JPS6224240A - Photopolymerizable composition having high sensitivity - Google Patents

Photopolymerizable composition having high sensitivity

Info

Publication number
JPS6224240A
JPS6224240A JP16300185A JP16300185A JPS6224240A JP S6224240 A JPS6224240 A JP S6224240A JP 16300185 A JP16300185 A JP 16300185A JP 16300185 A JP16300185 A JP 16300185A JP S6224240 A JPS6224240 A JP S6224240A
Authority
JP
Japan
Prior art keywords
benzophenone
group
bis
formula
photopolymerizable composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16300185A
Other languages
Japanese (ja)
Other versions
JPH0466349B2 (en
Inventor
Kenichi Fujii
健一 藤井
Yoshitaka Goto
後藤 義隆
Toshiya Yazawa
矢沢 俊也
Eiichi Yamada
栄一 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Priority to JP16300185A priority Critical patent/JPS6224240A/en
Publication of JPS6224240A publication Critical patent/JPS6224240A/en
Publication of JPH0466349B2 publication Critical patent/JPH0466349B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials

Abstract

PURPOSE:To obtain a photopolymerizable composition having high sensitivity and superior stability by combinedly using a specified org. peroxide and a photosensitizer as a photopolymn. initiator. CONSTITUTION:This photopolymerizable composition contains a compound having an ethylenic unsatd. double bond and a photopolymn. initiator consisting of a polyperoxy-ester having a benzophenone group represented by formula I and 4, 4'-bis(dialkylamino)benzophenone represented by formula II. The com pound represented by the formula I may be 3, 3', 4, 4'-tetra-(tert- butylperoxycarbonyl)benzophenone. 4, 4'-Bis(dimethylamino)benzophenone or 4, 4'-bis(diethylamino)benzophenone is preferably used as the compound represented by the formula II. The compounds represented by the formulae I, II are preferable used by 1-30pts.wt. each per 100pts.wt. compound having an ethylenic unsatd. double bond.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、高感度の光重合性組成物に関するものである
。この組成物は各種基板に塗布することによシ、刷版材
、製版用コンタクトフィルム、マスキングフィルム、ブ
ルー7ペーパー、記aフィルム、フォトレジストなどの
画偉形成材料として広い用途がある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a highly sensitive photopolymerizable composition. This composition has a wide range of uses when applied to various substrates, and as a material for forming image areas such as printing plate materials, contact films for plate making, masking films, Blue 7 paper, a-films, and photoresists.

〔従来の技術〕[Conventional technology]

従来、光重合性組成物の光に対する感度を高める手段と
して、ベンゾフェノンK 4.4’−ビス(ジメチルア
ミン)ベンゾフェノン(通称名q(ラーズケトン)を加
える方法(例えば、加藤清視、中原正二著rUV硬化技
術入門」P65、高分子刊行会(II984))やこれ
に有機過酸化物を加える方法(特開昭60−35725
号)があシ、確かに重合速度に対する効果は認められる
が、前者においては得られる感度が7オトレジストその
他に用いるには十分ではなく、又、後者は、高感度を得
るに必要な量の有機過酸化物を用いた場合、感光性樹脂
の液ならびに塗布された膜の熱的安定性を含めた経時安
定性(以下単に安定性という)が十分ではない。
Conventionally, as a means of increasing the sensitivity of photopolymerizable compositions to light, there has been a method of adding benzophenone K 4.4'-bis(dimethylamine)benzophenone (commonly known as q (larzketone)) (for example, rUV by Kiyomi Kato and Shoji Nakahara). "Introduction to Curing Technology" P65, Kobunshi Publishing Association (II984)) and the method of adding organic peroxide to this (Japanese Patent Laid-Open No. 60-35725)
Although the effect on the polymerization rate is certainly recognized, the sensitivity obtained in the former is not sufficient for use in 7-otoresists and other applications, and the latter does not require the amount of organic material necessary to obtain high sensitivity. When a peroxide is used, the stability over time (hereinafter simply referred to as stability) including the thermal stability of the photosensitive resin liquid and the applied film is not sufficient.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

光重合性組成物において感度は最も重要な特性であり、
また作業効率を考慮した場合もより高感度な製品の出現
が待たれているのが現状である。
Sensitivity is the most important property in photopolymerizable compositions;
In addition, when considering work efficiency, the appearance of products with higher sensitivity is currently awaited.

