JPS63118094A - Electroplating equipment - Google Patents
Electroplating equipmentInfo
- Publication number
- JPS63118094A JPS63118094A JP26177286A JP26177286A JPS63118094A JP S63118094 A JPS63118094 A JP S63118094A JP 26177286 A JP26177286 A JP 26177286A JP 26177286 A JP26177286 A JP 26177286A JP S63118094 A JPS63118094 A JP S63118094A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- strip
- anode
- ultrasonic
- soln
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009713 electroplating Methods 0.000 title claims description 19
- 238000007747 plating Methods 0.000 claims abstract description 40
- 229910021645 metal ion Inorganic materials 0.000 abstract description 6
- 238000009792 diffusion process Methods 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 3
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 239000004020 conductor Substances 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
- 238000003756 stirring Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 7
- 238000013019 agitation Methods 0.000 description 3
- 206010011224 Cough Diseases 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- -1 gold ions Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010907 mechanical stirring Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001256 stainless steel alloy Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、電気メッキ装置に関し、詳しくはストリップ
(鋼板素地など)の表面処理のための電気メッキ装Mに
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electroplating apparatus, and more particularly to an electroplating apparatus M for surface treatment of a strip (such as a steel plate base material).
12.1知のように、メッキ条件の一つの7!!流密度
は、可能な限り大きいことが望ましい。すなわち、(1
)メッキ速度を上昇させ、(2)水素過電圧の上昇によ
り卑な金属を11流効率よくメッキでき、(3)緻密な
、強度の大きいメッキ膜が作られ、(4)均一電着性が
改善される。しかしながら、使用可能な電流密度の上限
は、電橋近傍の金属イオン量で決まるので、換言すれば
、高電流密度になればなる程、金1イオンが787pi
、から被メッキ面に十分拡散できず、メッキ表面の金属
イオン濃度が低下する。したがって、この拡散層を小さ
くするため、11が電流密度の増加に有効な手段とされ
ており、ビット発生防止にもを効となっている。As shown in 12.1, one of the plating conditions is 7! ! It is desirable that the flow density be as high as possible. That is, (1
) Increases plating speed, (2) Increases hydrogen overvoltage to efficiently plate base metals, (3) Creates a dense and strong plating film, and (4) Improves uniform electrodeposition. be done. However, the upper limit of usable current density is determined by the amount of metal ions near the bridge, so in other words, the higher the current density, the more 787pi gold ions
, cannot be sufficiently diffused to the plated surface, and the metal ion concentration on the plated surface decreases. Therefore, in order to reduce the size of this diffusion layer, 11 is considered to be an effective means for increasing the current density, and is also effective in preventing bit generation.
ところで、かかる攪拌手段としては従来より(al空気
攪1?、(b1機械的攪+’l’ (プロペラ、陰極揺
動)、(C1超音波攪拌、fd+メッキ液の連続濾過に
よる強制対流などが知られており、特にストリップの電
気メッキ装置では、強制対流による攪拌が主として行わ
れている。By the way, as such stirring means, conventional methods include (al air stirring 1?, (b1 mechanical stirring + 'l' (propeller, cathode rocking), (C1 ultrasonic stirring, fd + forced convection by continuous filtration of the plating solution, etc.). It is well known that, particularly in strip electroplating apparatuses, agitation by forced convection is mainly carried out.
しかしながら、拡散層を小さくするために強制対流を強
化しようとすれば、流速を大きくとり、ひいてはポンプ
容量を大きくしなければならず、また、機械的攪拌では
方向性があったり、局部的な撹拌となる。また、実公昭
54−12007号公報で紹介されているような超音波
攪拌の単独使用では、ストリップの電気メッキ装置に用
いた場合、出力を大きくするとともに設備が大となる。However, if forced convection is to be strengthened to reduce the size of the diffusion layer, the flow rate must be increased and the pump capacity must be increased, and mechanical agitation requires directional or localized agitation. becomes. Further, when ultrasonic stirring is used alone as introduced in Japanese Utility Model Publication No. 12007/1983, when used in a strip electroplating apparatus, the output is increased and the equipment becomes large.
c問題点を解決するための手段〕
そこで本発明は、かかる従来技術の問題点を一挙に解決
するため創作されたもので、電気メッキのメッキ速度を
向上し、生産性を上げ、工場面積の縮小化ならびに省力
化に資するため、メッキ液の強制対流を施したメッキ槽
でストリップを電気メッキする電気メッキ装置において
、ストリップの表面上に適宜の間隔をおいて超音波振動
子を設け、該ストリップと該振動子との間に、咳据動子
に向け広がった角度を有する小透孔を穿設し陽極板を介
在させた電気メッキ装置を提供する。Means for Solving Problems c] Therefore, the present invention was created to solve all of the problems of the prior art at once. In order to contribute to downsizing and labor saving, ultrasonic vibrators are installed at appropriate intervals on the surface of the strip in an electroplating device that electroplates the strip in a plating tank with forced convection of the plating solution. An electroplating device is provided in which a small through hole having an angle that widens toward the cough emitter is formed between the oscillator and the cough emitter, and an anode plate is interposed therebetween.
