communication Engineers J65-C (1υ, 860.19B2), Applied Optics
), 17 (4), 646.1978, etc.
上記文献開示の方法により形成される光導波路は、光導
波損失が１０ｄＢ／ｍ以上と大きく、導波路長が数米に
及ぶものが作成できない。又、アプライド・フィジック
ス・レターズ（八ｐｐｌｉｅｄ ＰｈｙｓｉｃｓＬｅｔ
ｔｅｒｓ ） 、２４ （２）、７２．１９７４、アプ
ライド・オプティクス（Ａｐｐｌｉｅｄ ０ｐｔｉｃｓ
） 、１７ （４）、６４６．１９７Ｂ 、電子通信学
会論文誌Ｊ６５−Ｃ（１１） 、８６０．１９８２等に
述べられている方法では、現像時に七ツマ−を減圧で情
夫する工程があり、生産性が悪いと考えられる。The optical waveguide formed by the method disclosed in the above-mentioned document has a large optical waveguide loss of 10 dB/m or more, and it is impossible to create a waveguide with a length of several meters. Also, Applied Physics Letters
ters), 24 (2), 72.1974, Applied Optics
), 17 (4), 646.197B, Journal of the Institute of Electronics and Communication Engineers J65-C (11), 860.1982, etc., there is a step in which the seven rollers are heated under reduced pressure during development, which reduces production. It is considered to be a bad thing.
感光性樹脂組成物を該感光性樹脂組成物より屈折率の低
い基板上に塗布し、電磁波により露光し・現像液で現像
する方法は、導波路パターンを形成するためには、簡便
で生産性の高い方法である。The method of coating a photosensitive resin composition on a substrate with a refractive index lower than that of the photosensitive resin composition, exposing it to electromagnetic waves, and developing it with a developer is a simple and productive method for forming a waveguide pattern. This is the most expensive way to go.
この方法に用い得る感光性樹脂組成物は、光ファイバー
等との結合のために５０〜２００μｍ程度の膜厚を維持
できることが望まれ、かつ、感度解像度が高いことが好
ましい。このような要請から、この方法に用い得る感光
性樹脂組成物は、高分子物質と多官能アクリレート及び
／又は多官能メタクリレートを含むことが好ましいが、
一般的にこのような組成物では、高分子物質と多官能ア
クリレート及び／又は多官能メタクリレートとが光によ
って開始される化学反応の進行に伴って各々独立したミ
クロ相に分離する結果、それを構成する個々の材料の吸
収損失の和に比べ、形成された導波路の光導波損失はミ
クロ相界面での光散乱のため異常に大きなものとなる。The photosensitive resin composition that can be used in this method is desirably capable of maintaining a film thickness of about 50 to 200 μm for bonding with optical fibers, etc., and preferably has high sensitivity resolution. In view of these demands, the photosensitive resin composition that can be used in this method preferably contains a polymeric substance and a polyfunctional acrylate and/or a polyfunctional methacrylate.
Generally, in such compositions, the polymeric substance and the polyfunctional acrylate and/or polyfunctional methacrylate separate into independent microphases as a chemical reaction initiated by light progresses, resulting in the formation of Compared to the sum of absorption losses of individual materials, the optical waveguide loss of the formed waveguide becomes abnormally large due to light scattering at the microphase interface.
本発明の目的は、光導波損失がＯ″Ｃ〜８０℃の温度範
囲において１ＯｄＢ／ｍ以下で、かつ、簡単な工程で、
高い生産性で、光導波路、ホログラフィックレンズ、微
小プリズム等が得られる光学用感光性樹脂組成物を提供
することである。The purpose of the present invention is to reduce the optical waveguide loss to 1 OdB/m or less in the temperature range of O''C to 80C, and to achieve the same through a simple process.
An object of the present invention is to provide an optical photosensitive resin composition from which optical waveguides, holographic lenses, microprisms, etc. can be obtained with high productivity.
