JPS61143760A - Reduction projecting and exposing device - Google Patents
Reduction projecting and exposing deviceInfo
- Publication number
- JPS61143760A JPS61143760A JP60271455A JP27145585A JPS61143760A JP S61143760 A JPS61143760 A JP S61143760A JP 60271455 A JP60271455 A JP 60271455A JP 27145585 A JP27145585 A JP 27145585A JP S61143760 A JPS61143760 A JP S61143760A
- Authority
- JP
- Japan
- Prior art keywords
- image
- pattern
- reduction
- projected
- evaluation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7092—Signal processing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Holders For Sensitive Materials And Originals (AREA)
Abstract
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は縮小投影露光装置の改良に関するものである。[Detailed description of the invention] [Field of application of the invention] The present invention relates to an improvement of a reduction projection exposure apparatus.
従来、縮小投影露光装置で形成される縮小像は全く観測
されず、焦点合せやパターン検出においてレジスト像形
成によってその調整程度を評価してきた。このため、長
時間を費いやすとともに間接的であることより高精度が
望めず、常に特殊な技術者による評価が必要となるとい
う欠点がある。Conventionally, a reduced image formed by a reduced projection exposure apparatus has not been observed at all, and the degree of adjustment has been evaluated by forming a resist image during focusing and pattern detection. For this reason, it is disadvantageous in that it is time consuming, and because it is indirect, high precision cannot be expected, and evaluation by a special engineer is always required.
このような従来装置を示す例として、例えば、特開昭４
７−２６１４８号公報がある。As an example of such a conventional device, for example,
There is a publication No. 7-26148.
したがって、本発明の目的は、上述の欠点を除くために
縮小投影像を直接検出可能にし得る縮小投影露光装置を
提供することにある。SUMMARY OF THE INVENTION Therefore, it is an object of the present invention to provide a reduction projection exposure apparatus that can directly detect a reduction projection image in order to eliminate the above-mentioned drawbacks.
上記の目的を達成するために１本発明においては評価用
パターンとこのパターン上に形成される縮小投影像とを
拡大するための拡大光学系と、検出系とを具備させて縮
小投影露光装置を構成したことを特徴としている。In order to achieve the above object, in the present invention, a reduction projection exposure apparatus is equipped with an enlargement optical system for enlarging an evaluation pattern and a reduction projection image formed on the pattern, and a detection system. It is characterized by its composition.
以下１本発明を実施例によって詳細に説明する。 The present invention will be explained in detail below using examples.
−第１図は本発明による縮小投影露光装置における載物
台付近の基本構成を示したものである。同図において、
装置は載物台３上に設置された試料２と同様に、遮光材
より成る評価用パターン１２とこれを支持する光透過可
能な光学材料からなる基板４とにより構成されるマスク
１７を有し、さらに１反射ミラー５と、評価用パターン
１２と同一平面上に結像された縮小投影像と評価用パタ
ーン１２とを拡大するための光学系６とを有する。この
光学系６で拡大された合成光学像を像検出器７で電気信
号に変換し、パターン位置検出等の処理回路に転送する
。第１図には、拡大光学系６に凸レンズ、および像検出
器７にテレビカメラを使用した例を示している。さらに
、同図において、■は縮小投影レンズ、８はテレビカメ
ラ用信号ケーブル、９は試料２の真空チャック用エアホ
ース、１０はレーザ測定用ミラーおよび、１１は測長レ
ーザ光を示す。- FIG. 1 shows the basic configuration of the vicinity of the stage in a reduction projection exposure apparatus according to the present invention. In the same figure,
Similar to the sample 2 placed on the stage 3, the apparatus has a mask 17 composed of an evaluation pattern 12 made of a light-shielding material and a substrate 4 made of an optical material that can transmit light. , further includes one reflecting mirror 5 and an optical system 6 for enlarging the reduced projection image formed on the same plane as the evaluation pattern 12 and the evaluation pattern 12 . The composite optical image magnified by the optical system 6 is converted into an electrical signal by the image detector 7, and transferred to a processing circuit for pattern position detection and the like. FIG. 1 shows an example in which a convex lens is used as the enlarging optical system 6, and a television camera is used as the image detector 7. Furthermore, in the same figure, ▪ indicates a reduction projection lens, 8 indicates a signal cable for a television camera, 9 indicates an air hose for vacuum chuck of the sample 2, 10 indicates a mirror for laser measurement, and 11 indicates a length measurement laser beam.
