JPS62235382A - Thermosetting adhesive film - Google Patents

Thermosetting adhesive film

Info

Publication number
JPS62235382A
JPS62235382A JP7732886A JP7732886A JPS62235382A JP S62235382 A JPS62235382 A JP S62235382A JP 7732886 A JP7732886 A JP 7732886A JP 7732886 A JP7732886 A JP 7732886A JP S62235382 A JPS62235382 A JP S62235382A
Authority
JP
Japan
Prior art keywords
adhesive film
polyimide
polymaleimide
formula
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7732886A
Other languages
Japanese (ja)
Inventor
Shuichi Matsuura
秀一 松浦
Yasuo Miyadera
康夫 宮寺
Toshihiko Kato
利彦 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7732886A priority Critical patent/JPS62235382A/en
Publication of JPS62235382A publication Critical patent/JPS62235382A/en
Pending legal-status Critical Current

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Moulding By Coating Moulds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesive Tapes (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

PURPOSE:To obtain the title thermosetting adhesive film having excellent film- forming property, flexibility and heat-resistance and suitable for various bonding purposes, by compounding a specific polyimide with a specific maleimide and casting the obtained composition. CONSTITUTION:The objective adhesive film can be produced by casting a composition produced by compounding (A) a polyimide of formula I {Ar is bivalent group composed of bis[4-(3-aminophenoxy)phenyl]-sulfone and 3,3'- diaminodiphenylsulfone at a molar ratio of 100:0-50:50} and (B) a polymaleimide of formula II (R is >=2C group having integral valence; n is integer of >=2) preferably at an A:B ratio of 90:10-50:50.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は可撓性、耐熱性に優2″した熱硬化性接着フィ
ルムに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thermosetting adhesive film having excellent flexibility and heat resistance.

〔従来の技術〕[Conventional technology]

従来、電気絶縁材料、構造材料等に用いられているポリ
イミド接着剤としてはN、N’−(4,4−シフエニル
メタン)ビスマレイミドと4.4’−ジアミノジフェニ
ルメタンからなる予備縄付物が知らnている。
Conventionally, as a polyimide adhesive used for electrical insulating materials, structural materials, etc., a pre-attached material made of N,N'-(4,4-cyphenylmethane) bismaleimide and 4,4'-diaminodiphenylmethane is known. ing.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら上記の予備縮合物自体は、(i!i1<て
脆いため流延してフィルムとすることができなかった。
However, the precondensate itself could not be cast into a film because it was brittle (i!i1<).

また積層材等の接着シートとして用いるS甘には、その
溶液ンガラス布などの基材に含浸した後溶剤ケ除去しプ
レプレグとしなければならないため基材の厚さに限定さ
れ、したがりて薄いものを得ることができなかった。
Furthermore, in order to use adhesive sheets for laminated materials, etc., the solution must be impregnated into a base material such as glass cloth, and then the solvent must be removed to form a prepreg, which is limited by the thickness of the base material. I couldn't get it.

本発明にかへる状況に!I2みなされたものであって、
5′J撓性、耐熱性に優れた熱硬化性接着フィルムを提
供せんとするものである。
The situation is related to the present invention! I2 is considered to be
5'J It is an object of the present invention to provide a thermosetting adhesive film having excellent flexibility and heat resistance.

〔問題点を解決するための手段〕[Means for solving problems]

か〜る目的は本発明によれは1次の一般式で表わされる
ポリイミド(A)に。
According to the present invention, the purpose is to provide a polyimide (A) represented by the following general formula.

一般式 で表わされるポリマレイミド(B)を混合した樹脂酸物
′4!:流延成形することによって得らnる接着性フィ
ルムにより達成される。
Resin acid compound mixed with polymaleimide (B) represented by the general formula '4! : Achieved by an adhesive film obtained by casting.

