JPS63148613A - Manufacture of semiconductor integrated circuit - Google Patents
Manufacture of semiconductor integrated circuitInfo
- Publication number
- JPS63148613A JPS63148613A JP29590386A JP29590386A JPS63148613A JP S63148613 A JPS63148613 A JP S63148613A JP 29590386 A JP29590386 A JP 29590386A JP 29590386 A JP29590386 A JP 29590386A JP S63148613 A JPS63148613 A JP S63148613A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor integrated
- integrated circuits
- integrated circuit
- wafer
- pellets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 41
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000008188 pellet Substances 0.000 abstract description 9
- 235000012431 wafers Nutrition 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
Landscapes
- Design And Manufacture Of Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体集積回路の製造方法、特にウェハーをダ
イシングした後のペレット配列方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a semiconductor integrated circuit, and particularly to a method for arranging pellets after dicing a wafer.
半導体集積回路の製造において、回路の品種が多種多様
でしかも一品種の需要が比較的少ないことがある。この
場合、マスタースライス方式、即ち回路内に必要な素子
を設けておき配線パターンだけを変えて異なった回路を
つくる方式がとられる。従来、マスタースライス方式で
の配線パターンを形成する時に使用するマスクは一種類
の品種のみを有するようく形成されていた。In the manufacture of semiconductor integrated circuits, there are many different types of circuits, and demand for one type is relatively small. In this case, a master slice method is used, that is, a method in which necessary elements are provided in the circuit and only the wiring pattern is changed to create a different circuit. Conventionally, masks used when forming wiring patterns using the master slice method have been formed to have only one type of mask.
すなわち、第4図のように、ウェハー、41に半導体集
積回路人42のみの半導体Sk積回路を製造する方式を
とりさらに、個片の半導体集積回路に配列する場合に1
ウエハー、41をダイシング後、配列用シート、44に
拡大して配列していた。That is, as shown in FIG. 4, a method is adopted in which a semiconductor integrated circuit with only semiconductor integrated circuits 42 is manufactured on a wafer 41, and furthermore, when arranging into individual semiconductor integrated circuits, 1
After wafers 41 were diced, they were enlarged and arranged on an array sheet 44.
従って、半導体集積回路装置の品種を多く製造する場合
には、−品種の需要に比べ製造する量が必然的に増加し
、余剰製品の保管数及び保管場所が増大するという問題
差:ある。Therefore, when manufacturing a large number of types of semiconductor integrated circuit devices, there is a problem in that the amount of manufactured products inevitably increases compared to the demand for each type, and the number and storage space for surplus products increases.
本発明の目的は、多品種の半導体集積回路を製造する場
合に余剰製品を少なくし、ひいてはその保管数及び保管
場所の増大化を防止するために最適な半導体集積回路の
製造方法を提供することである。An object of the present invention is to provide an optimal method for manufacturing semiconductor integrated circuits in order to reduce surplus products when manufacturing a wide variety of semiconductor integrated circuits, and to prevent an increase in the number of products stored and the storage space. It is.
本発明は、二種以上の品種の半導体集積回路の配線パタ
ーンを有するウニノ・−をダイシングしてペレット配列
する場合、ペレット上に付加した認識コードを識別して
ペレット配列する製造方法を有している。The present invention has a manufacturing method for arranging the pellets by identifying a recognition code added on the pellets when dicing and arranging the pellets by dicing Uni-no-- having wiring patterns of two or more types of semiconductor integrated circuits. There is.
図面を参照して本発明の詳細な説明する。 The present invention will be described in detail with reference to the drawings.
