JPS63197652A - Ink jet recording head and its preparation - Google Patents

Ink jet recording head and its preparation

Info

Publication number
JPS63197652A
JPS63197652A JP2971487A JP2971487A JPS63197652A JP S63197652 A JPS63197652 A JP S63197652A JP 2971487 A JP2971487 A JP 2971487A JP 2971487 A JP2971487 A JP 2971487A JP S63197652 A JPS63197652 A JP S63197652A
Authority
JP
Japan
Prior art keywords
substrate
layer
valve
recording head
flow passage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2971487A
Other languages
Japanese (ja)
Inventor
Hirokazu Komuro
博和 小室
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2971487A priority Critical patent/JPS63197652A/en
Publication of JPS63197652A publication Critical patent/JPS63197652A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1646Manufacturing processes thin film formation thin film formation by sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2/14016Structure of bubble jet print heads
    • B41J2/14032Structure of the pressure chamber
    • B41J2/14048Movable member in the chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1601Production of bubble jet print heads
    • B41J2/1604Production of bubble jet print heads of the edge shooter type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)

Abstract

PURPOSE:To facilitate the formation of a fine valve and that of a fine flow passage and to solve the limit of the miniaturization or multiplication of an ink jet recording head as observed in a conventional example, by forming an integrally formed valve by utilizing a part of a substrate in a flow passage. CONSTITUTION:With due regard to the formation of a valve or durability as a substrate, for example, the substrate 1 consisting of a SiO2 layer 3, a polysilicon layer 4 and a SiO2 layer 5 is used on a silicon wafer 2. Next, a heat generator 6 composed of HfB2 and an electrode 14 are formed on the substrate 1. Subsequently, a heat generator and the SiO2 layer 7 becoming the protective layer of the electrode are formed in a thickness of about 2mum by a sputtering method. The formed SiO2 layer 7 and SiO2 layer 5 are treated with a photolithographic technique to form SiO2 patterns 15 on the polysilicon layer 4. By itching the polysilicon layer 4 by immersing the same in an etching liquid, the SiO2 layer 5 being a part of the layer constitution of the substrate is utilized to obtain a valve 8. A part 16 of the flow passage communicating with a liquid chamber is simultaneously formed. After a flow passage wall 10 is formed on a substrate 1, the cover plate 9 of the flow passage is laminated to form a flow passage 12 to complete a recording head.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、一般にインクと呼ばれている記録液を吐出さ
せて記録を行なうインクジェット記録ヘッド、中でも高
速応答性と優れた吐出安定性を有するインクジェット記
録ヘッドおよびその製造方法に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an inkjet recording head that performs recording by ejecting a recording liquid generally called ink, which has high-speed response and excellent ejection stability. The present invention relates to an inkjet recording head and a manufacturing method thereof.

(従来の技術) 従来より、記録液を吐出、飛翔させて記録を行うインク
ジェット記録法が知られている。該方法は、高速印字が
可能であり、低騒音、かつ記録品位が高く、しかもカラ
ー画像記録が容易であり、また普通紙等に記録できると
いった優れた特長を有している。
(Prior Art) Inkjet recording methods have been known in which recording is performed by ejecting and flying a recording liquid. This method has excellent features such as high-speed printing, low noise, high recording quality, easy color image recording, and the ability to record on plain paper.

このようなインクジェット記録方法では種々の液滴吐出
原理に基づくインクジェット記録ヘッドを用いて記録を
行なっているが、液滴吐出のための吐出エネルギー発生
手段として電気機械変換体などの圧力エネルギー発生手
段を用いるものや、特開昭53−101189号公報に
示されている電気熱変換体などの熱エネルギー発生手段
を用いるものが一般的である。
In such inkjet recording methods, recording is performed using inkjet recording heads based on various droplet ejection principles, but pressure energy generation means such as electromechanical transducers are used as ejection energy generation means for ejecting droplets. It is common to use thermal energy generating means such as an electrothermal converter as disclosed in Japanese Patent Laid-Open No. 53-101189.

