JPS61278532A - Production of hydroxyphenyl-terminated ladder polysiloxane - Google Patents

Production of hydroxyphenyl-terminated ladder polysiloxane

Info

Publication number
JPS61278532A
JPS61278532A JP12191985A JP12191985A JPS61278532A JP S61278532 A JPS61278532 A JP S61278532A JP 12191985 A JP12191985 A JP 12191985A JP 12191985 A JP12191985 A JP 12191985A JP S61278532 A JPS61278532 A JP S61278532A
Authority
JP
Japan
Prior art keywords
hydroxyphenyl
catalyst
polysiloxane
solution
ladder polysiloxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12191985A
Other languages
Japanese (ja)
Inventor
Hiroshi Adachi
足達 廣士
Etsushi Adachi
足達 悦志
Osamu Hayashi
修 林
Kazuo Okabashi
岡橋 和郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12191985A priority Critical patent/JPS61278532A/en
Publication of JPS61278532A publication Critical patent/JPS61278532A/en
Pending legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)

Abstract

PURPOSE:To obtain a hydroxyphenyl-terminated ladder polysiloxane of good heat resistance, by polycondensing an intermediate obtained by cohydrolyzing phenyltrichlorosilane with a specified silane compound by using a chloroformate ester as a catalyst. CONSTITUTION:Phenyltrichlorosilane is cohydrolyzed with a compound of the formula (wherein X is H, methyl, ethyl, or phenyl and m is 0-4). The obtained intermediate is polycondensed by using a chloroformate ester as a catalyst to obtain a hydroxyphenyl-terminated ladder polysiloxane having photosensitive groups as side chains. Examples of the silane compounds of the formula include vinyltrichlorosilane and allyltrichlorosilane. In performing said polycondensation reaction, the catalyst is added to a solution obtained by dissolving said intermediate in an organic solvent and this solution is heated to about 130 deg.C.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は側鎖に感光基を有する末′4+ニトロキシフェ
ニルラダーポリシロキサンの製法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a process for producing a terminal '4+ nitroxyphenyl ladder polysiloxane having a photosensitive group in its side chain.

[従来の扶i1 従来から電子部品あるいはLSIの層間絶縁膜などの感
光性耐熱材料の開発がなされているが、感光性耐熱材料
のなかでも高分子材料の開発には2つの流れがある。1
つは従来の7オトレジストの耐熱性向上を目的としたも
の、もう1つは耐熱性高分子材料に感光性を付与するこ
とを目的としたものである。前者としては環化ポリブタ
ジェン([ジャパニーズ・ジャーナル・オブ・アプライ
ド・フィジックス]、1980年、第19巻、460頁
)、後者としては感光性ポリイミド樹脂(「エレトロニ
クス」、1981年、)3頁)などがあげられる。
[Conventional Support i1 Photosensitive heat-resistant materials have been developed for use in electronic components or LSI interlayer insulating films, and among photosensitive heat-resistant materials, there are two trends in the development of polymeric materials. 1
One is aimed at improving the heat resistance of the conventional 7-otoresist, and the other is aimed at imparting photosensitivity to a heat-resistant polymer material. The former is cyclized polybutadiene (Japanese Journal of Applied Physics, 1980, Vol. 19, p. 460), and the latter is photosensitive polyimide resin (Eletronics, 1981, p. 3). etc.

[発明が解決しようとする問題点] 上記のような従来の光重合性化合物はその分子構造が鎖
状であるため耐熱性に劣り、また基板との密着性がわる
いため下地処理が必要であるなどの問題がある。
[Problems to be solved by the invention] Conventional photopolymerizable compounds such as those described above have a chain-like molecular structure and therefore have poor heat resistance, and also have poor adhesion to the substrate, requiring surface treatment. There are problems such as.

本発明はこのような問題を解決するためになされたもの
である。
The present invention has been made to solve such problems.

