JPS6127212A - Mold for synthetic resin - Google Patents
Mold for synthetic resinInfo
- Publication number
- JPS6127212A JPS6127212A JP14859084A JP14859084A JPS6127212A JP S6127212 A JPS6127212 A JP S6127212A JP 14859084 A JP14859084 A JP 14859084A JP 14859084 A JP14859084 A JP 14859084A JP S6127212 A JPS6127212 A JP S6127212A
- Authority
- JP
- Japan
- Prior art keywords
- mold
- synthetic resin
- film
- ethylene
- mold release
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
Abstract
Description
【発明の詳細な説明】
本発明は樹脂成形品との離形性が優れ、しかも鏡面性の
良い樹脂成形品を得ることができる合成樹脂成形用型に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mold for synthetic resin molding that has excellent mold release properties from resin molded products and can produce resin molded products with good specularity.
合成樹脂の成形において、成形品を型から取り出す場合
、エポキシ樹脂、不飽和ポリエステル樹脂、フェノール
樹脂等のように強い接着性を有するものは型からの離型
性が悪い。In molding synthetic resins, when removing a molded article from a mold, materials with strong adhesive properties such as epoxy resins, unsaturated polyester resins, and phenol resins have poor releasability from the mold.
このような場合成形用型に離型剤を塗布する方法が一般
的であるが、成形品に離型剤によるくもりが発生したり
、十分な鏡面が得られないことが多い。In such cases, a method of applying a mold release agent to the mold is common, but the molded product often becomes cloudy due to the mold release agent, and a sufficient mirror surface cannot be obtained.
特に合成樹脂よりなる光学部品を成形する場合には、ガ
ラス等のすぐれた鏡面性を有する型を用い、この型のも
つ鏡面性を成形品に転写させることが考えられる。Particularly when molding optical parts made of synthetic resin, it is conceivable to use a mold having excellent specularity, such as glass, and to transfer the specularity of this mold to the molded product.
しかしながら、例えばエポキシ樹脂成形品とガラス型の
場合、両者の密着力が強いので、エポキシ樹脂硬化後そ
の成形品はガラス型から容易に離型しない。However, in the case of an epoxy resin molded article and a glass mold, for example, the adhesion between the two is strong, so that the molded article is not easily released from the glass mold after the epoxy resin is cured.
またエポキシ樹脂の成形収縮による応力のためガラス型
の方に割れが発生することが多い。Furthermore, cracks often occur in the glass mold due to stress caused by molding shrinkage of the epoxy resin.
かかる合成樹脂成形品と成形用型との離型を良くするた
め前記のように型に離型剤を塗布する方法があるが、こ
の方法では離型剤が成形品に転写されることにより成形
品にくもりが発生するので、光学部品としては側底満足
しうるものは得られない。In order to improve the mold release between such synthetic resin molded products and the molding mold, there is a method of applying a mold release agent to the mold as described above, but in this method, the mold release agent is transferred to the molded product, thereby preventing molding. Since the product becomes cloudy, it is not possible to obtain an optical component that satisfies the bottom of the product.
本発明はかかる欠点を改良すべく鋭意検討してなされた
もので、合成樹脂成形品と型との離型を容易にし、かつ
型のもつ鏡面性を成形品に転写できる離型膜を型に形成
することにより、くもり等のないすぐれた鏡面性を有す
る合成樹脂成形品を得ることを目的としたものである。The present invention was developed after intensive study to improve these drawbacks, and includes a mold release film that facilitates the release of the synthetic resin molded product from the mold and that can transfer the specularity of the mold to the molded product. The purpose of this method is to obtain a synthetic resin molded product having excellent specularity without clouding or the like.
本発明は、合成樹脂と接する型面にプラズマ重合法によ
りエチレン、ブチレン、インブチレン、ペンテン、2−
メチルペンテン、4弗化エチレン、モノクロロ三弗化エ
チレン、弗化 ビニリデン、六弗化プロピレン、ヘキサ
メチルジシロキサン、テトラメチルジシロキサン等の有
機化合物モノマーを用いて薄膜を形成した合成樹脂成形
用型に関するものであり、得られた薄膜は型と強固に密
着している。In the present invention, ethylene, butylene, imbutylene, pentene, 2-
Related to a synthetic resin mold in which a thin film is formed using organic compound monomers such as methylpentene, ethylene tetrafluoride, ethylene monochlorotrifluoride, vinylidene fluoride, propylene hexafluoride, hexamethyldisiloxane, and tetramethyldisiloxane. The obtained thin film adhered firmly to the mold.
