JPS5937540A - Photosensitive composition and its development method - Google Patents
Photosensitive composition and its development methodInfo
- Publication number
- JPS5937540A JPS5937540A JP14861382A JP14861382A JPS5937540A JP S5937540 A JPS5937540 A JP S5937540A JP 14861382 A JP14861382 A JP 14861382A JP 14861382 A JP14861382 A JP 14861382A JP S5937540 A JPS5937540 A JP S5937540A
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- JP
- Japan
- Prior art keywords
- photosensitive
- photosensitive composition
- film
- soln
- developing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、ポリビニルブチラール、ポリビニルホルマー
ル又（ケボリ酢酸ビニルと、有機溶剤に用済なアシド化
合物とを含有する感光性組成物、及びその現像方法に関
するものであり、さらに詳細には感光皮膜が強靭で水系
現像液で現像可能な黒丸性組成゛吻及びその現１欧）５
去すご「何するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive composition containing polyvinyl butyral, polyvinyl formal, or vinyl acetate (kebolyvinyl acetate) and an acid compound used in organic solvents, and a method for developing the same. In detail, the photosensitive film is tough and has a dark round composition that can be developed with an aqueous developer.
"What are you going to do?
従４ｉｕ 、！：す、高分子化合物と芳香族アジド化合
物とを含有する感光性組成物が知られており、例えば理
化コムと芳香族アジド化合物の甜合せ、アルカリ可溶性
ホル・す７／議合樹脂と芳香族アンド化合物の組合せな
どがある。これらはツメトレーンスト、フォトレリーフ
などの用、余し・ζ利用されている。Jyu4iu,! Photosensitive compositions containing a polymer compound and an aromatic azide compound are known, for example, a combination of Rikacomb and an aromatic azide compound, an alkali-soluble phor-su7/assembly resin and an aromatic azide compound. There are combinations of and compounds, etc. These are used for Tsumetra strike, photo relief, etc., and are used as leftovers and ζ.
しか１−なから環化ゴムと−“−°ｉ香族アジド化合物
の組合せでは耐蝕性、密着性にはすぐれているが、有１
幾ｌｄ剤によって現像されるため人体′＼の毒性、引火
性等、作東環境の面からみて、好ましいとは再えない。However, although the combination of cyclized rubber and aromatic azide compound has excellent corrosion resistance and adhesion,
Since it is developed using a LD agent, it is not desirable from the viewpoint of the production environment, such as toxicity to the human body and flammability.
又アルカリ可溶性ホルマリン罹合、１さ４’ｌｉ盲と芳
香族了シト１ヒ合物の組合せでは、アルカリ水Ｒり〆８
で現像可能であるが、感光皮膜が脆く、きすがつきやす
いなど機械的強度が不充分である。In addition, in the combination of alkali-soluble formalin, 1-4'li blindness and aromatic acid compound, alkaline water-reduced
However, the photosensitive film is brittle and easily scratches, and its mechanical strength is insufficient.
本発明の目的は、こｎ、らのｒ￥１題点會解決し、感尼
用ｆｉ’４ ’ｔ、’バ強靭でしかも水系現１家液で現
像可能な感光性組成物及び、その現（累方法を提供する
１ことにちる、
本・ネ明者は、前記の問題点を解決すべく＠怠研究を進
めた。債鬼、ポリビニルブチラール、ポリビニルホルマ
ール、又はポリ酢酸ビニルと、有機溶剤に可溶なアンド
化合物とを含有する感光性組成物を使用するときは前記
目的を達成し得ることを発見し、化、本発明はかかる知
見に基づいごなされたものである。The object of the present invention is to solve these problems and to provide a photosensitive composition for photosensitive printing that is tough and can be developed with an aqueous solution. In order to solve the above-mentioned problems, the authors of this paper have carried out research to solve the above-mentioned problems. It has been discovered that the above object can be achieved when using a photosensitive composition containing an and compound which is soluble in .
