JPS6218048Y2 - - Google Patents
Info
- Publication number
- JPS6218048Y2 JPS6218048Y2 JP5225782U JP5225782U JPS6218048Y2 JP S6218048 Y2 JPS6218048 Y2 JP S6218048Y2 JP 5225782 U JP5225782 U JP 5225782U JP 5225782 U JP5225782 U JP 5225782U JP S6218048 Y2 JPS6218048 Y2 JP S6218048Y2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- metal
- buffer member
- sealed
- brazing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 claims description 25
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000011521 glass Substances 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- 238000005219 brazing Methods 0.000 claims description 7
- 238000003466 welding Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 description 8
- 230000017525 heat dissipation Effects 0.000 description 7
- 239000010953 base metal Substances 0.000 description 4
- 238000005476 soldering Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Casings For Electric Apparatus (AREA)
Description
【考案の詳細な説明】
本考案は、半導体用気密容器、特に、放熱を必
要とした半導体容器の耐熱構造に関する。[Detailed Description of the Invention] The present invention relates to an airtight container for semiconductors, and particularly to a heat-resistant structure for a semiconductor container that requires heat dissipation.
一般に、金属製端子を絶縁して封着する場合に
は、ガラス類が多用される。この場合、周辺のガ
ラス封着金属は、ガラスと膨張係数が近くかつぬ
れ性の良いものと、コンプレツシヨンをはたらか
すタイプの二種類に大別される。これらは、放熱
体基板とろう接・溶接等により簡単な緩衝材を介
して接合されるが、ろう接時もしくは半導体塔載
用ろう接等の加熱時に、熱膨張差の違いによりガ
ラス封着部に応力がかかり、しばしば気密不良、
クラツク発生等大問題があつた。 Generally, when insulating and sealing metal terminals, glass is often used. In this case, the surrounding glass sealing metals are roughly divided into two types: those with an expansion coefficient close to that of the glass and good wettability, and those that act as compression. These are joined to the radiator substrate through a simple cushioning material by brazing or welding, but the difference in thermal expansion during soldering or heating during soldering for semiconductor towers causes the glass seal to is stressed, often resulting in poor airtightness,
There were major problems such as cracks.
第1図はその一例を示しているが、半導体7の
放熱用基板金属6へのろう接時にガラス封着金属
3と放熱用基板金属6の熱膨張差により基板金属
6がバイメタル形状に変形が進み、緩衝部材5で
応力を和らげきれないことが多い。 FIG. 1 shows an example of this, and when the semiconductor 7 is soldered to the heat dissipation base metal 6, the base metal 6 is deformed into a bimetallic shape due to the difference in thermal expansion between the glass sealing metal 3 and the heat dissipation base metal 6. In many cases, the stress may not be alleviated by the buffer member 5.
本考案は、これら問題点を解決するためになさ
れたものであり、従つて本考案の目的は、熱によ
りガラス部の気密不良につながる応力を緩和させ
て高信頼性を得ることができる半導体容器の緩衝
部の新規な構造又は形状を提供することにある。 The present invention was made to solve these problems, and the purpose of the present invention is to provide a semiconductor container that can achieve high reliability by alleviating the stress that leads to poor airtightness in the glass part due to heat. An object of the present invention is to provide a new structure or shape of a buffer section.
本考案の上記目的は、リード線をガラスを介し
て気密絶縁して封着したガラス封着金属と、放熱
用基板金属と、前記ガラス封着金属の下面にろう
接又は溶接により接合された外側鍔部を有し且つ
ほぼ中心部に前記基板金属の凸部に嵌合する孔部
を備えると共に前記基板金属の肩面にろう接又は
溶接により接合された内側鍔部を含みしかも前記
内側鍔部と前記外側鍔部との間に一個又は複数個
の段差部を形成した緩衝部材とを具備することを
特徴とした半導体用気密容器によつて達成され
る。 The above-mentioned object of the present invention is to provide a glass-sealed metal in which lead wires are hermetically insulated and sealed through glass, a heat dissipation substrate metal, and an outer surface that is joined to the lower surface of the glass-sealed metal by brazing or welding. The inner flange has a flange, and has a hole approximately in the center that fits into the protrusion of the substrate metal, and also includes an inner flange joined to the shoulder surface of the substrate metal by brazing or welding. This is achieved by an airtight container for a semiconductor, comprising: a buffer member having one or more step portions formed between the outer flange portion and the outer flange portion.