例えば特開昭53−101189号公報に示されている
インクジェット記録ヘッドでは、流路内に付設した電気
熱変換体にパルス電流を与えて、該変換体と接する記録
液に発泡現象を生じさせ、気泡の生成に伴なう急速な体
積膨張が流路内の記録液に与える圧力を利用して、記録
液を吐出口から吐出させて記録を行なうのである。いず
れの原理にもとづくものであっても、記録装置としての
実用的な性能を得るには、1 kHz〜10 kHzの
高速において、液滴を繰り返し吐出させ得ることが要求
される。
For example, in the inkjet recording head disclosed in Japanese Patent Application Laid-Open No. 53-101189, a pulse current is applied to an electrothermal converter attached in a flow path to cause a bubbling phenomenon in the recording liquid in contact with the converter. Recording is performed by ejecting the recording liquid from the ejection port by utilizing the pressure exerted on the recording liquid in the flow path by the rapid volumetric expansion accompanying the generation of bubbles. Regardless of which principle is used, in order to obtain practical performance as a recording device, it is required to be able to eject droplets repeatedly at a high speed of 1 kHz to 10 kHz.

ところで、このようなインクジェット記録ヘッドで液滴
を繰り返し吐出させるためには、吐出によって失われた
分の液体を次の吐出までに補充しなければならない。そ
のための代表的な方法は、液体の表面張力を利用し、毛
細管現象によって液体を吐出口に導くというものである
By the way, in order to repeatedly eject droplets with such an inkjet recording head, it is necessary to replenish the amount of liquid lost during ejection before the next ejection. A typical method for this purpose is to use the surface tension of the liquid to guide the liquid to the discharge port by capillary action.

従って、吐出エネルギー発生手段を高周波数で駆動して
高速記録を行なうためには、吐出口に液体を補充しやす
い構造、すなわち流路を大きくすることが必要である。
Therefore, in order to perform high-speed recording by driving the ejection energy generating means at a high frequency, it is necessary to have a structure that makes it easy to replenish the ejection port with liquid, that is, to enlarge the flow path.

しかしながら、流路を大きくすれば、吐出エネルギー発
生時において吐出エネルギーの流路後方へのエネルギー
損失を生じて吐出エネルギーの液滴吐出への有効寄与が
阻害され、液滴の吐出速度が遅くなって印字品位の低下
を招いていた。
However, if the flow path is made larger, the ejection energy will be lost toward the rear of the flow path when ejection energy is generated, which will inhibit the effective contribution of ejection energy to droplet ejection, and the droplet ejection speed will slow down. This led to a decline in print quality.

このような開運を解消する方法として、流路内に弁を設
けることにより吐出エネルギーの有効利用をはかること
が提案されている。例えば特開昭80−245558号
公報、特開昭60−230865号公報などである。ま
た、実開昭61−78638号公報や特開昭59−68
251号公報などには弁の形状やその製造方法が提案さ
れている。
As a method for solving this problem, it has been proposed to provide a valve in the flow path to effectively utilize the discharge energy. For example, Japanese Patent Application Laid-open No. 80-245558, Japanese Patent Application Laid-open No. 60-230865, etc. In addition, Utility Model Application Publication No. 61-78638 and Japanese Patent Application Publication No. 59-68
The shape of the valve and its manufacturing method are proposed in Japanese Patent No. 251 and the like.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、このような弁を有する従来のインクジェ
ット記録ヘッドには、以下のような欠点があった。
However, conventional inkjet recording heads having such valves have the following drawbacks.

すなわち、l)微細な弁の形成が困難であるため、流路
の微細化が容易でなく、このため複数の吐出口を記録紙
の紙幅全体にわたって配列するフルマルチ型のインクジ
ェット記録ヘッド、特に特開昭53−101189号公
報に開示されであるようなフルマルチ化の容易なインク
ジェット記録ヘッドには十分な対応ができない。
That is, l) it is difficult to form fine valves, so it is not easy to make the flow path fine; therefore, a fully multi-type inkjet recording head in which multiple ejection ports are arranged over the entire width of the recording paper, especially a special This method cannot be adequately applied to an inkjet recording head that can easily be fully multi-layered as disclosed in Japanese Patent Publication No. 53-101189.

2)弁の取り付けを接着などにより行なうため、組み立
て工数が増加してコスト上昇を招くばかりか、微細化も
困難であり、更には取り付は精度の良否による信頼性の
低下や吐出の不安定なども生じていた。
2) Since valves are attached using adhesives, etc., not only does the number of assembly steps increase, which increases costs, but it is also difficult to miniaturize the valves.Furthermore, the accuracy of the attachment may reduce reliability and result in unstable discharge. etc. were also occurring.

