JPS5958431A - Photoengraving method of lithographic printing plate - Google Patents

Abstract

PURPOSE:To obtain a lithographic printing plate having high performance without pollution, etc. by exposing an image on a photosensitive lithographic printing plate, and developing the same with a developing soln. then washing the plate with repeatedly used washing water and further treating the plate with water contg. a surfactant. CONSTITUTION:A photosensitive layer contg. a photosensitive compsn. (salt of condensate of rho-diazodiphenyl amine and formaldehyde and hexafluorophosphate) is formed on a base having a hydrophilic surface such as paper, cellulose film or the like to prepare a photosensitive lithographic printing plate. The resulting photosensitive lithographic printing plate is exposed with an image and is developed with a developing soln. consisting of sodium carbonate, triethanol amine, benzyl alcohol, sodium sulfite, water, etc. The plate is then washed with repeatedly used washing water and is further treated with water contg. a surfactant (e.g.; polyoxyethylene alkyl ether or the like), whereby the intended original plate for printing is obtd.

Description

[Detailed description of the invention]

Pre-5 sensitized Pl plate having a photosensitive composition on a non-explosion support
ate, and hereafter referred to as the FPS version. ) This relates to a plate-making method for obtaining a lithographic printing plate from 1 to 10 times after development, and in particular, to a plate-making method that includes a washing step with repeatedly used washing water after development. To obtain a J paulownia master plate from a 9L rice, PS plate, imagewise expose the 28 plate, then develop it with a developer, wash it with plenty of running water, and then treat it with a plate stabilizer.ゎYuru gum pull)
The method to do this was widely known. This was unavoidable because a high-concentration Tsutomi developer was used, and the purpose was to prevent the performance of the lithographic printing plate from deteriorating due to incomplete washing with water. . Lion,
The use of multiple amounts of washing water only increases costs and should be avoided as much as possible in recent years when there is a strong concern about depletion of water sources and environmental pollution due to wastewater. Therefore, a treatment method that omitted water washing was developed in 1983.
This method is described in Japanese Patent Application No. 21, etc., and is partially implemented by using a dilute developer having a small processing capacity. However, the plate-making method that omit this water-washing step causes significant contamination due to the developer, desensitizing solution, resin commonly known from PS plates, etc. used in the plate-making method that omits this washing step, resulting in great inconvenience in maintenance and cleaning. In addition, the water washing step is the top and most important step in the 28 plate development process, and eliminating this water washing step does not improve the performance of the printing plate, and there is a strong tendency for surface printing stains and poor printing ink adhesion. In particular, if a developer with a high concentration of developer components, that is, a high throughput, is used, it will cause poor ink adhesion such as strong cam penetration, and print stains in non-image areas. Furthermore, if the plate making method does not include a water washing process between the development process and the gumming process, the plate preservation agent will rapidly become fatigued as the processing area of the PS plate increases because the washing process will not cause γ-7. . Fatigue here refers to the developer components in the current 1 station solution, the dissolved 1
mm fat, popular ingredients, developer replenisher, antifoaming agent, fatigue developer, etc. are brought in and mixed in by the 8th plate. When the fatigue of the plate surface protection material progresses and exceeds a certain limit (referred to as life span), the plate-made lithographic AIIIJ plate begins to cause problems with the tatami mats that cause uneven ink application and stains. If such a problem occurs, it is important to not only remove printed matter or printing paper, but also remove the
Many times the plates are wasted, and the countermeasures against this problem are a big problem for the keban technique name. As mentioned above, conventional plate making methods have problems with drainage, difficulty in maintenance, printing plate performance, and longevity of plate preservation agents66.
We have discovered and proposed a plate-making method that comprehensively composes 7'Jf (Referenced by the applicant on September 20, 1982, patent application number Sho, title of the invention [Plate-making method for lithographic printing plates]) ). That is, in a method for making a photosensitive lithographic printing plate having a photosensitive composition on a support having a hydrophilic surface, after imagewise exposing the photosensitive lithographic printing plate and developing it with a developer,
This is a plate-making method characterized by washing with repeatedly used washing water and further treating with a specific plate surface protectant. However, it has been found that this plate-making method has drawbacks such as failure to build up the development ink five times, and border bleeding due to the protective material on the plate surface during correction processing. In such a case, it is necessary to wash off the plate preservative from the surface of the lithographic printing plate with water, and then perform development ink application and correction processing. Furthermore, if plate making is completed without applying a specific plate surface protectant treatment after developing and rinsing with repeatedly used rinsing water, the resulting lithographic printing plate will suffer from fatigue of the rinsing water and poor ink adhesion. This results in stronger printing stains. Therefore, an object of the present invention is to provide a method for making a PS plate with less waste water, less pollution, and less environmental pollution. Another object of the present invention is d) to provide a PS plate making method which is advantageous in maintenance such as maintenance and cleaning of the machine. Another object of the invention is to provide a simple I)8 plate making method. Still another object of the present invention is to provide a method for making a PS plate, which allows a printing plate with good printing plate performance to be obtained even with a developer having a high alkaline concentration and a moderate throughput. Another object of the present invention is to apply urine ink and correction treatment 84 after development with a slight amount of washing water.
An object of the present invention is to provide a method for making a PS plate for use in a JJ' basket. In addition to non-invention, another purpose is to develop a PS that can be commercialized comprehensively by reducing washing water, reducing environmental pollution, increasing the life of the processing solution, reducing plate-making costs, and improving printing plate performance. The objective is to provide a plate making method. As a result of intensive research aimed at achieving the above object, Mokuming and others have come up with the present invention. That is, the present invention rli
In a method for making a photosensitive lithographic printing plate having a photosensitive composition on a support having a water-resistant surface, the photosensitive lithographic printing plate is exposed to light one image, developed with a developer, and then repeatedly used. This is a plate-making method that involves rinsing with rinsing water and further treating with water containing a surfactant. I would like to tell you about the future of F1 Honkomyo. It is a dimensionally stable plate-like material that is used as a support for the PS plate used in the present invention, and is used as a support for a pressed rice printing plate, and a trap is placed thereon. Examples of such supports include paper, paper laminated with plastics (e.g. polyethylene, polypropylene, polystyrene, etc.), aluminum (also referred to as aluminum alloy), zinc, copper, iron, and kettle handle plates such as multilayer gold maple plates. , for example, cellulose diacetate, cellulose triacetate, cellulose phlopionate, cellulose butyrate, cellulose sulfate butyrate, cellulose nitrate, polycorchinone terephthalate, polyethylene, polystyrene, polypropylene, 7-tricarbonate, polyvinylacemer, etc. A composite sheet in which an aluminum sheet is bonded to a polyethylene terephthalate film such as that described in No. 48-18327, 11 p. The support of the PS plate according to the present invention has a hydrophilic surface.In the present invention, the hydrophilic surface means that when the lithographic printing halftone plate is attached to a printing machine and printing is performed with standard flexibility. , refers to a surface that has the property of repelling printing ink when dampened with dampening water.The surface of the support is preferably subjected to a hydrophilic treatment. For example, in the case of a support having a glass surface, chemical treatment, electric discharge treatment, flame treatment, sieved rice treatment, high frequency treatment, glow discharge treatment, active 11 plasma treatment, laser treatment, etc. and the method of applying the undercoat layer after these treatments.In addition, in the case of a support with a metal surface, Q, graining treatment, sodium silicate, zirconium fluoride!