また、光重合性組成物の一斡安定性が不十分な場合には
、感光液を塗布した後の乾燥温度が高い時、露光時間が
一定とならず品質のバラツキの原因となり再現性の良い
鮮明な画像が得られなくなる、いわゆる「カプリ」現象
が発生する。
In addition, if the one-day stability of the photopolymerizable composition is insufficient, when the drying temperature after applying the photosensitive liquid is high, the exposure time will not be constant, which may cause variations in quality, resulting in poor reproducibility. A so-called "capri" phenomenon occurs in which a clear image cannot be obtained.

本発明は、高感度でかつ、感光液ならびに塗布された膜
の安定性の改善された光重合性組成物を得ることを目的
としている。
An object of the present invention is to obtain a photopolymerizable composition which is highly sensitive and has improved stability of a photosensitive solution and a coated film.

〔問題を解決するための手段〕 本発明者らは、光重合開始剤として特定の有機過酸化物
と光増感剤を組合せて用いることKよ)、高感度でしか
も安定性の優れた光重合性組成物が得られることを見い
出して本発明に至った。
[Means for Solving the Problems] The present inventors have proposed a method of using a specific organic peroxide in combination with a photosensitizer as a photopolymerization initiator), a highly sensitive and highly stable light source. The present invention was achieved by discovering that a polymerizable composition can be obtained.

すなわち、本発明は、エチレン性不胞和二重結式(II
)で示される4、4′−ビス(ジアルキルアミノ)ベン
ゾフェノンからなる光重合開始剤とを含有する高感度光
重合性組成物を提供するものである。
That is, the present invention provides an ethylenically uncelled double bond (II
) A highly sensitive photopolymerizable composition containing a photopolymerization initiator consisting of 4,4'-bis(dialkylamino)benzophenone represented by:

一般式(I) 一般式(II) 本発明に用いるエチレン性不飽和二重結合を有する化合
物としては、光重合開始剤により重合可能な化合物であ
ればよく、例えばアクリル酸、メタクリル酸、イタコン
酸、マレイン酸及びその無水物、フタル酸及びその無水
物、フマル酸等の不飽和酸や(メタ)アクリル酸メチル
、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチ
ル、(メタ)アクリル酸グリシジル、(メタ)アクリル
酸ヒドロキシエチル、マレイン酸ジメチル、マレイン酸
ジエチル、フマル酸ジメチル、ペンタエリスリトールト
リ(メタ)アクリレート、トリノテロールプロパントリ
(メタ)アクリレート、エチレングリコールジ(メタ)
アクリレート、プロピレングリコールジ(メタ)アクリ
レート等の不飽和酸エステル、及びスチレン、アクリル
アミド、7/IJロニトリル、N−ビ′ニルピロリドン
、酢酸ビニル、さらに種々の不飽和ポリエステル、不飽
和ポリエーテル、不飽和ポリウレタンやエポキシ基を有
す、L(′)7/1JLz−1イ″*’1m等d!69
0       Fまた本発明において光重合開始剤と
して用いる一般式(I)1 で示されるベンゾフェノン基含有多価ベルオキシエステ
ル伽澹麹の例としては、3.3’、4゜4′−テトラ−
(第3ブチルペルオキシカルボエル)ベンゾフェノ/、
3.了、4.4’−テトラ−(第3アミルペルオキシカ
ルボニル)ベンゾフェノン、313’14t4’−テト
ラ(第3へキシルペルオキシカルボニル)ベンゾフェノ
ン、3.3’、 4.4’−テトラ(第3オクチルベル
オキシカルボニル)ベンゾフェノン、3.3’、 4.
4’−テトラ(り電ルベルオキシカルボニル)ベンゾフ
ェノン%313’、4.4’−テトラ(p−イングロビ
ルクミルペルオキシカルボニル)ベンゾフェノン、等が
ある。
General formula (I) General formula (II) The compound having an ethylenically unsaturated double bond used in the present invention may be any compound that can be polymerized with a photopolymerization initiator, such as acrylic acid, methacrylic acid, itaconic acid, etc. , maleic acid and its anhydride, phthalic acid and its anhydride, fumaric acid and other unsaturated acids, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, glycidyl (meth)acrylate , hydroxyethyl (meth)acrylate, dimethyl maleate, diethyl maleate, dimethyl fumarate, pentaerythritol tri(meth)acrylate, trinoterol propane tri(meth)acrylate, ethylene glycol di(meth)acrylate
Unsaturated acid esters such as acrylate, propylene glycol di(meth)acrylate, styrene, acrylamide, 7/IJ lonitrile, N-vinylpyrrolidone, vinyl acetate, and various unsaturated polyesters, unsaturated polyethers, unsaturated Polyurethane or epoxy group-containing L(')7/1JLz-1i''*'1m etc.d!69
0 F Also, examples of the benzophenone group-containing polyhydric peroxyester Gaya koji represented by the general formula (I) 1 used as a photopolymerization initiator in the present invention include 3.3', 4°4'-tetra-
(tert-butylperoxycarboel)benzophenol/,
3. 4,4'-tetra(tertiary amylperoxycarbonyl)benzophenone, 313'14t4'-tetra(tertiary hexylperoxycarbonyl)benzophenone, 3.3', 4,4'-tetra(tertiary octylperoxycarbonyl) oxycarbonyl)benzophenone, 3.3', 4.
Examples include 4'-tetra(ridenruberoxycarbonyl)benzophenone%313', 4.4'-tetra(p-ingrovircumylperoxycarbonyl)benzophenone, and the like.