このように弁を用いた従来例のインクジェット記録ヘッ
ドでは、微細化やフルマルチ化に限度があるばかりか、
経済性や信頼性にも劣る等の種々の問題があった。
Conventional inkjet recording heads that use valves have limitations in miniaturization and full multiplication.
There were various problems such as poor economic efficiency and reliability.

本発明は、このような従来のインクジェット記録ヘッド
の有する問題点を解消したインクジェット記録ヘッドお
よびその製造方法を提供することを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide an inkjet recording head that solves the problems of conventional inkjet recording heads, and a method for manufacturing the same.

(問題点を解決するための手段) 本発明の上記目的は、以下の本発明によって達成される
(Means for Solving the Problems) The above objects of the present invention are achieved by the following present invention.

すなわち第1の発明は、記録液を吐出するための吐出口
に連通ずる流路を基板上に備えたインクジェット記録ヘ
ッドにおいて、前記流路に前記基板の一部を利用して一
体形成した弁を有することを特徴とするインクジェット
記録ヘッドである。
That is, the first invention is an inkjet recording head that includes a flow path on a substrate that communicates with an ejection port for ejecting recording liquid, and a valve that is integrally formed in the flow path using a part of the substrate. An inkjet recording head characterized by having:

第2の発明は、多層もしくは単層構成の基板を用い、 ■前記基板の層構成もしくは基板自体を利用して基板と
一体化した弁を作成する工程と、■前記弁を構成の一部
とする流路を形成する工程 とを有することを特徴とするインクジェット記録ヘッド
の製造方法である。
The second invention uses a multi-layered or single-layered substrate; (1) creating a valve integrated with the substrate using the layered structure of the substrate or the substrate itself; and (2) making the valve a part of the structure. A method of manufacturing an inkjet recording head is characterized by comprising a step of forming a flow path.

(作 用) 本発明では、従来のように弁を別途作成することなく、
基板の一部を利用して形成した基板と一体化した弁を用
いるため、記録ヘッドの微細化やフルマルチ化が容易で
あるばかりか、吐出も安定化し、高速かつ高品位な記録
を安定に行なえるインクジェット記録ヘッドを量産性よ
く、しかも経済的に提供できるものである。また、この
ような弁の形成に際して、微細パターンの形成が容易な
フォトリソ技法を採用し得るため、微細な弁を容易に基
板と一体形成することができ、更には一度に多数の弁を
形成可能なため、フルマルチ化が容易である。
(Function) In the present invention, there is no need to create a separate valve as in the past.
Since the valve is integrated with the substrate formed using a part of the substrate, it is not only easy to miniaturize the recording head and make it fully multifunctional, but also stabilizes ejection, ensuring stable high-speed and high-quality recording. This makes it possible to provide an inkjet recording head that can be mass-produced efficiently and economically. Furthermore, when forming such valves, it is possible to use photolithography, which facilitates the formation of fine patterns, so that fine valves can be easily formed integrally with the substrate, and furthermore, many valves can be formed at once. Therefore, full multiplication is easy.

ここで、本発明における基板としては、例えば耐久性や
絶縁性の向上をはかる等の種々の目的で所望の基材上に
各種の層を設けた複層構成のものが好ましく用いられる
。もちろん、これらの層を特には設けない単層の基板も
用いることができ、その材質も特に限定されるものでは
ない。
Here, as the substrate in the present invention, a multilayer structure in which various layers are provided on a desired base material is preferably used for various purposes such as improving durability and insulation. Of course, a single-layer substrate without any of these layers can also be used, and the material thereof is not particularly limited.

〔実施例〕〔Example〕

以下、図面を用いて本発明の詳細な説明する。 Hereinafter, the present invention will be explained in detail using the drawings.

なお、以下においては複数の吐出口を有するマルチアレ
イタイプのインクジェット記録ヘッドを主として説明す
るが、吐出口が1つのシングルアレイタイプのものにつ
いても本発明は適用し得るものである。
Note that although a multi-array type inkjet recording head having a plurality of ejection ports will be mainly described below, the present invention can also be applied to a single-array type inkjet recording head having one ejection port.

