JPS63148613A - Manufacture of semiconductor integrated circuit - Google Patents

Manufacture of semiconductor integrated circuit

Info

Publication number
JPS63148613A
JPS63148613A JP29590386A JP29590386A JPS63148613A JP S63148613 A JPS63148613 A JP S63148613A JP 29590386 A JP29590386 A JP 29590386A JP 29590386 A JP29590386 A JP 29590386A JP S63148613 A JPS63148613 A JP S63148613A
Authority
JP
Japan
Prior art keywords
semiconductor integrated
integrated circuits
integrated circuit
wafer
pellets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP29590386A
Other languages
Japanese (ja)
Inventor
Mutsuo Saito
斎藤 睦男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP29590386A priority Critical patent/JPS63148613A/en
Publication of JPS63148613A publication Critical patent/JPS63148613A/en
Pending legal-status Critical Current

Links

Landscapes

  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To reduce surplus products during the manufacture of many types by a method wherein, when a wafer containing wiring patterns of more than two types of semiconductor integrated circuits is diced and their pellets are arranged, these pellets are arranged after discriminating an identification code marked on each pellet. CONSTITUTION:In order to separate semiconductor integrated circuits A12 and semiconductor integrated circuits B13, both formed on a wafer 11, into each individual semiconductor integrated circuit, the wafer 11 is diced and they are separated. Furthermore, the semiconductor integrated circuits A12 and the semiconductor integrated circuits B13 are discriminated by an identification code 1 which is marked at a corner of a semiconductor integrated circuit 2 to indicate a product name or an identification number for discrimination of a type; then, they are arranged on an identical sheet 14 for arrangement use. That is to say, the semiconductor integrated circuits A12 and the semiconductor integrated circuits B13 are arranged on the identical sheet 14 for arrangement use by keeping a specified space so that these are not intermingled with each other. By this method, it is possible to reduce surplus products during the small production of many types of products.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は半導体集積回路の製造方法、特にウェハーをダ
イシングした後のペレット配列方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for manufacturing a semiconductor integrated circuit, and particularly to a method for arranging pellets after dicing a wafer.

〔従来の技術〕[Conventional technology]

半導体集積回路の製造において、回路の品種が多種多様
でしかも一品種の需要が比較的少ないことがある。この
場合、マスタースライス方式、即ち回路内に必要な素子
を設けておき配線パターンだけを変えて異なった回路を
つくる方式がとられる。従来、マスタースライス方式で
の配線パターンを形成する時に使用するマスクは一種類
の品種のみを有するようく形成されていた。
In the manufacture of semiconductor integrated circuits, there are many different types of circuits, and demand for one type is relatively small. In this case, a master slice method is used, that is, a method in which necessary elements are provided in the circuit and only the wiring pattern is changed to create a different circuit. Conventionally, masks used when forming wiring patterns using the master slice method have been formed to have only one type of mask.

すなわち、第4図のように、ウェハー、41に半導体集
積回路人42のみの半導体Sk積回路を製造する方式を
とりさらに、個片の半導体集積回路に配列する場合に1
ウエハー、41をダイシング後、配列用シート、44に
拡大して配列していた。
That is, as shown in FIG. 4, a method is adopted in which a semiconductor integrated circuit with only semiconductor integrated circuits 42 is manufactured on a wafer 41, and furthermore, when arranging into individual semiconductor integrated circuits, 1
After wafers 41 were diced, they were enlarged and arranged on an array sheet 44.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従って、半導体集積回路装置の品種を多く製造する場合
には、−品種の需要に比べ製造する量が必然的に増加し
、余剰製品の保管数及び保管場所が増大するという問題
差:ある。
Therefore, when manufacturing a large number of types of semiconductor integrated circuit devices, there is a problem in that the amount of manufactured products inevitably increases compared to the demand for each type, and the number and storage space for surplus products increases.

本発明の目的は、多品種の半導体集積回路を製造する場
合に余剰製品を少なくし、ひいてはその保管数及び保管
場所の増大化を防止するために最適な半導体集積回路の
製造方法を提供することである。
An object of the present invention is to provide an optimal method for manufacturing semiconductor integrated circuits in order to reduce surplus products when manufacturing a wide variety of semiconductor integrated circuits, and to prevent an increase in the number of products stored and the storage space. It is.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、二種以上の品種の半導体集積回路の配線パタ
ーンを有するウニノ・−をダイシングしてペレット配列
する場合、ペレット上に付加した認識コードを識別して
ペレット配列する製造方法を有している。
The present invention has a manufacturing method for arranging the pellets by identifying a recognition code added on the pellets when dicing and arranging the pellets by dicing Uni-no-- having wiring patterns of two or more types of semiconductor integrated circuits. There is.

