JPS59219392A - Odorization of gas and device for it - Google Patents

Odorization of gas and device for it

Info

Publication number
JPS59219392A
JPS59219392A JP9458983A JP9458983A JPS59219392A JP S59219392 A JPS59219392 A JP S59219392A JP 9458983 A JP9458983 A JP 9458983A JP 9458983 A JP9458983 A JP 9458983A JP S59219392 A JPS59219392 A JP S59219392A
Authority
JP
Japan
Prior art keywords
tank
gas
bypass pipe
odorant
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9458983A
Other languages
Japanese (ja)
Other versions
JPH0414158B2 (en
Inventor
Masao Seki
雅夫 関
Yoshihiro Yamamoto
佳宏 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Gas Engineering Co Ltd
Original Assignee
Tokyo Gas Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Gas Engineering Co Ltd filed Critical Tokyo Gas Engineering Co Ltd
Priority to JP9458983A priority Critical patent/JPS59219392A/en
Publication of JPS59219392A publication Critical patent/JPS59219392A/en
Publication of JPH0414158B2 publication Critical patent/JPH0414158B2/ja
Granted legal-status Critical Current

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  • Sampling And Sample Adjustment (AREA)
  • Treating Waste Gases (AREA)

Abstract

PURPOSE:To insure odorization of gas to a consistent concn., by attaching a bypass pipe provided with a odorant tank to a gas conduit pipe and controlling flow of gas passing through the bypass pipe in keeping with changes in pressure and temp. of the gas. CONSTITUTION:A bypass pipe 2 provided with an odorant tank 6 is attached to a gas conduit pipe 1. An odorant is vaporized into gas passing through the bypass pipe 2 to saturation in order to effect odorization of the gas. Pressure 7 in the odorant tank 6 and temp. 8 near the outlet of the tank 6 are sensored and these two variables are put in a computer 4 for calculation of a correction value and control of gas flow in the bypass pipe 2 through adjustment of a control valve 3. Thus, the gas flow is automatically controlled and the concn. of the odorant is maintained at a constant level even when the amt. of evaporated odorant is varied by change of temp. and pressure of gas passing through the bypass pipe 2.

Description

【発明の詳細な説明】 1  〔本発明の屈する技術分野〕 本発明(」、カスに対する付臭方υ、及びその装置にT
   関するもので、詳しくは、都市カスなどに於いし
   て、生ガスの漏洩を早期に発見じて処理するため
に、安全対策」−供給ガスに対してバイパス方式にイ 
  より刺具する方法及びその装置に関するものであi
ll    る。
DETAILED DESCRIPTION OF THE INVENTION 1 [Technical field to which the present invention pertains] The present invention (a method for adding odor to dregs, and an apparatus for the same)
For details, see ``Safety measures for detecting and disposing of leaks of raw gas at an early stage in urban wastes, etc.''
This article relates to a method and device for stabilizing the needle.
Ill.

籠  〔従来の技術〕 第1図は従来における/\イパス方式に基づく伺1  
 臭装置を示し、ガス導管01に絞り機構02を八つ 
  イパスするバイパス管03を取り付けると共にこL
   のバイパス省03内に付臭剤槽04を取すイ・1
け、バイパス管03を通過するガスに付臭剤を蒸発させ
て飽和させるものである。
Cage [Conventional technology] Figure 1 shows the conventional technology based on the /\Ipass method.
The odor device is shown, and eight throttle mechanisms 02 are installed in the gas conduit 01.
At the same time as installing the bypass pipe 03
Take the odorant tank 04 into the bypass tank 03 of 1.
The odorizing agent is evaporated and saturated in the gas passing through the bypass pipe 03.

〔従来技術の問題点〕[Problems with conventional technology]

従来のバイパス式付臭方法(装置)は以上の如き構成の
ため、バイパス管内を通過するガスの温度及び圧力変動
があると、付臭濃度が変化する欠点を有している。そこ
で、従来はバイパス管03内に手動バルブ05を取り付
けておき、この手動バルブ05を経験と勘に頼って操作
しながらバイパス管03内を通過するガス量を変化させ
て濃度が規定の範囲内に収まるように調整している。
Since the conventional bypass type odorization method (device) has the above-described configuration, it has a drawback that the odor concentration changes when there are fluctuations in the temperature and pressure of the gas passing through the bypass pipe. Therefore, in the past, a manual valve 05 was installed in the bypass pipe 03, and the concentration was kept within a specified range by operating the manual valve 05 relying on experience and intuition to change the amount of gas passing through the bypass pipe 03. It has been adjusted to fit.