第1図(a)、第1図(b)および第2図は本発明のイ
ンクジェット記録ヘッドの一態様を示すもので、第1図
(a)には該ヘッドの模式的斜視図が、また第1図(b
)には第1図(a)の状態から覆い板9を取り除いた部
分の該ヘッドの模式的斜視図が、また第2図には第1図
(b)の状態から流路壁lOを取り除いた該ヘッドの模
式的斜視図が示されている。
FIG. 1(a), FIG. 1(b), and FIG. 2 show one embodiment of the inkjet recording head of the present invention, and FIG. 1(a) also shows a schematic perspective view of the head. Figure 1 (b
) is a schematic perspective view of the head in the state shown in FIG. 1(a) with the cover plate 9 removed, and FIG. 2 is a schematic perspective view of the head in the state shown in FIG. A schematic perspective view of the head is shown.

この記録ヘッドは、基板1と、該基板1上に配列された
複数の吐出口l」と、該吐出口11に連通する流路12
と、該流路12の一部に吐出エネルギー発生手段として
の発熱体6と、この流路12に記録液を供給するための
液室13とを有したものとして構成されている。そして
この流路12には、基板1の一部を利用して基板1と一
体形成した弁8が設けられている。なお、第1図(b)
中に示す矢印は。
This recording head includes a substrate 1, a plurality of ejection ports 1 arranged on the substrate 1, and a flow path 12 communicating with the ejection ports 11.
A heating element 6 as an ejection energy generating means is provided in a part of the flow path 12, and a liquid chamber 13 is provided for supplying recording liquid to the flow path 12. This flow path 12 is provided with a valve 8 that is integrally formed with the substrate 1 using a part of the substrate 1. In addition, Fig. 1(b)
The arrow shown inside is.

液室13から流路12への記録液の補充方向を示すもの
であり、また第2図中に符合14にて示すものは発熱体
6に記録信号を印加するための電極である。
This shows the direction in which the recording liquid is replenished from the liquid chamber 13 to the flow path 12, and the reference numeral 14 in FIG. 2 is an electrode for applying a recording signal to the heating element 6.

このような本発明のインクジェット記録ヘッドを用いて
の記録は、従来例にあけると特に異なることな〈実施す
ることができ、例えば記録信号として所望の電気パルス
を吐出エネルギー発生手段であるところの発熱体6に印
加することにより行なう。
The recording using the inkjet recording head of the present invention is not particularly different from that of the conventional example. This is done by applying it to the body 6.

ここで、弁8は発熱体6に電気パルスを印加して液滴吐
出を行なう記録の際には、吐出口方向に向う流れとは別
に生じてしまう液室方向へ向う記録液の流れによって基
板1方向に屈曲し、結果的に流路を閉じて液滴吐出に寄
与しない吐出エネルギーの損失防止をなす。一方、液滴
吐出後の記録液の補充の際には、弁8は吐出口方向に向
う記録液の流れによって覆い板9方向に屈曲し、流路を
開放するため抵抗とはならずに速やかな記録液の補充が
なされる。このような弁8の作用により、本発明のイン
クジェット記録ヘッドでは高速安定記録が達成されるの
である。
Here, during recording in which droplets are ejected by applying electric pulses to the heating element 6, the valve 8 causes the flow of the recording liquid toward the liquid chamber, which is generated separately from the flow toward the ejection port, to the substrate. It bends in one direction, and as a result closes the flow path to prevent loss of ejection energy that does not contribute to droplet ejection. On the other hand, when replenishing the recording liquid after ejecting droplets, the valve 8 bends toward the cover plate 9 due to the flow of the recording liquid toward the ejection port and opens the flow path, so that the valve 8 is quickly refilled without creating any resistance. The recording liquid is replenished. Due to the action of the valve 8, the inkjet recording head of the present invention achieves high-speed and stable recording.

なお、吐出エネルギー発生手段は、上記発熱体のように
記録液への熱供給によって生じる発泡現象を利用してエ
ネルギー供給するものの他、圧電素子のように体積変形
を利用して記録液にエネルギー供給するもの等、周知の
手段を特に限定することなく用いることができる。
Note that the ejection energy generating means may be one that supplies energy by utilizing the bubbling phenomenon caused by heat supply to the recording liquid, such as the heating element described above, or one that supplies energy to the recording liquid by utilizing volume deformation, such as a piezoelectric element. Well-known means such as those that can be used can be used without particular limitation.

次に、上記のような弁を有する本発明のインクジェット
記録ヘッドの製造方法の一例を、特に弁の形成過程を中
心にしながら第3図に基づいて述べる。なお、この第3
図には第2図のXI−Yi線に対応する部分で切断した
際の模式的断面が示されている。
Next, an example of a method for manufacturing an inkjet recording head of the present invention having the valves as described above will be described with reference to FIG. 3, focusing in particular on the process of forming the valves. Furthermore, this third
The figure shows a schematic cross section taken along the line XI-Yi in FIG. 2.