472 Immersion treatment in aqueous solutions such as salts and phosphates, plating,
There are coatings, anodizing treatments, etc. Among the supports having a hydrophilic surface as described above, those exhibiting preferable hydrophilicity are those having an aluminum surface which has been subjected to a grain treatment (17) and a ceramic treatment according to necessity. It is a support that completely cures, or an iron plate covered with chrome threads. Photosensitive composition comprising a diazo compound in the photosensitive composition provided on a hydrophilic surface of a support, British Patent No. 1.23
5.281 A. Yohi ITjlJ No. 1,495,861
A photosensitive composition containing an azide compound containing -C as described in each specification, U.S. Patent No. 3.8fiO, 42
No. 6 Specification 1: A photosensitive composition comprising a photocrosslinkable photopolymer as described in US Pat. No. 4,072.52
No. 8 and No. 4 of the same. (Photosensitive compositions containing photopolymerizable photopolymers as described in the specifications of JP-A-56-19063 and JP-A-56-29)
11 described in the specification of No. 250. JP-A-52-62501 $ and JP-A No. 56-11
Examples include halogenated sulfur emulsion compositions as described in the specifications of No. 1852. Among these photosensitive compositions, the photosensitive composition containing a diazo compound has three advantages, such as the storage stability of the photosensitive layer and the development latitude.
) It is preferably used because it has excellent image performance such as image performance, picture night, printing performance such as ink receptivity, oil sensitivity, and abrasion resistance, and low pollution of the developer used. It will be done. Photosensitive compositions containing diazo compounds are divided into negative type and positive type. A negative-type sensitive composition containing a diazo compound is a composition containing a photosensitive diazo compound and preferably a polymer compound. Although it is possible, it is preferable to use an organic solvent iJ.
Salts of diazo resins in the bath, such as p-diazodiphenylamine and formaldehyde, salts of coacetaltehyde and hexafluorophosphoric acid, 2-hydroxy-4-methoxybenzophenone-5-sulfonate, etc. Examples include salt. Examples of molecular compounds include acrylic acid or methacrylic acid copolymers, norotonic acid copolymers, itaconic acid copolymers, 7-noic acid copolymers, cellulose U4 with carphoxol groups in the side chains, Carboxyl group v in the chain
Preferably used are commercially available polyvinyl alcohol derivatives, hydroxyalkyl acrynote or methacrynote copolymers having a carphoxol group in the side chain, unsaturated polyester resins having a carphoxol group, and the like. More preferably, those having a silicic acid value of 10 to 10 are used. 300. More preferably, the structural unit represented by the following general formula <1) described in specification 1 of JP-A No. 1-118802 and the structural unit represented by the following general formula (II) A polymer containing the structural unit shown, a monocylic unit having an aromatic hydroxyl group as described in Japanese Patent Application No. 56-79055, and a structural unit shown in the general formula (previously Polymers are used. R, R. 1 +CHz C+ +CHx c-)
-11 (In the general formula, R1 represents a hydrogen atom or a methyl group, and E
't, vi indicates hydrogen atom, methyl group, ethyl group or thalolmethyl group, 1<, indicates hydrogen atom or methyl group, n! 《　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　” , preferably 0-naphthoquinonediazide compounds. Among the 0-naphthoquinonediazide compounds, especially the 0-naphthoquinonediazide compounds
Naphthoquinone diacid sulfonic acid ester also V”o-
Preference is given to naphthoquinonediacidosulfonic acid esters and the aromatic amine compounds 0-naphthoquinonediazidesulfonic acid amides or 0-naphthoquinonediacidosulfonic acid amides. Preferred hydroxyl compounds include condensation resins with phenolic tocarbonyl group-containing compounds. The phenols include phenol, RiV
Examples of the carbonyl group-containing compound include formaldehyde, and preferred hydroxyl compounds include phenol formaldehyde, Kunzol formaldehyde resin, pyrogallol acetone resin, and resorcin benzaldehyde resin. Typical specific examples of 0-quinonediazide compounds include:
Benzoquinone-(1,2)-diazide sulpone Yarima/
This is naphthoquinone-(1,2)-diazide sulfonic acid tophenol/polmaldehyde resin or Kunzol/
Ester with 1 tablespoon of formaldehyde, JP-A-56-I
L) Naphthoquinone listed in No. 44 and 77
(1,2)-Diazide-(2)=ester of 5-sulfonic acid and resorcinol-benzaldehyde resin, naphthoquinone-(1) as described in U.S. Pat. No. 3,615,709. , 2) Ester of -7 azidosulfonic acid and pyrogallol acetone resin, published in 1988-7
Naphthoquinone listed in Publication No. 6346 - <1
．． 2) Esterification reaction of -7azido(2)-s-sulfonic acid and Vzorcin-pyroga*-Ml, -7 seven-door copolycondensate. Other useful 0-quinonediazide compounds include those obtained by esterifying polyester K o-naph I/quinonediazide sulfonyl chloride having a hydroxyl group at the terminal described in JP-A No. 1-117503; 1977-1
] 33 f35 From what is written in the published gazette p
-A homopolymer of hydroxystyrene or a co-Φ polymer with other copolymerizable monomers is subjected to an esterification reaction with 0-naphthoquinonediazide sulfonyl chloride, as described in Japanese Patent Publication No. 54-29922. Ester of bisphenol formaldehyde resin and 0-quinonediazide sulfonic acid, US 11J Patent No. J+
Condensates of copolymers of alkyl acrylates, acro-ylreoxyalkyl carbonates and hydroxoalkyl acrylates (v-) and 0-quinone diazidesulfonyl chloride described in No. 859 + 099, especially Reaction product of co-integration product of styrene and phenol derivative and 0-quinonediazide sulfonic acid described in Publication No. 49-17481 dC, Komeo Patent No. 3,759,7
Amides of copolymers of p-aminostyrene and other copolymerizable monomers with 0-naphthoquinonediazide sulfone and 0-naphthoquinonediazidecarboxylic acids as described in the specification of No. 11, and Other examples include polyhydroxybenzophenone 〇-Naphthoquinonediazide esterified with sulfonyl chloride. 〇These 0-quinonediazide compounds can be used alone, but they can be mixed with an alkali-soluble resin, and this mixture can be used as a photosensitive layer. It is better to set it as 7. Suitable alkali-soluble resins include phenolic and novohook type phenolic resins, specifically phenol formaldehyde resins,
Sol formaldehyde resin, JP-A-55-57841
The resins include phenol/cresol porumfuldehyde copolycondensate resin as described in Japanese Patent Publication No. Furthermore, as described in Japanese Unexamined Patent Publication No. 1-125806, in addition to the above-mentioned phenol resins, 1-butylphenol formaldehyde resins having 3 to 8 carbon atoms can be used.