上述した構成の縮小投影露光装置における焦点合せやパ
ターン検出の較正は以下のようにして行なわせることが
できる。縮小投影レンズＩで形成される縮小投影像を評
価用パターン１２上に投影すると、第２図に示したよう
な光学像がテレビカメラ７上に結像する。同図において
、１３が評価パターン１２の像であり、１４が縮小投影
像である。この像より、ＸＸ′上の位置と光量との関係
（信号）が第３図のように求まり、この信号より。Calibration of focusing and pattern detection in the reduction projection exposure apparatus having the above-described configuration can be performed as follows. When the reduced projection image formed by the reduced projection lens I is projected onto the evaluation pattern 12, an optical image as shown in FIG. 2 is formed on the television camera 7. In the figure, 13 is an image of the evaluation pattern 12, and 14 is a reduced projection image. From this image, the relationship (signal) between the position on XX' and the amount of light is determined as shown in FIG. 3, and from this signal.
焦点合せやパターン検出器の較正が可能となる。This enables focusing and pattern detector calibration.
すなおち、第３図において、縮小投影像Ｉ４にょるエッ
ヂ１６の形状が評価用パターン像Ｉ３にょるエッヂＩ５
の形状に最も近くなるように、縮小投影レンズ１の光軸
方向に縮小投影レンズ１を含む鏡筒系あるいは載物台３
を調整し、ベストフォカス点を決定する６また。第２お
よび第３図の信号処理により縮小投影像１４の重心位置
と評価用パターン１３の重心位置とが求まり、さらに、
移動台３の設定誤差量まで含めた縮小投影像１４の位置
が算出される。これにより、従来より用いられている検
出器、たとえば、被縮小投影パターン上で縮小投影レン
ズを通して得られる試料上の位置検出用マークと被縮小
投影パターンとの位置誤差等を検出するためのパターン
検出器の精度や誤差等が測定でき、このパターン検出器
の欠陥等を検査することができる。In other words, in FIG. 3, the shape of the edge 16 in the reduced projection image I4 is the same as that of the edge I5 in the evaluation pattern image I3.
The lens barrel system including the reduction projection lens 1 or the stage 3 is moved in the optical axis direction of the reduction projection lens 1 so that the shape is closest to the shape of the reduction projection lens 1.
6. Also adjust and determine the best focus point. Through the signal processing shown in FIGS. 2 and 3, the center of gravity of the reduced projection image 14 and the center of gravity of the evaluation pattern 13 are determined, and further,
The position of the reduced projection image 14 including the setting error amount of the movable table 3 is calculated. As a result, conventionally used detectors, such as pattern detection for detecting positional errors between the position detection mark on the sample obtained through the reduction projection lens on the reduction projection pattern and the reduction projection pattern, can be used. The precision and errors of the pattern detector can be measured, and defects in the pattern detector can be inspected.
以上述べたように１本発明によって、レジストへの露光
・現像およびＮＩＩ察等を用いず、短時間で、かつ、精
度よく焦点合せおよびパターン検出器の較正などを行う
ことができる。As described above, according to the present invention, it is possible to perform focusing, pattern detector calibration, etc. with high precision in a short time without using resist exposure/development and NII detection.
