JPS5896722A - Capacity type moisture sensor and method of producing same - Google Patents

Capacity type moisture sensor and method of producing same

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Publication number
JPS5896722A
JPS5896722A JP56194421A JP19442181A JPS5896722A JP S5896722 A JPS5896722 A JP S5896722A JP 56194421 A JP56194421 A JP 56194421A JP 19442181 A JP19442181 A JP 19442181A JP S5896722 A JPS5896722 A JP S5896722A
Authority
JP
Japan
Prior art keywords
metal compound
metal
film
humidity sensor
forming chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56194421A
Other languages
Japanese (ja)
Inventor
淑夫 今井
鍋田 庸一
犬塚 直夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP56194421A priority Critical patent/JPS5896722A/en
Publication of JPS5896722A publication Critical patent/JPS5896722A/en
Pending legal-status Critical Current

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  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Non-Adjustable Resistors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 この発明は、容量式湿度センサ及びその製造法に関する
ものであって、史に詳細にはアルミニウムまたはマグネ
シウムの酸化物若しくは窒化物の皮膜を誘電膜とし、機
械的強度に極めて優れ、高温条件下や有機溶媒雰囲気下
においても性能劣下することなく、応答が極めて良好で
、正確な湿度測定をなし得る谷撮式湿度センサ及びその
g!改法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a capacitive humidity sensor and a method for manufacturing the same. An extremely high-performance humidity sensor and its g! It concerns law reform.

一般に電′気湿度計は、湿度条件の変化による電気的特
性の変化を相対湿度として表示する一檀のトランスジユ
ーザとして理解され、その補水原理としては電気抵抗の
変化全利用するものと、静電容Iの変化を測定するもの
との二種類に大別される。このうち後者の靜電容曖式、
すなわち感湿部が吸湿したときの静電容Iの変化を測定
して湿度を求める型式の湿)(センサでは、従来より陶
磁器板やガラス繊維、アルマイト薄板ケ@珠加rしたも
の等が誘電体として用いられているが、測定感度が劣る
ため実用化上問題があるとされている。また、感湿部2
して機能する誘電体と[〜て有機高分子膜を使用する湿
度センサが近年提案されて分り、この種の技術は、例え
ば特開昭弘ターフ≠rs’r号、特開昭5S−A47≠
2号及び米国特許第33!02t1号明細瞥に開示され
ている。
In general, an electric hygrometer is understood as a transducer that displays changes in electrical characteristics due to changes in humidity conditions as relative humidity, and its water replenishment principle is one that makes full use of changes in electrical resistance, and one that uses static electricity. There are two types: those that measure changes in capacitance I; and those that measure changes in capacitance I. Of these, the latter, the Seiden Yongfu style,
In other words, it is a type of humidity sensor that determines humidity by measuring the change in capacitance I when the moisture-sensing part absorbs moisture. However, it is said that there is a problem in practical use because the measurement sensitivity is poor.
Humidity sensors using dielectrics and organic polymer films that function as
No. 2 and US Pat. No. 33!02t1.

ところで一般に、有機高分子膜からなる誘電体を感湿層
として使用する場合、この誘イ1体は1兄曲に対する応
答性に優れると共に反復再現性が良好であり、また湿度
対谷針の相対関係が極めて直線的に表われるので測定精
度が向上する等の利点を有する。しかしながら他方では
、前記有機高分子膜誘電体は、過度の乾燥条件下、高湿
11を条件FK長時間晒されると基板からの剥落等を生
じて、感湿特性が劣化する難点がある。
By the way, in general, when a dielectric material made of an organic polymer film is used as a moisture-sensitive layer, this dielectric material has excellent responsiveness to one-dimensional music and has good repeatability. Since the relationship appears extremely linear, it has advantages such as improved measurement accuracy. On the other hand, however, the organic polymer film dielectric has the disadvantage that if it is exposed to excessively dry conditions and high humidity (11) for a long period of time, it will peel off from the substrate and its moisture sensitive properties will deteriorate.

また、有機高分子膜は有機溶剤(例えばアセトン)によ
り侵され易いので、印刷工場、塗料工場等のように有+
@晦剤蒸気が多量に存在する雰囲気下では悪影響を受け
るため使用に供1−得ない等の難点が指摘される。
In addition, since organic polymer membranes are easily attacked by organic solvents (e.g. acetone),
It has been pointed out that in an atmosphere where a large amount of lubricant vapor is present, it is adversely affected and cannot be used.