It is even more preferable to use a condensate of formaldehyde and phenol or cresol substituted with an alkyl group. The content of the 0-quinonediazide compound is preferably 5 to 80% based on the total solid content of the photosensitive composition,
Particularly preferred is 10 to 50 [i 11%. The content of the alkali-soluble resin is preferably 30 to 90%, particularly preferably 50%, based on the total solid content of the photosensitive composition.
~85% by weight. The photosensitive composition layer can be divided into four layers, and if necessary, additives such as dyes, plasticizers, and components imparting printout performance can be added. Application of the photosensitive composition provided on the support
．． 1 to 7 fl/lrt is preferable, more preferably 0.
5-4. ! iil/rrt. The PS plate thus obtained is exposed through a transparent original to a light source rich in actinic light such as a carbon arc lamp, mercury lamp, metal halide lamp, tungsten lamp, or xenon lamp, and then developed in the dark. The developer used in the present invention varies depending on the type of photosensitive composition used in the PS plate, but preferably contains at least one of an alkaline agent and an organic solvent. Examples of alkali agents include sodium silicate, lithium silicate, lithium silicate, sodium hydroxide, 1V potassium water, lithium hydroxide, ammonium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, and tribasic phosphoric acid. Inorganic alkaline agents, such as potassium, potassium diphosphate, ammonium triphosphate, ammonium diphosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, ammonium carbonate, etc.
Mada is triethanolamine, 7-, cy, or trimethylamine, mono-, di-, or trimethylamine, 7-, diisoglobilamine, n-methylamine, 7)-, cy, or trimethylamine. Exemplary amine compounds include amine, ethynonimine, and ethylenediimine. In particular, when the photosensitive composition provided on the hydrophilic surface of the support contains a negative-working diazo compound (hereinafter referred to as a negative-working zoazo PS plate), the photosensitive composition provided on the hydrophilic surface of the support is Preferably, it is an alkaline aqueous solution with an organic solvent and a solubility of 12% in water at 9°C.
It is preferable that the ink is higher than that in terms of development rate of 1/4 of the 28th plate, improvement in ink receptivity and water retention. Some examples of h6 solvents with a solubility in water of 10% by weight or more at 20°C include, for example, ethyl acetate, propyl acetate, butyl acetate, (+'r: l-fractured amyl, 1"IE Acid pencil, ethyl acetoacetate, ethylene glycol monobutyl acetate, malonic acid, esters of 11%, such as butyl phosphate, ethyl ethyl ketone, mezyl isobutyl ketone, 7 Ketones such as chlorhexanone, ethylene glycol monobutyl ether, ethylene glycol monobutylphenyl ether, ethylene glycol mono-benzyl ether, ethylene glycol mono-n-hexyl ether, ethylene glycol monophenyl ether, glopi V glycol monophenyl ether, benzyl alcohol,
Alcohols such as coatkin ethoxyethanol, methylphenylcarbinol, n-amyl alcohol, methylamyl alcohol, 4-phenyl-]-phthanol, β-phenethyl alcohol, 3-phenyl-1-propatol, xynon, etc. Examples include alkyl Im substituted aromatic hydrocarbons, 5fx halogenated hydrocarbons such as methylene dichloride, ethylene dichloride, and monochlorobenzene. These organic bath mediums may be more than 1 tsubo I. Among the bath media, ethynone glycol monophenyl ether and benzyl alcohol are particularly effective. In addition, the content of 11C in the developer of the organic solvent is preferably 1-weighted to %, particularly 2 to 1%.
More favorable results can be obtained when the amount is 0%. Further, the preferred content of the alkaline agent in the developing agent for negative-working diazo 28 plates is 0.05 to 1% by weight, preferably 0.5 to 2% by weight. Furthermore, it is preferable to contain an anionic surfactant, a water-bathable I11 sulfate, a soluble additive, etc. in the developing solution for the negative-working diazo 28 plate in order to improve the image quality. Examples of the anionic surfactants include higher alcohol sulfate esters, aliphatic alcohol phosphate ester salts, alkylaryl sulfonates, alkylamidosulfonic acid groups, which are described in JP-A-57-5045; Examples include sulfonic acid groups of dibasic fatty acid esters, argylnaphthalene sulfonates, and formaldehyde condensates of alkylnaphthanone sulfonates. Among these, sodium butylnaphthalene sulfonate and sodium butylnaphthalene sulfonate formaldehyde silk hardware are particularly preferred because they have a strong ability to separate the photosensitive composition layer from the hydrophilic surface on the developing surface. The content of these 7-ion surfactants in the developer component is preferably 0.5 to 10%,
It is preferably 1 to 5% by weight. Water-soluble sulfite has the effect of preventing the photosensitive composition from sticking to or remaining on the hydrophilic surface due to side reactions and improving developability.
Specific examples include alkali or alkaline earth metals such as sodium ferrite, potassium sulfite, potassium sulfite, etc. Examples include ItI magnesium sulfate. A preferred content of sulfite in the developer composition is 0. (15~4 car knowledge%, more desirable is 01~
1 car in%. Since the bath additive supports the general understanding of organic solvents having a solubility of 10% or less in water at 9°C, it is preferable to use organic solvents that are more easily soluble in water.
7. It is best to use low molecular weight alcohols, ketones, and lactams. Specifically, for example, methanol, ethanol, propatool, butanol, acetone, methino 1. Ethyl ketone, ethyl glycol 7-methyl ether, ethylene glycol 7-methyl ether, methoxybutanol, ethoxybutanol, 4-methoxy-4
-Methylphthanol, N-methylpyrrolidone and the like are preferred. The amount of the generalizing agent used is 30% in the developer. It is preferable to set the amount to % or more. In addition, when a photosensitive composition containing a positive type diazo compound is provided on the hydrophilic surface of the support (
It is written as s version. ), the developer is preferably an alkaline aqueous bath solution, and is preferably used as an alkaline agent.