[問題を解決するための手段1 本発明は、フェニルトリクロロシランおよび一般式(■
): 1(I) CH= C)I云CH,〜SiCム (式中、Xは水素原子、メチル基、エチル基またはフェ
ニル基、XはO〜4の整数を示す)で表わされる化合物
を共加水分解することによりえちれた中間体を、触媒と
してクロロギ酸エステル類で縮合重合させることにより
側鎖に感光基を有する末端ヒドロキシフェニルラグ−ポ
リシロキサンの製法に関する。
[Means for Solving the Problem 1] The present invention provides phenyltrichlorosilane and the general formula (■
): 1(I) CH= C) IenCH, ~SiCm (wherein, This invention relates to a method for producing a terminal hydroxyphenylrag-polysiloxane having a photosensitive group in a side chain by condensation polymerizing an intermediate obtained by cohydrolysis using a chloroformic acid ester as a catalyst.

[実施例] 本発明によればフェニルトリクロロシランおよび一般式
(I): 1(I) CH= CH→CH,〜SiCム (式中、Xは水素原子、メチル基、エチル基または7ヱ
ニル基、肩はO〜4の整数を示す)で表わされる化合物
を共加水分解することによりえられた中間体を、触媒と
してクロロギ酸エステル類で縮合重合させることにより
側鎖に感光基を有する末端ヒドロキシフェニルラグ−ポ
リシロキサンかえられる。
[Example] According to the present invention, phenyltrichlorosilane and general formula (I): 1(I) CH= CH→CH, ~SiCm (wherein, X is a hydrogen atom, a methyl group, an ethyl group or a 7enyl group) , the shoulder indicates an integer from O to 4) is condensed and polymerized using chloroformic acid esters as a catalyst to form a terminal hydroxyl compound having a photosensitive group in the side chain. Phenyllag-polysiloxane can be replaced.

前記一般式(1)で示されるシラン化合物は、化合物中
に一般式(■): 1(■) C)I=C)I云C11,〜 で表わされる感光基を有する化合物であるが、Xは製造
される末端ヒドロキシフェニルラグ−ポリシロキサンを
感光させたばあい、光重合性にすぐれている、水素原子
、メチル基、エチル基または7ヱニル基が好ましく、マ
たlは耐熱性の面から0〜4の整数であるのが好ましい
The silane compound represented by the general formula (1) is a compound having a photosensitive group represented by the general formula (■): 1(■) C)I=C)IyenC11, ~, but When the terminal hydroxyphenyl rag-polysiloxane to be produced is exposed to light, a hydrogen atom, a methyl group, an ethyl group or a 7-enyl group are preferable because they have excellent photopolymerizability, and from the viewpoint of heat resistance, the material is Preferably, it is an integer from 0 to 4.

前記一般式(I)で示されるシック化合物としては、た
とえばビニルトリクロロシラン、アリルト17 クロロ
シラン、2−フェニルビニル) +7クロロシラン、3
−フェニルアリルトリクロロシランなどがあげられるが
、これらのみに限定されるものではない。
Examples of the thick compound represented by the general formula (I) include vinyltrichlorosilane, allyl chlorosilane, 2-phenylvinyl) +7 chlorosilane, 3
Examples include, but are not limited to, -phenylallyltrichlorosilane.

前記共加水分解反応はフェニルトリクロロシランと一般
式(I)で示される化合物とを調合し、これを調合液と
同一体積の有機溶媒に溶解させたのち、多量のイオン交
換水中に攪拌しながら滴下し、発生した塩酸をイオン交
換水によって洗浄することにより行なわれる。*た前記
えられた中間体は低分子量の化合物のため、適当な沈澱
剤がないので、溶媒を留去して乾燥することにより、固
体の化合物としてえられる。
The above co-hydrolysis reaction is carried out by preparing phenyltrichlorosilane and the compound represented by general formula (I), dissolving this in the same volume of organic solvent as the prepared solution, and then dropping it into a large amount of ion-exchanged water with stirring. This is done by washing the generated hydrochloric acid with ion-exchanged water. *Since the intermediate obtained above is a low molecular weight compound and there is no suitable precipitant, it can be obtained as a solid compound by distilling off the solvent and drying.

脱水縮合反応はつぎのようにして行なわれる。The dehydration condensation reaction is carried out as follows.

加水分解してえられた共加水分解物を有機溶媒に溶解さ
せて均一層とする。
The cohydrolyzate obtained by hydrolysis is dissolved in an organic solvent to form a uniform layer.