本発明において使用する高分子化合物は、ポリビニルブ
チラール、ポリビニルホルマール、又ハポリ酢酸ビニル
よりなる群から選ばれた１種以−Ｌが用いられる。これ
ら高分子化合物は有機ｎ剤に可溶であれば使用可能であ
るが、その分子量が少なすぎると、皮膜強度が低下し、
父、分子量が太きすぎると、感光液が高粘度になり、そ
の調整が困難になるため好ましくない。ブチラール化度
及びホルマール化度については低すぎると耐水１生が怜
くなり、高すき゛ると水系現１象液−←゛の現像性が低
下する、以上の理由により、ポリビニルブチラールにお
いては平均分子ｔ １００００から２３１．） ０００
で、ブチラール化１！［が２０からｇＱｍｏ１％、ポリ
ビニルホルマールにおいては、平均分子量９０００から
１５０ ｉｌ ０ ｔｌでホルマール化度が２０から８
０ｍｏ１％、ポリ酢酸ビニルにおいては平均分子７１５
０００から２７ Ｕ ＯＯＯである高分子化合物が好ま
しい。The polymer compound used in the present invention is one or more selected from the group consisting of polyvinyl butyral, polyvinyl formal, and hapolyvinyl acetate. These polymer compounds can be used if they are soluble in the organic n-agent, but if their molecular weight is too low, the film strength will decrease,
On the other hand, if the molecular weight is too large, the photosensitive liquid will have a high viscosity, making it difficult to adjust the viscosity, which is not preferable. Regarding the degree of butyralization and formalization, if it is too low, the water resistance becomes poor, and if it is too high, the developability of the aqueous developing solution decreases.For the above reasons, polyvinyl butyral has an average molecular weight of t. 10000 to 231. ) 000
So, butyral conversion 1! [is 20 to gQmo1%, in polyvinyl formal, the average molecular weight is 9000 to 150 il 0 tl, and the degree of formalization is 20 to 8.
0mo1%, average molecule 715 in polyvinyl acetate
000 to 27 U OOO is preferred.
又、本発明において使用する有機溶剤に可溶なアジド化
合物としては、４．４′−ジアジドカルコン、２．６−
ジ（４′−アジドペンデル）−シクロヘキサツノ、２′
、６−ジ（４′−アンドベンザル）′−４−メチルーン
クロヘキサノン、４．４′−ジアジドカルコン銀灯、４
′−ジアジドベンゾフェノン、Ｐ−フェニレンジアジド
、４．４′−ジアジドフェニルメタン等をあげることが
できる。In addition, examples of azide compounds soluble in organic solvents used in the present invention include 4,4'-diazide chalcone, 2,6-
Di(4'-azidopendel)-cyclohexantho, 2'
, 6-di(4'-andbenzal)'-4-methylone clohexanone, 4,4'-diazide chalcone silver lamp, 4
'-Diazidobenzophenone, P-phenylene diazide, 4,4'-diazidophenylmethane and the like can be mentioned.
）
これら、有機溶剤に可溶なアジド化合物の、高分子化合
物に対する添加量は、重連で、通常ｌから６０％、好適
な添加量は４から３０％である。) The amount of these organic solvent-soluble azide compounds added to the polymer compound is usually 1 to 60%, preferably 4 to 30%.
さらに、必要に応ｌ；、これらアンド化合物の増感剤、
染料、顔料／等を添加しても差支えない。Furthermore, if necessary, sensitizers for these and compounds,
There is no problem in adding dyes, pigments, etc.
又、使用目的に応じ、現像性、耐蝕性等の改善の必要が
有れば、ポリビニルブチラール、ボリビ、−ルホルマー
ル、又はポリ酢酸ビニルと相溶性のあるフェノール樹脂
、スチレン−マレイン酸共重合樹脂、アルヤツド圏脂、
エポキシ樹脂等をポリビニルブチラール、ポリビニルホ
ルマール、又ハポリ酢酸ビニルに対して等量まで添加し
ても良い。Depending on the purpose of use, if there is a need to improve developability, corrosion resistance, etc., polyvinyl butyral, boribi, formal, or phenol resins compatible with polyvinyl acetate, styrene-maleic acid copolymer resins, Aryatudo sphere fat,
An epoxy resin or the like may be added in an amount equal to that of polyvinyl butyral, polyvinyl formal, or hapolyvinyl acetate.