本発明者らは、上記目的達成のため鋭意研究の結果、本
発明を完成するに至った。The present inventors have completed the present invention as a result of intensive research to achieve the above object.
即ち、本発明は、■重量平均分子量５０００以上の不飽
和炭素−炭素結合を有しない高分子物質、■重合硬化後
膣高分子物質との屈折率差がＯ℃〜８０℃の温度範囲に
おいて０．０１５以下の多官能アクリレート及び／又は
多官能メタクリレート、及び■光重合開始剤とからなり
、該高分子物質と多官能アクリレート及び／又は多官能
メタクリレートとの重量組成比が２０／８０〜８０／２
０であることを特徴とする光学用感光性樹脂組成物に関
するものである。That is, the present invention provides: (1) a polymeric material having a weight average molecular weight of 5,000 or more and having no unsaturated carbon-carbon bonds; .015 or less polyfunctional acrylate and/or polyfunctional methacrylate, and (1) a photopolymerization initiator, the weight composition ratio of the polymer substance and the polyfunctional acrylate and/or polyfunctional methacrylate is 20/80 to 80/ 2
The present invention relates to an optical photosensitive resin composition characterized in that:
但し、ここに言う多官能アクリレート及び／又は多官能
メタクリレートの重合硬化後の屈折率とは、該多官能ア
クリレート及び／又は多官能メタクリレートの１００重
量部に対し１重量部のベンジルジメチルケタールを加え
、十分に光重合硬化させた測定用試料を作成し、ナトリ
ウムＤ線の波長において測定した屈折率の値を言う。However, the refractive index after polymerization and curing of polyfunctional acrylate and/or polyfunctional methacrylate referred to herein means that 1 part by weight of benzyl dimethyl ketal is added to 100 parts by weight of the polyfunctional acrylate and/or polyfunctional methacrylate, It refers to the refractive index value measured at the wavelength of the sodium D line after preparing a measurement sample that has been sufficiently photopolymerized and cured.
本発明の多官能アクリレート及び／又は多官能メタクリ
レートとしては、実際に様々なものを用い得るが、好ま
しくは２官能アクリレート及び／又は２官能メタクリレ
ートである。又、単官能アクリレート及び／又は単官能
メタクリレートを、２官能以上のアクリレート及び／又
は２官能以上のメタクリレートと併用することができる
。Various types of polyfunctional acrylate and/or polyfunctional methacrylate can be used in the present invention, but difunctional acrylate and/or difunctional methacrylate are preferred. Moreover, a monofunctional acrylate and/or a monofunctional methacrylate can be used in combination with a difunctional or more functional acrylate and/or a difunctional or more functional methacrylate.
本発明の高分子物質としては、種々のホモポリマーない
しコポリマーを用い得るが、特に好ましいのは、光学的
透明性が高く、かつ、機械的特性に優れたメタクリレー
ト系のホモポリマーないしコポリマーである。これらの
高分子物質の分子量は、５０００以上であることが好ま
しく、５０００以下の場合は感光性樹脂組成物の膜厚を
維持することが回能である。Various homopolymers or copolymers can be used as the polymeric substance of the present invention, but particularly preferred are methacrylate-based homopolymers or copolymers that have high optical transparency and excellent mechanical properties. The molecular weight of these polymeric substances is preferably 5,000 or more, and when it is 5,000 or less, it is important to maintain the film thickness of the photosensitive resin composition.
高分子物質と多官能アクリレート及び／又は多官能メタ
クリレートとの組合せには様々なものが挙げられるが、
例えば、ポリ （メチルメタクリレート）と後掲の化合
物（１）で示す構造の２官能メタクリレート、ポリ （
１−メチルシクロヘキシルメタクリレート）と化合物（
２）で示す構造の２官能メタクリレート、ポリ （４−
メチルシクロへキシルメタクリレート）と化合物（３）
で示す構造の２官能アクリレート、ポリ （２−フェニ
ルエチルメタクリレート）と化合物（４）で示す構造の
２官能メタクリレート、等は好ましい組合せである。There are various combinations of polymeric substances and polyfunctional acrylates and/or polyfunctional methacrylates, but
For example, poly(methyl methacrylate), bifunctional methacrylate having the structure shown in compound (1) below, poly(methyl methacrylate), and poly(methyl methacrylate).