前記有機溶媒は、たとえばメチルイソブチルケトン、メ
チルエチルケトン、アセトンなどのケト’ R,9エチ
ルエーテル、イソプロピルエーテルなどのエーテル類、
キシレン、トルエン、ベンゼンなどの芳香族炭化水素な
どの加水分解する化合物を溶解しうる溶剤があげられる
が、非水溶媒系溶媒を1種または2種以上混合して用い
るのが好ましい。
The organic solvent includes, for example, keto'R,9 ethyl ether such as methyl isobutyl ketone, methyl ethyl ketone, and acetone; ethers such as isopropyl ether;
Examples include solvents that can dissolve hydrolyzable compounds such as aromatic hydrocarbons such as xylene, toluene, and benzene, but it is preferable to use one type or a mixture of two or more non-aqueous solvents.

またこのぽあい中間体の濃度は重合反応を促進するため
に前記有機溶媒中に40重景%以上含まれるのが好まし
い。
In order to promote the polymerization reaction, the concentration of the polyester intermediate is preferably 40% or more in the organic solvent.

前記縮合重合反応に用いられる触媒はたとえば有機溶媒
に可溶である、クロロギ酸メチル、クロロギ酸エチル、
クロロギ酸ブチル、クロロギ酸イソプロピルなどのクロ
ロギ酸エステルなどがあげられ、これらを1種または2
種以上混合して前記中間体を溶解させてえられた溶液に
添加して用いられる。
The catalyst used in the condensation polymerization reaction is, for example, methyl chloroformate, ethyl chloroformate, which is soluble in an organic solvent.
Examples include chloroformate esters such as butyl chloroformate and isopropyl chloroformate.
It is used by mixing two or more species and adding them to a solution obtained by dissolving the intermediate.

このばあい前記触媒の添加量は中間体のヒドロキシル基
の数および目的とする感光性末端ヒドロキシフェニルラ
ダーポリシロキサンの分子量によって決定される。触媒
添加量が増加すると該分子量は増加し、スピンナーを用
いて基板上に回転塗布したときに厚膜がえられやすいが
、通常中間体1重量部に対して前記触媒を0.01〜0
.5重量部添加して用いられる。かかる添加量は0.0
1重量部末端のばあい重合性に劣り、また0、5重量部
をこえると副反応が主反応となるので好ましくない。
In this case, the amount of the catalyst added is determined by the number of hydroxyl groups in the intermediate and the molecular weight of the desired photosensitive terminal hydroxyphenyl ladder polysiloxane. As the amount of catalyst added increases, the molecular weight increases, and a thick film is likely to be obtained when spin-coating onto a substrate using a spinner.
.. It is used by adding 5 parts by weight. The amount added is 0.0
If the amount is 1 part by weight at the end, the polymerizability will be poor, and if it exceeds 0.5 parts by weight, the side reaction will become the main reaction, which is not preferable.

縮合重合反応は反応式(■): で示されるように進行するが、上記反応の進行構想は生
成するHCl、CO2あるいはアルコールを検出するこ
とにより確認される。
The condensation polymerization reaction proceeds as shown by the reaction formula (■): The progress of the above reaction is confirmed by detecting HCl, CO2, or alcohol produced.

反応に要する時間は、一般に反応温度が高いほど短いが
、上記反応においでは反応温度130℃で約5時間であ
ればよい。
Generally, the time required for the reaction is shorter as the reaction temperature is higher, but in the above reaction, it may be about 5 hours at a reaction temperature of 130°C.

上記反応終了後、えちれた反応溶液をメタノールあるい
はn−ヘキサンなどの沈澱剤中に注入することにより、
感光基を側鎖に有する末端ヒドロキシフェニルラダーポ
リシロキサンが沈澱物としてえられる。
After the above reaction is completed, by pouring the concentrated reaction solution into a precipitant such as methanol or n-hexane,
A terminal hydroxyphenyl ladder polysiloxane having a photosensitive group in its side chain is obtained as a precipitate.

えられた末端ヒドロキシフェニルラグ−ポリシロキサン
は、アスピレータ一ついでロータリーポンプで減圧乾燥
することにより、容易に未分離の塩酸を除去しうる。
Unseparated hydrochloric acid can be easily removed from the obtained terminal hydroxyphenyl lag polysiloxane by drying it under reduced pressure with a rotary pump using an aspirator.