しかし、上記の方法では、経験者でないと調整出来ない
ことと、温度変化や圧力変化が大きい設備ではバルブの
操作が頻繁となり、現実的な対応が不可能である。そこ
で、他の付臭装置に比し多くの利点を有する前記従来方
式ではあるが、採用は見送られている。
However, with the above method, only an experienced person can make adjustments, and in equipment where temperature and pressure changes are large, the valves must be operated frequently, making it impossible to handle them realistically. Therefore, although the conventional method has many advantages over other odorizers, its adoption has been postponed.

〔本発明の目的〕 本発明は叙上の如き点から、バイパス管内を通過する圧
力及び温度変化があっても付臭濃度が変化しない付臭方
法及びこの方法に使用される付臭装置を提案するのが目
的である。
[Object of the present invention] Based on the above points, the present invention proposes an odor adding method in which the odor concentration does not change even if there are changes in pressure and temperature passing through the bypass pipe, and an odor adding device used in this method. The purpose is to.

〔本発明の構成〕[Configuration of the present invention]

本発明は上記目的を達成するために、バイパス管(ライ
ン)内を通過するガスの圧力と温度とを検出し、この検
出値に基づいて次の式により演算を11い、補正値を求
め、この補正値に基づいてバイパス管内に取り付けた流
量制御弁を自動制御して流量制御を行ないながら付臭濃
度を一定に維持するものである。
In order to achieve the above object, the present invention detects the pressure and temperature of the gas passing through the bypass pipe (line), calculates the correction value using the following formula based on the detected value, and calculates the correction value. Based on this correction value, the flow rate control valve installed in the bypass pipe is automatically controlled to maintain a constant odor concentration while controlling the flow rate.

先ず、第2図に於いて、ガス導管1内を通過するガスの
流量をV+ (N% となし、バイパス管2内を通過す
るガスの流量をV2 (”%)とするとき、バイパス流
路の流量調節弁以外の流体抵抗はほとんど無視できるも
のとして、 ・分流比 CV+・・・メインガス導管ノズル の容量係数 CV2・・・バイパス管の流量制御 弁の容量係数 ・付臭剤バランス 蒸発量F丁(g/h)、滴下率α(g Am’ )、A
点の揮発量γ(g Am” ) FT=α・(■+v2)=′v2φγ ・ガス圧力とA点の揮発量の関係 ガス圧力PI(kg/crn’abs)、 付臭剤飽和
蒸気圧Po (mmHzo ) 、付臭剤の種類により
定まる定数KP′n (°、”P、)>PD) ・付臭剤の飽和蒸気圧特性 ガス温度t(’Cり P、=ヂ(1+) −−−−−−−−−■■〜■式より ■式より となる。
First, in FIG. 2, when the flow rate of gas passing through the gas conduit 1 is V+ (N%) and the flow rate of gas passing through the bypass pipe 2 is V2 (%), the bypass flow path Assuming that the fluid resistance other than the flow rate control valve can be almost ignored, ・Division ratio CV+...Capacity coefficient of the main gas conduit nozzle CV2...Capacity coefficient of the flow rate control valve of the bypass pipe・Odorant balance evaporation amount F (g/h), dropping rate α (g Am'), A
Volatilization amount at point γ (g Am”) FT=α・(■+v2)=′v2φγ ・Relationship between gas pressure and volatilization amount at point A Gas pressure PI (kg/crn'abs), Odorant saturated vapor pressure Po (mmHz), constant KP'n determined by the type of odorant (°, "P,) > PD) - Saturated vapor pressure characteristics of the odorant gas temperature t ('CriP, = も(1+) -- −−−−−−−■■~■Formula 2 is better than formula ■.

以上の演算から、バイパス管2に取り付けたりニアル特
性を有する制御弁3の制御値(CV)を圧力・温度の関
数としての上式のように特性化すると、定量性の高い、
付臭が可能となる。
From the above calculations, if we characterize the control value (CV) of the control valve 3 that is attached to the bypass pipe 2 or has a linear characteristic as a function of pressure and temperature as in the above equation, we can obtain a highly quantitative
It is possible to add odor.