第1図は本発明の第1の実施例を示す図であり、第3図
は半導体集積回路の部分拡大図である。まず、第1図に
ボすように、ウニノ−−,11に形成された、半導体集
積回路A・、12及び半導体集積回路B、13を個片の
半導体集積回路にするため、ウェハー、11を公知のダ
イシング技術により分離する。さらに、第3図に示すよ
うに、半導体集積回路2のコーナ一部に設けられた品種
を区別するための製品名又は詞繊番号を示す認識コード
1により半導体集積回路人、12と半導体集積回路B、
13を認識して同一の配列用シー)、14に配列する。FIG. 1 is a diagram showing a first embodiment of the present invention, and FIG. 3 is a partially enlarged view of a semiconductor integrated circuit. First, as shown in FIG. 1, in order to make the semiconductor integrated circuits A, 12 and semiconductor integrated circuits B, 13 formed on the wafer 11 into individual semiconductor integrated circuits, the wafer 11 is Separate by a known dicing technique. Furthermore, as shown in FIG. 3, a recognition code 1 indicating a product name or a serial number for distinguishing the product type provided at a part of the corner of the semiconductor integrated circuit 2 indicates that the semiconductor integrated circuit is recognized, 12 and the semiconductor integrated circuit. B,
13 and arranges it in the same array sheet) and 14.
すなわち、同一の配列用シート、14に半導体集積回路
人、12と半導体集積回路B、13が特定の空間をおい
て、混在しないように配列することになる。本実施例で
は、第3図のようなコーナ一部の認識コード、1を説明
したが、半導体集積。That is, the semiconductor integrated circuits 12 and 12 and the semiconductor integrated circuits B and 13 are arranged on the same arrangement sheet 14, with a specific space therebetween, so that they do not coexist. In this embodiment, the recognition code 1 for a part of the corner as shown in FIG.
回路、2の周辺部で同様に、認識するための認識座標を
変えることにより認識可能である。Similarly, the peripheral part of circuit 2 can be recognized by changing the recognition coordinates for recognition.
〔実施例2〕
第2図は、本発明の第2の実施例を示す図である。第1
の実施例と同様に、ウニノー−,21に形成された半導
体集積回路人、22を第3図に示す認識コード1により
配列用シー)A、24に、又、同様に、半導体集積回路
B、23を配列用シートB、25に配列する。この*m
例では品種ごとに区別して配列するので、二種以上の品
種の半導体集積回路の配線パターンを有するウニノー−
をダイシングして、ペレット配列し、さらに第3図のバ
ンプ、3に外部接続端子をボンディングする場合の作業
において、認識コードを識別しなくて良い利点がある。[Embodiment 2] FIG. 2 is a diagram showing a second embodiment of the present invention. 1st
Similarly to the embodiment shown in FIG. 23 are arranged on the arrangement sheet B, 25. This*m
In this example, the wiring patterns of two or more types of semiconductor integrated circuits are arranged separately for each type.
There is an advantage that there is no need to identify the recognition code in the work of dicing, arranging pellets, and bonding external connection terminals to the bumps 3 shown in FIG.
以上説明したように、本発明によれば、多品撫少量生産
方式により少量の半導体集積回路を生産する場合に、二
種以上の品種の半導体集積回路の配線パターンを有する
ウェハーをダイシングして、ペレット配列することがで
きるので、余剰製品を少なくでき、さらに製品の保管数
及び保管場所の増大化を防止できる効果がある。As explained above, according to the present invention, when producing a small amount of semiconductor integrated circuits by a high-product, low-volume production method, wafers having wiring patterns of two or more types of semiconductor integrated circuits are diced, Since pellets can be arranged, surplus products can be reduced, and the number of products stored and storage space can be prevented from increasing.
第1図及び第2図は本発明の詳細な説明図、第3図は半
導体集積回路の部分拡大図、第4図は従来技術による実
施例の説明図である。
1・・・・・・認識コード、2・・・・・・半導体集積
回路、3・・・・・・バンプ、4・・・・・・シ冒−ト
防止バンプ、11゜21.41・・・・・・ウェハー、
12,22,42・・・・、・半導体集積回路A、13
.23・・・・・・半導体集積回路B114.44・・
・・・・配列用シート、24・・・・・・配列用シート
A125・・・・・・配列用シートB0牛λ 図
第3 の1 and 2 are detailed explanatory diagrams of the present invention, FIG. 3 is a partially enlarged view of a semiconductor integrated circuit, and FIG. 4 is an explanatory diagram of an embodiment according to the prior art. 1... Recognition code, 2... Semiconductor integrated circuit, 3... Bump, 4... Blank prevention bump, 11°21.41. ...Wafer,
12, 22, 42..., Semiconductor integrated circuit A, 13
.. 23...Semiconductor integrated circuit B114.44...