こうしてえられた末端ヒドロキシフェニルラダーポリシ
ロキサンを赤外分光法で分析したところ、S!−CJs
に帰属される吸収ピークが1595c置−1と1430
cz−’に、また該ポリマーがラダー構造を有すること
を示す5i−0−Siの逆対称伸縮振動に帰属する吸収
ピークが1135c+++−’と101045c’に、
基板との密着性に寄与する5i−OHに帰属される吸収
ピークが3400cz−’に、さらには該ポリマーが感
光性であることを示すビニル基に帰属される吸収ピーク
が12フ0cJl″″にそれぞれ観測される。
When the thus obtained terminal hydroxyphenyl ladder polysiloxane was analyzed by infrared spectroscopy, it was found that S! -CJs
The absorption peaks assigned to 1595c-1 and 1430
cz-', and absorption peaks at 1135c+++-' and 101045c', which are attributed to the antisymmetric stretching vibration of 5i-0-Si, which indicates that the polymer has a ladder structure.
The absorption peak attributed to 5i-OH, which contributes to the adhesion with the substrate, is at 3400 cz-', and the absorption peak attributed to the vinyl group, which indicates that the polymer is photosensitive, is at 12 f0 cJl''''. Each is observed.

これらの結果から上記ポリマーが側鎖に感光基を有する
末端ヒドロキシフェニルラグ−ポリシロキサンであるこ
とが確認される。
These results confirm that the above polymer is a terminal hydroxyphenylrag-polysiloxane having a photosensitive group in the side chain.

つぎに本発明の末端ヒドロキシフェニルラダーポリシロ
キサンの製法を実施例にもとすいて説明するが、本発明
はかかる実施例のみに限定されるものではない。
Next, the method for producing the terminal hydroxyphenyl ladder polysiloxane of the present invention will be explained using Examples, but the present invention is not limited to these Examples.

参考例1 フェニルトリクロロシラン(C,HsSiCj!5)1
05.8g(0,50モル)およびビニルトリクロロシ
ラン(CH2=CH−3iC1,*)8.1g(0,0
50モル)をジエチルエーテル200m1に溶解させた
溶液を攪拌機および温度計を取付け、水浴で冷却された
21の4つロフラスコ内のイオン交換水1000xfの
中に攪拌しながら温度を10℃以下に保持して約3時間
かけて徐々に滴下して加水分解を行なった。そののち液
温を室温にもどし、さらに30分間攪拌し、加水分解反
応を完結させた。
Reference example 1 Phenyltrichlorosilane (C, HsSiCj!5) 1
05.8 g (0.50 mol) and 8.1 g (0.0 mol) of vinyltrichlorosilane (CH2=CH-3iC1,*)
A solution of 50 mol) dissolved in 200 ml of diethyl ether was attached to a stirrer and a thermometer, and the temperature was kept below 10°C while stirring into 1000xf of ion-exchanged water in a 21 4-bottle flask cooled in a water bath. Hydrolysis was carried out by gradually dropping the solution over a period of about 3 hours. Thereafter, the liquid temperature was returned to room temperature and stirred for an additional 30 minutes to complete the hydrolysis reaction.

えられた2層に分離した反応液からエーテル層を分取し
たのち、イオン交換水で中性になるまで数回水洗した。
The ether layer was separated from the resulting two-layered reaction solution and washed several times with ion-exchanged water until it became neutral.

該中間体は低分子量のため、適当な沈澱剤がないので減
圧下で溶剤を留去して、白色粉末として回収した。
Since the intermediate has a low molecular weight and there is no suitable precipitating agent, the solvent was distilled off under reduced pressure and the intermediate was recovered as a white powder.

えちれた白色粉末を赤外分光法で分析したところ、34
00cm””に5i−OHの吸収ピークが、さらにジャ
ーナル・オプ・ポリマー・サイエンス(1963年刊)
C−1巻、83真に記載されているようなS i −0
−S iの逆対称伸縮振動に帰属する吸収ピークが11
35cm−’と1045c漏伺に、またC1.=CH−
にもとすく吸収ピークが1270cz−’に観測された
When the white powder was analyzed by infrared spectroscopy, it was found that 34
The absorption peak of 5i-OH is found at
S i -0 as described in Volume C-1, 83
-The absorption peak attributed to the antisymmetric stretching vibration of Si is 11
35cm-' and 1045c, and C1. =CH-
An absorption peak was observed at 1270 cz-'.