第１図は本発明による縮小投影露光装置の載物台付近の
基本構成図、第２図は第１ｒｇＩの装置において評価用
パターンと縮小投影像とを重ね合せ拡大してテレビカメ
ラ上に結像した時の像関係図、第３図は第２図のＸＸ′
軸上の光量の変化を電気信号に変換した時の波形図であ
る。
１・・・縮小投影レンズ、２・・・試料、３・・・載物
台。
４・・・光透過基板、５・・反射ミラー、６・・・光学
系（凸レンズ）、７・・・像検出器（テレビカメラ）、
８・・・テレビカメラ用信号ケーブル、９・・・真空チ
ャック用エアホース、１０・・・レーザ測定用ミラー、
】１・・・測長レーザ光、１２・・・評価用パターン、
１３・・・評価用パターン像、１４・・・縮小投影像、
１７・・・マスク。
縮小援影露尤哀１
′１ｌＩ５１ 力
】
コ
１゜
−Ｃ，ＩＣＩ−Fig. 1 is a basic configuration diagram of the stage near the stage of the reduction projection exposure apparatus according to the present invention, and Fig. 2 shows the evaluation pattern and the reduction projection image in the apparatus of 1rgI superimposed and enlarged to form an image on the television camera. The image relationship diagram when
FIG. 3 is a waveform diagram when a change in the amount of light on the axis is converted into an electrical signal. 1... Reduction projection lens, 2... Sample, 3... Mounting stage. 4... Light transmission substrate, 5... Reflection mirror, 6... Optical system (convex lens), 7... Image detector (TV camera),
8... Signal cable for TV camera, 9... Air hose for vacuum chuck, 10... Mirror for laser measurement,
]1...Length measurement laser beam, 12...Evaluation pattern,
13...Evaluation pattern image, 14...Reduced projection image,
17...Mask. Shrinking Enhancing Shadow 1 '1lI51 Power] KO1゜-C, ICI-
Claims (1)
材によるパターンを光透過可能な基板上に形成した評価
用試料と、上記パターンの像および上記パターン上に形
成される縮小投影像の光学像を拡大するための光学系と
、上記光学系によって拡大された拡大光学像を検出する
ための検出器とを具備してなることを特徴とする縮小投
影露光装置。1. An evaluation sample in which a pattern made of a light-shielding material is formed on a light-transmissible substrate placed on a stage that is to hold an object to be exposed, an image of the pattern, and a sample formed on the pattern. 1. A reduction projection exposure apparatus comprising: an optical system for enlarging an optical image of a reduced projection image; and a detector for detecting an enlarged optical image enlarged by the optical system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60271455A JPS61143760A (en) | 1985-12-04 | 1985-12-04 | Reduction projecting and exposing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60271455A JPS61143760A (en) | 1985-12-04 | 1985-12-04 | Reduction projecting and exposing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61143760A true JPS61143760A (en) | 1986-07-01 |
| JPH0227811B2 JPH0227811B2 (en) | 1990-06-20 |
Family
ID=17500268
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60271455A Granted JPS61143760A (en) | 1985-12-04 | 1985-12-04 | Reduction projecting and exposing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61143760A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0318960U (en) * | 1989-06-29 | 1991-02-25 | ||
| US5153916A (en) * | 1990-04-20 | 1992-10-06 | Hitachi, Ltd. | Method and apparatus for detecting focal plane |
| JPH08167558A (en) * | 1994-12-15 | 1996-06-25 | Nikon Corp | Projection aligner |
-
1985
- 1985-12-04 JP JP60271455A patent/JPS61143760A/en active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0318960U (en) * | 1989-06-29 | 1991-02-25 | ||
| US5153916A (en) * | 1990-04-20 | 1992-10-06 | Hitachi, Ltd. | Method and apparatus for detecting focal plane |
| JPH08167558A (en) * | 1994-12-15 | 1996-06-25 | Nikon Corp | Projection aligner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0227811B2 (en) | 1990-06-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3109852B2 (en) | Projection exposure equipment | |
| US4614432A (en) | Pattern detector | |
| GB1501908A (en) | Automatic positioning of image and/or object surfaces in optical apparatus | |
| US7471372B2 (en) | Exposure apparatus and production method of device using the same | |
| JPS61143760A (en) | Reduction projecting and exposing device | |
| US4580167A (en) | Device for and method of producing photographs of controlled contrast | |
| JPH0612753B2 (en) | Pattern detection method and apparatus thereof | |
| JPH01228130A (en) | Process and device of exposure | |
| JPH0612754B2 (en) | Projection exposure device | |
| JPS61230114A (en) | Optical device for alignment | |
| JP3448663B2 (en) | Projection exposure equipment | |
| JPH0634560A (en) | Surface condition inspector | |
| JPS60249325A (en) | Projection exposure apparatus | |
| JPS57200029A (en) | Exposing device | |
| JPH0547631A (en) | Method and apparatus for semiconductor exposure | |
| KR100221022B1 (en) | Apparatus for optical lithography | |
| JP2653356B2 (en) | Projection exposure method | |
| JP2634791B2 (en) | Projection type alignment method and device | |
| JPS5886638U (en) | Reduction projection exposure equipment | |
| JPH0547091B2 (en) | ||
| JPH01242905A (en) | Method for measuring actual size of visual device | |
| JP2840303B2 (en) | Exposure equipment | |
| JPS61231719A (en) | Pattern detector | |
| JPS6266112A (en) | Position detector | |
| JP2698329B2 (en) | Projection type alignment method and device |