本発明の感光性組成物は、一般的には有機溶剤に溶解し
、基材に塗布して使用する。有機溶剤の具体列としては
、アセト／、メチルエチルケト二／、シクロヘキサツノ
、メチルアルコール、エチルアルコール、フロビルアル
コール、トルエン、キシレン、酢酸エチル、酢酸ブチル
、エチレングリコールモノメチルエーテル、エチレング
リコールモノエチルＴＬ−チル、ジメチルホルムアミド
等、又はこれら有機溶剤の混合物をあげることができる
。The photosensitive composition of the present invention is generally used by dissolving it in an organic solvent and applying it to a substrate. Specific examples of organic solvents include aceto/, methyl ethyl ketodi/, cyclohexane, methyl alcohol, ethyl alcohol, flobyl alcohol, toluene, xylene, ethyl acetate, butyl acetate, ethylene glycol monomethyl ether, ethylene glycol monoethyl TL-tyl. , dimethylformamide, etc., or a mixture of these organic solvents.
本発明の感光性組成物の現像液としては、芳香族カル）
メン酸、芳香族スルホン酸、フェノール類、又はアルキ
ル硫酸のアルカリ金属塩化合物の水溶液を使用すること
ができる。これらの化合物の具体例を示せば、芳香族カ
ルボン酸としてはＰ−クロル安息香酸、サリチル酸、ア
ントラニル酸等、芳香族スルホン酸としては１−ナフト
ルー４−スルホン酸等、フェノール類としてはＰ−ヒ
ドロキシ安息香酸エチル、ペンタクロルフェノール等、
アル’ｆル・諏酸としてはシウリル〒鷹酸／等が有り、
これらの仕合物のナトリウム、カリウム等のアルカリ金
属塩化合物をあげることができ／）、、現像液の現像性
、安定性ノ等からみて、最も好ましいものとしては、Ｐ
−クロル安息香酸ナトリウム、サリチル酸ナトリウムを
あげることができる。現像液の濃度としては通常４から
４０重量係の水溶液として使用することができるが、現
像性を改善すル目的で、メチルアルコール
イソプロピルアルコール、ベンジルアルコールを等の有
機溶剤をこれら現像液に対し重量で１から４０係添加す
ることもできる。As the developer for the photosensitive composition of the present invention, aromatic compounds (aromatic compounds)
Aqueous solutions of alkali metal salt compounds of menic acid, aromatic sulfonic acids, phenols, or alkyl sulfates can be used. Specific examples of these compounds include aromatic carboxylic acids such as P-chlorobenzoic acid, salicylic acid, and anthranilic acid, aromatic sulfonic acids such as 1-naphtho-4-sulfonic acid, and phenols such as P-chlorobenzoic acid, salicylic acid, and anthranilic acid. Ethyl hydroxybenzoate, pentachlorophenol, etc.
Examples of al'f-solic acid include shiuryl falconic acid/etc.
Among these compounds, alkali metal salt compounds such as sodium and potassium can be mentioned.From the viewpoint of the developability and stability of the developer, the most preferable ones are P.
-Sodium chlorbenzoate and sodium salicylate can be mentioned. The developer solution can be used as an aqueous solution with a concentration of 4 to 40% by weight, but for the purpose of improving developability, an organic solvent such as methyl alcohol, isopropyl alcohol, benzyl alcohol, etc. is added to the developer solution by weight. It is also possible to add 1 to 40 parts.
本発明の感光１・ＩＬ♀；１１成物およびｍ像方法によ
れば、皮膜が強靭でレリーフがシーヤープな良好な画像
が得られ、又有機溶剤を使用しないので作業性も良い。According to the photosensitive 1/IL♀;11 composition and m-image method of the present invention, good images with strong films and sharp relief can be obtained, and workability is also good since no organic solvent is used.