Potassium silicate, lithium silicate, sodium silicate, sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium triphosphate, sodium diphosphate, potassium triphosphate, potassium diphosphate, sodium carbonate , potassium carbonate, and the like. Among these, developers containing alkali silicates such as potassium silicate, lithium silicate, and sodium silicate are the most preferred because they have excellent development gradation. In ratio [
5i02 ]/CM) = 0.5 to 1.5 (here (
Si02) and [N1] represent the molar concentration of 5in2 and the molar concentration of the total alkaline pot, respectively. ) and S
A developer containing 0.8 to 8% by weight of to2 is preferably used. Among this alkali silicate composition, especially in terms of molar ratio (5ho2'J/CM) = 0.5 to 0.75
A developer with 5i (h) of 8 to 4% by weight is preferably used because it is easy to neutralize the developer waste solution due to its low concentration; A developer containing 1 to 8% by weight of S02 is preferably used because it has a high buffering power and a high processing capacity. 1977-
By containing at least one of an anionic surfactant and an amphoteric surfactant as described in Japanese Patent Application Laid-open No. 55-95946 and Japanese Patent Application Laid-open No. 56-142528, By incorporating a polyelectrolyte as shown in FIG. The concentration is not particularly limited, but Q, fl is preferably 0.3 to 3% by weight, and particularly 0.Ofl is preferably 6 to 1% by weight. It is preferable that potassium is contained in an amount of mol % or more, since the generation of insoluble matter in the developer is reduced, and it is more preferable that potassium is contained in an amount of 90 mol % or more, and most preferably potassium is contained in an amount of 100 mol %. Photosensitive composition Whether the product is of negative or positive type, the developer used in the present invention may contain an antifoam agent.Suitable antifoam agents include fusisilane compounds. Various conventionally known methods can be used to develop the image-exposed PS plate with the developer described above.Specifically, it is possible to develop the PS plate after image exposure. A method in which the developing solution is exposed to the photosensitive layer of the PS plate through a number of nozzles; How to wipe i, this nll
Examples include a method of rolling a developed image onto the surface of the external light layer (of a PS plate). After applying a developer to the photosensitive layer of the L's plate for 12 minutes, the entire surface of the photosensitive layer can be rubbed with a dry cloth or the like. When developing red H/V, it is possible to increase τ+g as appropriate depending on the developing method described above. - To give an example, for example, in the world 5 image force method by Riku τ\, kei, +
The method of immersing one drop of FiLl sand in a developer solution at a temperature of 1.0°C to 10°C is accelerated. The P S IUi obtained by imagewise exposure and development as described above is then washed with repeatedly used washing water. Here, "repeated use" means that at least a part of the washing water is water that has been used for washing once before, but in the present invention, the entire amount is water that has been used for washing once. Particularly preferred in cases where As for the washing method, treatment methods similar to the above-mentioned developing method can be used, such as immersion, spraying from multiple nozzles, coating and washing with a roller, etc., but residual adhesion remains on the developed planographic printing plate. Since the purpose is to remove the developing solution and the like, it is preferable to use a method of washing with water at a moderate flow rate, such as a method of ejecting water from a large number of nozzles. Once used, the washing water is used as developer acid and photosensitive layer material. Traditionally, the water used for washing every two months has been discarded, which has caused concern as issues such as energy conservation and pollution have been raised. As a result of analyzing and studying the substances that increase and decrease in the rinsing water, we have found that the rinsing water that has been used once can be used repeatedly. In addition, as a washing method, a method in which two or more tanks are substantially separated is used, a method in which washing water is flowed into a tank in the forward or reverse direction of the progress of the lithographic printing plate, etc. is used. Furthermore, by using methods such as purifying the washing water using a solid matter filtration device or a device that separates the five substances in the side mold, washing can be carried out more efficiently and washing can be done using less washing water. T: 31. A preferred method for increasing IJ capacity and further reducing the amount of washing water. It was 17. This is explained in detail in Japanese Patent Application No. 564322RI filed March 26, 1981 (title of the invention [Plate making method and apparatus I]). It is preferable to include the Id of the gods, such as. A preferred diagonal compound is carboxylic acid RCOOH. Sulfonic acid + t80sH, sulfinic acid R802H, phenol Ar0)1, enol RCH=C(OH)R,
', 1,3-diketone type compound q't2t RCO
CH, , COR·, thiophenol Ar5H, imide rtcONl-1cOR', oxime RCH=NOH. Yoshii jb arrow sulfonamide ArSO2NH2, Ar5O
2NHR. Primary and secondary nitro compounds RCH2No2, R2
Organic acids with heptafunctional groups such as CHNO2, lone pairs of electrons such as oxygen atoms, nitrogen atoms, etc.
Examples include compounds having a ligand (Li<and )'< which has an atom having relectron') in the molecule. In addition to monodentate ligands, self-ligands include polydentate ligands such as bidentate ligands. , phosphorus oxyacids such as trimetaphosphoric acid. DJ's ability to reduce the occurrence of suspended matter and sediment in the washing water is achieved by incorporating substances and substances selected from organic compounds other than water, inorganic compounds, etc. into the washing water. It can prevent clogging of nozzles, etc. The rate at which the washing water is circulated, stirred, and ejected from a nozzle or the like is preferably 17/min or more. More preferable (7
It*Fi is 3~5011/min, and the highest is 9. j7-E L. It is 5 to 3 tJ l/min. Furthermore, the method of gushing. There are various ways to indirectly clean the lithographic printing plate by spraying it onto opposing rollers that pass through the lithographic printing plate, but the method (in which the lithographic printing plate is sprayed directly onto the plate) has a cleaning efficiency of 1.
□711 Therefore, preferred 1° In the present invention, the water-washed lithographic printing plate is treated with water containing a surfactant. In the present invention, the water containing the surfactant is a component of the developer that accumulates in the water wash 7 that is carried by the lithographic printing plate.