本発明に用いる一般式(II) で示される化合物には、例えば4,4′−ビス(ジメチ
ルアミノ)ベンゾ7二ノン 441−ビス(ジエチルア
ミノ)ベンゾフェノン、4.4’−ビス(シタクロへキ
シルアミノ)ベンゾフェノン、4.4’−ビス(ジヒド
ロ中ジエチルアミノ)ベンゾフェノン等がある。これら
のうちで4.4′−ビス(ジメチルアζ))ベンゾフェ
ノンと4,4′−ビス(ジエチルアζ))ベンゾフェノ
ンが特に好ましい。
Examples of the compound represented by the general formula (II) used in the present invention include 4,4'-bis(dimethylamino)benzo7dinone, 441-bis(diethylamino)benzophenone, and 4,4'-bis(cytaclohexylamino). Examples include benzophenone, 4,4'-bis(diethylamino in dihydro)benzophenone, and the like. Among these, 4,4'-bis(dimethylaζ))benzophenone and 4,4'-bis(diethylaζ))benzophenone are particularly preferred.

上記各成分の配合割合は、エチレン性不飽和二重結合を
有する化合物100重量部に対して、−ステル伽−一及
び一般式(II)で示す化合物がそれぞれ0.01〜1
00重量部、好ましくは0.1〜30重量部、特に好ま
しくは1〜30重量部である。
The blending ratio of each of the above components is 0.01 to 1 part by weight of the compound represented by -Sterka-1 and general formula (II) per 100 parts by weight of the compound having an ethylenically unsaturated double bond.
00 parts by weight, preferably 0.1 to 30 parts by weight, particularly preferably 1 to 30 parts by weight.

また一般式(II)で示す化合物葎)と一般式(II)
で示す化合物(b)の配合比は重量比でa、bが1=1
0〜10:1が好ましい。
Also, the compound represented by the general formula (II)) and the compound represented by the general formula (II)
The compounding ratio of compound (b) shown is that a and b are 1=1 by weight.
0 to 10:1 is preferred.

上記の配合量および配合比の範囲外では優れた性能の光
重合性組成物が得られない。
A photopolymerizable composition with excellent performance cannot be obtained outside the range of the above-mentioned blending amount and blending ratio.

本発明の光重合性組成物は、前記の光重合開始剤と重合
可能なエチレン性不飽和二重結合を有する化合物を必須
成分とするが、必要に応じてバインダー樹脂、重合防止
剤、色素等を適宜配合して用いることができる。
The photopolymerizable composition of the present invention has as an essential component a compound having an ethylenically unsaturated double bond that is polymerizable with the photopolymerization initiator, but may optionally include a binder resin, a polymerization inhibitor, a dye, etc. can be used by appropriately blending them.