〔実施例〕〔Example〕

図面を参照して本発明の詳細な説明する。 The present invention will be described in detail with reference to the drawings.

第1図は本発明の第1の実施例を示す図であり、第3図
は半導体集積回路の部分拡大図である。まず、第1図に
ボすように、ウニノ−−,11に形成された、半導体集
積回路A・、12及び半導体集積回路B、13を個片の
半導体集積回路にするため、ウェハー、11を公知のダ
イシング技術により分離する。さらに、第3図に示すよ
うに、半導体集積回路2のコーナ一部に設けられた品種
を区別するための製品名又は詞繊番号を示す認識コード
1により半導体集積回路人、12と半導体集積回路B、
13を認識して同一の配列用シー)、14に配列する。
FIG. 1 is a diagram showing a first embodiment of the present invention, and FIG. 3 is a partially enlarged view of a semiconductor integrated circuit. First, as shown in FIG. 1, in order to make the semiconductor integrated circuits A, 12 and semiconductor integrated circuits B, 13 formed on the wafer 11 into individual semiconductor integrated circuits, the wafer 11 is Separate by a known dicing technique. Furthermore, as shown in FIG. 3, a recognition code 1 indicating a product name or a serial number for distinguishing the product type provided at a part of the corner of the semiconductor integrated circuit 2 indicates that the semiconductor integrated circuit is recognized, 12 and the semiconductor integrated circuit. B,
13 and arranges it in the same array sheet) and 14.

すなわち、同一の配列用シート、14に半導体集積回路
人、12と半導体集積回路B、13が特定の空間をおい
て、混在しないように配列することになる。本実施例で
は、第3図のようなコーナ一部の認識コード、1を説明
したが、半導体集積。
That is, the semiconductor integrated circuits 12 and 12 and the semiconductor integrated circuits B and 13 are arranged on the same arrangement sheet 14, with a specific space therebetween, so that they do not coexist. In this embodiment, the recognition code 1 for a part of the corner as shown in FIG.

回路、2の周辺部で同様に、認識するための認識座標を
変えることにより認識可能である。
Similarly, the peripheral part of circuit 2 can be recognized by changing the recognition coordinates for recognition.

〔実施例2〕 第2図は、本発明の第2の実施例を示す図である。第1
の実施例と同様に、ウニノー−,21に形成された半導
体集積回路人、22を第3図に示す認識コード1により
配列用シー)A、24に、又、同様に、半導体集積回路
B、23を配列用シートB、25に配列する。この*m
例では品種ごとに区別して配列するので、二種以上の品
種の半導体集積回路の配線パターンを有するウニノー−
をダイシングして、ペレット配列し、さらに第3図のバ
ンプ、3に外部接続端子をボンディングする場合の作業
において、認識コードを識別しなくて良い利点がある。
[Embodiment 2] FIG. 2 is a diagram showing a second embodiment of the present invention. 1st
Similarly to the embodiment shown in FIG. 23 are arranged on the arrangement sheet B, 25. This*m
In this example, the wiring patterns of two or more types of semiconductor integrated circuits are arranged separately for each type.
There is an advantage that there is no need to identify the recognition code in the work of dicing, arranging pellets, and bonding external connection terminals to the bumps 3 shown in FIG.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、多品撫少量生産
方式により少量の半導体集積回路を生産する場合に、二
種以上の品種の半導体集積回路の配線パターンを有する
ウェハーをダイシングして、ペレット配列することがで
きるので、余剰製品を少なくでき、さらに製品の保管数
及び保管場所の増大化を防止できる効果がある。
As explained above, according to the present invention, when producing a small amount of semiconductor integrated circuits by a high-product, low-volume production method, wafers having wiring patterns of two or more types of semiconductor integrated circuits are diced, Since pellets can be arranged, surplus products can be reduced, and the number of products stored and storage space can be prevented from increasing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明の詳細な説明図、第3図は半
導体集積回路の部分拡大図、第4図は従来技術による実
施例の説明図である。 1・・・・・・認識コード、2・・・・・・半導体集積
回路、3・・・・・・バンプ、4・・・・・・シ冒−ト
防止バンプ、11゜21.41・・・・・・ウェハー、
12,22,42・・・・、・半導体集積回路A、13
.23・・・・・・半導体集積回路B114.44・・
・・・・配列用シート、24・・・・・・配列用シート
A125・・・・・・配列用シートB0牛λ 図 第3 の
1 and 2 are detailed explanatory diagrams of the present invention, FIG. 3 is a partially enlarged view of a semiconductor integrated circuit, and FIG. 4 is an explanatory diagram of an embodiment according to the prior art. 1... Recognition code, 2... Semiconductor integrated circuit, 3... Bump, 4... Blank prevention bump, 11°21.41. ...Wafer,
12, 22, 42..., Semiconductor integrated circuit A, 13
.. 23...Semiconductor integrated circuit B114.44...
...Arraying sheet, 24... Arraying sheet A125... Arraying sheet B0 Cow λ Figure 3