It is believed that it has the effect of stabilizing the dispersion of dissolved photosensitive compositions and preventing them from sticking to the planographic printing plate surface even after drying. Examples of such surfactants include polyoxyethylene alkyl ether 11, phoriogysoethylene alkylphenyl ethers, polyoxyethylene polystyrylphenyl ether, polyoxoethino/polyoxypropylene alkyl ether, glycerin fatty acid partial esters, and sorbitan fatty acid moiety. Ester, pentaerythritol fatty acid partial ester 1, fluorinone glycol mono H'a fatty acid M ester, sucrose partial fatty acid ester, polyoxyethylene/ethinone rubitan fatty acid partial ester, polyoxyethylene norbitol fatty acid partial ester Class, polyethylene glycol month '71 Blj r;r
! Ester I=, polyglycerin fat m partial esters, polyoxyethylene chloride castor oil, polyoxyethyl chloride V
Nonionic surfactants such as glycerin fatty acid partial esters, fatty acid jetanolamide M, N, N-bis-2-hydroxyalkylamines, polyoxyethylene alkylamine, triethanolamine fatty acid ester, trialkylamine oxide, etc. , fatty acid sulfonate, avicenoic acid salts, hydroxyalkanesulfone W salts, alkanesulfonic acid salts, dialkyl sulfonate acid ester salts, linear alkylbenzene sulfonates, branched chain alkylbenzene sulfone + yia, alkyl naphtha V sulfo 7M salts ff4, alkyl phenoxy polyquinoethynone globil sulfonates, polyoxy 7 ethylene alkyl sulfophenyl ethers, N-methyl-
N-onyltaurine sodium salts, N-alkyl sulfosuccinic acid monoamide disodium salts, petroleum sulfonates, Tsukuda TM castor oil, (Iif 11 & oxfoot oil), sulfate ester salts of fatty acid alkyl esters, alkyl sulfate esters Salts, polyoxyethylene alkyl ether sulfate ester salts, fatty acid monoglyceride Nisdel sulfate 4%, holoxyethylene alkylphenyl ether polarized C acid ester salts, polyoxyethynone styryl phenyl ether sulfate ester salts, alkyl phosphate ester salts, polyoxyethylene Alkyl ether/v
lW ester Hanyo, polyoxyethylene alkyl phenyl ether phosphate ester Q ffi, /(f L
'Hmm, anhydrous male iMJ! , partially saponified compounds of □, partially saponified compounds of olefin-anhydride maleic compound, anionic surfactants such as naphtha V sulfonate formalin catalysts, alkyl amine tri-V alkyl Amine salts, cationic compounds such as polyethinone polyamine conductors, carboquine betaines,
Examples include amphoteric surfactants such as amide 7 carboxylic acids, sulfobetaines, amine sulfate esters, and imidane 1-nones. Among the above-mentioned surfactants, polyoxyethylene can also be read as polyoxyalkylene such as polyoxymethylene, polyoxypropylene, and polyoxyethylene, and these surfactants are also included. The same applies to the following explanations. Among these, polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyoxyethinone alkyl ethers, polyoxene Ethylene Jζ1) Mexyprobynone alkyl ethers, 1-non-1 non-fatty acid partial esters, norhythane fatty acid partial esters” J+,
Pentaerythritol fat M Ml< fraction, Esters, polyoxyethylene castor L? , dialkyl sulfosuccinates, alkylbenzene sulfonic acids, alkyl naphthalates, alkyl sulfate ester salts, fat c4il esters, alkyl phosphate ester 11 naphtha V sulfonate formalin condensate, Bo! J Me-"xyezalene alkyl sulfate ester salts, polyoxyethyl alkyl amine salts, alkyl amine salts, and quaternary ammonium salts are used in the image area of lithographic printing plates (σ), which also tends to suppress the deterioration of greasy adhesion. Preferably, in cl), temopolyoxyethylene alkylphenyl ethers, polyoxyethylene polystyrylphenyl ethers, polyoxyethylene alkyl ethers, glycerin nh' fatty acid partial esters, sorbitan fatty acid partial esters, polyoxyethynone sol Vikun fatty acid partial esters, pentaerythritol fat F [partial esters, globi V glycol]
Particularly preferred are M/)N BRR esters, polyethylene glycol fatty acid esters, dialkyl sulfosuccinate ester salts, alkyl sulfate ester salts, and alkylbenzenesulfonic acid groups. The most preferred are alkylbenzene sulfonic acid salts and dialkyl sulfosuccinate ester salts, which have strong dispersing power. The above-mentioned interfacial l-occupying agents can be used alone or in combination of two or more types, and can be used in the water bath liquid at approximately 0.0, i. lol
% to about 20%, more preferably 0.5% to 10% by weight. The pH of the aqueous solution containing the surfactant in the present invention is 1 to 1.
2 is good and 7 is good. In order to adjust the aqueous solution to this pH, it is preferable to contain either or both of d s- and a water-soluble salt as a buffer. This results in
When the aqueous solution is applied to a lithographic printing plate, the developer components remaining on the plate are neutralized. Non-image areas become more hydrophilic. For details on buffering agents, see, for example, 1-Chemical Handbook Basics @ 11, Nippon Kagaku Kanawa, 1972, 2.
May 20th 5th printing, published by Maruzen Co., Ltd., 1312-132
They are described on page 0 and can be applied as is. Suitable acids and water-soluble salts include inorganic acids such as molybdic acid, boric acid, nitric acid, sulfuric acid, phosphoric acid, polyacid, acetic acid, oxalic acid, im'z5 acid, benzoic acid, succinic acid, citric acid, and malic acid. Examples include acids such as water-soluble organic acids such as , lactic acid, and p-1 luenesulfonic acid, and their salts. More preferred salts are water-soluble alkali metal salts and ammonium salts, and particularly preferred are molybdates such as ammonium molybdate, phosphates such as sodium phosphate, polyphosphates such as potassium tetrapolyphosphate and sodium trimetaphosphate, and sodium oxalate. oxalates such as, tartrates such as potassium tartrate, succinates such as sodium succinate,
It is a citrate such as β-ammonium l. Such acids and water-soluble salts can be used alone or in combination of two or more. A more preferable pH of the aqueous solution containing the surfactant is 12~)
It is 3. The most preferable pH is 2.5 to 6.5, and in this case, the insensitivity of the non-image area of the lithographic printing plate becomes more effective. In addition, in the plate-making method of the present invention, developer components are brought into the water bath solution, so in order to neutralize the developer components, an amount of acid and/or acid is added in advance according to the planned processing time of the PS plate. It is preferable to include it. The aqueous solution contains no particular restrictions on the amount of acid heptase added, but the total amount of the acid hepta-salt is 1.2% based on the total weight of the water bath solution.
3, it is preferable that F is about 10% or more by vehicle weight. Better than 1
L2< is used in the range of 0.01 to 6M soft%. The aqueous solution contained in the surfactant in the VC of the present invention further includes preservatives such as sorbic acid and ethyl p-oxybenzoate, fungicides, propyl gallate, 2,6-di-t-phthyl-4-
Antioxidants such as ethylphenol and 2,6-sheet-t-butyl-4-methylphenol may be contained. By adding these preservatives, antifungal agents, and antioxidants in small amounts, it is possible to prevent deterioration in quality due to storage of the aqueous solution. Weight%. . It is preferable that the aqueous solution containing the surfactant in the present invention contains a lipophilic substance. As a result, the image area of the lithographic printing plate becomes more oil-sensitive,
Not only does the development process become easier, but when the printing plate is treated with a purulent preservative after the treatment with the aqueous solution, a decrease in the oil sensitivity of the image area can be strongly suppressed. Preferred layers include oily substances KH1flJ, organic carboxylic acids having 5 to 2!5 carbon atoms, such as officic acid, lauric acid, valeric acid, nonylic acid, capric acid, mystilic acid, palmitic acid, castor oil, etc. It will be done. These lipophilic substances can be used alone or in combination of two or more. The lipophilic substance contained in the surfactant-containing aqueous solution in the present invention is preferably from 0.005% to about 10% by weight, more preferably from 0.05% to 0.05% by weight, based on the total JF amount.