まず、第3図(a)に示すように、所望の基板1を準備
する。本例では、後工程で実施する弁の形成や基板とし
ての耐久性などを考慮して、シリコンウェハー2上に5
i02層3、ポリシリコン層4および5i02層5を順
次積層してなる多層構成の基板1を用いた。そして、こ
れら各層の作成は以下のように行なフた。
First, as shown in FIG. 3(a), a desired substrate 1 is prepared. In this example, in consideration of the formation of valves to be carried out in the later process and the durability of the substrate, five
A substrate 1 having a multilayer structure in which an i02 layer 3, a polysilicon layer 4, and a 5i02 layer 5 are sequentially laminated was used. Each of these layers was created as follows.

すなわち、シリコンウェハー2上に熱酸化により5i0
2層3を1μ厚にまず形成した。
That is, 5i0 is deposited on the silicon wafer 2 by thermal oxidation.
Two layers 3 were first formed to a thickness of 1 μm.

次いで、この上にCVD法によりポリシリコン層4を3
0μ厚に形成した。この際、原料ガスとしてはSiH4
とBH3を用い、ホウ素が+O〜lO/clI2程度ド
ープされるようにポリシリコン層形成時のガス比を調整
した。
Next, three polysilicon layers 4 are formed on this by CVD method.
It was formed to have a thickness of 0μ. At this time, the raw material gas is SiH4
Using BH3 and BH3, the gas ratio at the time of forming the polysilicon layer was adjusted so that boron was doped to about +O to lO/clI2.

次いで、このポリシリコン層4上に、後で詳述する第3
図(e)の工程でエツチングを施さない符合401にて
示す部分に対応する部分を開口した5i02からなるパ
ターンをフォトリソ技法によって形成した。
Next, on this polysilicon layer 4, a third layer, which will be described in detail later, is formed.
A pattern 5i02 with openings corresponding to the portions indicated by reference numeral 401 which were not etched in the step of FIG. 3(e) was formed by photolithography.

次いで、上記パターン形成したシリコンウェハーをBH
3ガスを流した拡散炉に入れ、!000℃程度の温度で
上記の開口部にホウ素を拡散させた。拡散させる部分は
5f02層3までとし、少ない所でも10 7cm2程
度のホウ素がドープされるまで行なつた。その後、この
5i02からなるパターンをエツチング除去した後、ポ
リシリコン層4上にスパッタリングによって約3μ厚の
SiO□層5を形成することにより、第3図(a)に示
した多層構成の基板1を得た。
Next, the patterned silicon wafer is subjected to BH
3Put it in a diffusion furnace with gas flowing through it! Boron was diffused into the openings at a temperature of about 0.000°C. The portion to be diffused was limited to the 5f02 layer 3, and the diffusion was continued until at least about 10 7 cm 2 of boron was doped. Thereafter, after removing the pattern made of 5i02 by etching, a SiO□ layer 5 having a thickness of approximately 3 μm is formed on the polysilicon layer 4 by sputtering, thereby forming the multilayered substrate 1 shown in FIG. 3(a). Obtained.

次に、この基板1上に第3図(b)に示すようなHfB
、からなる発熱体6と前述した第2図に示した電極口を
形成した。この発熱体6はスパッタリング法により1l
fB2の層を基板i上に形成した後、この層を7オトリ
ソ技法を用いてバターニングすることにより得た。また
、電極14は、上記発熱体形成後、電子ビーム蒸着法を
用いて基板1上にAIを蒸着した後、このAnの蒸着層
をフォトリソ技法を用いてバターニングすることにより
得た。
Next, HfB as shown in FIG. 3(b) is placed on this substrate 1.
A heating element 6 consisting of , and the electrode opening shown in FIG. 2 described above were formed. This heating element 6 is made of 1 liter by sputtering method.
After forming a layer of fB2 on substrate i, this layer was obtained by patterning using 7-otolithography technique. Further, the electrode 14 was obtained by depositing AI on the substrate 1 using an electron beam evaporation method after forming the heating element, and then patterning the deposited layer of An using a photolithography technique.

