JPS60116151A - Sealing method of electronic parts - Google Patents
Sealing method of electronic partsInfo
- Publication number
- JPS60116151A JPS60116151A JP22529983A JP22529983A JPS60116151A JP S60116151 A JPS60116151 A JP S60116151A JP 22529983 A JP22529983 A JP 22529983A JP 22529983 A JP22529983 A JP 22529983A JP S60116151 A JPS60116151 A JP S60116151A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- powder
- film
- ultraviolet ray
- bonded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
Abstract
Description
【発明の詳細な説明】
〔技術分野〕
この発明は、防湿絶縁処理される各種の電子部品または
ハイブリッドICなどに対する、防湿絶縁処理のだめの
封止法に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for sealing a moisture-proof insulated container for various electronic components or hybrid ICs to be subjected to moisture-proof insulation.
コンデンサ、抵抗アレイあるいは各種の電子部品を塔載
したハイブリッドICなどでは、防湿絶縁するために樹
脂被覆して、これらを保護している。Hybrid ICs and the like mounted with capacitors, resistor arrays, and various electronic components are protected by resin coating for moisture-proof insulation.
防湿絶縁の方法とし−Cは、従来、熱硬化性または光硬
化性、あるいは光、熱併用硬化性の液状の樹脂フェスを
ディッピング(浸漬法)などの方法で電子部品の表面に
塗着し、加熱または紫外線照射によって、あるいは加熱
、紫外線の両方を併用して樹脂ケ硬化させる方法か、あ
るいは、熱硬化性のエポキシ樹脂粉末を電子部品に付着
させ、加熱して被膜形成し、硬化させる方法が行なわれ
てきたO
これらの方法のうち、液状樹j指を用いる方法において
、熱硬化性樹脂を使用した場合、樹脂を完全に硬化させ
るのに、室温〜180℃の温度で30分から3時間を要
するため、非常に生産性が悪かった。これに対し、光硬
化性樹脂を使用した場合、紫外線を数秒から数分照射す
るだけで樹脂を硬化させることができるので、生産性は
著しく向上するが、一方で、たとえば第1図に見るよう
に、トランジスタなどの塔載部品lと基板2との隙間部
分、すなわち光の届かない影の部分4に樹脂3が入り込
んで、その樹脂が紫外線照射後も硬化しないという欠点
があった。また、液状の熱硬化性および光硬化性樹脂に
は、共通して次のような欠点があった。すなわち、■液
状モノマーは異臭があるうえ、人体に悪影響を与えるも
のが多く、作業環境がよくない、■フェノは引火爆発の
危険性があり、取扱いに注意を要する、といつだ作業上
、公害上の問題の他に、■フェノの垂れなどにより塗膜
の偏肉が大きくなり、均一な塗1漢が望めないのである
。Moisture-proof insulation method-C has conventionally applied a thermosetting, photocurable, or photo- and thermocurable liquid resin face to the surface of electronic components using a method such as dipping. There is a method of curing the resin by heating or ultraviolet irradiation, or a combination of both heating and ultraviolet rays, or a method of attaching thermosetting epoxy resin powder to electronic parts, heating it to form a film, and curing it. Among these methods, when thermosetting resin is used in the method using liquid resin, it takes 30 minutes to 3 hours at a temperature of room temperature to 180°C to completely cure the resin. As a result, productivity was extremely low. On the other hand, when using a photocurable resin, the resin can be cured by irradiating it with ultraviolet light for only a few seconds to a few minutes, which significantly improves productivity. However, on the other hand, as shown in Figure 1, Another disadvantage is that the resin 3 gets into the gap between the mounted component l such as a transistor and the substrate 2, that is, the shadow area 4 where light does not reach, and the resin does not harden even after being irradiated with ultraviolet rays. Furthermore, liquid thermosetting and photocurable resins have the following drawbacks in common. In other words, ■Liquid monomers have a strange odor and many have a negative impact on the human body, making them a poor working environment.■Pheno has the risk of ignition and explosion and must be handled with care. In addition to the above problems, (1) The thickness of the paint film becomes uneven due to dripping of the phenol, making it impossible to achieve uniform coating.
他方、熱硬化性樹脂粉末を用いた場合、前記のような問
題は解決されるが、樹脂の硬化に130゜〜180℃で
30分から3時間という長い時間を要し、しかも性能の
高い加熱炉が必要とされるのである。On the other hand, when thermosetting resin powder is used, the above problems are solved, but it takes a long time to cure the resin at 130° to 180°C, from 30 minutes to 3 hours, and it requires a high-performance heating furnace. is needed.