本発明の型に合成樹脂を注入し成形すると、合成樹脂と
型に形成された薄膜との密着力は型と薄膜との密着力に
比較してはるかに小さいので、この薄膜は成形時におい
て離型膜として働く利点がある。When synthetic resin is injected into the mold of the present invention and molded, the adhesion between the synthetic resin and the thin film formed on the mold is much smaller than the adhesion between the mold and the thin film, so this thin film separates during molding. It has the advantage of acting as a mold film.
光学部品のうち光記憶媒体用基板のように鏡面性が強く
要求される合成樹脂成形品の場合には型の有する鏡面性
か全く損なわれず成形品に転写されるので特に有効であ
る。Among optical parts, this method is particularly effective in the case of synthetic resin molded products that strongly require specularity, such as substrates for optical storage media, because the specularity of the mold is transferred to the molded product without being impaired at all.
本発明に於て、合成樹脂成形用型の成形面に形成される
N膜の材料として有機化合物が使用されるが、ヘキサメ
チレンンシロキサン、テトラメチルジシロキサン、四弗
化エチレン、モノクロロ三弗化エチレン、六弗化プロピ
レン、エチレン、ブチレン、イソブチレン、ペンテン、
2−メチルペンテン等が合成樹脂との離型性及び”金属
、ガラス、セラミック等からなる型との密着性において
すぐれている。In the present invention, an organic compound is used as a material for the N film formed on the molding surface of a synthetic resin molding die, and examples include hexamethylenesiloxane, tetramethyldisiloxane, ethylene tetrafluoride, and monochlorotrifluoride. Ethylene, propylene hexafluoride, ethylene, butylene, isobutylene, pentene,
2-methylpentene and the like have excellent mold releasability from synthetic resins and adhesion to molds made of metal, glass, ceramic, etc.
これらのモノマーのプラズマ重合膜は架橋構造を有する
ため100℃以上の耐熱性を有し、三次元硬化型合成樹
脂成形用型の離型剤としての必要特性を満す利点を有し
ている。Since the plasma polymerized film of these monomers has a crosslinked structure, it has heat resistance of 100° C. or more, and has the advantage of satisfying the necessary characteristics as a mold release agent for a three-dimensionally curable synthetic resin molding mold.
かかる薄膜の厚さは成形品の材質、用途により異なるが
一般的には500〜3000Aが適当である。The thickness of such a thin film varies depending on the material and purpose of the molded product, but generally 500 to 3000 Å is appropriate.
厚さが500A以下では使用できる回数が少くなってし
まう、又300OA以上では厚み分布精度が悪くなり適
当で゛ない。If the thickness is less than 500A, the number of times it can be used will be reduced, and if it is more than 300OA, the thickness distribution accuracy will deteriorate, making it unsuitable.
本発明において、合成樹脂の成形方法は圧縮成形、移送
成形、射出成形、注型成形等いかなる方法でも良い。In the present invention, the synthetic resin may be molded by any method such as compression molding, transfer molding, injection molding, cast molding, etc.
合成樹脂も特に制限されるものではないが型に使用され
る材料と密着性の大きいエポキシ樹脂、フェノール樹脂
、不飽和ポリエステル樹脂、ジアリルフタレート樹脂等
を使用する場合本発明は効果的で、エポキシ樹脂、不飽
和ポリエステル樹脂等の紫外線硬化型樹脂等により光学
部品を成形する場合において特に有効である。Synthetic resins are not particularly limited, but the present invention is effective when using epoxy resins, phenol resins, unsaturated polyester resins, diallyl phthalate resins, etc. that have high adhesion to the material used for the mold. This method is particularly effective when molding optical components using ultraviolet curable resins such as unsaturated polyester resins.
次に本発明の実施例を示す。Next, examples of the present invention will be shown.