バインダー樹脂は、刷版材やフォトレジストなどの塗膜
形成助剤として物性向上の目的で用いるものであシ、エ
チレン性不飽和二重結合を有する化合物100重量部に
対して通常50〜500重量部程度使用するのが好まし
い。バインダー樹脂として例えば、(メタ)アクリル酸
エステル系の樹脂、ビニルピロリドン系の樹脂、ビニル
アルコール系の樹脂等があシ、樹脂中に重合基を含有し
ていてもしていなくとも嵐い。
Binder resin is used as a coating film forming aid for printing plate materials and photoresists for the purpose of improving physical properties, and is usually used in an amount of 50 to 500 parts by weight per 100 parts by weight of a compound having an ethylenically unsaturated double bond. It is preferable to use about 1 part. Examples of binder resins include (meth)acrylic acid ester resins, vinyl pyrrolidone resins, vinyl alcohol resins, etc., regardless of whether the resin contains a polymeric group or not.

重合防止剤の例としてp−メトキシフェノールやヒドロ
キノン等があり、色素の例として、ブリリアントグリー
ン、エチルバイオレット、エオシン、エリス四クンBな
どがある。
Examples of polymerization inhibitors include p-methoxyphenol and hydroquinone, and examples of dyes include brilliant green, ethyl violet, eosin, and Eris Shikun B.

本発明の光重合性組成物は、各種基板上に塗布して感光
性樹脂シートとして用いるものであシ、仁の際、光重合
性組成物をメチルエチルケトン、4’/プロパツール、
メチルセロソルブなどの溶媒で5〜100倍程度に希釈
して、回転塗布、ロールマート、バーコード等の方法を
用いて基板上に0.5〜50μ−の厚さになるよう均一
に塗布して用いる。
The photopolymerizable composition of the present invention is used as a photosensitive resin sheet by coating it on various substrates.
Dilute it approximately 5 to 100 times with a solvent such as methyl cellosolve, and apply it uniformly to a thickness of 0.5 to 50μ on the substrate using a method such as spin coating, roll mart, or barcode. use

このようにして得た感光性樹脂シートは、紫外線等の活
性光線を照射することにより光重合反応が達成され、こ
れを現像するととKよシ所定の画像が得られる。
The photosensitive resin sheet thus obtained undergoes a photopolymerization reaction by being irradiated with actinic light such as ultraviolet rays, and when developed, a predetermined image can be obtained.

〔発明の効果〕〔Effect of the invention〕

本発明の光重合性組成物は、光重合開始剤として前記の
一般式(I)で示す化合物シよび一般式(ト)で示す化
合物を組み合わせて用いているため、従来の光重合性組
成物よ〕も著しく高感度であシ、しかも安定性も優れて
いる。したがって、多くの光重合反応に使用可能であシ
10%種の画像形成材料や光硬化型の樹脂、塗料および
印刷インキなど多方面に応用することができる。
The photopolymerizable composition of the present invention uses a combination of the compound represented by the general formula (I) and the compound represented by the general formula (g) as a photopolymerization initiator, so that it is different from the conventional photopolymerizable composition. ] also has extremely high sensitivity and excellent stability. Therefore, it can be used in many photopolymerization reactions and can be applied to many fields such as 10%-type image forming materials, photocurable resins, paints, and printing inks.

〔実施例〕〔Example〕

以下実施例及び比較例によって本発明をさらに詳細に説
明する。例中の部は重量部を示す。
The present invention will be explained in more detail below with reference to Examples and Comparative Examples. Parts in the examples indicate parts by weight.

実施例1〜2および比較例1〜3 下記の配合組成からなる光重合性組成物を均一に混合し
て感光液を調製した。
Examples 1 to 2 and Comparative Examples 1 to 3 A photosensitive liquid was prepared by uniformly mixing photopolymerizable compositions having the following composition.

これらの感光液を、砂目立てした陽極酸化処理アルζ;
りム板上に、ホワラーを用いて乾燥m膜厚が2μ諷とな
るように塗布し、40℃で5分間乾燥して、感光性基板
とした。
These photosensitive solutions are anodized with a grained grain;
It was coated onto a rim plate using a whirler so that the dry film thickness was 2 μm, and dried at 40° C. for 5 minutes to obtain a photosensitive substrate.

