JPS62172306A - Method for forming film on end surface of optical fiber - Google Patents

Method for forming film on end surface of optical fiber

Info

Publication number
JPS62172306A
JPS62172306A JP61013512A JP1351286A JPS62172306A JP S62172306 A JPS62172306 A JP S62172306A JP 61013512 A JP61013512 A JP 61013512A JP 1351286 A JP1351286 A JP 1351286A JP S62172306 A JPS62172306 A JP S62172306A
Authority
JP
Japan
Prior art keywords
film
optical fiber
end surface
resist film
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61013512A
Other languages
Japanese (ja)
Inventor
Yahei Oyamada
弥平 小山田
Fumihiro Nihei
二瓶　文博
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP61013512A priority Critical patent/JPS62172306A/en
Publication of JPS62172306A publication Critical patent/JPS62172306A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/42—Coupling light guides with opto-electronic elements
    • G02B6/4201—Packages, e.g. shape, construction, internal or external details
    • G02B6/4202—Packages, e.g. shape, construction, internal or external details for coupling an active element with fibres without intermediate optical elements, e.g. fibres with plane ends, fibres with shaped ends, bundles
    • G02B6/4203—Optical features
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/241—Light guide terminations

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Mechanical Coupling Of Light Guides (AREA)

Abstract

PURPOSE:To attain partial formation of a film on the end surface of an optical fiber so as to make it appropriate for mass production by forming a regist film on one end surface of the optical fiber and irradiating light upon the other end surface. CONSTITUTION:An optical fiber A1 is cut off at first, and after grinding one end surface of the optical fiber A1 in accordance with necessity, a regist solution is applied to the whole surface of the other end surface to form a regist film 4. Then, light is made incident upon the other end surface and the film 4 formed on a core part is exposed by the light transmitted through the core 1 to form a deteriorated regist film 7. An unexposed film 4 is removed by a developer. Then, a reflecting film material is sticked to the whole end surface of the fiber A1 including residual film part 7 to form a reflecting film 3. Finally, the residual film 7 is removed by a solvent together with the reflecting film 3 formed on the film 7.

Description

【発明の詳細な説明】 （技術分野） 本発明は、光フアイバ端面上に部分的に光の反射膜、吸
収膜あるいは散乱膜などの膜を作成する方法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a method for forming a film such as a light reflecting film, an absorbing film, or a light scattering film partially on the end face of an optical fiber.

（従来の技術） 光フアイバ端面上に部分的に膜を作成しようとする場合
に一般的に考えられる方法は第２図に示すようなもので
ある。第２図は、ファイバ端面のクラッド部分だけに反
射膜を作成する方法について示したものである。同図に
おいて、Ｅ１〜Ｅ６は作成の各段階を示しており、Ａ１
は光ファイバ、Ａ２はフォトマスク、Ａ３は光源を示し
ている。(Prior Art) A method generally considered when attempting to partially form a film on the end face of an optical fiber is as shown in FIG. FIG. 2 shows a method of forming a reflective film only on the cladding portion of the fiber end face. In the same figure, E1 to E6 indicate each stage of creation, and A1
indicates an optical fiber, A2 indicates a photomask, and A3 indicates a light source.

１は光ファイバＡ１のコア、２はクラッド、３は反射膜
、４はレジスト膜の未露光部分、５はフォトマスクＡ２
の透明部分、６はフォトマスクＡ２の不透明部分、７は
露光されたレジスト膜の部分である。先ず、光ファイバ
Ａ１を切断し、必要によって研磨した後（段階Ｅ１）、
反射膜用材料を付着させて反Ｄ４膜３を全端面にわたっ
て作成し、その上からレジスト液を塗布してレジスト膜
４を作成する〈段階Ｅ２）。1 is the core of the optical fiber A1, 2 is the cladding, 3 is the reflective film, 4 is the unexposed part of the resist film, 5 is the photomask A2
6 is an opaque portion of the photomask A2, and 7 is an exposed portion of the resist film. First, after cutting the optical fiber A1 and polishing it if necessary (step E1),
The anti-D4 film 3 is created over the entire end surface by attaching a reflective film material, and a resist solution is applied thereon to create a resist film 4 (step E2).