施例1
鏡面を有するガラス板にプラズマ重合によりヘキサメチ
ルノシロキサン重合薄膜を形成する。Example 1 A hexamethylnosiloxane polymeric thin film was formed on a glass plate having a mirror surface by plasma polymerization.
重合条件は次の通りである。装置;島津製作所製プラズ
マ重合装置LCVD−12型、前処理;洗剤で洗浄、乾
燥した後酸素プラズマエツチングを行った。The polymerization conditions are as follows. Apparatus: Plasma polymerization apparatus model LCVD-12 manufactured by Shimadzu Corporation. Pretreatment: After washing with detergent and drying, oxygen plasma etching was performed.
使用モアマーガス;ヘキサメチルジシロキサン(Ald
ric−11社試薬)、真空度;最初に0.005 T
orrまで真空排気後0.2Torrにする、電力;1
00W、重合時開;3分。Moamar gas used; hexamethyldisiloxane (Ald
RIC-11 reagent), vacuum degree: 0.005 T initially
After evacuation to 0.2 Torr, power: 1
00W, open during polymerization; 3 minutes.
得られた薄膜の厚みは800Aであった。次にエルマ光
学(株)製接触角測定装置を用い、純水を使用して接触
角の測定を行った結 果を第−表に示す。The thickness of the obtained thin film was 800A. Next, the contact angle was measured using pure water using a contact angle measuring device manufactured by Elma Optical Co., Ltd. The results are shown in Table 1.
形成されたシリコン重合膜により、ガラス板が疎水化し
ているこ とが証明された。It was proven that the silicone polymer film formed made the glass plate hydrophobic.
第 −表
測定値はn:6の平均値
実施例2
鏡面を有するガラス板にプラズマ重合によりエチレン重
合膜を形成する。Table 1: Measured values are average values for n:6 Example 2 An ethylene polymer film is formed on a glass plate having a mirror surface by plasma polymerization.
重合条件は次の通りである。装置;島津製作所製プラズ
マ重合装置、前処理;洗剤で洗浄、乾燥した後酸素プラ
ズマエツチング、使用モノマーガス;エチレン、真空度
;最初に0.005 Torrまで真空排気後0.5T
orrにする・電力;50W、重合時間;3分。The polymerization conditions are as follows. Equipment: Plasma polymerization equipment manufactured by Shimadzu Corporation, Pretreatment: Oxygen plasma etching after cleaning with detergent and drying, Monomer gas used: Ethylene, Degree of vacuum: First evacuated to 0.005 Torr, then 0.5T
orr power: 50 W, polymerization time: 3 minutes.
得られた薄膜の厚みは1500Aであった。次にエルマ
光学(株)製接触角測定装置を用い、純水を使用して接
触角の測定を行った結果を第二表に示す。The thickness of the obtained thin film was 1500A. Next, the contact angle was measured using pure water using a contact angle measuring device manufactured by Elma Optical Co., Ltd. The results are shown in Table 2.
形成されたエチレン重合膜により、ガラス板が疎水化し
ていることが証明された。It was proven that the formed ethylene polymer film made the glass plate hydrophobic.