本発明においてポリイミド(8)はクレゾール、フェノ
ール等の溶媒中で5.5’、4.4’−ベンゾフェノン
テトラカルボン酸二無水物(以下BTDA、!:略f)
、!:ビス(4−(3−アミノフェノキシ)フェニルン
スルホン(以下m−APPSと略す)ト3.3’−ジア
ミノジフェニルスルホン[下3゜3’ −D D Sと
略す)とン加熱攪拌することによって得られるが、ジメ
チルアセトアミド、ジメチルホルムアミド等の非プロト
ン性極性溶媒中で室温以下の温度で反応させ、対応する
ポリアミド酸を合成し、無水酢酸−ピリジン等の脱水剤
?用いて脱水閉環させることによって得ることもできる
In the present invention, polyimide (8) is prepared as 5.5',4.4'-benzophenonetetracarboxylic dianhydride (hereinafter referred to as BTDA!: abbreviated as f) in a solvent such as cresol or phenol.
,! : Bis(4-(3-aminophenoxy)phenylsulfone (hereinafter abbreviated as m-APPS)) and 3,3'-diaminodiphenylsulfone [abbreviated as 3゜3'-DDS] and stirred under heating. However, the corresponding polyamic acid is synthesized by reacting it in an aprotic polar solvent such as dimethylacetamide or dimethylformamide at a temperature below room temperature, and then acetic anhydride-dehydrating agent such as pyridine? It can also be obtained by dehydration and ring closure.

ポリイミド(4)中のm−APPSと5.5’−DDS
のモル比は100:O〜50:50が好ましく3.3’
−DDSが50モル%よりも多いとポリイミド(5)が
固くなり成膜性が悪くなる。
m-APPS and 5.5'-DDS in polyimide (4)
The molar ratio of 3.3' is preferably 100:O to 50:50.
- If the DDS content is more than 50 mol %, the polyimide (5) becomes hard and film forming properties deteriorate.

本発明に用いることのできるポリマレイミドtB)の具
体例とし′CはN、N’ −(4,4’−ジフェニルメ
タン]ビスマレイミド、 N、N’ −(4,4’−ジ
フェニルオ中シンビスマレイミド、NsN’  1)−
フェニレンビスマレイミド、N、N’−m−フェニレン
ビスマレイミド、N、N’−2,4−)リレンビスマL
/(ミド、  N、N’−2,6−トリレンビスマレイ
ミド、  N、N’−エチレンビスマレイミ)”、 N
、N’−ヘギナメテレンビスマレイミド、あるいはとい
りた構造式で表わされるポリマレイミドがあり、こわら
を単独あるいは二種以上混合して用いることができる。
Specific examples of the polymaleimide tB) that can be used in the present invention include N, N'-(4,4'-diphenylmethane) bismaleimide, N, N'-(4,4'-diphenylmethane), Maleimide, NsN' 1)-
Phenylene bismaleimide, N,N'-m-phenylene bismaleimide, N,N'-2,4-)rylene bisma L
/(mido, N, N'-2,6-tolylene bismaleimide, N, N'-ethylene bismaleimide)", N
There are polymerimides represented by the following structural formulas: , N'-hegynamethelene bismaleimide, or the like, and these stiffeners can be used alone or in a mixture of two or more kinds.

ポリイミド囚とポリマレイミドtB)の混合割合は、ポ
リマレイミドIB)χポリイミド(8)に対して10〜
50重量%で用いるのが好ましく、さらに好ましくは1
5へ30重童%である。ポリマレイミド(B)が10重
11%より少ないと硬化が十分でなく50重量%より多
いと樹脂組成物がもろく成形性がなくなる。
The mixing ratio of polyimide prisoner and polymaleimide tB) is 10 to 10 to polymaleimide IB) χ polyimide (8).
It is preferably used at 50% by weight, more preferably 1
5 to 30% of children. When the amount of polymaleimide (B) is less than 10% by weight and 11%, curing is insufficient, and when it is more than 50% by weight, the resin composition becomes brittle and lacks moldability.