It is within the range of heavy salary. In the invention, a developer is repeatedly used on the surface of a lithographic printing plate after development and washing with water. It is preferable to use as little squeegee force as possible with the washing water. In addition, by squeegeeing to reduce the amount of developer on the planographic printing plate, contamination by the developer in the washing water can be reduced. This is because contamination of the containing aqueous solution by washing water is prevented as much as possible, and processing capacity with washing water and a water bath liquid containing a surfactant is increased. Therefore, the residual amount of developer and washing water on the lithographic printing plate after squeegeeing is preferably 12 rnl/TL' or more, more preferably less than 71 gmg. Most preferably it is 5M/m' or less. Various methods of treatment with a water bath containing a surfactant are possible, including immersion in the same way as washing with water, application with a roller, and spraying from multiple nozzles onto a lithographic printing plate or O'roller. However, by repeatedly using the aqueous solution containing the surfactant, it becomes possible to significantly reduce the usage loss of the aqueous solution containing the surfactant per 28 plate-making plates. The flow rate for supplying the surfactant water bath solution onto the lithographic printing plate is 1 (1/min
, more than 40 A! /min, or less is preferable. More preferably, it is 3 to 20 l/mjn. It is desirable that the lithographic printing plate treated with a water bath solution containing a surfactant be squeegeeed so that the coating amount and coating thickness of the aqueous solution are as uniform as possible and in an appropriate amount. Desirable, coating ptit 1 ml/m or more, 'A
JIII/II/m' It is under JJ. A more preferable coating amount is 2 nu, /i or more, at the edge of the planographic printing plate (
IUm that reduces uneven application, including on the ear area
l/m or less. As a method of squeegeeing the plate surface of a lithographic printing plate, d'' example, t
If the liquid is scraped out with an air knife, or the lithographic printing plate is passed between a pair of elastic rollers whose surfaces are coated with an elastic material such as rubber, and the liquid on the plate surface is squeezed out by the nip pressure, or the surface is smooth and elastic. It is possible to adopt a method such as placing the material in a 72-sided manner in the 11-in feeding path of the lithographic printing plate, and then bringing the plate surface into sliding contact with the plate surface to force the liquid. . Exposure ζ Effective squeegee method and method of passing the lithographic printing plate through a pair of elastic rollers 11=
-(・This is a method of applying a load between a pair of rollers.σ
More preferably, Rollata J +i>-1b22
RitsuυCrl'%: '+'s 荀sha roller is 41+=Sei) It's a method! l! , tJ material and t2 are natural combs, 7 supo 1 noisofu. V rubber, styrene butadiene rubber, styrene butadiene rubber, butyl rubber, butyl rubber, butyl rubber, ethylene rubber
Talorosulfonated; % IJ Ethin), 7 Krylcom, TS V Kunkom, No 17 Konkom, normal rubber, non-opnon rubber, multivalued rubber, Flastixox QIP
-h: ! I get confused. Butyl Column, Nido 1j Fluke Diene Rubber, Ethynon Probylene Column 1j, Acrylic 1j
Rubber, silicone rubber, fluorine comb, polyurethane rubber (Hycoom has excellent oil resistance), so it is suitable for rollers treated with surfactant water bath solution 61S. Tracing the lithographic printing plate between a pair of rollers

[7. In a method in which a squeegee is applied to the surface of the lithographic printing plate after the treatment has been completed and the surface-active agent is passed through the surfactant water bath, the treatment is performed. The device is designed so that at least one of the two rollers is at rest (hereinafter referred to simply as A+1-. and N[7-j.).
It is preferable to have 1.1 to save unnecessary power. However, during this rest period, the aqueous surfactant solution often accumulates in the contact area between the pair of rollers and becomes dry and solidified. In this case, when restarting the processing of the printing plate, the amount of surfactant aqueous solution +4? A1i B"A thickness tends to become uneven. As a way to avoid this situation, there is a method of stopping the surfactant water-soluble oil treatment and keeping the pair of rollers rotating during the treatment. [1. Take at least one method such as spraying the surfactant water number Y from multiple nozzles onto the pair of rollers to delay the drying of the pair of rollers. Thing 7
5; Preferably. It is preferable that the plate treated with an aqueous solution containing a surfactant is dried so as not to collect dust or the like or to facilitate handling. The preferred drying temperature is m to 120°C. The lithographic printing plate obtained by processing in this way is the best in the world.
It can be used for a variety of processes such as inking, additions, corrections such as erasure, and plate preservation. According to the present invention described above, the oil sensitivity of the image area can be reduced by IJ>
We have been able to provide a simple PS plate making method that not only does not reduce the insensitivity of non-image areas without causing T''- but also reduces washing waste liquid and causes extremely little environmental pollution. We were able to obtain a cylindrical printing plate with high printing plate performance by using a developer with high processing capacity.Furthermore, after development, after rinsing with a small amount of washing water, it was possible to correct any build-up of the developing ink. We were able to provide a method for making a PS plate.Therefore, the amount of washing water is reduced, environmental pollution is reduced, the lifespan of each processing solution is increased, the plate making cost is reduced,
It has been possible to provide a PS plate making method that can improve printing plate performance, etc. in detail.Hereinafter, the present invention will be explained in more detail based on examples of the present invention. The percentage in the sentence is 1%, Miyako.'' Turtle &) Betani shall be shown. First, the following photosensitive lithographic printing plates A and Bi were prepared and exposed. [Photosensitive lithographic printing plate A] Novolak molding V sol formaldehyde 4m Fat 1
, 1 part by weight of 2-naphthoquinone-2-diazide-5-sulfonic acid partial ester and 1 part of novolac-type cresol formaldehyde double layer and 20, Kfg part 0) ethyl glycol methyl ether to form a photosensitive solution. was prepared. thickness. An oxide film of about 2mm' was formed on a grained aluminum plate by electrolytic anodic oxidation, thoroughly washed and dried, and then coated with the above photosensitive solution and dried. A photosensitive lithographic printing plate A having a photosensitive layer of 5 &/m' was obtained. ? A metal halide lamp [Iwasaki Electric Co., Ltd., r Idolphin 200o]
] A 75 second m1 exposure was carried out from a distance of 0.8 m. [Photosensitive lithographic printing plate B] ) h d O, 24 to 1 aluminum plate was immersed in an aqueous solution of thorium phosphate to degrease it, and this was soaked in 0.2 N salt solution for 3 A/'nj. After frosting and polishing at a density upstream of '1', the material was subjected to severe polishing in a C acid bath. At this time, the amount of camellia was 3.0.9 weight m"f. Further, the pores were sealed with an aqueous sodium metasilicate solution I7 to obtain a support for a lithographic printing plate. The composition F was applied to this aluminum plate. Using a whirler, the photosensitive solution containing n9/11i1. The two joint military bodies have a composition by weight of p-hydroxyphenyl methacrylamide/acrylonitrile/methyl methacrylate/methacrylic acid -20735/35/10, and the average molecular weight is 80.(+00), and the above Diazo resin, p-diazodiphenylamine and roseformaldehyde are combined into a hexafluorophosphoric acid block. A halftone photographic transparent negative is placed on top of this, and the metal halide lamp and idle fin 20 fl O are used at 0.8
Exposure was performed for 50 seconds from a distance of m. Next, the following tik developing solutions 1 to 1 were prepared. [Developer solution A] [Developer solution inlet] [Developer solution C] [Developer solution 1/Water solution 2] [Developer solution E] [To developer] [Developer solution G] [Developer solution C] Example development processing section and water washing part, surfactant aqueous solution treatment part and drying J
: Charge the developer solution E into the development processing section of an automatic development processing device having a processing time, and while burying the 28th plate, transfer it to the developer solution.