・エポキシアクリレート       100部(盾中
村化学工架■製 Eム−800)・ポリ(ブチルアクリ
レート/エチルアクリレート/メタクリル酸)    
  100部(モル比50/4G/10.分子量io万
)・3. 3’、  4. 4’−テト2−(第3ブチ
ルペルオキシカルボニル)ベンゾフェノン ・4.4′−ビス(ジエチルアミノ)ベンゾフェノン(
以下EMKという)−ター− eベンゾフェノン(以下BPという) 澁d6 ・ジーwI3ブチルペルオキシイソフタレート(以下F
1a1Fという)     −一7部・メチルセロソル
ブ       1800部この感光性基板にステップ
タブレット(コダック■製12)を重ねて真空密着し、
6G(mの距離から2fJI+の超高圧水銀灯で1.5
秒間露光した後、市販のアルカリIA儂液(富士写真フ
ィルム■製DN−3C水希釈品)で現像を行ない、乾燥
後に得られるステップタブレットによる露光部分の段数
を目視の判断で求め、これを初期感度とした。
・Epoxy acrylate 100 parts (EM-800 manufactured by Shishi Nakamura Kagaku Koka) ・Poly(butyl acrylate/ethyl acrylate/methacrylic acid)
100 parts (mole ratio 50/4G/10. molecular weight io million)・3. 3', 4. 4'-teto2-(tert-butylperoxycarbonyl)benzophenone/4.4'-bis(diethylamino)benzophenone (
(hereinafter referred to as EMK) -ter-e benzophenone (hereinafter referred to as BP)
1a1F) -17 parts 1,800 parts of methyl cellosolve A step tablet (12 manufactured by Kodak ■) was stacked on this photosensitive substrate and vacuum-adhered.
6G (1.5 with a 2fJI+ ultra-high pressure mercury lamp from a distance of m)
After exposure for seconds, development is performed with a commercially available alkaline IA solution (DN-3C water-diluted product manufactured by Fuji Photo Film ■), and the number of steps in the exposed area is determined by visual judgment using the step tablet obtained after drying. Sensitivity.

結果を表IK示す。なお段数は数値が太き%/%11ど
高感度であることを示し、2段差があると感度は2倍に
なる。
The results are shown in Table IK. Note that the number of steps indicates high sensitivity, such as thick %/%11, and if there is a difference of two steps, the sensitivity is doubled.

次に%露光前の感光性基板を55℃の保温基中に48時
間静置した後、前記と同様に露光後現像を行ない安定性
を調べ九。結果1表IK示す。なお、ここで「正常」は
露光後に正常に現像できるものを示し、「不能」は「カ
プリ」が出て正常な現像が不可能なことを示す。
Next, the photosensitive substrate before exposure was left for 48 hours in a heat insulating base at 55° C., and the stability was examined by performing post-exposure development in the same manner as above.9. The results are shown in Table 1. Note that here, "normal" indicates that development can be performed normally after exposure, and "impossible" indicates that "capri" appears and normal development is impossible.

!!l 率画像ができない。 傘串全く感光しない。! ! l I can't get a rate image. The umbrella skewer is not exposed to light at all.

!Ilの結果から明らかなように、BTTBとEMKと
を併用する本発明のものは、いずれも比較例のものよシ
高感度であシまた安定性も優れている。なお、本発明は
BTTBとEMKの相乗効果によることは比較例1およ
び比較例2から明らかであるが、さらに1実施例11C
訃いて、EMKS部に対し同一分子内にベンゾフェノン
基とペルオキシ基とを有するIITTBを8部という小
値用いることで、比較例3においてBPとPBIFを別
々に合計34部も用いた場合よシも著しく優れた性能が
得られることでも、その擾れた相乗効果が紹められる。
! As is clear from the results of Il, the products of the present invention that use BTTB and EMK in combination have higher sensitivity and better stability than the comparative examples. It is clear from Comparative Examples 1 and 2 that the present invention is based on the synergistic effect of BTTB and EMK, but in addition, Example 11C
However, by using a small value of 8 parts of IITTB, which has a benzophenone group and a peroxy group in the same molecule, for the EMKS moiety, it was possible to achieve a better result than when a total of 34 parts of BP and PBIF were used separately in Comparative Example 3. The outstanding synergistic effect is also demonstrated by the significantly superior performance obtained.