そこで、高温条件や有機溶剤雰囲気等の悪環境ドでも好
適に使用し得る、機械的強1髪に優れた容曖式湿+5セ
ンサの実用化が業界において強く要耀されている。この
種の要望に応えるものとして、例えば特開昭3.2−1
817号[金属酸化膜感湿素子」や、特開昭j3−タj
りj→[アルミニウムの陽極酸化皮膜をIf用したき湿
量検出素子j等が提案されている。これは、いずれもア
ルミニウム板等の基板自体に電解その他の手段によって
導電性の多孔性金)4酸化皮膜を形成するものであるが
、素子表面が粗いため測定誤差が生じ易く、まlここの
金属酸化皮膜自体の機械的強度も光分でない等、1へ然
として前記要請を満足するものではなかった。
Therefore, there is a strong demand in the industry for the practical application of a humidity sensor with excellent mechanical strength, which can be suitably used in adverse environments such as high temperature conditions and organic solvent atmospheres. For example, Japanese Patent Application Laid-Open No. 3.2-1
No. 817 [Metal Oxide Film Moisture Sensing Element] and JP-A No. 3-J
rij → [Wetness detection element j using an anodic oxide film of aluminum for If, etc. have been proposed. In both of these methods, a conductive porous gold (4) oxide film is formed on the substrate itself, such as an aluminum plate, by electrolysis or other means, but measurement errors are likely to occur due to the roughness of the element surface. However, the mechanical strength of the metal oxide film itself was not as high as that of light, and thus did not meet the above requirements.

それ故、発明者等は前記諸欠点を解決するべく種々試作
研究を車ねた結束、基板自体[酸化や1!を解により被
膜を形成することに代えて、ガラス等の酸化になじまな
い絶縁基板に金嫡化合物(例えば金禰酸化物、金@窒化
物)の膜を、高周波電界内に対応金属の蒸気と酸素ま′
fcは窒素若しくはアンモニアガスを導き、イオンブレ
ーティングにより形成するようにすれば、得られる金属
化合物膜は極めて大会な強度を有するのC1前述した荀
酷な環境下での使用に充分耐え、しかも膜面も平滑で密
となるので、応答性、反復再現性IL優れて測定精度も
向上することを突止めて特許出願をした。
Therefore, in order to solve the above-mentioned drawbacks, the inventors have carried out various prototype research on the bond, the substrate itself [oxidation, etc.] Instead of forming a film by solution, a film of a metal compound (e.g. gold oxide, gold@nitride) is deposited on an insulating substrate that is not compatible with oxidation, such as glass, and the vapor of the corresponding metal is applied in a high-frequency electric field. Oxygen
If fc is formed by introducing nitrogen or ammonia gas and ion blating, the resulting metal compound film will have extremely high strength. Since the surface is smooth and dense, it was found that responsiveness, repeatability, IL, and measurement accuracy were improved, and a patent application was filed.

しかし、その後、高真空下に酸素とアルゴンの混合ガス
またる・1アンモニアガス若しくは窒素と水素の混合ガ
スヶ導入しつつ高周波電界内で対応金@をイオンガンに
よりスパッタしてイオンブレーティングさせる方法が好
適なこと、更に、金属化合物膜を機械的処理、例えばプ
ラズマエツチングにより粗面化すれば、応答性が顕著に
向上する事実を見出し本発明を完成した。
However, after that, it is preferable to perform ion blating by sputtering the corresponding gold with an ion gun in a high-frequency electric field while introducing a mixed gas of oxygen and argon, 1 ammonia gas, or a mixed gas of nitrogen and hydrogen under a high vacuum. Furthermore, the present invention was completed based on the discovery that if the surface of the metal compound film is roughened by mechanical treatment, such as plasma etching, the responsiveness can be significantly improved.

従って、本発明の一般的な目的は、機械的強度に優れ、
高温条件や有機溶剤雰囲気等の醒酷な悪環境ドでも性能
劣1ヒ會呈すること/:C<、応答が極めて良好で正確
な湿度Titll定をなし得る6計式湿度センサを提供
するにある。
Therefore, the general object of the present invention is to have excellent mechanical strength;
To provide a 6-meter humidity sensor that exhibits poor performance even in harsh environments such as high temperature conditions and organic solvent atmospheres. .