次に、こうして発熱体と電極とを形成した基板1に、こ
れら発熱体および電極の保護層となる5f02層7をス
パッタリング法で第3図(C)に示すように約2μ厚に
形成した。
Next, on the substrate 1 on which the heating elements and electrodes were formed, a 5f02 layer 7, which was to serve as a protective layer for the heating elements and electrodes, was formed by sputtering to a thickness of about 2 μm as shown in FIG. 3(C).

次に、第3図(e)のエツチング工程を行なうに先立フ
て、上述のようにして形成した5f02層7と前述した
基板1の有する5f02層5とをフォトリソ技法により
バターニングして、第3図(d)に示すよりな5i02
のパターンI5をポリシリコン層4上に形成した。
Next, prior to performing the etching process shown in FIG. 3(e), the 5f02 layer 7 formed as described above and the 5f02 layer 5 of the substrate 1 described above are patterned by photolithography. 5i02 shown in Figure 3(d)
A pattern I5 was formed on the polysilicon layer 4.

次に、上記のようなバターニングを施した基板1を、6
3.3重量%の水、23.4重量%のにOHおよび13
.3重量%のイソプロピルアルコールの混合溶液からな
るエツチング液に浸漬してポリシリコン層4をエツチン
グすることにより、基板の層構成の一部である5f02
層5を利用して形成された第3図(e)に例示の弁8を
得た。この時、液室に連通ずる流路の一部16も同時に
形成される。なお、説明を分りやすくするため、第4図
に、こうして弁を形成した基板を第2図のX2−Y2線
に対応する部分で切断した際の模式的断面図を示す。
Next, the substrate 1 that has been patterned as described above is
3.3% by weight water, 23.4% by weight OH and 13% by weight
.. By etching the polysilicon layer 4 by immersing it in an etching solution consisting of a mixed solution of 3% by weight of isopropyl alcohol, 5f02, which is part of the layer structure of the substrate, is etched.
The exemplary valve 8 of FIG. 3(e) formed using layer 5 was obtained. At this time, a portion 16 of the flow path communicating with the liquid chamber is also formed at the same time. In order to make the explanation easier to understand, FIG. 4 shows a schematic cross-sectional view of the substrate on which the valve is formed, taken along the line X2-Y2 in FIG. 2.

ここで、上記エツチング液はホウ素のドープ量が少ない
ポリシリコン層に対してはエツチング液として有効に作
用するが、ドープ量の多いものや5f02層にはエツチ
ング液として作用しないという性状を有しており、この
ためホウ素のドープ量が10 〜10  /cm程度と
少ない領域402のポリシリコン層は約1 p / w
inのスピードでエツチングされる。これに対して、ホ
ウ素のドープ量が、10”/cm程度と多い領域401
のポリシリコン層はエツチングされず、また5f02層
もエツチングされないので、上記第3図(e)および第
4図示のような基板と一体化された弁が形成できるので
ある。
Here, the above-mentioned etching solution has the property that it acts effectively as an etching solution for a polysilicon layer doped with a small amount of boron, but does not act as an etching solution for a polysilicon layer doped with a large amount of boron or a 5f02 layer. Therefore, the polysilicon layer in the region 402 where the amount of boron doped is as small as about 10 to 10/cm is approximately 1 p/w.
It is etched at a speed of in. On the other hand, the region 401 has a high boron doping amount of about 10”/cm.
Since the polysilicon layer is not etched and the 5f02 layer is not etched, a valve integrated with the substrate as shown in FIGS. 3(e) and 4 above can be formed.

最後に、常法に従って第1図(b)に示すような流路壁
lOを基41il上に形成した後、第1図(a)に示す
ような流路の覆い板9を積層して流路12を形成し、イ
ンクジェット記録ヘッドを完成させる。
Finally, after forming a channel wall lO as shown in FIG. 1(b) on the base 41il according to a conventional method, a channel cover plate 9 as shown in FIG. The channel 12 is formed to complete the inkjet recording head.

なお、上記においては特に説明しなかったが、弁材料は
上述の5f02に特に限定されるものではなく、他の無
機絶縁物や金属、あるいはポリイミドなどの有機材料と
してもよい。また、弁形威徳    −に、Taなどを
弁にコーティングして耐久性の向上などをはかってもよ
い。
Although not specifically described above, the valve material is not particularly limited to the above-mentioned 5f02, and may be other inorganic insulators, metals, or organic materials such as polyimide. Further, the valve may be coated with Ta or the like to improve durability.