これらの結果からえられた白色粉末が側鎖にビニル基を
有する末端ヒドロキシフェニルラグ−型シロキサンであ
ることを確認した。
From these results, it was confirmed that the white powder obtained was a terminal hydroxyphenyl rag-type siloxane having a vinyl group in the side chain.

また該粉末は溶融温度が約90℃で、分子量が約150
0のものであった。
The powder has a melting temperature of about 90°C and a molecular weight of about 150°C.
It was 0.

参考例2〜6 第1表に示す配合量で参考例1と同じ方法で中間体を作
製した。えられた中間体は、赤外分光法によって側鎖に
感光基を有する末端ヒドロキシフェニルラグ−型シロキ
サンであることを確認した。
Reference Examples 2 to 6 Intermediates were produced in the same manner as in Reference Example 1 using the amounts shown in Table 1. The obtained intermediate was confirmed by infrared spectroscopy to be a terminal hydroxyphenyl rag-type siloxane having a photosensitive group in the side chain.

えられた中間体はいずれも約90℃で溶融し、分子量は
約1500であった。
All of the obtained intermediates melted at about 90°C and had a molecular weight of about 1500.

実施例1 還流冷却器、攪拌機、温度計を取付は フラスコに参考例1でえられた中間体10.c9シンン
30tlを入れて溶解しクロロギ酸エチル0,1.を加
え、その均一層を約130℃で3時間反応させた。
Example 1 A reflux condenser, a stirrer, and a thermometer were attached to the flask, and the intermediate 10 obtained in Reference Example 1 was placed in the flask. Add 30 tl of c9 thin, dissolve and add ethyl chloroformate 0.1. was added, and the homogeneous layer was reacted at about 130° C. for 3 hours.

反応終了後溶液を冷却し、10倍体積量のメタノール中
に注いで白色沈殿をえた。えられた白色沈澱はアスピレ
ータ−1ついでロータリーポンプを用いて減圧乾燥し、
収量を測定したところ約9gであった。
After the reaction was completed, the solution was cooled and poured into 10 times the volume of methanol to obtain a white precipitate. The obtained white precipitate was dried under reduced pressure using an aspirator and a rotary pump.
When the yield was measured, it was about 9 g.

つぎにえられた白色粉末を赤外分析法で分析したところ
、3400c瀧−1に5i−Offの吸収ピークが、ま
た5i−0−Siの逆対称伸縮振動に帰属する吸収ピー
クが1135cg−’と1045cz−’とに、またC
H,= C)l−にもとづく吸収ピークが1270cm
−’に観測された。参考例でえちれた白色粉末に比較し
て3400cx””の吸収ピークの相対強度は減少し、
1135cz−’と1045cm−’の二つの吸収ピー
クのくびれは深くなったが、12フ0cjI−’の吸収
ピークの変化は認められなかった。
Next, when the obtained white powder was analyzed by infrared analysis, an absorption peak of 5i-Off was found at 3400c Taki-1, and an absorption peak attributable to the antisymmetric stretching vibration of 5i-0-Si was found at 1135cg-' and 1045cz-', and C
The absorption peak based on H, = C) l- is 1270 cm
−' was observed. Compared to the white powder obtained in the reference example, the relative intensity of the absorption peak at 3400cx"" decreased,
The necks of the two absorption peaks at 1135cm-' and 1045cm-' became deeper, but no change was observed in the absorption peak at 12f0cjI-'.

これらの結果により、えられた白色粉末が側鎖にビニル
基を有する末端ヒドロキシフェニルラグ−ポリシロキサ
ンであることを確認した。
From these results, it was confirmed that the obtained white powder was a terminal hydroxyphenylrag-polysiloxane having a vinyl group in the side chain.