次に本発明を実施例によって更に詳細に説明する。なお
、本発明は以下の実施例によって制限を受けるものでは
ない。Next, the present invention will be explained in more detail with reference to Examples. Note that the present invention is not limited by the following examples.
実情例に
１０ノー放′ｔＬ処理した厚さ１００μのポリエチレン
フタレートフィルム上に、下記組成の感光液を乾燥後の
塗膜が３μになるように塗布し、次いで乾４菜した。As a practical example, a photosensitive solution having the following composition was coated on a polyethylene phthalate film having a thickness of 100 μm which had been subjected to a 10-tL treatment so that the coating film after drying would be 3 μm, and then dried.
感光液
このようにして得られた感光性フィルトにネガ原稿を密
着させ２ ｋＷの超高圧水銀灯で１ｍの距離より１分間
露′Ｊｔ．を行った蕾、次に示した現像液で現ｌＩ４！
を行い未露光部を除去し鮮明なボン画像を得た。Photosensitive liquid A negative original was brought into close contact with the photosensitive filter thus obtained and exposed for 1 minute from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp. Develop the buds using the developer shown below.
The unexposed areas were removed and a clear BON image was obtained.
現像液
実施例２
１００／Ｚのポリエチレンフタレートフィルムの片面に
真空Ｍ＊ ６”よ！７ ｕ． ｓμのアルミニウム膜ヲ
設け、その上に下記組成感光液を乾燥後の塗膜が３μに
なる様に塗布し、乾燥した。Developer Example 2 An aluminum film of vacuum M*6"!7 u.sμ was provided on one side of a 100/Z polyethylene phthalate film, and a photosensitive solution with the following composition was applied thereon so that the coating film after drying would be 3μ. was applied and dried.
感光液
このフィルムにネガ原稿を摺着させ、２ｋＷの超高圧水
銀灯で１ｍの距離より２分間露光を行った後、次に示す
曳＋’求ｓ’ｉで、現像ケ行った。次いで５。Photosensitive solution: A negative original was attached to this film, exposed for 2 minutes from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp, and then developed using the following method. Then 5.
重ｉｔ係り／酸水Ｍ？＆で、アルミニウムのエツチング
を行った、、露光部の感光層は十分にレジストとしての
機能な果たし、画像遮光性の高い鮮明なアルミニウムの
ボン画像が得られた。Heavy IT worker/acid water M? The photosensitive layer in the exposed area sufficiently functioned as a resist, and a clear aluminum image with high image light-shielding properties was obtained.
現像液
実施レリｊ
１１すｌｏｏμのポリエチレンテレフタレートフィルム
上に下記の組成の皮膜形成液を乾燥後の膜厚が１０μに
なるように塗布、乾燥し、アルコール可溶性ポリアミド
層を形成した。A film-forming solution having the following composition was applied onto a polyethylene terephthalate film having a thickness of 11 μm so that the film thickness after drying was 10 μm and dried to form an alcohol-soluble polyamide layer.
皮膜形成液
次に上記ポリアミド層の上に下記１１成の感光液を乾燥
後の塗膜が；３μになるように堕布、乾燥して感光性フ
イルノ・を得た。Film-forming solution Next, a photosensitive solution of the following composition No. 11 was applied onto the above polyamide layer on a cloth so that the coating film after drying had a thickness of 3 μm, and was dried to obtain a photosensitive film.
感光液
この感光性フィルムをポジ原稿と密着させ、超高圧水銀
灯２ ｋＷで１ｍの距離より、４０秒訂光を行った後、
実施例２で用いた現像液で処理することにより、感光層
の現像及びポリアミド層のエツチングを２液で行うこと
、ができ、良好なネガフィルム：う；冴らルだ。Photosensitive liquid This photosensitive film was brought into close contact with a positive original, and after light correction was performed for 40 seconds from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp,
By processing with the developing solution used in Example 2, the development of the photosensitive layer and the etching of the polyamide layer could be performed with two solutions, resulting in a good negative film.