実施例3および比較例4〜5 下記の配合組成の感光液を実施例1に準じて調製し1.
これを塗工紙(三iI!親紙■製、パールコートφ10
0)上に1パー;−ターを用いて乾燥塗膜厚が1μmに
なるように均一に塗布し、乾燥を行なって感光性シート
を得た。この感光性シートを用いて、現gRK水を用い
た以外は実施例1・と同様にして、初期感度および安定
性を調べた。それらの結果を表2に示す。
Example 3 and Comparative Examples 4 to 5 A photosensitive solution having the following composition was prepared according to Example 1.1.
Coated paper (Made by SaniI!Oyashi ■, pearl coat φ10)
A photosensitive sheet was obtained by uniformly coating the film on the surface of the photosensitive film 0) using a 1-per-tar so that the dry coating thickness was 1 μm, and drying. Using this photosensitive sheet, the initial sensitivity and stability were examined in the same manner as in Example 1, except that current gRK water was used. The results are shown in Table 2.

・べ/クエリスリトールトリアクリレート100部 ・ポリ−N−ビニルピロリドン (分子1136万)        100部−BTT
B           H2に示すI−4,4’−ビ
ス(ジメテルアオノ)ベンゾフェノン(以下MKという
) ・ BP ・ II  B  I  F ・メチルセロソルブ       50001表  2 表2の結果から、本発明のものは比較例のものよυ高感
度で安定性も優れていることが明らかである。
・100 parts of B/querythritol triacrylate ・100 parts of poly-N-vinylpyrrolidone (11,360,000 molecules) - BTT
I-4,4'-bis(dimetelaono)benzophenone (hereinafter referred to as MK) shown in B H2 ・BP ・II BIF ・Methyl cellosolve 50001 Table 2 From the results in Table 2, it can be seen that the products of the present invention are better than those of the comparative example. It is clear that υ has high sensitivity and excellent stability.

実施例4および比較例6 下記の配合組成の感光液を実施例IK準じて調製し、こ
れを鏡面に近く研磨した鋼板(日本テストパネル工業■
製、JI8H3100(CIlooP))上に、回転塗
布機を用いて乾燥酋膜厚が5IwsKなるように均・−
に塗布し、乾燥を行なって感光性銅板を得た。この感光
性銅板を用いて、現像にイソプロパツール/水(重ff
i比50150Jを用いた以外は実施例1と同様にして
、初期感度および安定性を調べ丸。それらの結果を表3
に示す。
Example 4 and Comparative Example 6 A photosensitive solution having the following composition was prepared according to Example IK, and a steel plate polished to a near mirror surface (Japan Test Panel Industry ■) was prepared.
Co., Ltd., JI8H3100 (CIlooP)) using a rotary coater so that the dry coating thickness was 5IwsK.
A photosensitive copper plate was obtained by coating and drying. Using this photosensitive copper plate, isopropanol/water (heavy) is used for development.
Initial sensitivity and stability were investigated in the same manner as in Example 1 except that an i ratio of 50150 J was used. Table 3 shows the results.
Shown below.

・トリメチロールプロパントリアクリレート50部 ・ポリ(メチルメタクリレート/メタクリル酸〕(七ル
比5G150、分子量8万) 150部 ・3.3’、 4.4’−テトラ(@3へ中シルペルオ
キシカルボニル)ベンゾフェノン (以下BTTHという)  表3に示す部・ KMK ・ BP @ PBIF ・エテルバイオレット          2I・p−
メト中ジフェノール       0.11・メチルエ
チルケトン       500#・イソプロパツール
        500#表 3 表3の結果から、本発明のものは比較例のものよシ高感
度で安定性も優れていることが明らかである。
・50 parts of trimethylolpropane triacrylate ・150 parts of poly(methyl methacrylate/methacrylic acid) (hetyl ratio 5G150, molecular weight 80,000) ・3.3', 4.4'-tetra (@3 to medium silperoxycarbonyl) Benzophenone (hereinafter referred to as BTTH) Part shown in Table 3・KMK・BP @PBIF・Ether violet 2I・p-
Diphenol in meth 0.11・Methyl ethyl ketone 500#・Isopropatool 500# Table 3 From the results in Table 3, it is clear that the product of the present invention has higher sensitivity and better stability than the comparative example. .