1-methylcyclohexyl methacrylate) and the compound (
Bifunctional methacrylate with the structure shown in 2), poly(4-
methylcyclohexyl methacrylate) and compound (3)
Preferred combinations include a bifunctional acrylate having a structure shown by , poly (2-phenylethyl methacrylate) and a bifunctional methacrylate having a structure shown by compound (4).
これらの高分子物質と多官能アクリレート及び又はメタ
クリレートの組合せを用いて得られる感光性組成物が、
特に広い温度範囲にわたって光学的に優れた特性を示す
理由は、これらの組合せにおいて高分子物質の屈折率と
多官能アクリレート及び／又は多官能メタクリレートの
屈折率の差が０．０１５以下と非常に小さいため、ミク
ロ相分離の効果が見掛は上現れないためであると考えら
れる・感光性樹脂組成物としては、上記の高分子物質と
多官能アクリレート及び／又は多官能メタクリレートの
ための光重合開始剤が必要である。光重合開始剤として
は、ラジカル重合開始型のものであればどのようなもの
でも用い得るが、導波光の吸収損失の点から、例えば、
ベンゾインイソブチルエーテルやベンジルジメチルケタ
ール等が好ましい０通常これらの光重合開始剤は、本発
明の感光性樹脂組成物１００重量部に対して０．０５〜
５重量部用いることが好ましい。A photosensitive composition obtained using a combination of these polymeric substances and a polyfunctional acrylate and/or methacrylate is
The reason why it exhibits excellent optical properties over a particularly wide temperature range is that in these combinations, the difference between the refractive index of the polymer material and the refractive index of the polyfunctional acrylate and/or polyfunctional methacrylate is as small as 0.015 or less. This is thought to be due to the fact that the effect of microphase separation does not appear as it appears. ・As a photosensitive resin composition, photopolymerization initiation for the above-mentioned polymeric substance and polyfunctional acrylate and/or polyfunctional methacrylate agent is required. Any radical polymerization initiator can be used as the photopolymerization initiator, but from the viewpoint of absorption loss of guided light, for example,
Benzoin isobutyl ether, benzyl dimethyl ketal, etc. are preferred. Usually, these photopolymerization initiators are used in an amount of 0.05 to 100 parts by weight of the photosensitive resin composition of the present invention.
It is preferable to use 5 parts by weight.
本発明の組成物においては、光重合硬化後の内部の光学
的均一性が高く、光導波損失が１０ｄＢ／ｍ以下の光導
波路や、低損失のホログラフィックレンズ、微小プリズ
ム等が得られるようになる。The composition of the present invention has high internal optical uniformity after photopolymerization and curing, so that optical waveguides with optical waveguide loss of 10 dB/m or less, low-loss holographic lenses, microprisms, etc. can be obtained. Become.
本発明における光学用感光性樹脂組成物を用いることに
より光導波損失が１０ｄＢ／ｎ＋以下の光導波路や、低
損失のホログラフィックレンズ、微小プリズム等が容易
に得られる。By using the optical photosensitive resin composition of the present invention, optical waveguides with an optical waveguide loss of 10 dB/n+ or less, low-loss holographic lenses, microprisms, etc. can be easily obtained.
以下に実施例を示す。例中部は重量部を表す。 Examples are shown below. The middle part of the example represents parts by weight.