ストリップを陰極としたメッキ槽に浸を責しながら走行
させ、咳メフキ槽に濾過されたメッキ液を噴出して槽内
のメッキ液を攪拌するとともに、超音波振動子からの超
音波によってもメッキ液を攪拌して、ストリップ表面の
拡散層を可及的に小とするので、電流密度を大としなが
らメッキ速度を向上させることができる。かかる場合、
超音波1辰勤子からの超音波が陽極板によって妨げられ
るので、陽極板に小透孔を穿設して超音波を該小透孔を
透過させストリップに照射させる。かかる超音波の照射
によってメッキ面は斑点模様などの局部的なメッキが形
成されるので、これを防ぐため、超音波振動子に向け広
がった小透孔の傾斜面で、超音波を反射してストリップ
面に均一な攪拌を行う。The strip is run through a plating tank with the cathode as a cathode, and the filtered plating solution is spouted into the plating tank to agitate the plating solution in the tank, and the plating is also carried out using ultrasonic waves from an ultrasonic vibrator. Since the liquid is stirred to make the diffusion layer on the strip surface as small as possible, the plating speed can be improved while increasing the current density. In such case,
Since the ultrasonic waves from the ultrasonic wave are blocked by the anode plate, a small hole is drilled in the anode plate so that the ultrasonic wave is transmitted through the small hole and irradiated onto the strip. Because the irradiation of such ultrasonic waves causes localized plating, such as spot patterns, to be formed on the plating surface, in order to prevent this, the ultrasonic waves are reflected on the sloped surface of the small through hole that widens toward the ultrasonic transducer. Stir evenly over the strip surface.
本発明の構成の詳細を添付図面に示す実施例により説明
する。図示は連続電気メッキラインのメッキ装置を示し
、1はストリップ、2は電解メッキ槽でトレイ式といわ
れる上部開放横形槽を示す。The details of the structure of the present invention will be explained with reference to embodiments shown in the accompanying drawings. The figure shows a plating apparatus of a continuous electroplating line, where 1 is a strip plating tank and 2 is an electrolytic plating tank, which is a horizontal tank with an open top, which is called a tray type.
3.3は上、下陽極、4.4は前後のコンダククロール
、5,5はメッキ液吹出し口、6,6はメッキ液オーバ
フローロを示す、該オーバフローロ6.6からオーバフ
ローしたメッキ液は、適宜のイオン金属濾過装置(図示
せず)を経由して、ポンプPによりメッキ液吹出し口5
,5より陽極3゜3間に向け吹出すようになっている0
以上の構造は周知の連続電気メッキラインのメッキ装置
を示すものである。3.3 is the upper and lower anode, 4.4 is the front and rear conductor crawl, 5, 5 is the plating solution outlet, and 6, 6 is the plating solution overflow roller.The plating solution that overflowed from the overflow roller 6.6 is , a plating solution outlet 5 is supplied by a pump P via an appropriate ion metal filtration device (not shown).
, 5, the air is blown out between the anodes 3° and 3.
The above structure represents a known plating apparatus for a continuous electroplating line.
ここにおいて、本実施例は上の陽極3上に1枚の1辰勤
板7を設け、該振動板7上に等間隔に設置された複数の
振動子8,8・・・を設ける。したがって、振動子8に
よる超音波はストリップlおよび陽極3に垂直に照射す
るようにし、これにより、陰極であるストリップ1およ
び陽極3の分橿作用による電圧降下を抑制することがで
きる。また、下の陽極3も同様の構造としている。Here, in this embodiment, one single-strength plate 7 is provided on the upper anode 3, and a plurality of vibrators 8, 8, . . . are provided on the diaphragm 7 at equal intervals. Therefore, the ultrasonic waves from the vibrator 8 are irradiated perpendicularly to the strip 1 and the anode 3, thereby suppressing the voltage drop due to the splitting action of the strip 1, which is the cathode, and the anode 3. Further, the lower anode 3 has a similar structure.
ところで、この超音波の周波19fは、ストリップ1の
電気メッキの場合、以下の範囲が望ましい。By the way, in the case of electroplating the strip 1, the frequency 19f of this ultrasonic wave is preferably in the following range.