次にフォトマスクΔ２と光源Ａ３を用いてクラッド部に
塗布されたレジスト！ｌ１Ｉ７だけを露光し、変質させ
る（段階Ｅ３）。次にディベロツバ−と一般に呼ばれて
いる薬品を用いて露光されなかったレジスト膜部分４を
取り除く（段階４）。次にエツチングにより、レジスト
膜の残っていない部分の反０’ｊｌｌを取り除く（段階
Ｅ５）。最後に、残っているレジストｌＩ７を溶剤等を
用いて取り除く（段１１Ｅ６）。Next, resist was applied to the cladding using photomask Δ2 and light source A3! Only l1I7 is exposed and altered (step E3). Next, the unexposed resist film portion 4 is removed using a chemical commonly called a developer (step 4). Next, by etching, the anti-0'jll portion of the resist film that does not remain is removed (step E5). Finally, the remaining resist lI7 is removed using a solvent or the like (step 11E6).

以上の手順により、クラッド部分だけに反ｔＪ４ＩＩＳ
を作成することが可能である。By the above procedure, anti-tJ4IIS is applied only to the cladding part.
It is possible to create

（発明が解決しようとする問題点） しかし、前述した方法にはフォトマスクを用いて部分露
光する工程が含まれており、この工程ではフォトマスク
Ａ２とファイバＡ１間の高精度な位置合わせが必要であ
り、大量生産に向かないという欠点がある。(Problem to be solved by the invention) However, the above-mentioned method includes a step of partial exposure using a photomask, and this step requires highly accurate alignment between the photomask A2 and the fiber A1. However, it has the disadvantage that it is not suitable for mass production.

（発明の目的） 本発明の目的は、このような高精度な位置合わせを必要
としない大量生産に適したファイバ端面上での部分的な
膜の作成方法を提供することにある。(Objective of the Invention) An object of the present invention is to provide a method for forming a partial film on a fiber end face, which is suitable for mass production and does not require such highly accurate alignment.

（問題点を解決するための手段） 本発明は上記目的を達成するため、光ファイバの一方の
端面にレジスト膜を作成し、該光ファイバの他の端面に
光を照射し、コアを伝搬した光によって前記レジスト膜
を部分的に露光させ、露光したレジスト膜部分または露
光しなかったレジスト膜部分のうちの一方だけを取り除
き、該レジスト膜の残った前記光フアイバ端面に目的と
する膜の作成用の材料を全面にわたって付着させて膜を
作成し、しかる後部分的に残っていたレジスト膜をその
上に付着された前記膜と共に取り除くことを特徴とする
。(Means for Solving the Problems) In order to achieve the above object, the present invention creates a resist film on one end face of an optical fiber, irradiates light onto the other end face of the optical fiber, and propagates through the core. Partially exposing the resist film to light, removing only one of the exposed resist film portion and the unexposed resist film portion, and forming a desired film on the end face of the optical fiber where the resist film remains. The method is characterized in that a resist material is deposited over the entire surface to form a film, and then the partially remaining resist film is removed together with the film deposited thereon.

（作用） 本発明によれば、高精度な位置合わせを行うことなしに
、ファイバ端面上に部分的に反射膜や吸収膜あるいは散
乱膜などを作成できる。(Function) According to the present invention, a reflective film, an absorbing film, a scattering film, etc. can be formed partially on the fiber end face without performing highly accurate alignment.

（実施例） 第１図は、本発明による作成方法の実施例であり、ファ
イバ端面上でクラッド部分だけに反射膜を作成する手順
を示したものである。なお、図中従来例と同一構成部分
は同一符号をもって表わす。(Example) FIG. 1 is an example of the manufacturing method according to the present invention, and shows the procedure for creating a reflective film only on the cladding portion on the fiber end face. In the figures, the same components as those of the conventional example are represented by the same reference numerals.

すなわち図中、Ｅ１〜Ｅ６は作成の段階を示している。That is, in the figure, E1 to E6 indicate the stages of creation.

また、Ａ１は光ファイバ、Ａ３は光源であり、１は光フ
ァイバＡ１のコア、２は同じくクラッド、３は反射膜、
４は未露光のレジスト膜、７は露光されたレジスト膜で
ある。Further, A1 is an optical fiber, A3 is a light source, 1 is the core of the optical fiber A1, 2 is the cladding, 3 is a reflective film,
4 is an unexposed resist film, and 7 is an exposed resist film.