この発明は、上記従来の方法による欠点を解消し、硬化
速度が速く、均一な塗膜の得られる間服封止法を提供す
ることを目的とする。It is an object of the present invention to provide a temporary sealing method which eliminates the drawbacks of the above-mentioned conventional methods, has a fast curing speed, and provides a uniform coating film.
〔発明の開示J
上記の目的を達成するために、この発明にかかる電子部
品の封止法は、光硬化性樹脂粉末を電子部品に付着させ
て被膜を形成し、紫外線照射により硬化させることを特
徴とし、これにより、防湿絶縁処理の所要時間を大幅に
短縮し、塗膜が均一な信頼性の高い防湿絶縁を行なおう
とするものである。[Disclosure of the Invention J In order to achieve the above object, the method for encapsulating electronic components according to the present invention involves attaching photocurable resin powder to electronic components to form a film, and curing it by irradiation with ultraviolet rays. This feature aims to significantly shorten the time required for moisture-proof insulation treatment and provide highly reliable moisture-proof insulation with a uniform coating.
この発明において用いられる光硬化性樹脂粉末は、紫外
線を照射することによって重合硬化する樹脂の中で、融
点あるいは軟化温度が50°〜150℃のものであれば
よく、通常の粉砕法などによって50〜350メツシユ
の粒度になるよう粉砕して用いる。一般には、エポキシ
アクリレート、ウレタンアクリレート、不飽和ポリエス
テル樹脂にベンゾインアルキルエーテル、ペンジルジメ
チルケタール、ベンゾフェノンなどの光重合開始剤を含
有する組成物である。この光硬化性樹脂組成物に広さら
に心安に応じて、上記の樹脂と相溶性を有する線状高分
子化合物、たとえば、メタクリル樹脂。The photocurable resin powder used in this invention may be a resin that polymerizes and hardens by irradiation with ultraviolet rays, as long as it has a melting point or softening temperature of 50°C to 150°C. It is used after being ground to a particle size of ~350 mesh. Generally, it is a composition containing a photopolymerization initiator such as benzoin alkyl ether, penzyl dimethyl ketal, benzophenone, etc. in epoxy acrylate, urethane acrylate, or unsaturated polyester resin. A linear polymer compound having compatibility with the above resin, such as methacrylic resin, may be used in this photocurable resin composition.
メタクリルーヌナレン共重合体、ポリスチレン。Methacryl-nunalene copolymer, polystyrene.
エチルセルロース、ポリカーボネート、炭化水素樹脂斤
どを含んでもよく、また、その他に、重合性モノマー、
充てん材、顔料、カップリング剤などを含んでもよい。May contain ethyl cellulose, polycarbonate, hydrocarbon resin, etc. In addition, polymerizable monomers,
It may also contain fillers, pigments, coupling agents, etc.
次に、この発明にかかる電子部品の封止法について説明
する。Next, a method for sealing an electronic component according to the present invention will be explained.
電子部品表面への樹脂粉末の付着は、公知の粉体塗装法
と同様の方法で実施することができる。The resin powder can be attached to the surface of the electronic component by a method similar to a known powder coating method.
すなわち、流動浸漬法、浴射法、散布法、静電乾式吹付
は法などがある。そこで、流動浸漬法を例にとって説明
すると、まず、樹脂粉末の軟化温度以上に電子部品を予
熱し、この部品を流動槽に導き、槽内で電子部品の表面
に樹脂を付着させる。Namely, there are the fluidized immersion method, the bath spray method, the spray method, and the electrostatic dry spray method. Therefore, to explain the fluidized dipping method as an example, first, an electronic component is preheated to a temperature higher than the softening temperature of the resin powder, the component is introduced into a fluidized bath, and the resin is adhered to the surface of the electronic component within the bath.
均一な塗膜が得′チれるまで、場合によっては数回予熱
、浸漬をくり返す必要がある。所要の膜厚で均一な樹脂
被膜が形成されたら、次に紫外線を照射して樹脂を硬化
させる。この場合、電子部品の温度が高い間に紫外線を
照射すれば、硬化反応を完結させる上で好都合である。In some cases, it may be necessary to repeat preheating and dipping several times until a uniform coating is obtained. Once a uniform resin film with the required thickness is formed, the resin is cured by irradiation with ultraviolet rays. In this case, it is convenient to irradiate the electronic component with ultraviolet light while the temperature of the electronic component is high to complete the curing reaction.