10KHz ≦「≦1000KHz
すなわち、1OKHz以下では攪拌効果が少なく、]0
OOKHz以上ではキャビテーションエロージョンが発
生し、これにより斑点の腐蝕模様が発生する。なお、か
かる周並数fは
f〜1゜05f
で、超音波発生装置の電圧を変えることにより、連続的
に変調する。これは超音波を一定周波数fで行うと、攪
拌の効果が周波数fのピークのところで最大となり、そ
れ以外のところではその効果が小さくなるからである。10KHz ≦"≦1000KHz In other words, below 1KHz, the stirring effect is small, ]0
At OOKHz or higher, cavitation erosion occurs, resulting in a spotted corrosion pattern. The parallel number f is f~1°05f, and is continuously modulated by changing the voltage of the ultrasonic generator. This is because when ultrasonic waves are applied at a constant frequency f, the stirring effect is maximum at the peak of the frequency f, and the effect is small elsewhere.
次に、振動子8とストリップ1の距Mdは、電着性にと
って重要であるが、これは以下のようにすればよいこと
が判明した。すなわち、この距離dによって、超音波の
攪拌力が
d#1/4λ (2n−1)
で最大となるため、メッキ金属イオンの濃度勾配をみい
だすことができる。Next, the distance Md between the vibrator 8 and the strip 1 is important for electrodepositivity, and it has been found that this can be determined as follows. That is, due to this distance d, the stirring force of the ultrasonic wave reaches its maximum at d#1/4λ (2n-1), so that a concentration gradient of the plating metal ions can be found.
ただし、
λは超音波の波長(λ・f=c、cは音速)nは自然数
したがって、当初、振動子8とストリップ1との距離d
にしておくと、メッキ(金属の析出)が進むと、その厚
さによりピークの位置における距離dと実際の距離は一
致しなくなる。すなわちメッキ層の厚さが異なってくる
。そこで、超音波発生装置の電圧を変えることにより、
周波数を変関し、メ・7キが析出しても、その表面に超
音波の効果が最も得られるようにする。また、かかる変
調はメッキ液の圧力変動を生じさせるため、金属イオン
をストリップ表面に供給し、変調しない場合より拡散効
果をあげることができる。However, λ is the wavelength of the ultrasonic wave (λ・f=c, c is the speed of sound) n is a natural number. Therefore, initially, the distance d between the transducer 8 and the strip 1 is
If the plating (metal precipitation) progresses, the distance d at the peak position will no longer match the actual distance due to its thickness. In other words, the thickness of the plating layer differs. Therefore, by changing the voltage of the ultrasonic generator,
The frequency is varied so that even if metal particles are deposited, the effect of ultrasonic waves can be maximized on the surface of the metal particles. Furthermore, since such modulation causes pressure fluctuations in the plating solution, metal ions can be supplied to the strip surface and the diffusion effect can be increased more than when no modulation is used.
次に、陽極3の表面と振動子8の距離d°にも以下の関
係を成立させ、超音波による共振にて不溶性電極表面に
発生した酸素ガスの離脱を助ける。Next, the following relationship is established for the distance d° between the surface of the anode 3 and the vibrator 8 to help release the oxygen gas generated on the surface of the insoluble electrode due to the resonance caused by the ultrasonic waves.
d′ ヰλ/4 (2n−1)
ただし、
λ、nは前記と同様である
更に、上の陽極3は例えば、ステンレス、銅合金等の金
属材料で超音波の反射率の高いもので構成し、その形状
は、第1図および第2図に示すように形成する。該陽極
3にはスリット9を設け、該スリット9はストリップl
の走行方向に直角に、かつ、該スリット9の中心線上に
前記振動子8を位置させるよう穿設し、該スリット9を
振動子8に向け広がった角度を有するよう形成し、傾斜
面10を構成する。その結果、該傾斜面lOで超音波が
反射されるため陽8j3とストリップlとの間のメッキ
液への影響は、スリット9の開口面積より拡大されるの
で、ストリップ1に対し、局所的な超音波の照射が回避
できる。d' ヰλ/4 (2n-1) However, λ and n are the same as above.Furthermore, the upper anode 3 is made of a metal material such as stainless steel or copper alloy that has a high ultrasonic reflectance. The shape is formed as shown in FIGS. 1 and 2. The anode 3 is provided with a slit 9, and the slit 9 is connected to the strip l.
The slit 9 is perforated so that the vibrator 8 is located at right angles to the traveling direction of the slit 9 and on the center line of the slit 9. Configure. As a result, since the ultrasonic waves are reflected by the inclined surface 1O, the influence on the plating solution between the positive 8j3 and the strip 1 is expanded by the opening area of the slit 9, and therefore the local Ultrasonic irradiation can be avoided.