この目的を達成するため本発明は、非導電性基板上に電
極を対向配置し、前記電極上に湿気に活性な金属化合物
膜を独立して形成し、前記金属化合物膜を機械的処理に
より粗面とし、前記粗面上に湿気、透過性の金礪皮@を
形Ijy、r石こと全特徴とする。
In order to achieve this object, the present invention arranges electrodes facing each other on a non-conductive substrate, independently forms a moisture-active metal compound film on the electrodes, and roughens the metal compound film by mechanical treatment. A surface, and a moisture-permeable gold peel on the rough surface is formed into a shape Ijy, r stone.

なお、金属化合*J1漢を基板に形成する方法としては
、高周彼区界内でイオンガンによるイオンプレーディン
グが好適に使用され、得られた金属化合物1摸は同じ装
置によりプラズマエツチングC相開化される。従って本
発明に係る湿ノ丈センサの製造方法は、非導電性基板を
真空形成室中の高圧電極に支持して高覗圧金印卯し、真
空形成室内の不紳気体全篩真空にすることにより除去し
、外部より所定の気体を導入し、真空形成室内に高周波
11t界を形成した後、前記真空形成室中に配置膚した
金属板若しくは金属化合物1摸イオンガンよりのイオン
によりスパッタして金頃イオン若しくは全綱化合物イオ
ンを生成ぜしめ、金属イオンは導入した気体により金属
化合物イオンとなし、前記非導電性基板と電極上とに金
属化合物膜1摸を独立して形成後、引続缶前記高醒圧の
印加を高めて前記金属化合物膜11全プラズマエツチン
グぜしめて粗面化し、前記粗面上に湿気透過性の金属皮
膜全形成することを特徴とする。
Ion plating with an ion gun in a high-frequency zone is preferably used as a method for forming the metal compound*J1 on a substrate, and one sample of the obtained metal compound is subjected to plasma etching and C phase opening using the same equipment. be done. Therefore, in the method for manufacturing a humidity sensor according to the present invention, a non-conductive substrate is supported on a high-voltage electrode in a vacuum forming chamber, and a high pressure metal seal is applied to the substrate, thereby evacuating all infertile gases in the vacuum forming chamber. After introducing a predetermined gas from the outside and forming a high frequency 11T field in the vacuum forming chamber, one metal plate or metal compound placed in the vacuum forming chamber is sputtered with ions from an ion gun. After generating gold ions or all-class compound ions, converting the metal ions into metal compound ions by the introduced gas, and forming a sample of the metal compound film independently on the non-conductive substrate and the electrode, the subsequent canning is performed. The present invention is characterized in that the application of the high pressure is increased to roughen the entire surface of the metal compound film 11 by plasma etching, and a moisture-permeable metal film is entirely formed on the rough surface.

次に、本発明に係る客層式湿度センサ及びその製造法に
つ鴬、好適な実施例を挙げて添付図面全参照しながら以
下詳細[説明する。
Next, the customer layer type humidity sensor and its manufacturing method according to the present invention will be described in detail below with reference to preferred embodiments and all the accompanying drawings.

第1図及び第2図は、本発明に係る各皺式湿度センサの
一実施例を示すものであって、参照符第1図に示すよう
に一対の′F部東極12、/2が対向的に蒸着、ホトエ
ツチング等の手段により約/μの厚さに形成され、この
場合前記下部電極は1@形とし、各櫛歯が相互に接触す
ることなく噛み合うようなパターンとなるよう配設する
のが好適である。なお、この下部電極々しては、化学的
に不活性な金″!iたけパラジウム等が好適な材料とし
て使用される。このように下部は極/2、/2を形成し
た基板10に、後述するように高周波電源ケ便用したイ
オンブレーティング法を実施し、湿気に活性な金属化合
物膜l弘(例えば金属酸化物膜や金属窒化物膜)を約/
〜2μの厚さで基板に対し独立して形1戊し。
1 and 2 show an embodiment of each wrinkle type humidity sensor according to the present invention, and as shown in FIG. The lower electrodes are formed oppositely to a thickness of about 1/μ by means of vapor deposition, photoetching, etc. In this case, the lower electrodes are 1@-shaped and arranged in a pattern such that the comb teeth mesh without touching each other. It is preferable to do so. Note that chemically inert gold, palladium, or the like is preferably used as a material for the lower electrodes.In this way, the lower electrodes are formed on the substrate 10 on which the electrodes /2 and /2 are formed. As described later, an ion blating method using a high frequency power source is carried out to coat a moisture-active metal compound film (for example, a metal oxide film or a metal nitride film).
Shape 1 is cut independently to the substrate with a thickness of ~2μ.