なお、第2図に於いて、4は演算器、5はこの演算器4
と制御弁3を結ぶ信号線、6は付臭装置、7は圧力検出
点、8は温度検出器、9.10は信号線、11は温度変
換器である。
In addition, in FIG. 2, 4 is an arithmetic unit, and 5 is this arithmetic unit 4.
6 is an odorizer, 7 is a pressure detection point, 8 is a temperature detector, 9.10 is a signal line, and 11 is a temperature converter.

第3図は上記符号6で示した付臭装置を示し、(ツ臭剤
槽6内にパイプ12を垂直に装入し、このパイプ12の
一部にガス導管lからガス13を導入してパイプ12内
に送入し、バブルポンプ方式により付臭剤槽6内の付臭
剤を槽内上部に導いてバイパス管2から槽内に入ったガ
スに蒸発させて飽和させる構成である。
FIG. 3 shows the odorizing device indicated by the reference numeral 6, in which a pipe 12 is inserted vertically into the odorant tank 6, and a gas 13 is introduced into a part of the pipe 12 from the gas conduit l. The odorant is introduced into the pipe 12, and the odorant in the odorant tank 6 is guided to the upper part of the tank using a bubble pump method, and is evaporated into gas entering the tank from the bypass pipe 2 to be saturated.

第4.Aは付臭装置の他の実施例を示し、付臭剤槽6内
に仕切板14をたて方向にずらして装入することにより
蛇行流路15を形成し、この蛇行流路L5内においてバ
イパス管2から槽内に入ったガスに付臭剤を蒸発させて
飽和させる構成である。なお、仕切板14の両面に付臭
液と親和性の高い繊維等の多孔質材料を添伺すればガス
と4=]臭液との接触面積が拡大し、高流量域まで飽和
状態が維持でき、本装置の適用範囲の拡大が図れる。
4th. A shows another embodiment of the odorizer, in which a meandering flow path 15 is formed by shifting the partition plate 14 in the vertical direction into the odorant tank 6, and in this meandering flow path L5. The structure is such that the odorant is evaporated and saturated in the gas that enters the tank from the bypass pipe 2. In addition, if porous materials such as fibers that have a high affinity with the odorizing liquid are placed on both sides of the partition plate 14, the contact area between the gas and the odorizing liquid will be expanded, and the saturated state will be maintained up to a high flow rate range. It is possible to expand the scope of application of this device.

第5図は付臭装置の他の実施例を示し、付臭剤槽6の天
蓋中心に対して上方からガス送入パイプ16を挿入し、
槽内のフロート17により液面よりやや離れた位置に浮
上させた傘状噴出体18のカス人口19を前記カス送入
パイプ16内に上下動自在に挿入し、液面の変動に常に
追従させながら安定した刺具剤の蒸発と飽和を図る構成
である。20は傘状噴出体18の周囲に形成した多脚状
のスカートにして、ガスと付臭液との接触の促進を図る
ものである。
FIG. 5 shows another embodiment of the odorizer, in which a gas feed pipe 16 is inserted from above into the center of the canopy of the odorizer tank 6,
The waste mass 19 of the umbrella-shaped ejection body 18 floated to a position slightly apart from the liquid level by the float 17 in the tank is inserted into the waste feed pipe 16 so as to be able to move up and down, and is made to constantly follow fluctuations in the liquid level. It is designed to achieve stable evaporation and saturation of the pricking agent. Numeral 20 is a multi-legged skirt formed around the umbrella-shaped ejector 18 to promote contact between the gas and the odorized liquid.

〔本発明の効果〕[Effects of the present invention]

本発明は以1−のように、ガス圧に変動があった場合及
びガスに温度変化が生じ、この結果飽和蒸気圧に変動が
あった場合に、これを検出し、この検出値から補正値を
演算することによりバイパス管2内を通過するガス量を
制御して、付臭濃度の安定化を図るので、付臭濃度の変
化に基づくトラブルの発生は防止できる。
As described in 1- below, the present invention detects when there is a change in gas pressure, or when a temperature change occurs in the gas, resulting in a change in saturated vapor pressure, and uses this detected value to create a correction value. By calculating , the amount of gas passing through the bypass pipe 2 is controlled and the odor concentration is stabilized, so troubles due to changes in the odor concentration can be prevented from occurring.