該ポリマーの分子量は測定したところ約25000で加
熱して溶融せず、熱重量測定(窒素雰囲気下、昇温速度
10℃/分)を行なったところ、458℃で重量減少が
みちれた。
The molecular weight of the polymer was measured to be about 25,000, and it did not melt when heated, and thermogravimetric measurement (in a nitrogen atmosphere, temperature increase rate of 10°C/min) showed a significant weight loss at 458°C.

また該ポリマーのトルエン溶t(15重量%)の粘度は
、約5ePでこの溶液をスピンナーを用いて回転数約2
000rp曽でガラス基板上に塗布したところ、約2μ
瀧の薄膜かえられた。
The viscosity of the polymer dissolved in toluene (15% by weight) is about 5eP, and the solution is spun at about 2 rotations using a spinner.
When coated on a glass substrate at 000 rpm, it was approximately 2μ
Taki's thin film has been changed.

実施例2〜12 @2表に示す配合量で実施例1の方法にしたがって本発
明のシリコーン化合物を製造した。えちれたシリコーン
化合物は赤外分光法により分析したところ側鎖に感光基
を有する末端ヒドロキシフェニルラグーボ+1シロキサ
ンであることがわかった・ えられたシリコーン化合物の分子量、トルエン15重景
%溶液の粘度、熱重量およびガラス基板上の回転塗布膜
の膜厚を実施例1の方法にしたがって測定した。その結
果を第2表に示す。
Examples 2 to 12 Silicone compounds of the present invention were produced according to the method of Example 1 using the amounts shown in Table @2. The obtained silicone compound was analyzed by infrared spectroscopy and was found to be a terminal hydroxyphenylragubo+1 siloxane having a photosensitive group in the side chain. Molecular weight of the obtained silicone compound, 15% solution in toluene The viscosity, thermogravimetry, and thickness of the spin-coated film on the glass substrate were measured according to the method of Example 1. The results are shown in Table 2.

比較例1 耐熱性高分子材料であるポリイミドに、感光性を付与し
た感光性耐熱材料を以下のように製造した。
Comparative Example 1 A photosensitive heat-resistant material in which photosensitivity was imparted to polyimide, which is a heat-resistant polymer material, was produced as follows.

温度計、攪拌機、窒素導入管、塩化カルシウム管を配置
した100tlの4つロア?スコに、4,4′−ジ7ミ
7ノフェニルエーテル2 g(0,01モル)と乾燥し
たN−メチル−2−ピロリドン(以下、Nl4Pという
)15gをよく混合した。えられた溶液に3.3’、4
.4’−ベンゾフェノンテトラカルボン酸二無水物の3
.22゜(0,61モル)を加え、25℃で4時間攪拌
することによりポリアミド酸をえた。
100 tl four lowers equipped with a thermometer, stirrer, nitrogen inlet pipe, and calcium chloride pipe? 2 g (0.01 mol) of 4,4'-di7mi7nophenyl ether and 15 g of dried N-methyl-2-pyrrolidone (hereinafter referred to as Nl4P) were thoroughly mixed in a Scoop. 3.3', 4 to the resulting solution
.. 4'-benzophenone tetracarboxylic dianhydride 3
.. 22° (0.61 mol) was added and stirred at 25°C for 4 hours to obtain polyamic acid.

上記ポリアミド酸溶液に、2−(アジリジニル)エチル
メタクリレートの3,1g(0,02モル)を加え、3
0°Cで4時間反応させることによって感光性耐熱材料
を製造した。
Add 3.1 g (0.02 mol) of 2-(aziridinyl)ethyl methacrylate to the above polyamic acid solution,
A photosensitive heat-resistant material was produced by reacting at 0°C for 4 hours.

この感光性耐熱材料は実施例1と同様の方法で熱重量測
定(、窒素雰囲気下、昇温速度10℃/分)を行なった
ところ、400℃で重量減少がみられた。
When this photosensitive heat-resistant material was subjected to thermogravimetric measurement in the same manner as in Example 1 (in a nitrogen atmosphere, at a heating rate of 10°C/min), a weight loss was observed at 400°C.