Claims (1)

【特許請求の範囲】[Claims]  マスタースライス方式により製造する半導体集積回路
において、二種以上の品種の半導体集積回路の配線パタ
ーンを有するウェハーをダイシングして個片の半導体集
積回路に配列する場合、種類の異なる半導体集積回路上
の認識コードを識別して個片の半導体集積回路に配列す
ることを特徴とする半導体集積回路の製造方法。
In semiconductor integrated circuits manufactured by the master slicing method, when dicing a wafer having wiring patterns of two or more types of semiconductor integrated circuits and arranging them into individual semiconductor integrated circuits, recognition of different types of semiconductor integrated circuits is required. 1. A method of manufacturing a semiconductor integrated circuit, comprising identifying codes and arranging them on individual semiconductor integrated circuits.
JP29590386A 1986-12-12 1986-12-12 Manufacture of semiconductor integrated circuit Pending JPS63148613A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29590386A JPS63148613A (en) 1986-12-12 1986-12-12 Manufacture of semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29590386A JPS63148613A (en) 1986-12-12 1986-12-12 Manufacture of semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPS63148613A true JPS63148613A (en) 1988-06-21

Family

ID=17826642

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29590386A Pending JPS63148613A (en) 1986-12-12 1986-12-12 Manufacture of semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS63148613A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5925258A (en) * 1982-07-30 1984-02-09 Fujitsu Ltd Semiconductor integrated circuit device and its manufacture
JPS61234025A (en) * 1985-04-10 1986-10-18 Nec Corp Semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5925258A (en) * 1982-07-30 1984-02-09 Fujitsu Ltd Semiconductor integrated circuit device and its manufacture
JPS61234025A (en) * 1985-04-10 1986-10-18 Nec Corp Semiconductor device

Similar Documents

Publication Publication Date Title
US20050017332A1 (en) Asymmetric partially-etched leads for finer pitch semiconductor chip package
US20150294942A1 (en) Indexing of electronic devices distributed on different chips
JPS63148613A (en) Manufacture of semiconductor integrated circuit
JP2766857B2 (en) Semiconductor integrated circuit device forming wafer
JPS63280439A (en) Semiconductor integrated circuit
JPS6212664B2 (en)
US5656851A (en) Semiconductor wafer having slices and limited scribe areas for implementing die
JPH0691124B2 (en) IC package
JPS587847A (en) Semiconductor device
JPS63220542A (en) Manufacture of semiconductor device
JPS6278848A (en) Large scale semiconductor integrated circuit
JPS62165963A (en) Manufacture of semiconductor integrated circuit
JPH0715142Y2 (en) Integrated circuit device
JPS6187156A (en) Photomask for producing integrated circuit
JPS61263237A (en) Manufacture of semiconductor device
JPH03237742A (en) Master slice integrated circuit
JPH04368175A (en) Master slice lsi
JPS58175820A (en) Semiconductor chip of semiconductor integrated circuit device
JPH022164A (en) Integrated circuit
JPH0451512A (en) Semiconductor integrated circuit device
JPH0677105A (en) Semiconductor device and its manufacture
JPH0434974A (en) Semiconductor integrated circuit device
JPS6272155A (en) Manufacture of integrated circuit
JPS63102237A (en) Manufacture of semiconductor device
JPS58182841A (en) Monolithic integrated circuit