I decided to replenish it. Well water 10/min was charged into the washing section, circulated at a flow rate of 10/min, and spouted from a large number of nozzles. The surfactant aqueous solution processing unit νζ circulated a surfactant bath liquid 61 having the following composition at a rate of 8e/mtn, and spouted it from a number of nozzles. The amount of liquid remaining on the plate at the squeegee ridge in the processing area of tL is about 11rrn;/7i for developer and about 8mt/rr for washing water.
j, the surfactant solution was about 61 nl/17 (''. The resin composition and developer were recovered and were considerably colored. When the resulting printing plate was printed on a printing press, a print with no stains and high ink receptivity was obtained.
It has been found that this is a printing method that does not reduce oil insensitivity and does not reduce oil sensitivity. Similarly, Nishidei 44 et al.] 1. Take out the other printing plate and wash it without washing off the surfactant skin III on the plate. Well, when I corrected it with an eraser, it was possible to make a good correction. Furthermore, the plate surface protectant could be applied directly to printing. Comparative Example 1゜ Only the water washing section of the automatic processing apparatus of Example 1 was stopped,
Cleaning was performed with running water from another pipe. The other parts were treated in the same way and 200 plates were treated, and the washing water was 36
In addition to using 001, in Example 1, the exhausted developer that adhered to the plate after development and was collected in the washing water was discarded, polluting the environment. Comparative Example 2゜A plate surface protectant 61 having the following composition was charged into the surfactant aqueous solution processing section of the automatic processing apparatus N of Example 1, and the other conditions were as in Example 1.
I did the same thing. [Plate surface protectant] 150 parts of water was obtained.I also corrected the plate surface protective film on the lithographic printing plate without washing it off with the erasing solution, but the border of the area where the erasing solution was applied smudged. I couldn't make a good correction. Example 2 The developer solution A was charged into the development processing section of an automatic development processing apparatus similar to that in Example J to process the PS plate and replenish the developer solution port. In the washing section, 12 g of well water, 10,9.2-hydroquine ethylethylenediamine triacetic acid, 5 tetrametaphosphoric acid! ! , 5 g of ethylene diamine tetraacetic acid, and 112 g of 1,2-diaminocyclo-7-chlorohexane tetraacetic acid were charged, and the mixture was circulated at a flow rate of 6 d/min and jetted from a number of nozzles. d in the surfactant aqueous solution treatment section, and the following 1.14 formations i & i r
& Sex agent aqueous solution 1.01, 11 l/min. It was circulated at a flow rate of [Surfactant 1 aqueous solution 1 pH = 5.5 area 0.6 nrr'' P S j'Jj, B to 700
When plate making [7] was carried out, a considerable amount of resin and developer, which were the photosensitive composition on the PS plate, were recovered in the washing water. I↓t
When the Rahata lithographic printing plate was printed with a printing press, beautiful printed matter with high ink density and no stains i1 was obtained. From this, it was found that the plate-making method did not reduce the oil-insensitivity and did not reduce the oil-sensitivity. The lithographic printing plate obtained in the same manner was taken out [7. Without washing off the surfactant film on the plate, one development ink build-up was performed, and the ink build-up was easily achieved. I did this and made it a preserved version. Also, Comparative Example 3 described below. By comparison, this plate-making method showed that the surfactant aqueous solution had far fewer debits than expected, contributing to lower plate-making costs. In addition, the residual liquid on the plate after the squeegee in each processing area and the development rate were approximately 2.5rnl/yj,
The washing water was about 4 ml/yj, and the surfactant water γe4 liquid was about 4 me/m. Comparative Example 3 Example 2.0 Only the water washing section is stopped, and other processing is partial 1
(1r5) was used as in Example 2, and plate making was performed without washing with water at all. 1k) et al. J It was also confirmed that the printing plate did not have sufficient ink receptivity and had a decrease in oil sensitivity. Continuing with the second edition, at the 250th edition, the aqueous surfactant layer was severely contaminated by the resin components and developer that contained the photosensitive composition of the 28th edition. Surface active (゛If the ice cutting solution paste is not renewed, it will not be necessary to apply pressure, and the time between plate making work t1.'p will be 1 to 7, increasing the plate making cost Δ
I set it. Comparative Example 4゜Example 2.0 A surface active agent having the same composition was charged into the water bath treatment section and circulated for 1 time at a flow rate of 181 parts min. Other processing parts are as in Example 2. and l for the same main invasion. It was a long time ago. [Plate retention agent] When the obtained lithographic printing plate was coated with development ink, the development ink build-up time was the same as that of Example 2. It took about twice as long to complete the process, reducing work efficiency. Example 3: An automatic development processing apparatus 6 having a development processing section, a water washing processing section, a surfactant aqueous solution processing section, and a drying process is used (2, the above-mentioned home solution 1 is charged into the development processing section, As a conveyance roller and a squeegee roller (1 tlil is placed opposite the lower side of the butyl rubber loaf-1 with a neoprene rubber roller,
Furthermore, a load roller and a roller of Shiko'Jy 3 were placed on top of it. The developing tank was processed with 28 plates and replenished with the developer solution 2. 7. 16 liters of tap water was charged into the washing section and circulated at a flow rate of 121 parts min. I made it erupt so that it would hit the 28th edition. Both the conveyance roller and the squeegee roller were made of nitrile butadiene rubber rollers, and the lower roller was made of harder rubber than the roller on the lower side. Surfactant solution processing department! A nitrile butadiene rubber roller was used for the r/'i transport roller and the lower squeegee roller, and a silicone rubber roller was used for the upper squeegee roller. The surfactant solution was set to be sprayed from a plurality of nozzles so as to hit the upper roller at a flow rate of 41/'m+n and to be circulated. Then, prepare 11 of the following surfactant solutions, and prepare the above 1 with an area of 0.8 d.