紫外線の光源には、超高圧水銀灯、高圧水銀灯、低圧水
銀灯、カーボンアークランプ、キセノンアークランプ、
メタルハライドランプなどを使用することができる。紫
外線の強度は、特に限定されないが、硬化の作業上30
−160W/cmOものが好ましい。1]1脂に対して
10〜20cmの距離から紫外線を照射すれば、硬化は
通常数秒以内に完了する。したがって、熱硬化性樹脂を
用いた従来法に比べて高速硬化が達J戎されることにな
る。Ultra-high-pressure mercury lamps, high-pressure mercury lamps, low-pressure mercury lamps, carbon arc lamps, xenon arc lamps,
A metal halide lamp or the like can be used. The intensity of the ultraviolet rays is not particularly limited, but for curing work 30
-160 W/cmO is preferred. 1] If one resin is irradiated with ultraviolet rays from a distance of 10 to 20 cm, curing is usually completed within a few seconds. Therefore, faster curing can be achieved compared to conventional methods using thermosetting resins.
なお、この発明においては、必要に応じて粉末付着後に
後加熱してもよく、予熱を省略して後加熱のみによるこ
ともできる。In the present invention, post-heating may be performed after powder adhesion, if necessary, or preheating may be omitted and only post-heating may be performed.
この:a明にかかるfli 脂封止では粉末樹脂を用い
ているので、第2図に見るように、光の照たらない隙間
部分4に樹脂3が入り込まず、未硬化部分を残す恐れが
ない。また、塗布後の樹脂が垂れて塗膜の厚みを不均一
にするようなこともない。Since a powdered resin is used in the resin sealing, the resin 3 will not enter the gap 4 where light does not shine, and there is no risk of leaving uncured parts as shown in Figure 2. . Moreover, the resin after application does not drip and the thickness of the coating film becomes uneven.
ところで、IC,トランジスタまたはダイオードなどの
半導体素子の封止やハイブリッドICの部分封止、ある
いはコンデンサの末端封口などを行なう場合には、粉末
樹脂をあらかじめ封止箇所の形状に合わせるなど、所望
の形状にタブレット化しておくと便利である。この発明
にがかる封止法は、かかる用途にも適用することができ
る。従来、この用途には熱硬化性のエポキシ樹脂粉末を
押しかためだタブレットが用いられてきたが、その場合
だと樹脂の硬化[120・〜180℃の温度で30分〜
20時間という長い時間を要していた。By the way, when sealing semiconductor elements such as ICs, transistors, or diodes, partially sealing hybrid ICs, or sealing the ends of capacitors, it is necessary to adjust the powder resin to the shape of the sealing area in advance so that the desired shape is achieved. It is convenient to have it on a tablet. The sealing method according to the present invention can also be applied to such uses. Conventionally, tablets for pressing thermosetting epoxy resin powder have been used for this purpose;
It took a long time, 20 hours.
その点で、この発+J1にかかる封止法は著しい硬化時
間の短縮を実現している。In this respect, the sealing method according to this release +J1 achieves a remarkable shortening of the curing time.
(実施例1)
エポキシアクリレート(昭和的分子社製、リポキシVR
−60)100 g(S (重量部、以F同U ) 。(Example 1) Epoxy acrylate (manufactured by Showa-tei Bunsoku Co., Ltd., Lipoxy VR)
-60) 100 g (S (parts by weight, hereinafter F).
ベンジルジメチルケタール2部を暗所で加熱混合して、
均一にベンジルジメチルケタールを溶解させたのち、こ
れを低温で20()メツシュ程1隻の粒度に粉砕して、
融点が80”Cの粉体塗料を得プζ。Heat and mix 2 parts of benzyl dimethyl ketal in a dark place.
After uniformly dissolving benzyl dimethyl ketal, it is ground at a low temperature to a particle size of about 20 mesh.
A powder coating with a melting point of 80"C was obtained.
上記の粉末樹脂を用い、前記したように通常の流動浸漬
法によってノ・イブリッドICの全面に1fi4脂被膜
を形成したのち、80W/c!nの高圧水銀灯で、10
cmの距離から5秒間紫外線ケ照射し、硬い樹脂被膜を
得た。Using the above powdered resin, a 1fi4 resin film was formed on the entire surface of a hybrid IC by the usual fluidized dipping method as described above, and then 80W/c! n high pressure mercury lamp, 10
Ultraviolet rays were irradiated for 5 seconds from a distance of cm to obtain a hard resin coating.
硬化後、ハイブリッドIC上に塔載された部品を取り外
したところ、部品と基板との約0.255mの隙間には
樹脂が入り込んでおらず、液状樹脂の場合と異なり、樹
脂の未硬化部分は存在しなかった。After curing, when we removed the parts mounted on the hybrid IC, we found that no resin had entered the approximately 0.255 m gap between the parts and the board, and unlike in the case of liquid resin, the uncured parts of the resin It didn't exist.
(実施例2)
実施例1で使用した樹脂粉末と同じ樹脂から、通常の方
法で樹脂タブレットを作製し、マイラーコンデンサの末
端封口に用いた。(Example 2) A resin tablet was prepared in a conventional manner from the same resin as the resin powder used in Example 1, and used for sealing the end of a Mylar capacitor.