先ず、光ファイバＡ１を切断し、一方の端面を必要に応
じて研磨した後（段ＭＥ１）、該光フアイバ端面の全面
にレジスト液を塗布してレジスト膜４を作成する（段階
Ｅ２）。次に、光ファイバＡ１のもう一方の端面から光
を入射せしめ、コア１を伝搬した光によって、コア部分
に塗布され１＝レジスト膜４を露光して変質したレジス
ト膜７とする（段階Ｅ３）。次に未露光のレジスト膜４
をディベロツバ−を用いて取り除く（段階Ｅ４）。First, the optical fiber A1 is cut and one end face is polished if necessary (step ME1), and then a resist solution is applied to the entire end face of the optical fiber to form a resist film 4 (step E2). Next, light is made to enter from the other end surface of the optical fiber A1, and the light propagated through the core 1 coats the core portion and exposes the resist film 4 to become a changed resist film 7 (step E3). . Next, the unexposed resist film 4
is removed using a developer tool (step E4).

次に、反射膜用材料をレジスト膜７の残っている部分も
含めて全光ファイバ端面に付着させ、反射１１！３を作
成する（段階Ｅ５）。最後に溶剤を用いて、残っている
レジストＩＩ！＄７をその１に作成した反射膜と共に取
り除く。Next, a material for a reflective film is attached to the entire end face of the optical fiber including the remaining portion of the resist film 7 to create a reflection 11!3 (step E5). Finally, use a solvent to remove the remaining resist II! Remove $7 along with the reflective film created in Part 1.

このように、本発明による作成方法を用いれば、高精度
な位置合わせをすることなしにクラッド部分だけに反射
膜を作成することができる。As described above, by using the production method according to the present invention, it is possible to produce a reflective film only on the cladding portion without performing highly accurate alignment.

第１図に示した実施例では、ディベロツバ−による処理
により露光して変質した部分７が残るレジスト液を使っ
ているが、逆に未露光部分４が残るレジスト液を用いれ
ば、コア部分だけに反射膜を作成することができる。In the embodiment shown in FIG. 1, a resist solution is used in which the exposed and altered portions 7 remain due to processing by a developer, but if a resist solution is used in which the unexposed portions 4 remain, only the core portions are left. A reflective film can be created.

光ファイバの一端から光を入射した時の他端における光
の強度はコアの中でも屈折率の高いところ程強い。従っ
て、コアの中心で屈折率が最も高く、中心から離れるに
従って徐々に屈折率が低下しているグレー°デッド型フ
ァイバの場合、コアの中心で光強度が最も強く、中心か
ら離れるに従って徐々に弱くなる。この点を利用すれば
、反射膜を作成せんとする端面とは異なるもう一方の端
面から入射する光の量を適当に設定することにより、レ
ジスト膜が変質するに足りるだけの光エネルギーをコア
の中心付近に塗布された一部のレジスト膜だけに与える
ことができる。このような技術を使えば、ファイバ端面
のうち、コアの中心付近の一部分だけを残して反射膜を
施したり、反対にコア付近だけに反射膜を施したりする
ことができる。When light enters from one end of the optical fiber, the intensity of the light at the other end is higher in the core where the refractive index is higher. Therefore, in the case of a graded fiber, in which the refractive index is highest at the center of the core and gradually decreases as you move away from the center, the light intensity is strongest at the center of the core and gradually weakens as you move away from the center. Become. By taking advantage of this point, by appropriately setting the amount of light that enters from the other end surface, which is different from the end surface on which the reflective film is to be created, sufficient light energy to change the quality of the resist film can be applied to the core. It can be applied only to a part of the resist film coated near the center. Using such a technique, it is possible to apply a reflective film to only a portion of the fiber end face near the center of the core, or to apply a reflective film only to the vicinity of the core.

なお、実施例の説明かられかるように、作成せんとする
膜は反射膜ではなく吸収膜や散乱膜などであっても全く
同じ作成手段で部分的な躾を作成することかできる。As can be seen from the description of the embodiments, even if the film to be created is not a reflective film but an absorbing film, a scattering film, etc., partial control can be created using exactly the same manufacturing means.