実施例４
銅張り積層板上に下記組成の感光液を乾燥後の塗膜が４
μになるよう（・こ伍布し、乾・聰しＩ・−０これをネ
ガ原稿と密着させ２ ｋＷの超高圧水銀灯で１ｍの距離
より２分間露光を行った。実施例２で用いた現像液で現
像を行った後、４０重量係の塩化第二鉄水溶液に浸漬し
、非画線部の銅のエツチングを行ったが、露光部の感光
層は十分にｌ／シストとしての機能を果たした。その後
レジスト層の除去はジメチルホルムアミドに浸漬するこ
とにより簡単に行うことができた。Example 4 After drying a photosensitive liquid with the following composition on a copper-clad laminate, the coating film was 4.
This was placed in close contact with a negative original and exposed for 2 minutes from a distance of 1 m using a 2 kW ultra-high pressure mercury lamp. After development with a developer, the copper was etched in the non-image areas by immersion in a 40% by weight ferric chloride aqueous solution, but the photosensitive layer in the exposed areas did not fully function as l/cyst. After that, the resist layer could be easily removed by dipping it in dimethylformamide.
実施例５
実施例１で露光まで行ったフィルムを、次に示した現（
埃液１〜３で現像を行ったが、現隊液１−３のいずれに
よっても実施例１と同様鮮明なポジ画像が得られた。Example 5 The film that had been exposed in Example 1 was subjected to the following process (
Although development was performed using dust solutions 1 to 3, a clear positive image was obtained as in Example 1 using any of the developer solutions 1 to 3.
現像液１
現像液２
現（象液、３
比較例
実施例３で製造したアルコール可溶性ポリアミド１￥を
有するポリエチレ／デレフタレー トフイルノ、のポリ
アミド層の上に、下記組成の公知の感光Ｊ（坂を乾燥後
の塗膜が３μになるように塗布、乾燥して感光性フィル
ムを得た。Developer Solution 1 Developer Solution 2 Comparative Example 3 On the polyamide layer of polyethylene/derephthalate Tofilno having alcohol-soluble polyamide 1 yen produced in Comparative Example Example 3, a well-known photosensitive J (dried slope) having the following composition A photosensitive film was obtained by coating and drying so that the subsequent coating film had a thickness of 3 μm.
感光液
この感光性フィルムをポジ原稿と密着させ超高圧水銀灯
２ ｋＷで１ｍの距離より１コシト３０秒露光を行った
・隣、１重量係水酸化ナトリウム水溶液で感光層の現像
全行った。次いで実施例２で用いた現像液でポリアミド
層のエツチングを行つ／ｌが、感光層に亀裂が生じ、亀
裂が生じた部分のポリアミド層までエツチングが行：ｂ
れてしまい、実施例３のような良好なネガフィルムが・
謙られなかった。Photosensitive solution This photosensitive film was brought into close contact with a positive original and exposed for 30 seconds at a distance of 1 m using an ultra-high pressure mercury lamp of 2 kW.Next, the photosensitive layer was completely developed with a 1 weight aqueous sodium hydroxide solution. Next, the polyamide layer was etched using the developer used in Example 2. A crack appeared in the photosensitive layer, and etching was performed to the polyamide layer at the cracked part: b
As a result, a good negative film like Example 3 is
I couldn't be humbled.