この表面を機械的、例えばプラズマエツチングにより約
10o、1oooAの厚さ粗面化した粗面/6を形成す
る。更に、この得られた金属化合物膜/≠の粗面/を上
に、湿気透過性で化学的に安定な金属、例えば合皮1嘆
またはパラジウム皮膜を厚さ200−λjO^に蒸着形
成して上部電極itとする。これによって、機械的強度
の極めて優れ、かつ応答性の極めて良好な湿1(センサ
が得られる。
This surface is mechanically roughened, for example by plasma etching, to form a rough surface/6 with a thickness of about 10.degree. Furthermore, a moisture-permeable and chemically stable metal such as synthetic leather or palladium film is vapor-deposited on top of the obtained metal compound film/≠ rough surface/ to a thickness of 200−λjO^. Let it be the upper electrode it. As a result, a humidity sensor 1 (sensor) having extremely excellent mechanical strength and extremely good responsiveness can be obtained.

次に、下部電極/、2./2を形成E7た基板10に金
属化合物膜/≠及び粗面16を形成する方法について1
悦明する。第3図(1この方法を実施する装置の概略を
示すものCあって、外界から気密に遮断り能な真空形成
室2θ中に負電極22、コイル2≠及び金属呼たに金属
化合物板を固足するIF電本コを及びイオンガン、2t
が図示のように配置されている。前dピIE負醒極22
 、.26(fcId−0,0j 〜/kVの11流′
市圧が印加されるよう1でなっており、またコイル2弘
は外部高周波1[源30に接続されている。1E覗極2
乙はコイル2≠の下部において、イオンガンと約2〜3
t−n+の距離を酋(八でり0度の角度で対向し、かつ
IF電極2を自体は水平向に対し約urH5傾斜して配
設される。イオンガンの外部iii極32dl 〜jk
Vのは庄でjmN〜10mAの電流を供給する。
Next, the lower electrode/,2. 1 Regarding the method of forming the metal compound film /≠ and the rough surface 16 on the substrate 10 with /2 formed E7
Be happy. Figure 3 (1) shows an outline of an apparatus for carrying out this method, in which a negative electrode 22, a coil 2≠, and a metal compound plate are placed in a vacuum forming chamber 2θ that can be airtightly isolated from the outside world. IF electric book and ion gun, 2t
are arranged as shown. Front dpi IE negative arousal pole 22
,.. 26 (fcId-0,0j ~/kV 11th flow'
1 so that the city pressure is applied, and the coil 2 is connected to an external high frequency source 30. 1E peep pole 2
At the bottom of coil 2≠, connect it with the ion gun by about 2 to 3
The IF electrodes 2 are arranged at a distance of t-n+ at an angle of 0 degrees, and the IF electrodes 2 are inclined at an angle of about urH5 with respect to the horizontal direction.
A current of jmN to 10 mA is supplied at the voltage of V.

またitl記戊仝形成゛室lOから管体3すを導出して
、升体36ケ介した区、真空ポンプ3gに接続し、また
同様に真空形成室20から管体≠Oを導出して弁体グ2
を介し後述するガス源(図示せず)に接続する。
In addition, the tube body 3 is led out from the itl record forming chamber 1O, and connected to the vacuum pump 3g through 36 cells, and the tube body ≠O is similarly led out from the vacuum formation chamber 20. Valve body 2
It is connected to a gas source (not shown), which will be described later.