ポリイミドとポリマレイミドの混4!rは粉状で行なっ
てもよいが、通常はDMFのような浴剤に溶解したポリ
アミドフエスにポリマレイミドを添加溶解することによ
って行なわれる。
Mixture of polyimide and polymaleimide 4! Although r may be carried out in powder form, it is usually carried out by adding and dissolving the polymaleimide in polyamide foam dissolved in a bath agent such as DMF.

このようにして得たポリイミドとポリマレイミドとの混
曾ワニス馨ガラスfi!、ステンレス板等に流延、□乾
燥することにより接着フィルムを得る。乾燥温度と時間
は用いる浴剤、ポリマレイミドのS類によって異なるが
、温度はポリマレイミドの反応が顕著になる温度よりも
低く保つ必要があり、時間は残存溶剤量が1%以下にな
るようにしなければならない。
The thus obtained mixed varnish of polyimide and polymaleimide Kaoru glass fi! , cast onto a stainless steel plate, etc., and dry to obtain an adhesive film. The drying temperature and time vary depending on the bath agent used and the type S of the polymerimide, but the temperature must be kept lower than the temperature at which the reaction of the polymaleimide becomes noticeable, and the drying time should be set so that the amount of residual solvent is 1% or less. There must be.

得られた接着フィルムは被着体と重ねた後。After the obtained adhesive film is overlapped with the adherend.

軟化点以上の温度で加熱加圧することによりて耐熱性に
優れ、良好な接着力’t[する成形品?得ることができ
る。
Molded products with excellent heat resistance and good adhesive strength by heating and pressurizing at temperatures above the softening point. Obtainable.

本発明に係る接W74ルムはEl撓性に富んでいるため
、フレキシブル配線板の銅箔ト耐熱フィルムの接着剤と
して講じている。
Since the contact W74 lumen according to the present invention has high El flexibility, it is used as an adhesive for a heat-resistant film on a copper foil of a flexible wiring board.

以下実施例によって本発明の詳細な説明するが、本発明
はこれらの実施例に陳述されるものではない。
The present invention will be described in detail below with reference to Examples, but the present invention is not limited to these Examples.

実施例1 BTDA32.2g、m−APP834.6g%3.3
’−DDS 5.0 gを攪拌機、温度計、窒素ガス導
入管、冷却管ン備えた四つロフラスコに入れ、m−クレ
ゾール646g、)ルエン108gχ添加し、窒素ガス
を流しながら加熱攪拌した。150〜160℃で16時
間反応させて樹脂分216%、粘度7Pのポリイミドフ
ィルム得た。このポリイミドワニス乞アセトン中に注い
で丹沈し粉砕、洗浄、乾燥することによってポリイミド
粉末を得た。ポリイミド粉末の還元粘度(1度0.1g
/di、溶媒N、N−ジメチルホルムアミド(DMF)
、温度3α0゛Cンは1151dl/gであった。得ら
れたポリイミド粉末100gとN、N’−(4,4’−
ジフェニルメタン)ビスマレイミド(BMI )10g
’t’DMF400gに溶解してフェスとした。このワ
ニスンガラス板上に流延し、130℃10分乾燥した礫
、剥離し鉄枠に止めて200℃1時間乾燥して接着フイ
ルムン得た。得られた接着フィルムは厚さ25μm、残
存溶媒i1%、軟化点220℃であり、180°に折曲
げても割れず可撓性に優れたものであった。
Example 1 BTDA32.2g, m-APP834.6g%3.3
5.0 g of '-DDS was placed in a four-hole flask equipped with a stirrer, a thermometer, a nitrogen gas inlet tube, and a cooling tube, and 646 g of m-cresol and 108 g of luene were added thereto, followed by heating and stirring while flowing nitrogen gas. The reaction was carried out at 150 to 160°C for 16 hours to obtain a polyimide film having a resin content of 216% and a viscosity of 7P. This polyimide varnish was poured into acetone and sedated, pulverized, washed and dried to obtain polyimide powder. Reduced viscosity of polyimide powder (0.1g per degree)
/di, solvent N, N-dimethylformamide (DMF)
, temperature 3α0°C was 1151 dl/g. 100g of the obtained polyimide powder and N,N'-(4,4'-
diphenylmethane) bismaleimide (BMI) 10g
't' It was dissolved in 400 g of DMF to make a festival. This varnish was poured onto a glass plate, dried at 130°C for 10 minutes, peeled off, fixed on an iron frame, and dried at 200°C for 1 hour to obtain an adhesive film. The resulting adhesive film had a thickness of 25 μm, a residual solvent i of 1%, a softening point of 220° C., and was excellent in flexibility without cracking even when bent at 180°.