まず、前記タブレットをコンデンサの末端に置き、13
0℃に加熱して粉末を溶融させ、均一な被膜としたのち
、実施例1と同様に、BOW/amの高圧水銀灯で10
σの距離から10秒間紫外線を照射して樹脂を硬化させ
た。First, place the tablet at the end of the capacitor and
After heating to 0°C to melt the powder and form a uniform coating, it was heated to 0°C using a high-pressure mercury lamp of BOW/am for 10 min.
The resin was cured by irradiating ultraviolet light for 10 seconds from a distance of σ.
完成品を分解したところ、液状樹脂ではフィルム(マイ
ラー膜)間に樹脂の浸透が見られ、その部分は光照射後
も未硬化であったが、この発明和かかる実施同品では、
樹脂の浸透は見られなかった。When the finished product was disassembled, it was found that the liquid resin had penetrated between the films (Mylar film), and that part remained uncured even after irradiation with light.
No resin penetration was observed.
上にみたように、この発明の封止法では、樹脂が光の照
たらない隙間などに入り込んだり、塗布後に垂れて塗1
模の厚みを不均一にするようなことがないので、1漢厚
が均一で、信頼性の高い防湿絶縁を行なうことができる
。また、樹脂の硬化時間が非常に短かいため、著しく生
産性を高めることができる。As seen above, in the sealing method of this invention, the resin may get into gaps where light does not shine, or it may drip after application and cause damage to the coating.
Since there is no possibility of uneven thickness of the insulation, it is possible to provide highly reliable moisture-proof insulation with uniform thickness. Furthermore, since the curing time of the resin is very short, productivity can be significantly increased.
第1図は従来法によるハイブリッドICの封止断面図、
第2図はこの発り]にがかる一実施例を示し、かかる封
止法によって防湿絶縁されたハイブリッドICの断面図
である。
1・・・ミニモールドトランジスタ 2・・・ハイブリ
ッドIC基& 3・・・1酎脂被1戻 4・・・1涼間
代理人 弁理士 松 本 武 彦
第1図
第2図Figure 1 is a cross-sectional view of a hybrid IC sealed by the conventional method.
FIG. 2 shows an embodiment of this invention, and is a sectional view of a hybrid IC which is moisture-proof and insulated by this sealing method. 1...Mini-mold transistor 2...Hybrid IC base & 3...1 Liquor coating 1 return 4...1 Suzuma agent Patent attorney Takehiko Matsumoto Figure 1 Figure 2
Claims (2)
を形成し、紫外線照射により硬化させることを特徴とす
る電子部品の封止法。(1) A method for sealing electronic components, which comprises attaching photocurable resin powder to electronic components to form a film, and curing the film by irradiating it with ultraviolet rays.
の範囲@1項記載の電子部品の封止法。(2) The method for sealing an electronic component according to claim 1, wherein the photocurable resin powder is in the form of a doublet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22529983A JPS60116151A (en) | 1983-11-28 | 1983-11-28 | Sealing method of electronic parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22529983A JPS60116151A (en) | 1983-11-28 | 1983-11-28 | Sealing method of electronic parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60116151A true JPS60116151A (en) | 1985-06-22 |
Family
ID=16827156
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22529983A Pending JPS60116151A (en) | 1983-11-28 | 1983-11-28 | Sealing method of electronic parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60116151A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62133741A (en) * | 1985-12-06 | 1987-06-16 | Nec Corp | Package |
JPS62133742A (en) * | 1985-12-06 | 1987-06-16 | Nec Corp | Package |
JPS62252955A (en) * | 1985-09-05 | 1987-11-04 | Nec Corp | Package |
CN104185370A (en) * | 2013-05-24 | 2014-12-03 | 索尼电子(无锡)有限公司 | Substrate with waterproof layer, forming method of waterproof layer in substrate, and processing equipment |
-
1983
- 1983-11-28 JP JP22529983A patent/JPS60116151A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62252955A (en) * | 1985-09-05 | 1987-11-04 | Nec Corp | Package |
JPS62133741A (en) * | 1985-12-06 | 1987-06-16 | Nec Corp | Package |
JPS62133742A (en) * | 1985-12-06 | 1987-06-16 | Nec Corp | Package |
JPH0516667B2 (en) * | 1985-12-06 | 1993-03-05 | Nippon Electric Co | |
JPH0521342B2 (en) * | 1985-12-06 | 1993-03-24 | Nippon Electric Co | |
CN104185370A (en) * | 2013-05-24 | 2014-12-03 | 索尼电子(无锡)有限公司 | Substrate with waterproof layer, forming method of waterproof layer in substrate, and processing equipment |
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