以下、本考案をその良好な各実施例について図
面を参照して詳細に説明しよう。 Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings.
第2図は本考案の主要部である緩衝部材の第1
の構成例を示す断面図である。図において、参照
番号15はガラス封着金属3とほぼ同様の外周形
状を有する緩衝部材を示し、該緩衝部材の中央部
には放熱用基板金属6の半導体塔載部分を含む凸
部61に嵌合する孔部151が設けられ、且つ緩
衝部材15の周辺部には段差部152が形成され
ている。 Figure 2 shows the first part of the buffer member, which is the main part of the present invention.
FIG. 2 is a cross-sectional view showing a configuration example. In the figure, reference numeral 15 indicates a buffer member having an outer circumferential shape substantially similar to that of the glass sealing metal 3, and a convex portion 61 including a semiconductor mounting portion of the heat dissipating substrate metal 6 is provided at the center of the buffer member. A hole 151 for fitting is provided, and a stepped portion 152 is formed at the periphery of the buffer member 15.
153は内側鍔部、154は外側鍔部となつて
いる。本構成例においては、段差部152は2段
の段差となつているが、この段差を1段とするこ
ともできる。 153 is an inner flange, and 154 is an outer flange. In this configuration example, the stepped portion 152 has two steps, but this step may also be one step.
第4図は第2図に示した緩衝部材15を放熱用
基基板金属6とガラス封着金属3の間に介在させ
て構成した本考案に係る気密半導体容器の一実施
例を示す断面図である。図において、緩衝部材1
5は、放熱用基板金属6上に、その凸部61に孔
部151を嵌合することにより装着され、緩衝部
材の内側鍔部153の下面には基板金属の凸部6
1の肩面に、外側面の上面にはガラス封着金属3
の下面がそれぞれろう接又は溶接により接合され
ている。 FIG. 4 is a sectional view showing an embodiment of the airtight semiconductor container according to the present invention, in which the buffer member 15 shown in FIG. 2 is interposed between the heat dissipation base metal 6 and the glass sealing metal 3. be. In the figure, the buffer member 1
5 is mounted on the heat dissipation substrate metal 6 by fitting the hole 15 1 into the protrusion 6 1 , and the lower surface of the inner flange 15 3 of the buffer member has the protrusion 6 of the substrate metal.
1 , and glass-sealed metal 3 on the upper surface of the outer surface.
The lower surfaces of each are joined by brazing or welding.
第4図に示す構造を有する容器のろう接又は溶
接時に発熱した場合に、ガラス封着金属3と基板
金属6の熱膨張差による応力が発生し、その結
果、放熱用基板金属6が第5図に示すように変形
しようとするけれども、その応力の伝達は、本緩
衝部材15の二段の段差で吸収され、ガラス封着
金属3への影響の減少、換言すれば、異種の二種
類の金属間に生ずる大きな力は本段差部152の
変形により相殺される。 When heat is generated during soldering or welding of a container having the structure shown in FIG. 4, stress is generated due to the difference in thermal expansion between the glass sealing metal 3 and the substrate metal 6. Although it tries to deform as shown in the figure, the transmission of the stress is absorbed by the two-step difference in the buffer member 15, reducing the influence on the glass sealing metal 3. In other words, the two different types of The large force generated between the metals is offset by the deformation of the stepped portion 152 .
第3図は本考案の主要部である緩衝部材の第2
の構成例を示す断面図である。本構成例は第2図
に示した構成例の2段の段差部を3段とした例で
ある。この構成による緩衝部材を用いて第4図と
同様の半導体容器を形成することができ、これを
第2の実施例とする。この段差部152を4個又
は4個以上として、第3、第4の実施例も同様に
構成し得ることは勿論であり、これらの実施例は
前記第1の実施例と同様またはそれ以上の効果を
示すことは明らかである。 Figure 3 shows the second part of the buffer member, which is the main part of the present invention.