実施例１
ポリメチルメタクリレート（旭化成工業−裂、２０℃に
おける屈折率１．４９２ ） ５８部、２官能メタクリ
レ−’ ） ＨＸ−２２０Ｍ （日本化薬ＧｔＩ製、
化合物（１）、重合硬化後の２０℃における屈折率１．
４９３ ） ４２部、及びベンジルジメチルケタール１
部をメチルエチルケトン１３５部に溶解して均一溶液と
した。これを濾過してごみを除いた後、１００μｍの厚
みのポリ弗化ビニリデンのフィルム上にドクターブレー
ドで塗布し、乾燥して９０μｍの厚みの透明な塗膜を得
た。フォトマスクを通して紫外線を照射し＝１゜１．１
− ）リクロロエタンを用いて現像し、水洗によるリン
スを行って、幅１４０μｍ１長さ４００ｍｍの直線状光
導波路のパターンを得た。この直線状光導波路の損失係
数を波長６３２．８ｎｍのＨｅ−Ｎｅ レーザー（出力
２ｍＷ）を用いて測定したところ、ｏ℃〜８゜、℃の温
度範囲において４〜１０ｄＢ／ｍの良好な値を得た。ポ
リメチルメタクリレート及び重合硬化したＨＸ−２２０
Ｍの屈折率をアツベの屈折針を用いて測定したところ、
それぞれ０℃において１．４９４０と１・４９７９．２
０℃において１．４９２０と１．４９３３．４０℃にお
いて１．４９０１と１．４８８７．８０℃において１
、４８６０と１．４７９４であった。Example 1 Polymethyl methacrylate (Asahi Kasei Co., Ltd., refractive index 1.492 at 20°C) 58 parts, difunctional methacrylate) HX-220M (manufactured by Nippon Kayaku GtI,
Compound (1), refractive index at 20°C after polymerization and curing: 1.
493) 42 parts, and benzyl dimethyl ketal 1
1 part was dissolved in 135 parts of methyl ethyl ketone to make a homogeneous solution. After filtering this to remove dust, it was applied onto a polyvinylidene fluoride film with a thickness of 100 μm using a doctor blade, and dried to obtain a transparent coating film with a thickness of 90 μm. Irradiate ultraviolet light through a photomask = 1°1.1
-) It was developed using dichloroethane and rinsed with water to obtain a linear optical waveguide pattern with a width of 140 μm and a length of 400 mm. When the loss coefficient of this linear optical waveguide was measured using a He-Ne laser (output 2 mW) with a wavelength of 632.8 nm, a good value of 4 to 10 dB/m was found in the temperature range of 0°C to 8°C. Obtained. Polymethyl methacrylate and polymerization cured HX-220
When the refractive index of M was measured using Atsube's refraction needle,
1.4940 and 1.4979.2 at 0°C, respectively.
1.4920 at 0℃ and 1.4933.1.4901 at 40℃ and 1.4887.1 at 80℃
, 4860 and 1.4794.
実施例２〜４
高分子物質と多官能アクリレート及び／又は多官能メタ
クリレートとの組合せを変えた例を、実施例１の結果と
併せて第１表に示す。Examples 2 to 4 Examples in which the combinations of polymeric substances and polyfunctional acrylates and/or polyfunctional methacrylates were changed are shown in Table 1 together with the results of Example 1.
第２表には、各実施例の高分子物質と多官能アクリレー
ト及び／又は多官能メタクリレート硬化物の屈折率を示
し、第３表には、使用した化合物（１）〜（４）の構造
式を示す。Table 2 shows the refractive index of the polymer material and polyfunctional acrylate and/or polyfunctional methacrylate cured product of each example, and Table 3 shows the structural formulas of the compounds (1) to (4) used. shows.
比較例
実施例１のＨＸ−２２０Ｍに代え、第３表の化合物（５
）で示す構造で表される２官能アクリレート（日本化薬
■製、商品名ＭＡＮＤＡ 、重合硬化後の２０℃におけ
る屈折率１．５０９ ）を用い、実施例１と同様の操作
により、幅１４０ μｍ、厚み９０μｍ、長さ４００ｍ
ｍの直線状光導波路を得た。 Ｈｅ−Ｎｅレーザーを光
源として先導波路損失を測定したところ２０℃において
８０ｄＢ／ｍであった。Comparative Example Instead of HX-220M in Example 1, the compound (5
) (manufactured by Nippon Kayaku ■, trade name: MANDA, refractive index at 20°C after polymerization and curing: 1.509) was used in the same manner as in Example 1 to form a sheet with a width of 140 μm. , thickness 90μm, length 400m
A linear optical waveguide of m length was obtained. When the leading wavepath loss was measured using a He-Ne laser as a light source, it was 80 dB/m at 20°C.