ファイバ端面に作成する膜の材料や厚さ、大きさ、ファ
イバ端面の角度、更には膜をコア部分に作成するかクラ
ッド部分に作成するかなどを適当に選択することにより
、部分的に作成された膜を用いて光スィッチ、光分岐、
光減衰器、光モ・−ドフィルタなどを構成することが可
能である。By appropriately selecting the material, thickness, and size of the film to be created on the fiber end face, the angle of the fiber end face, and whether the film is created on the core or cladding part, it is possible to create a film partially. Optical switches, optical branching,
It is possible to configure an optical attenuator, an optical mode filter, etc.

（発明の効果） 以上説明したように、本発明によれば、高精度な位置合
わせを行うことなしに、ファイバ端面上に部分的に反射
膜や吸収膜あるいは散乱膜などを作成でき、光スィッチ
、光分岐、光減衰器、光モードフィルタなどの曙能を有
する光デバイスを人聞にかつ低コストで生産できるとい
う利点がある。(Effects of the Invention) As explained above, according to the present invention, a reflective film, an absorbing film, a scattering film, etc. can be formed partially on the fiber end face without performing highly accurate positioning, and an optical switch can be This method has the advantage that optical devices with advanced capabilities such as optical branches, optical attenuators, and optical mode filters can be produced manually and at low cost.

【図面の簡単な説明】[Brief explanation of drawings]

第１図は本発明による作成方法の実施例を示す工程説明
図、第２図は光ファイバ端面上に部分的に膜を作成する
従来の方法の工程説明図である。 Ｅ１〜Ｅ６・・・作成の段階を示す記号、Ａ１・・・光
ファイバ、Ａ２・・・フォトマスク、Ａ３・・・光源、
１・・・コア、２・・・クラッド、３・・・反１）［，
４・・・未露光のレジスト膜、５・・・フォトマスクの
不透明部分、７・・・露光されたレジスト膜。FIG. 1 is a process explanatory diagram showing an embodiment of the manufacturing method according to the present invention, and FIG. 2 is a process explanatory diagram of a conventional method for partially forming a film on the end face of an optical fiber. E1 to E6...Symbols indicating stages of creation, A1...Optical fiber, A2...Photomask, A3...Light source,
1... Core, 2... Clad, 3... Anti-1) [,
4... Unexposed resist film, 5... Opaque portion of photomask, 7... Exposed resist film.

Claims (1)

【特許請求の範囲】[Claims] 光ファイバの一方の端面にレジスト膜を作成し、該光フ
ァイバの他の端面に光を照射し、コアを伝搬した光によ
って前記レジスト膜を部分的に露光させ、露光したレジ
スト膜部分または露光しなかったレジスト膜部分のうち
の一方だけを取り除き、該レジスト膜の残った前記光フ
ァイバ端面に目的とする膜の作成用の材料を全面にわた
って付着させて膜を作成し、しかる後部分的に残ってい
たレジスト膜をその上に付着された前記膜と共に取り除
くことを特徴とする光ファイバ端面の膜作成方法。A resist film is created on one end face of an optical fiber, the other end face of the optical fiber is irradiated with light, the resist film is partially exposed by the light propagated through the core, and the exposed resist film portion or the exposed part is exposed. Remove only one of the parts of the resist film that remained, and apply a material for creating the desired film over the entire surface of the end face of the optical fiber where the resist film remained. 1. A method for forming a film on an end face of an optical fiber, comprising removing a resist film deposited on the resist film along with the film deposited thereon.
JP61013512A 1986-01-24 1986-01-24 Method for forming film on end surface of optical fiber Pending JPS62172306A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61013512A JPS62172306A (en) 1986-01-24 1986-01-24 Method for forming film on end surface of optical fiber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61013512A JPS62172306A (en) 1986-01-24 1986-01-24 Method for forming film on end surface of optical fiber

Publications (1)

Publication Number Publication Date
JPS62172306A true JPS62172306A (en) 1987-07-29

Family

ID=11835198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61013512A Pending JPS62172306A (en) 1986-01-24 1986-01-24 Method for forming film on end surface of optical fiber

Country Status (1)

Country Link
JP (1) JPS62172306A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01255803A (en) * 1988-04-06 1989-10-12 Nec Corp Optical fixed attenuator
JP2004163577A (en) * 2002-11-12 2004-06-10 Pentax Corp Processing method of optical fiber

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01255803A (en) * 1988-04-06 1989-10-12 Nec Corp Optical fixed attenuator
JP2004163577A (en) * 2002-11-12 2004-06-10 Pentax Corp Processing method of optical fiber

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