) To the S plate 7 (+ (1 plate processed 7. The amount of remaining liquid on the plate after the squeegee in the processed part of the plate is about 4 m of developer.
l', /n+, the washing water was about 7 ml/711", and the surfactant solution was about 8 me/711". When the image area on the obtained lithographic printing plate was erased and corrected, the correction was successful. Also, the lithographic printing plate with 10 plate openings is 7()
Similarly, the 0th lithographic printing plate produced a beautiful print with no stains and good ink receptivity, and the oil sensitivity of the image area did not decrease without decreasing the oil sensitivity of the non-image area. No printed version was obtained. Furthermore, even if the developer is a developer with a high alkaline concentration and high processing capacity, there will be less IW turbidity (in the surfactant solution), less fatigue in the surfactant solution, and less oxidation. One of the advantages of F4J is that it is a plate-making method with little change in capacity. [Aqueous surfactant solution] pH = 5.7 Example 4゜Example 3. After that, the development processing waste solution was collected. If we look at the numerical value of an automatic developing device as it is, there is a developing solution in the developing processing section.
Since the PS plate resin composition and the like adhered together, the 3.1f and f4j treated areas were washed with about 12 d of the washing water used for plate making. When I collected the cleaning solution, stored it, and used it instead as water to prepare a developer during subsequent plate-making work, there was no difference between the developer and the developer prepared with regular water. I was able to do that. Comparative Example 5゜Water washing section is set to 1/'C/Stop shape! 7 to 1. kj Example 3 except that no cleaning was performed. Same as and translated as [7, area o, s
When the above PS plate of d was made into 3 full 1 plates, 14 turbidity was generated in the surfactant solution. Missing printed materials - 1st grade 1-7). At this time, the pH of the surfactant solution was above 9J. Comparative Example 6 "Example 1" except that the washing section was changed to the conventional method of washing with running water and then disposing of the pile. When processed in the same manner as in Example 3, a 1 ulill printing plate with no beautiful stains could be obtained.
More than 3.5 tons of tap water was consumed and the i-flow water was leaked. Really? l! iX illusion 15 Development process 111 (and water washing process ll1j part and surfactant solution treatment process; A nitrile butadiene rubber roller was placed on the upper side and a neoprene rubber roller was placed on the lower side as a conveyance roller and a squeegee roller, which were opposed to each other.While processing the PS plate, the developer solution 1 was replenished.Water washing process ]J1
! Pour 166 liters of tap water into Pan 19, 20 l/”m t
A uni 3i was stirred at a flow rate of n, and 0 negative was discharged from a nozzle of a number so as to directly hit the PS plate. Both the conveyance roller and the squeegee roller were nitrile butadiene com rollers. On the + side of the surfactant solution treatment section, a butyl rubber roller was used as the first squeegee conveyance roller and the lower squeegee roller, and a silicone rubber roller was used as the upper squeegee roller. At a flow rate of 51/min, the interface Y
The occulting agent solution was applied to a plurality of nozzles and a roller on the R+ side, and was spouted so as to flow down onto the CP8 plate, and was also sent in a circulating manner. The above PS plate A was prepared by charging 16A of the surfactant solution described in F and having an area of l m, X O, 8,0.
500 editions were processed. At this time, when a metal load roller was placed on the squeegee roller of each processing section, the amount of remaining liquid on the plate after the squeegee was approximately 0 m 17 m of developer.
The amount of washing water was approximately 6 ml/111, and the amount of surfactant solution was approximately 6 ml/7)1'. The obtained lithographic printing plate d1, both the plate-making start plate and the 500th plate 0, are non-image 151
The non-greasy properties of the parts were good. Lipid sensitivity of image area ml
The initial number of inked sheets during printing was approximately 11, indicating high oil sensitivity. In addition, the device was assembled to stop the insertion while the PS version was being processed.
The surfactant solution is ejected from the nozzle and the surfactant solution is dried with a roller so that it does not become sticky, so there is no uneven coating of the surfactant solution on the lithographic printing plate when plate making is restarted. It became so. [Surface-raising activator LD liquid] When the obtained lithographic printing plate was directly corrected with an erasing liquid and developed ink was applied, good correction and development ink build-up were possible, so a plate surface protectant was applied. This is a preserved version. Compared to the comparative example described below, which consumes several tons of washing water to make the same number of lithographic printing plates,
By illegally using only 1 () liter, it was possible to prevent wastage of water resources, reduce wastewater as much as possible, and prevent environmental pollution. Comparative Example 7 The conventional method of rinsing with running water and then discarding the plate was changed, and the following plate retention agent was used instead of the surfactant solution. The other parts are as in Example 5. When 500 plates were processed in the same manner as above, approximately 6 tons of washing water was wasted and discharged as waste water. The initial number of inked sheets of the resulting lithographic printing plate during printing was 50, resulting in a large amount of wasted printing paper. [Plate 1r/1 retainer dΦ agent] Shimizu
160 grams of lithographic printing plate part 1
It is difficult to erase details when erasing with a small-scale erasing liquid d)
, wash out the first film that preserves the surface [you have to do it after 7 days, I guess). Agent Aji Kuwabara - Written amendment to the Yobi procedure (to a friend) 1 Width I'101;, Showa 57 (Li Royal Permit No. 171124 +; 2
Name of the invention: Method for making lithographic printing plates: l hH, il 3゛ 8 Relationship to the case Patent applicant address 26 Wf, 1-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo
2 Bow name (127) Roku Konishi photo] Nigyo Co., Ltd.?
1 (Director Nobuhiko Kawamoto 1 Agent 〒19'' Jll: Tokyo 1..l 'JIf Sakuracho 111: 5 So Lil's Order 11 I.J February 22, 1980 (Shipped) 6. Application and specification to be amended 7. Contents of the amendment As per attached sheet, engraving of the application and specification (no change in content) Procedural amendment October 20, 1942 1. Indication of the case 1988 patent Application No. 171124 2 Name of the invention Method for making lithographic printing plates 3 Relationship to the case of the person making the amendment Patent applicant address 1-26-2 Nishi-Shinjuku, Shinjuku-ku, Tokyo Name (127) Konishiroku Photo Industry Co., Ltd. Company Representative Director Igohiko Kawamoto 4 Agent 191 Voluntary 6 Column 7 of “Detailed Description of the Invention” of the specification to be amended Contents of the amendment (1) The detailed description of the invention has been amended as follows: do.

Claims (1)

[Claims] In a method for making a photosensitive lithographic printing plate having a photosensitive composition on a support having a water-visible bronze surface, after the photosensitive lithographic printing plate is imagewise exposed and developed with a developer, washing water is repeatedly used. A plate-making method characterized by washing with water and further treating with water containing a surfactant.