代理人 弁理士 守 谷 −建Agent Patent Attorney Ken Moritani
Claims (1)
ビニルホルマール、又はポリ酢酸ビニルよりなる群から
選ばれた１種以上と、有機溶剤に可！得なアンド化合物
とをＡ有することを特徴とする感光性組成・物。 ２、 ポリビニルブチラールが平均分子量１００００か
ら２３００００で、ブチラール化度が２０から８０ｍｏ
ｌ・％である特許請求の範囲第１項に記載の感光性組成
物。 ３、 ポリビニルホルマールが平均分子ｆｉ９０ＱＯか
ら１５０００１）で、ホルマール化度が２０から８０ｍ
ｏｌ係である特許請求の範囲第１項に記載の感光性組成
物。 ４、 ポリ酢酸ビニルが平均分子−１１５０００カラ２
７０ （ｌ ＯＯである特許請求の範囲第１項に記載の
感光性組成物。 ５、アンド化合物の高分子化合物に対する詑加営が１か
ら６０ ＴＬ ’瞳係である特許請求の範囲第１項、第
２項、第３項又は第４項いずれかに記載の感光性組成物
。 ６、 高分子化合物としてポリビニルプチジ・−ル、ポ
リビニルホルマール、又はポリ酢酸ビニルよりなる群か
ら選ばれた１種以上と、有機溶剤に可ｔ４なアジド化合
物とを含有する感）′を性５８、ｌ酸物を露光してた硬
化きせ、次いで水系現四液で現像すること′、Ｉ−特徴
とする感光性組成物の現像方法。 ７、水系現像液が芳香族カルボン酸、芳香族スルホン酸
、フェノール類、又はアルキ１ル疏酸のアルカリ金属順
化合物の水溶液である特許請求の範囲第６項に記載の現
像方法。[Claims] 1. One or more polymeric compounds selected from the group consisting of polyvinyl butyral, polyvinyl formal, or polyvinyl acetate, and an organic solvent! 1. A photosensitive composition/product characterized by having A and a favorable and compound. 2. Polyvinyl butyral has an average molecular weight of 10,000 to 230,000 and a degree of butyralization of 20 to 80 mo.
1.% of the photosensitive composition according to claim 1. 3. Polyvinyl formal has an average molecular fi90QO to 150001) and a formalization degree of 20 to 80m.
The photosensitive composition according to claim 1, which is a photosensitive composition. 4. Polyvinyl acetate has an average molecular weight of -115,000 Kara2
The photosensitive composition according to claim 1, which is 70 (l OO). , the photosensitive composition according to any one of Items 2, 3, and 4. 6. The polymer compound is 1 selected from the group consisting of polyvinylbutylene, polyvinyl formal, or polyvinyl acetate. 58, a compound containing an azide compound which can be used in an organic solvent, is cured by exposing it to light, and then developed with an aqueous developing solution.I-Characteristic: A method for developing a photosensitive composition. 7. The developing method according to claim 6, wherein the aqueous developer is an aqueous solution of an alkali metal compound of aromatic carboxylic acid, aromatic sulfonic acid, phenols, or alkyl sulfonic acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14861382A JPS5937540A (en) | 1982-08-26 | 1982-08-26 | Photosensitive composition and its development method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14861382A JPS5937540A (en) | 1982-08-26 | 1982-08-26 | Photosensitive composition and its development method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5937540A true JPS5937540A (en) | 1984-03-01 |
| JPH0361938B2 JPH0361938B2 (en) | 1991-09-24 |
Family
ID=15456694
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14861382A Granted JPS5937540A (en) | 1982-08-26 | 1982-08-26 | Photosensitive composition and its development method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5937540A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02173645A (en) * | 1988-12-26 | 1990-07-05 | Konica Corp | Photosensitive composition and image forming method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4825518A (en) * | 1971-08-02 | 1973-04-03 | ||
| JPS5936245A (en) * | 1982-08-25 | 1984-02-28 | Hitachi Ltd | Photosensitive composition |
-
1982
- 1982-08-26 JP JP14861382A patent/JPS5937540A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4825518A (en) * | 1971-08-02 | 1973-04-03 | ||
| JPS5936245A (en) * | 1982-08-25 | 1984-02-28 | Hitachi Ltd | Photosensitive composition |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02173645A (en) * | 1988-12-26 | 1990-07-05 | Konica Corp | Photosensitive composition and image forming method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0361938B2 (en) | 1991-09-24 |
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