...Arraying sheet, 24... Arraying sheet A125... Arraying sheet B0 Cow λ Figure 3
Claims (1)
において、二種以上の品種の半導体集積回路の配線パタ
ーンを有するウェハーをダイシングして個片の半導体集
積回路に配列する場合、種類の異なる半導体集積回路上
の認識コードを識別して個片の半導体集積回路に配列す
ることを特徴とする半導体集積回路の製造方法。In semiconductor integrated circuits manufactured by the master slicing method, when dicing a wafer having wiring patterns of two or more types of semiconductor integrated circuits and arranging them into individual semiconductor integrated circuits, recognition of different types of semiconductor integrated circuits is required. 1. A method of manufacturing a semiconductor integrated circuit, comprising identifying codes and arranging them on individual semiconductor integrated circuits.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29590386A JPS63148613A (en) | 1986-12-12 | 1986-12-12 | Manufacture of semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29590386A JPS63148613A (en) | 1986-12-12 | 1986-12-12 | Manufacture of semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63148613A true JPS63148613A (en) | 1988-06-21 |
Family
ID=17826642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29590386A Pending JPS63148613A (en) | 1986-12-12 | 1986-12-12 | Manufacture of semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63148613A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5925258A (en) * | 1982-07-30 | 1984-02-09 | Fujitsu Ltd | Semiconductor integrated circuit device and its manufacture |
JPS61234025A (en) * | 1985-04-10 | 1986-10-18 | Nec Corp | Semiconductor device |
-
1986
- 1986-12-12 JP JP29590386A patent/JPS63148613A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5925258A (en) * | 1982-07-30 | 1984-02-09 | Fujitsu Ltd | Semiconductor integrated circuit device and its manufacture |
JPS61234025A (en) * | 1985-04-10 | 1986-10-18 | Nec Corp | Semiconductor device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20050017332A1 (en) | Asymmetric partially-etched leads for finer pitch semiconductor chip package | |
US20150294942A1 (en) | Indexing of electronic devices distributed on different chips | |
JPS63148613A (en) | Manufacture of semiconductor integrated circuit | |
JP2766857B2 (en) | Semiconductor integrated circuit device forming wafer | |
JPS63280439A (en) | Semiconductor integrated circuit | |
JPS6212664B2 (en) | ||
US5656851A (en) | Semiconductor wafer having slices and limited scribe areas for implementing die | |
JPH0691124B2 (en) | IC package | |
JPS587847A (en) | Semiconductor device | |
JPS63220542A (en) | Manufacture of semiconductor device | |
JPS6278848A (en) | Large scale semiconductor integrated circuit | |
JPS62165963A (en) | Manufacture of semiconductor integrated circuit | |
JPH0715142Y2 (en) | Integrated circuit device | |
JPS6187156A (en) | Photomask for producing integrated circuit | |
JPS61263237A (en) | Manufacture of semiconductor device | |
JPH03237742A (en) | Master slice integrated circuit | |
JPH04368175A (en) | Master slice lsi | |
JPS58175820A (en) | Semiconductor chip of semiconductor integrated circuit device | |
JPH022164A (en) | Integrated circuit | |
JPH0451512A (en) | Semiconductor integrated circuit device | |
JPH0677105A (en) | Semiconductor device and its manufacture | |
JPH0434974A (en) | Semiconductor integrated circuit device | |
JPS6272155A (en) | Manufacture of integrated circuit | |
JPS63102237A (en) | Manufacture of semiconductor device | |
JPS58182841A (en) | Monolithic integrated circuit |