実施例2 N、N’−(4,4’ −シフェニルメタンンビスマレ
イミドのかわりにBMI−M(三井東圧化学■製ポリマ
レイミド)20g乞伶加する以外は実施例1と同様にし
て接着フィルムを得た。得もれたWc漕フィルムは厚さ
25 urn 、残存溶媒量1.1%、軟化点220℃
であり、180oに折曲げても割れず可撓性に優れたも
のであった。
Example 2 The same procedure as in Example 1 was carried out except that 20 g of BMI-M (polymaleimide manufactured by Mitsui Toatsu Chemical Co., Ltd.) was added instead of N,N'-(4,4'-cyphenylmethane bismaleimide). An adhesive film was obtained. The obtained Wc column film had a thickness of 25 urn, a residual solvent amount of 1.1%, and a softening point of 220°C.
It did not crack even when bent at 180 degrees and had excellent flexibility.

比較例1 ケルイミド601(日本ポリイミド■製ポリアミノビス
マレイミドa4脂) 100 g’kDMF100 g
K溶解したワニスンガラス機上に流延後、130℃10
分、ついで170”020分乾燥したが、もろくてフィ
ルムとならなかった。
Comparative Example 1 Kelimide 601 (polyamino bismaleimide A4 resin manufactured by Nippon Polyimide ■) 100 g'kDMF100 g
After casting on a varnish glass machine with K melted, 130℃10
It was then dried for 170" and 20 minutes, but it was brittle and did not form a film.

実施例3〜5.比較例2〜3 実施例10aMBIを表1のように変更する以外は実施
例1と同様にして得た接着フィルムを1mm厚のアルミ
仮と35μm#の片面粗化鋼箔の間にはさんで50kg
f/aIP、 275℃、30分の条件で積層して鋼張
基f2を得た。基板の臀性?表1に示す。
Examples 3-5. Comparative Examples 2 to 3 Example 10a An adhesive film obtained in the same manner as Example 1 except that the MBI was changed as shown in Table 1 was sandwiched between a 1 mm thick aluminum temporary and a 35 μm # single-sided roughened steel foil. 50kg
Lamination was performed under f/aIP conditions at 275° C. for 30 minutes to obtain a steel-clad base f2. The buttocks of the board? It is shown in Table 1.

表1 軟化点は荷重25kg/aIF、昇温速度10℃/鯛で
ペネトレーシラシ法で測定した。
Table 1 The softening point was measured by the Penetrate Shirashi method at a load of 25 kg/aIF and a heating rate of 10° C./sea bream.

鋼箔引剥し強さは引張速K 50 mm 7wmで90
゜引剥し強さケ測定した。
Steel foil peel strength is 90 at tensile speed K 50 mm 7wm
゜Peel strength was measured.

を工んだ耐熱性は20111111角の試験片ya/は
んだ浴上に鋼箔を下側にして浮べた後、ふ(れの有無を
観察した。
The heat resistance was determined by floating a 20111111 square test piece on a solder bath with the steel foil facing down, and then observing the presence or absence of bulges.