〔発明の効果〕〔Effect of the invention〕

以上の本発明によってもたらされる効果としては、以下
に列挙するようなものを挙げることができる。
The effects brought about by the present invention described above include those listed below.

I)微細化に通したフォトリソ技法の利用により、弁の
微細化がはかれるようになった。このため、従来よりも
小型化されたインクジェット記録ヘッドを提供できるよ
うになった。
I) The use of photolithography technology, which leads to miniaturization, has made it possible to miniaturize valves. For this reason, it has become possible to provide an inkjet recording head that is smaller than before.

2)弁を基板と一体形成しているため、弁の取り付けを
特に必要とせず、信頼性が向上した。
2) Since the valve is integrally formed with the substrate, there is no need to attach the valve, improving reliability.

3)一度に多数の弁を精度よく形成することが可能であ
り、フルマルチ化への十分な対応ができるようになった
3) It is possible to form a large number of valves at once with high precision, making it possible to fully support full multiplication.

4)このような弁の微細化と、信頼性の向上により、高
速かつ高品位な記録を安定に行なうことが可能なインク
ジェット記録ヘッドを量産性よく、しかも経済的に提供
できるようになった。
4) Due to such miniaturization of valves and improved reliability, it has become possible to provide inkjet recording heads that can stably perform high-speed, high-quality recording with good mass production efficiency and at an economical cost.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はおよび第2図は本発明のインクジェット記録ヘ
ッドの一例を説明する図、第3図および第4図は本発明
のインクジェット記録ヘッドの製造方法の一例を説明す
る図である 1一基板      2・−シリコンウェハー3.5.
7−5i02層 4−ポリシリコン層6−・発熱体  
   8−弁 9−覆い板     l〇−流路壁 11−吐出口     12−流路 13−・液室 731図(a)
1 and 2 are diagrams for explaining an example of an inkjet recording head of the present invention, and FIGS. 3 and 4 are diagrams for explaining an example of a method for manufacturing an inkjet recording head of the present invention. 2.-Silicon wafer 3.5.
7-5i02 layer 4-Polysilicon layer 6-・Heating element
8-Valve 9-Cover plate l〇-Flow path wall 11-Discharge port 12-Flow path 13-・Liquid chamber 731 diagram (a)

Claims (1)

【特許請求の範囲】 1、記録液を吐出するための吐出口に連通する流路を基
板上に備えたインクジェット記録ヘッドにおいて、前記
流路に前記基板の一部を利用して一体形成した弁を有す
ることを特徴とするインクジェット記録ヘッド。 2、多層もしくは単層構成の基板を用い、 (1)前記基板の層構成もしくは基板自体を利用して基
板と一体化した弁を作成する工程と、 (2)前記弁を構成の一部とする流路を形成する工程 とを有することを特徴とするインクジェット記録ヘッド
の製造方法。
[Scope of Claims] 1. In an inkjet recording head provided with a flow path on a substrate that communicates with an ejection port for ejecting recording liquid, a valve is integrally formed in the flow path using a part of the substrate. An inkjet recording head comprising: 2. Using a multi-layered or single-layered substrate, (1) using the layered structure of the substrate or the substrate itself to create a valve integrated with the substrate; (2) making the valve a part of the structure; 1. A method for manufacturing an inkjet recording head, comprising the step of forming a flow path.
JP2971487A 1987-02-13 1987-02-13 Ink jet recording head and its preparation Pending JPS63197652A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2971487A JPS63197652A (en) 1987-02-13 1987-02-13 Ink jet recording head and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2971487A JPS63197652A (en) 1987-02-13 1987-02-13 Ink jet recording head and its preparation

Publications (1)

Publication Number Publication Date
JPS63197652A true JPS63197652A (en) 1988-08-16

Family

ID=12283776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2971487A Pending JPS63197652A (en) 1987-02-13 1987-02-13 Ink jet recording head and its preparation

Country Status (1)

Country Link
JP (1) JPS63197652A (en)

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US6676844B2 (en) * 2000-12-18 2004-01-13 Samsung Electronics Co. Ltd. Method for manufacturing ink-jet printhead having hemispherical ink chamber
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JPS6119372A (en) * 1984-07-07 1986-01-28 Nec Corp Ink jet head

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US6676844B2 (en) * 2000-12-18 2004-01-13 Samsung Electronics Co. Ltd. Method for manufacturing ink-jet printhead having hemispherical ink chamber
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