以上要するに本発明は、特許請求の範囲に記載された構
成を探択したので以下の効果を奏する。In summary, the present invention has the following effects because the configuration described in the claims has been explored.
(発明の効果〕
本発明によれば、電気メッキのメッキ速度を向上し、生
産性を上げ、工場面積の縮小化ならびに省力化を図るこ
とは勿論、特に、ストリップについての電気メッキ装置
は一般に過大になりがちであるが、メッキ液の強制対流
による攪拌作用と超音波による攪拌作用とを組合せたの
で、かかるいずれの装置も過大化を回避でき、メッキ速
度を向上することができる。しかも、ストリップの電気
メッキ装置に使用される陽極に小透孔を穿没し、該小透
孔を超音波振動子に向け広がった角度を形成したので、
超音波の均一な照射ができ、ストリップのメッキ面に斑
点(ピット)などをなくし品質を向上する。(Effects of the Invention) According to the present invention, it is possible to improve the plating speed of electroplating, increase productivity, reduce the factory area and save labor, and in particular, electroplating equipment for strips is generally oversized. However, by combining the stirring action of forced convection of the plating solution with the stirring action of ultrasonic waves, it is possible to avoid overscaling of any of these devices and improve the plating speed. A small through hole was drilled into the anode used in the electroplating equipment, and the small through hole was formed at an angle that widened toward the ultrasonic vibrator.
Uniform ultrasonic irradiation eliminates spots (pits) on the plated surface of the strip, improving quality.
第1図は本発明の実施例の概要図、第2図は要部斜視図
を示す。
1・・・ストリップ、2・・・電気メッキ槽、3・・・
陽極、8・・・振動子、9・・・スリット。FIG. 1 is a schematic diagram of an embodiment of the present invention, and FIG. 2 is a perspective view of the main parts. 1... Strip, 2... Electroplating tank, 3...
Anode, 8... vibrator, 9... slit.
Claims (1)
を電気メッキする電気メッキ装置において、該ストリッ
プの表面上に適宜の間隔をおいて超音波振動子を設け、
該ストリップと該振動子との間に、発信子に向け広がっ
た角度を有する小透孔を穿設した陽極板を介在させたこ
とを特徴とする電気メッキ装置。In an electroplating apparatus for electroplating a strip in an electroplating bath with forced convection of a plating solution, ultrasonic vibrators are provided at appropriate intervals on the surface of the strip,
An electroplating apparatus characterized in that an anode plate having a small through-hole having an angle that widens toward the transmitter is interposed between the strip and the vibrator.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26177286A JPS63118094A (en) | 1986-11-05 | 1986-11-05 | Electroplating equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26177286A JPS63118094A (en) | 1986-11-05 | 1986-11-05 | Electroplating equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63118094A true JPS63118094A (en) | 1988-05-23 |
Family
ID=17366479
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26177286A Pending JPS63118094A (en) | 1986-11-05 | 1986-11-05 | Electroplating equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63118094A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391290A (en) * | 1992-04-21 | 1995-02-21 | Nkk Corporation | Method for continuously tin-electroplating metal strip |
US6444887B1 (en) | 1999-09-16 | 2002-09-03 | Namco Ltd. | String-plucking type electronic musical instrument with photo sensor for generating signal for sound |
WO2004101863A2 (en) * | 2003-05-15 | 2004-11-25 | Gebr. Schmid Gmbh & Co. | Method and device for coating a substrate |
WO2018030973A3 (en) * | 2016-08-08 | 2018-07-05 | Net Boru Sanayi Ve Dis Ticaret Kollektif Sirketi Bora Saman Ve Ortagi | Copper-coated steel sheet production assembly and method |
-
1986
- 1986-11-05 JP JP26177286A patent/JPS63118094A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5391290A (en) * | 1992-04-21 | 1995-02-21 | Nkk Corporation | Method for continuously tin-electroplating metal strip |
US6444887B1 (en) | 1999-09-16 | 2002-09-03 | Namco Ltd. | String-plucking type electronic musical instrument with photo sensor for generating signal for sound |
WO2004101863A2 (en) * | 2003-05-15 | 2004-11-25 | Gebr. Schmid Gmbh & Co. | Method and device for coating a substrate |
WO2004101863A3 (en) * | 2003-05-15 | 2005-01-20 | Schmid Gmbh & Co Geb | Method and device for coating a substrate |
WO2018030973A3 (en) * | 2016-08-08 | 2018-07-05 | Net Boru Sanayi Ve Dis Ticaret Kollektif Sirketi Bora Saman Ve Ortagi | Copper-coated steel sheet production assembly and method |
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