また該ポリマーの15重量%NMP溶液の粘度は約10
00cPでこの溶液をスピンナーを用いて回転数的20
00rpmでガラス基板上に塗布したところ、約5[発
明の効果1 上記のように本発明の方法によると耐熱性が良好でしか
も光重合性を有する末端ヒドロキシフェニルラグ−ポリ
シロキサンを容易に製造しうるという効果を奏する。
Further, the viscosity of a 15% by weight NMP solution of the polymer is about 10
This solution was spun at 20 rpm using a spinner at 00 cP.
When coated on a glass substrate at 0.00 rpm, approximately It has a soothing effect.

Claims (1)

【特許請求の範囲】[Claims] (1)フェニルトリクロロシランおよび一般式( I )
:▲数式、化学式、表等があります▼( I ) (式中、Xは水素原子、メチル基、エチル基またはフェ
ニル基、nは0〜4の整数を示す)で表わされる化合物
を共加水分解することによりえられた中間体を、触媒と
してクロロギ酸エステル類で縮合重合させることにより
側鎖に感光基を有する末端ヒドロキシフェニルラダーポ
リシロキサンの製法。
(1) Phenyltrichlorosilane and general formula (I)
:▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) Co-hydrolysis of a compound represented by A method for producing a terminal hydroxyphenyl ladder polysiloxane having a photosensitive group in the side chain by condensation polymerizing the intermediate obtained by using a chloroformic acid ester as a catalyst.
JP12191985A 1985-06-05 1985-06-05 Production of hydroxyphenyl-terminated ladder polysiloxane Pending JPS61278532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12191985A JPS61278532A (en) 1985-06-05 1985-06-05 Production of hydroxyphenyl-terminated ladder polysiloxane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12191985A JPS61278532A (en) 1985-06-05 1985-06-05 Production of hydroxyphenyl-terminated ladder polysiloxane

Publications (1)

Publication Number Publication Date
JPS61278532A true JPS61278532A (en) 1986-12-09

Family

ID=14823157

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12191985A Pending JPS61278532A (en) 1985-06-05 1985-06-05 Production of hydroxyphenyl-terminated ladder polysiloxane

Country Status (1)

Country Link
JP (1) JPS61278532A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03207719A (en) * 1990-01-10 1991-09-11 Mitsubishi Electric Corp Hydroxyphenyl-terminated ladder polysiloxane for semiconductor and production of hydroxyphenyl-terminated ladder polysiloxane having high purity
WO1999003911A1 (en) * 1997-07-17 1999-01-28 Institute Of Chemistry, Chinese Academy Of Sciences Tube-like organosilicon polymers and the preparation and uses thereof
WO1999003910A1 (en) * 1997-07-17 1999-01-28 Institute Of Chemistry, Chinese Academy Of Sciences Tube-like organosilicon polymeric complexes and the method for producing the same
CN103588806A (en) * 2013-11-14 2014-02-19 青岛驰科工业技术有限公司 Preparation method of flame-retardant organosilicone acrylate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859222A (en) * 1981-10-03 1983-04-08 Japan Synthetic Rubber Co Ltd Organopolysilsesquioxane and its production
JPS59213727A (en) * 1983-05-17 1984-12-03 Mitsubishi Electric Corp Manufacture of hydroxyphenyl-terminated ladder polysiloxane

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5859222A (en) * 1981-10-03 1983-04-08 Japan Synthetic Rubber Co Ltd Organopolysilsesquioxane and its production
JPS59213727A (en) * 1983-05-17 1984-12-03 Mitsubishi Electric Corp Manufacture of hydroxyphenyl-terminated ladder polysiloxane

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03207719A (en) * 1990-01-10 1991-09-11 Mitsubishi Electric Corp Hydroxyphenyl-terminated ladder polysiloxane for semiconductor and production of hydroxyphenyl-terminated ladder polysiloxane having high purity
WO1999003911A1 (en) * 1997-07-17 1999-01-28 Institute Of Chemistry, Chinese Academy Of Sciences Tube-like organosilicon polymers and the preparation and uses thereof
WO1999003910A1 (en) * 1997-07-17 1999-01-28 Institute Of Chemistry, Chinese Academy Of Sciences Tube-like organosilicon polymeric complexes and the method for producing the same
CN103588806A (en) * 2013-11-14 2014-02-19 青岛驰科工业技术有限公司 Preparation method of flame-retardant organosilicone acrylate

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