実施例6 50μm犀のポリイミドフィルムと35μm厚の片面粗
化鋼箔の間に実施例1で得た接着)4ルAL’1枚はさ
んで、275℃、50kgf/aIF30分の条件で積
層しフレ牛シプル印刷配[i1周基!&ケ得た。この基
板の90°銅箔引剥し強さ乞引張速度50 mm /m
=で測定したところ室温で2.6kgf/CrB115
0℃で2.1 kgf/e11であった。
Example 6 A 50 μm rhinoceros polyimide film and a 35 μm thick single-sided roughened steel foil were sandwiched between one sheet of the adhesive) 4 AL' obtained in Example 1 and laminated at 275° C. and 50 kgf/a IF for 30 minutes. Free beef ciple printing layout [i1 Shuki! &ke got it. The 90° copper foil peel strength of this board is 50 mm/m.
=2.6kgf/CrB115 at room temperature
It was 2.1 kgf/e11 at 0°C.

−!りこの基板を300℃のはんだ浴に1分間浸漬した
がふくれは生じなかった。
-! Riko's board was immersed in a 300°C solder bath for 1 minute, but no blistering occurred.

実施例7 BMI量を30 phrとする以外は実施例1と同様に
して接着フィルムχ作製した。508℃厚のポリイミド
フィルムの両側にこの接着フィルムと35μm片面粗化
銅箔乞重ねて275℃。
Example 7 An adhesive film χ was produced in the same manner as in Example 1 except that the BMI amount was changed to 30 phr. This adhesive film and 35 μm single-sided roughened copper foil were layered on both sides of a 508°C thick polyimide film at 275°C.

50 kgf#、 30分の条件で積層しフレキシブル
印刷配fil板用基板乞得た。
Lamination was carried out under conditions of 50 kgf# and 30 minutes to obtain a substrate for a flexible printing distribution board.

この基板の90°銅箔引剥し強さは室温で2゜4kgf
/cm、  150℃で2.0 kgf/Cmであり、
300℃のはんだ浴に1分間浸漬してもふくれは生じな
かった。
The 90° copper foil peel strength of this board is 2°4 kgf at room temperature.
/cm, 2.0 kgf/Cm at 150℃,
No blistering occurred even after immersion in a 300°C solder bath for 1 minute.

実施例8 BMIのかわりにBMI−M(三井東圧化学姿ポリマレ
イミド)15gン用いる以外は実施例1と同様にして作
製したフィルム状接滑剤を用い実施例7と同様にしてフ
レキシブル印刷配線板用基板ン得た。この基板の90°
銅箔引剥し強さは室温で2.4 kgf/cm、  1
50℃で1.9kgf/ cmであり、300℃のはん
だ浴に1分間浸漬してもふくれは生じなかった。
Example 8 A flexible printed wiring board was prepared in the same manner as in Example 7 using a film-like lubricant prepared in the same manner as in Example 1 except that 15 g of BMI-M (Mitsui Toatsu Chemical Polymaleimide) was used instead of BMI. I got a board for use. 90° of this board
Copper foil peel strength is 2.4 kgf/cm at room temperature, 1
It was 1.9 kgf/cm at 50°C, and no blistering occurred even when immersed in a 300°C solder bath for 1 minute.

比較例4 本発明に係る接着フィルムのかわりにバイララック(チ
ェボン社製アクリル系フィルム状接着剤)ケ用い%実施
例6と同様のmgで180’C130kgf/at、 
60分の条件で積層し、フレキシブル印刷配線板用基板
ン得た。この基板の900銅箔引剥し強さは室温で2.
2 kgf/Cm 、  150℃で16kgf/Cm
であった。またこの基板を300℃のはんだ浴に1分間
浸漬したところふくれが生じた。
Comparative Example 4 In place of the adhesive film according to the present invention, Baylarac (acrylic film adhesive manufactured by Chebon Co., Ltd.) was used.% Same mg as in Example 6, 180'C130 kgf/at,
Lamination was carried out for 60 minutes to obtain a substrate for a flexible printed wiring board. The 900 copper foil peel strength of this board is 2.
2 kgf/Cm, 16 kgf/Cm at 150℃
Met. Further, when this board was immersed in a 300° C. solder bath for 1 minute, blistering occurred.