Claims (1)

【特許請求の範囲】 エチレン性不飽和二重結合を有する化合物と下記一般式
( I )で示されるベンゾフェノン基含有多価ベルオキ
シエステル及び一般式(II)で示される4,4′−ビス
(ジアルキルアミノ)ベンゾフェエノンからなる光重合
開始剤とを含有する高感度光重合性組成物。 一般式 ▲数式、化学式、表等があります▼( I ) [式中R_1およびR_1′はそれぞれ炭素数4から8
の第3アルキル基、または炭素数9から12の第3アラ
ルキル基、R_2およびR_2′はそれぞれ水素原子ま
たは炭素数4から8の第3アルコキシ基または炭素数9
から12の第3アラルキルオキシ基を表す。 一般式 ▲数式、化学式、表等があります▼・・・(II) 但し、Rは炭素数1から6のアルキル基、シクロアルキ
ル基またはヒドロキシアルキル基を表わす。
[Scope of Claims] A compound having an ethylenically unsaturated double bond, a polyvalent benzophenone group-containing peroxyester represented by the following general formula (I), and a 4,4'-bis( A highly sensitive photopolymerizable composition containing a photopolymerization initiator consisting of dialkylamino)benzopheenone. General formula▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) [In the formula, R_1 and R_1' each have 4 to 8 carbon atoms.
or a tertiary aralkyl group having 9 to 12 carbon atoms; R_2 and R_2' are each a hydrogen atom or a tertiary alkoxy group having 4 to 8 carbon atoms; or a tertiary aralkyl group having 9 to 12 carbon atoms;
represents a tertiary aralkyloxy group of 12. General formula ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼... (II) However, R represents an alkyl group, cycloalkyl group, or hydroxyalkyl group having 1 to 6 carbon atoms.
JP16300185A 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity Granted JPS6224240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16300185A JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16300185A JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Publications (2)

Publication Number Publication Date
JPS6224240A true JPS6224240A (en) 1987-02-02
JPH0466349B2 JPH0466349B2 (en) 1992-10-22

Family

ID=15765310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16300185A Granted JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Country Status (1)

Country Link
JP (1) JPS6224240A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63206741A (en) * 1987-02-24 1988-08-26 Mitsubishi Gas Chem Co Inc Photosensitive polymer composition
JPH0391753A (en) * 1989-09-05 1991-04-17 Nippon Oil & Fats Co Ltd Photopolymerization initiator
US5184027A (en) * 1987-03-20 1993-02-02 Hitachi, Ltd. Clock signal supply system
WO1999064471A1 (en) * 1998-06-08 1999-12-16 Nippon Steel Chemical Co., Ltd. Photopolymerizable resin composition and use thereof
KR100349600B1 (en) * 1998-08-18 2002-11-18 주식회사 엘지화학 Triazine compound containing benzophenone group and photoinitiator containing the same
WO2023282045A1 (en) * 2021-07-05 2023-01-12 株式会社Adeka Compound, composition, cured product, and method for producing cured product

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035725A (en) * 1983-08-09 1985-02-23 Fuji Photo Film Co Ltd Photopolymerizable composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035725A (en) * 1983-08-09 1985-02-23 Fuji Photo Film Co Ltd Photopolymerizable composition

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63206741A (en) * 1987-02-24 1988-08-26 Mitsubishi Gas Chem Co Inc Photosensitive polymer composition
US5184027A (en) * 1987-03-20 1993-02-02 Hitachi, Ltd. Clock signal supply system
JPH0391753A (en) * 1989-09-05 1991-04-17 Nippon Oil & Fats Co Ltd Photopolymerization initiator
JP2751453B2 (en) * 1989-09-05 1998-05-18 日本油脂株式会社 Photopolymerization initiator
WO1999064471A1 (en) * 1998-06-08 1999-12-16 Nippon Steel Chemical Co., Ltd. Photopolymerizable resin composition and use thereof
KR100349600B1 (en) * 1998-08-18 2002-11-18 주식회사 엘지화학 Triazine compound containing benzophenone group and photoinitiator containing the same
WO2023282045A1 (en) * 2021-07-05 2023-01-12 株式会社Adeka Compound, composition, cured product, and method for producing cured product

Also Published As

Publication number Publication date
JPH0466349B2 (en) 1992-10-22

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