第二表Table 2
Claims (1)
離型膜、含弗素系離型膜又はポリオレフィン系離型膜が
形成されていることを特徴とする合成樹脂成形用型。A mold for synthetic resin molding, characterized in that a silicon-containing mold release film, a fluorine-containing mold release film, or a polyolefin-based mold release film is formed on the mold surface in contact with the synthetic resin by a plasma polymerization method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14859084A JPS6127212A (en) | 1984-07-19 | 1984-07-19 | Mold for synthetic resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14859084A JPS6127212A (en) | 1984-07-19 | 1984-07-19 | Mold for synthetic resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6127212A true JPS6127212A (en) | 1986-02-06 |
JPH0430891B2 JPH0430891B2 (en) | 1992-05-25 |
Family
ID=15456149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14859084A Granted JPS6127212A (en) | 1984-07-19 | 1984-07-19 | Mold for synthetic resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6127212A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0841140A2 (en) * | 1996-11-12 | 1998-05-13 | Bae Hyeock Chun | Method of enhancing releasing effect of mould using low temperature plasma processes |
WO2000044544A1 (en) * | 1999-01-29 | 2000-08-03 | Daikin Industries, Ltd. | Fluorine-containing elastomer moldings and method for preparing the same |
WO2002005972A2 (en) * | 2000-07-17 | 2002-01-24 | Acmos Chemie Gmbh & Co. | Method for producing a permanent demoulding layer by plasma polymerization on the surface of a moulded-part tool |
JP2010253775A (en) * | 2009-04-23 | 2010-11-11 | Towa Corp | Molding equipment and molding method |
JP2010537867A (en) * | 2007-09-06 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | Method of forming a mold and method of forming an article using such a mold |
US20170225364A1 (en) * | 2015-07-30 | 2017-08-10 | Tanazawa Hakkosha Co., Ltd. | Resin molding mold |
US11130701B2 (en) | 2016-09-30 | 2021-09-28 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
US11148225B2 (en) | 2013-12-17 | 2021-10-19 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
US11697178B2 (en) | 2014-07-08 | 2023-07-11 | Corning Incorporated | Methods and apparatuses for laser processing materials |
US11713271B2 (en) | 2013-03-21 | 2023-08-01 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
-
1984
- 1984-07-19 JP JP14859084A patent/JPS6127212A/en active Granted
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0841140A3 (en) * | 1996-11-12 | 2000-02-23 | Bae Hyeock Chun | Method of enhancing releasing effect of mould using low temperature plasma processes |
EP0841140A2 (en) * | 1996-11-12 | 1998-05-13 | Bae Hyeock Chun | Method of enhancing releasing effect of mould using low temperature plasma processes |
WO2000044544A1 (en) * | 1999-01-29 | 2000-08-03 | Daikin Industries, Ltd. | Fluorine-containing elastomer moldings and method for preparing the same |
WO2002005972A2 (en) * | 2000-07-17 | 2002-01-24 | Acmos Chemie Gmbh & Co. | Method for producing a permanent demoulding layer by plasma polymerization on the surface of a moulded-part tool |
WO2002005972A3 (en) * | 2000-07-17 | 2002-09-26 | Acmos Chemie Gmbh & Co | Method for producing a permanent demoulding layer by plasma polymerization on the surface of a moulded-part tool |
US6949272B2 (en) | 2000-07-17 | 2005-09-27 | Acmos Chemie Gmbh & Co. | Method for producing a permanent demoulding layer by plasma polymerization on the surface of a moulded-part tool, a moulded-part tool produced by said method and the use thereof |
JP2010537867A (en) * | 2007-09-06 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | Method of forming a mold and method of forming an article using such a mold |
JP2010253775A (en) * | 2009-04-23 | 2010-11-11 | Towa Corp | Molding equipment and molding method |
US11713271B2 (en) | 2013-03-21 | 2023-08-01 | Corning Laser Technologies GmbH | Device and method for cutting out contours from planar substrates by means of laser |
US11148225B2 (en) | 2013-12-17 | 2021-10-19 | Corning Incorporated | Method for rapid laser drilling of holes in glass and products made therefrom |
US11556039B2 (en) | 2013-12-17 | 2023-01-17 | Corning Incorporated | Electrochromic coated glass articles and methods for laser processing the same |
US11697178B2 (en) | 2014-07-08 | 2023-07-11 | Corning Incorporated | Methods and apparatuses for laser processing materials |
US11648623B2 (en) | 2014-07-14 | 2023-05-16 | Corning Incorporated | Systems and methods for processing transparent materials using adjustable laser beam focal lines |
US11773004B2 (en) | 2015-03-24 | 2023-10-03 | Corning Incorporated | Laser cutting and processing of display glass compositions |
US20170225364A1 (en) * | 2015-07-30 | 2017-08-10 | Tanazawa Hakkosha Co., Ltd. | Resin molding mold |
US10773426B2 (en) * | 2015-07-30 | 2020-09-15 | Tanazawa Hakkosha Co., Ltd. | Resin molding mold |
US11130701B2 (en) | 2016-09-30 | 2021-09-28 | Corning Incorporated | Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots |
US11542190B2 (en) | 2016-10-24 | 2023-01-03 | Corning Incorporated | Substrate processing station for laser-based machining of sheet-like glass substrates |
Also Published As
Publication number | Publication date |
---|---|
JPH0430891B2 (en) | 1992-05-25 |
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