次に、イ+J臭装置として、第3図に示すような/″−
プルポンプ方式第4図に示すような流路蛇行方式、第5
図に示すようなフローi・方式を採用することにより、
高流量域まで付臭液の飽和状態が保障される。
Next, as an I + J odor device, /''- as shown in Figure 3.
Pull pump method Meandering flow path method as shown in Fig. 5
By adopting the flow i method as shown in the figure,
The saturated state of the odorized liquid is guaranteed up to the high flow rate range.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のバイパス式付臭装置の説明図、第2図は
本発明に係る付臭方法及びその装置を示す一実施例図、
第3図(イ)、(ロ)はバブルポンプ方式を採用した付
臭装置の断面図、第4図(イ)、(ロ)は蛇行流路方式
を採用した付臭装置の断面図、第5図(イ)、(ロ)、
(ハ)はフロート方式を採用した付臭装置の断面図であ
る。 1・・・・・・ガス導管、2・・・・・・バイパス管、
3・旧・・流量制御弁、4・・・・・・演算器、6・・
・用刺具装置。
FIG. 1 is an explanatory diagram of a conventional bypass type odorization device, and FIG. 2 is an embodiment diagram showing the odorization method and device according to the present invention.
Figures 3 (a) and (b) are cross-sectional views of an odorizer that uses a bubble pump system, and Figures 4 (a) and (b) are cross-sectional views of an odorizer that uses a meandering channel system. Figure 5 (a), (b),
(C) is a cross-sectional view of an odorization device employing a float method. 1...Gas conduit, 2...Bypass pipe,
3. Old...Flow rate control valve, 4... Arithmetic unit, 6...
・Stab device.

Claims (4)

【特許請求の範囲】[Claims] (1)カス導管に対してバイパス管を取り付けると」に
このバイパス管の一部に刺具剤槽を取り付け、バイパス
管内を通過するカスに付臭剤を蒸発させて飽和させるガ
スに対する付臭方法において、イ・臭剤槽内の圧力と槽
内山側又は出口近傍の温度」を検出し、これら二つの変
動値から補正値を演3してバイパス省内を通過するカス
のがL蛍を調整するカスに対する付臭方法。
(1) When a bypass pipe is attached to the waste conduit, a stinging agent tank is attached to a part of the bypass pipe, and the waste passing through the bypass pipe is evaporated with an odorant to saturate the gas. 1) Detect the pressure inside the odor agent tank and the temperature on the inside of the tank or near the outlet, calculate a correction value from these two fluctuation values, and adjust the amount of waste passing through the bypass chamber. A method of adding odor to the residue.
(2)伺晃剤槽内1こパイプを垂直に装入し、このパ・
プ内にカス導管内のカスの一部を送入し、付臭tを槽内
上部に導いて拡散し、蒸発させるように本成した刺具装
置。
(2) Insert one pipe vertically into the detergent tank, and
This prick device is designed to feed part of the waste in the waste conduit into the tank, and introduce the odorized t to the upper part of the tank, where it is diffused and evaporated.
(3) 4・l臭剤槽内たて方向に仕切板をずらして装
入することにより蛇行流路を形成し、バイパス管内Cカ
スをこの蛇行流路を介して通過させることに。 り刺具剤を蒸発させるように構成したイ」臭装置。
(3) A serpentine flow path is formed by shifting the partition plate in the vertical direction of the 4-l odorant tank and passing the C dregs in the bypass pipe through this serpentine flow path. An odor device configured to evaporate a stinging agent.
(4) 4=j臭剤槽の天蓋中心に対して上方からガス
送入パイプを取すイ・」け、下位にフロートを取り伺け
た傘状噴出体のカス入口を前記ガス送入パイプ内に」二
下動目在に挿入し、ガスの噴出口を液面に近づ(けてイ
・]臭剤の蒸発を行うように構成した刺具装置。
(4) 4=J Remove the gas inlet pipe from above against the center of the canopy of the odorant tank, and insert the waste inlet of the umbrella-shaped ejector, which has reached the float below, into the gas inlet pipe. A prick device inserted into the second lower movement point and configured to bring the gas outlet close to the liquid surface to evaporate the odor agent.
JP9458983A 1983-05-27 1983-05-27 Odorization of gas and device for it Granted JPS59219392A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9458983A JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9458983A JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Publications (2)