第１表 第２表 第３表 化合物（４）Table 1 Table 2 Table 3 Compound (4)
Claims (1)
−炭素結合を有しない高分子物質、［２］重合硬化後該
高分子物質との屈折率差が０℃〜８０℃の温度範囲にお
いて０．０１５以下の多官能アクリレート及び／又は多
官能メタクリレート、及び［３］光重合開始剤とからな
り、該高分子物質と多官能アクリレート及び／又は多官
能メタクリレートとの重量組成比が２０／８０〜８０／
２０であることを特徴とする光学用感光性樹脂組成物。(1) [1] A polymeric substance having a weight average molecular weight of 5,000 or more and having no unsaturated carbon-carbon bonds, [2] A temperature range in which the refractive index difference with the polymeric substance after polymerization and curing is 0°C to 80°C. It consists of a polyfunctional acrylate and/or polyfunctional methacrylate of 0.015 or less, and [3] a photopolymerization initiator, and the weight composition ratio of the polymer substance and the polyfunctional acrylate and/or polyfunctional methacrylate is 20/80. ~80/
20. An optical photosensitive resin composition characterized in that the composition is
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14979787A JPS63314224A (en) | 1987-06-16 | 1987-06-16 | Optical photopolymer composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14979787A JPS63314224A (en) | 1987-06-16 | 1987-06-16 | Optical photopolymer composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63314224A true JPS63314224A (en) | 1988-12-22 |
Family
ID=15482927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14979787A Pending JPS63314224A (en) | 1987-06-16 | 1987-06-16 | Optical photopolymer composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63314224A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007086697A (en) * | 2004-12-13 | 2007-04-05 | Hitachi Chem Co Ltd | Resin composition for optical material, resin film for optical material and optical waveguide using them |
| EP1818366A1 (en) * | 2004-10-07 | 2007-08-15 | Hitachi Chemical Company, Ltd. | Resin composition for optical material, resin film for optical material and optical waveguide using same |
| JP2011052225A (en) * | 2004-12-13 | 2011-03-17 | Hitachi Chem Co Ltd | Resin composition for optical waveguide material, resin film for optical waveguide material and optical waveguide using the same |
-
1987
- 1987-06-16 JP JP14979787A patent/JPS63314224A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1818366A1 (en) * | 2004-10-07 | 2007-08-15 | Hitachi Chemical Company, Ltd. | Resin composition for optical material, resin film for optical material and optical waveguide using same |
| EP1818366A4 (en) * | 2004-10-07 | 2009-03-04 | Hitachi Chemical Co Ltd | Resin composition for optical material, resin film for optical material and optical waveguide using same |
| US7751678B2 (en) | 2004-10-07 | 2010-07-06 | Hitachi Chemical Company, Ltd. | Resin composition for optical material, resin film for optical material and optical waveguide using same |
| EP2392619A1 (en) * | 2004-10-07 | 2011-12-07 | Hitachi Chemical Company, Ltd. | Resin composition for optical material, resin film for optical material, and optical waveguide using same |
| US8326110B2 (en) | 2004-10-07 | 2012-12-04 | Hitachi Chemical Company, Ltd. | Flexible optical waveguide having a cladding layer composed of a resin for forming a cladding layer and a base material film |
| JP2007086697A (en) * | 2004-12-13 | 2007-04-05 | Hitachi Chem Co Ltd | Resin composition for optical material, resin film for optical material and optical waveguide using them |
| JP2011052225A (en) * | 2004-12-13 | 2011-03-17 | Hitachi Chem Co Ltd | Resin composition for optical waveguide material, resin film for optical waveguide material and optical waveguide using the same |
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