〔発明の効果〕〔Effect of the invention〕

Claims (1)

【特許請求の範囲】 1、一般式▲数式、化学式、表等があります▼ (式中Arは▲数式、化学式、表等があります▼と ▲数式、化学式、表等があります▼のモル比が100:
0〜 50:50である2価の基を表わす) で表わされるポリイミド(A)に、 一般式▲数式、化学式、表等があります▼ (式中Rは炭素数2以上の整数価の基であ りnは2以上の整数である) で表わされるポリマレイミド(B)を配合してなる組成
物を流延成形してなる熱硬化性接着フィルム。 2、ポリイミド(A)とポリマレイミド(B)の比率(
A:B)が90:10〜50:50である特許請求の範
囲第1項記載の熱硬化性接着フィルム。
[Claims] 1. General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, Ar is the molar ratio of ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ 100:
0 to 50:50 (represents a divalent group with a ratio of 0 to 50:50) General formula ▲ Numerical formula, chemical formula, table, etc. are available for polyimide (A) represented by A thermosetting adhesive film obtained by casting a composition containing a polymaleimide (B) represented by the formula (n is an integer of 2 or more). 2. Ratio of polyimide (A) and polymaleimide (B) (
The thermosetting adhesive film according to claim 1, wherein A:B) is 90:10 to 50:50.
JP7732886A 1986-04-03 1986-04-03 Thermosetting adhesive film Pending JPS62235382A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7732886A JPS62235382A (en) 1986-04-03 1986-04-03 Thermosetting adhesive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7732886A JPS62235382A (en) 1986-04-03 1986-04-03 Thermosetting adhesive film

Publications (1)

Publication Number Publication Date
JPS62235382A true JPS62235382A (en) 1987-10-15

Family

ID=13630865

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7732886A Pending JPS62235382A (en) 1986-04-03 1986-04-03 Thermosetting adhesive film

Country Status (1)

Country Link
JP (1) JPS62235382A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268778A (en) * 1988-04-20 1989-10-26 Hitachi Chem Co Ltd Hot-melt adhesive, polyimide film with said adhesive layer and printed circuit board therefrom
US5478918A (en) * 1993-02-09 1995-12-26 Central Glass Company, Limited Low stress polyimide composition and precursor composition solution of same
US6468664B1 (en) 1999-10-19 2002-10-22 Samsung Electronics Co., Ltd. Poly(imide-siloxane) compound for tapeless LOC packaging
EP1787809A1 (en) 2005-11-21 2007-05-23 Fujifilm Corporation Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate
US20120059119A1 (en) * 2009-05-08 2012-03-08 Mitsubishi Gas Chemical Company, Inc. Thermosetting polyimide resin composition, cured product, and adhesive
WO2013141239A1 (en) * 2012-03-22 2013-09-26 日産化学工業株式会社 Polyamic acid and polyimide

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01268778A (en) * 1988-04-20 1989-10-26 Hitachi Chem Co Ltd Hot-melt adhesive, polyimide film with said adhesive layer and printed circuit board therefrom
US5478918A (en) * 1993-02-09 1995-12-26 Central Glass Company, Limited Low stress polyimide composition and precursor composition solution of same
US6468664B1 (en) 1999-10-19 2002-10-22 Samsung Electronics Co., Ltd. Poly(imide-siloxane) compound for tapeless LOC packaging
EP1787809A1 (en) 2005-11-21 2007-05-23 Fujifilm Corporation Ink composition, inkjet recording method, printed material, production method of a planographic printing plate and planographic printing plate
US20120059119A1 (en) * 2009-05-08 2012-03-08 Mitsubishi Gas Chemical Company, Inc. Thermosetting polyimide resin composition, cured product, and adhesive
WO2013141239A1 (en) * 2012-03-22 2013-09-26 日産化学工業株式会社 Polyamic acid and polyimide

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