Publication Number Publication Date
JPS59219392A true JPS59219392A (en) 1984-12-10
JPH0414158B2 JPH0414158B2 (en) 1992-03-11

Family

ID=14114459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9458983A Granted JPS59219392A (en) 1983-05-27 1983-05-27 Odorization of gas and device for it

Country Status (1)

Country Link
JP (1) JPS59219392A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004035185A1 (en) * 2002-10-14 2004-04-29 The Private Enterprise Firm 'texkon' Gas odoriser
JP2007103347A (en) * 2005-09-07 2007-04-19 Toyota Motor Corp Hydrogen supply device
WO2008120697A1 (en) * 2007-03-30 2008-10-09 Mitsui Engineering & Shipbuilding Co., Ltd. Odorizing apparatus
EP2149596A1 (en) * 2007-04-19 2010-02-03 Toyota Jidosha Kabushiki Kaisha Odorant adding device and fuel gas supply system
JP2010256311A (en) * 2009-04-28 2010-11-11 Espec Corp Test method and testing equipment
JP2010256312A (en) * 2009-04-28 2010-11-11 Espec Corp Test method, organic gas supply device, and testing equipment
EP3037504A1 (en) * 2014-12-23 2016-06-29 Linde Aktiengesellschaft Method and odorisation agent storage for odorising an useful gas, especially natural gas

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281303A (en) * 1975-12-27 1977-07-07 Osaka Gas Co Ltd Apparatus for odorizing gas
JPS5299362A (en) * 1976-02-16 1977-08-20 Omron Tateisi Electronics Co Group control of weaving machine
JPS52132355A (en) * 1976-04-28 1977-11-07 Tokyo Electric Power Co Inc:The Setting system for protective relay

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5281303A (en) * 1975-12-27 1977-07-07 Osaka Gas Co Ltd Apparatus for odorizing gas
JPS5299362A (en) * 1976-02-16 1977-08-20 Omron Tateisi Electronics Co Group control of weaving machine
JPS52132355A (en) * 1976-04-28 1977-11-07 Tokyo Electric Power Co Inc:The Setting system for protective relay

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004035185A1 (en) * 2002-10-14 2004-04-29 The Private Enterprise Firm 'texkon' Gas odoriser
US8746274B2 (en) 2005-09-07 2014-06-10 Toyota Jidosha Kabushiki Kaisha Hydrogen supply apparatus and fuel gas supply apparatus
JP2007103347A (en) * 2005-09-07 2007-04-19 Toyota Motor Corp Hydrogen supply device
EP1935844A1 (en) * 2005-09-07 2008-06-25 Toyota Jidosha Kabushiki Kaisha Hydrogen supply apparatus and fuel gas supply apparatus
EP1935844A4 (en) * 2005-09-07 2009-09-16 Toyota Motor Co Ltd Hydrogen supply apparatus and fuel gas supply apparatus
WO2008120697A1 (en) * 2007-03-30 2008-10-09 Mitsui Engineering & Shipbuilding Co., Ltd. Odorizing apparatus
JP2008248046A (en) * 2007-03-30 2008-10-16 Mitsui Eng & Shipbuild Co Ltd Odorization apparatus
EP2149596A1 (en) * 2007-04-19 2010-02-03 Toyota Jidosha Kabushiki Kaisha Odorant adding device and fuel gas supply system
EP2149596A4 (en) * 2007-04-19 2013-01-02 Toyota Motor Co Ltd Odorant adding device and fuel gas supply system
US9028570B2 (en) 2007-04-19 2015-05-12 Toyota Jidosha Kabushiki Kaisha Odorant addition device and fuel gas supply system
JP2010256312A (en) * 2009-04-28 2010-11-11 Espec Corp Test method, organic gas supply device, and testing equipment
JP2010256311A (en) * 2009-04-28 2010-11-11 Espec Corp Test method and testing equipment
EP3037504A1 (en) * 2014-12-23 2016-06-29 Linde Aktiengesellschaft Method and odorisation agent storage for odorising an useful gas, especially natural gas

Also Published As

Publication number Publication date
JPH0414158B2 (en) 1992-03-11

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