FIG. 2 is a cross-sectional view showing a configuration example. This configuration example is an example in which the two-step stepped portion of the configuration example shown in FIG. 2 is changed to three steps. A semiconductor container similar to that shown in FIG. 4 can be formed using a buffer member having this configuration, and this is referred to as a second embodiment. It goes without saying that the third and fourth embodiments can be constructed in the same manner by using four or more step portions 152 , and these embodiments are similar to or more than the first embodiment. It is clear that the effect of
緩衝部材を以上のような構造又は形状にするこ
とにより、ガラスのクラツクなどの破損のない耐
熱性に優れた気密性の高い半導体容器が得られ
る。又、機械的衝撃に対してもきわめて強く信頼
性も向上するものである。 By forming the buffer member into the structure or shape as described above, a highly airtight semiconductor container with excellent heat resistance and no damage such as glass cracks can be obtained. Furthermore, it is extremely strong against mechanical shock and has improved reliability.
第1図は従来の半導体用容器の一例を示す断面
図、第2図は本考案の主要部である緩衝部材の第
1の構成例を示す断面図、第3図は緩衝部材の第
2の構成例を示す断面図、第4図は本考案に係る
半導体容器の一実施例を示す断面図、第5図は本
考案による緩衝部材の変形状態の一例を示す断面
図である。
1……リード線、2……ガラス封着部、3……
ガラス封着金属、4……ろう接部(溶接部)、5
……緩衝部材、6……放熱用基板金属、7……半
導体(基板)、8……ろう接部、15……緩衝部
材、151……孔部、152……段差部、153
……内側鍔部、154……外側鍔部。
FIG. 1 is a cross-sectional view showing an example of a conventional semiconductor container, FIG. 2 is a cross-sectional view showing a first configuration example of a buffer member, which is the main part of the present invention, and FIG. FIG. 4 is a cross-sectional view showing an example of the structure of the semiconductor container according to the present invention, and FIG. 5 is a cross-sectional view showing an example of a deformed state of the buffer member according to the present invention. 1...Lead wire, 2...Glass sealing part, 3...
Glass-sealed metal, 4... Brazed part (welded part), 5
... Buffer member, 6 ... Heat dissipation substrate metal, 7 ... Semiconductor (substrate), 8 ... Brazing part, 15 ... Buffer member, 15 1 ... Hole, 15 2 ... Step part, 15 3
...Inner collar, 15 4 ...Outer collar.
Claims (1)
たガラス封着金属と、放熱用基板金属と、前記ガ
ラス封着金属にろう接又は溶接により接合された
外側鍔部を有し且つほぼ中心部に前記基板金属の
凸部に嵌合する孔部を備えると共に前記基板金属
にろう接又は溶接により接合された内側鍔部を含
みしかも前記内側鍔部と前記外側鍔部との間に一
個又は複数個の段差部を形成した緩衝部材とを具
備することを特徴とした半導体用気密容器。 A glass-sealed metal in which lead wires are hermetically insulated and sealed through glass, a heat-dissipating substrate metal, and an outer flange joined to the glass-sealed metal by brazing or welding, and approximately at the center thereof. a hole that fits into a convex portion of the substrate metal, and an inner flange portion joined to the substrate metal by brazing or welding, and one or more flange portions are provided between the inner flange portion and the outer flange portion. What is claimed is: 1. An airtight container for semiconductors, comprising: a buffer member having individual stepped portions.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5225782U JPS58155843U (en) | 1982-04-09 | 1982-04-09 | Airtight container for semiconductors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5225782U JPS58155843U (en) | 1982-04-09 | 1982-04-09 | Airtight container for semiconductors |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58155843U JPS58155843U (en) | 1983-10-18 |
JPS6218048Y2 true JPS6218048Y2 (en) | 1987-05-09 |
Family
ID=30062968
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5225782U Granted JPS58155843U (en) | 1982-04-09 | 1982-04-09 | Airtight container for semiconductors |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58155843U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002361183A (en) * | 2001-06-01 | 2002-12-17 | Natl Inst Of Industrial Safety Independent Administrative Institution | Roll surface cleaning apparatus for roll machine |
-
1982
- 1982-04-09 JP JP5225782U patent/JPS58155843U/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002361183A (en) * | 2001-06-01 | 2002-12-17 | Natl Inst Of Industrial Safety Independent Administrative Institution | Roll surface cleaning apparatus for roll machine |
Also Published As
Publication number | Publication date |
---|---|
JPS58155843U (en) | 1983-10-18 |
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