操作に際してit、*空形成室2θ中の1電極の下面に
、前記下部電極/2./2を形成した基板10f水平に
固定し、陽極2tに例えばアルミニウム板ケ固定した後
、真空形成室、20を気密に閉成する。次いで、真空ポ
ンプ311fJi。
During operation, it is applied to the lower surface of one electrode in the empty forming chamber 2θ, the lower electrode/2. After the substrate 10f on which the substrate 2 is formed is fixed horizontally, and an aluminum plate, for example, is fixed to the anode 2t, the vacuum forming chamber 20 is hermetically closed. Next, the vacuum pump 311fJi.

動させて真空形成室2.0中の不純気体を除去し、真空
度が10  乃至10tnrrに達したところで弁≠2
を開放し、前記ガス源より酸素d、アルゴンlの比率の
混合ガス捷たは−rンモニア苔しくけ窒素り、水素lの
比率の混合ガスを室、20中に導入し、無空l〈を3x
10  torrに安定させ、前記負電極、2.2に、
10〜100Vの直流電圧を印加する。史に、コイル2
’ttには200WIう至300〜■で/ j、 J 
j−MI(zの高周波電源を接続し、またイオンガン2
1を作動させて正極2乙に取付けたアルミニウム板をス
パッタし、生成したアルミニウムイオンは、コイル2I
/lによる高周波電界を通過し、電極22により電圧が
印加されている基板IO並びに下部電極/、2に集中し
、前記混合ガスとの反応下に、基板10並びに下部電極
/2上に酸化アルミニウムまたは窒化アルミニウムの皮
膜を形成する。
to remove impurity gas in the vacuum forming chamber 2.0, and when the degree of vacuum reaches 10 to 10 tnrr, the valve≠2.
was opened, and a mixed gas in the ratio of oxygen (d) and argon (l) was introduced into the chamber 20, or a mixed gas in the ratio of -r ammonia, moss, nitrogen, and hydrogen (l) was introduced into the chamber 20. 3x
10 torr, the negative electrode, 2.2;
Apply a DC voltage of 10 to 100V. In history, coil 2
'tt has 200WI and 300~■/j, J
j-MI (connect the high frequency power supply of z, and also connect the ion gun 2
1 is activated to sputter the aluminum plate attached to the positive electrode 2B, and the generated aluminum ions are sent to the coil 2I.
Aluminum oxide is concentrated on the substrate IO and the lower electrode /2, to which a voltage is applied by the electrode 22, and reacts with the mixed gas to form aluminum oxide on the substrate 10 and the lower electrode /2. Or form a film of aluminum nitride.

ti−o−J′o分のイオンブレーティングによりアル
ミニウム化合物の皮膜厚さはl乃至λμとなる。正電極
に取付けたアルミニウム板へのイオンガンよりのイオン
照射駄、正@、1!極への印加電圧等の調整を行うこと
により、皮膜厚さの制御が可能である。次に、電極22
.26への印加電圧をOt〜/kVに高めてイオングレ
ーティング操作を継続することにより、先に形成したイ
オンブレーティング皮1漠に対しプラズマエツチングが
実施され、約20分の実施により100〜toooQの
厚さにffl而化面れる。gs図、第を図は走査型電子
顕微鏡写真(X10,000)により粗面化前と粗面化
後の断面写真が示されている。このようにして、所謂金
属化合物膜l≠及び粗面/2を形成した後、前述した湿
気透過性の金属上部電極/I、例えば全皮膜またはパラ
ジウム皮膜を蒸層することにより、約200−λ!O^
の厚さの皮1漢を形成する。かくして本発明に係る湿度
センサを得ることができる。
The thickness of the aluminum compound film becomes l to λμ by ion blating for ti-o-J'o. Ion irradiation from an ion gun to an aluminum plate attached to the positive electrode, positive @, 1! The film thickness can be controlled by adjusting the voltage applied to the poles. Next, the electrode 22
.. By increasing the voltage applied to 26 to Ot~/kV and continuing the ion grating operation, plasma etching is performed on the previously formed ion brating skin, and after about 20 minutes, 100~tooQ is etched. The thickness makes me laugh. The gs diagram and the second figure are scanning electron micrographs (X10,000) showing cross-sectional photographs before and after surface roughening. After forming the so-called metal compound film l≠ and rough surface /2 in this way, the above-mentioned moisture-permeable metal upper electrode /I, for example, a full film or a palladium film, is deposited to form a layer of approximately 200-λ ! O^
Form a layer of skin with a thickness of . In this way, a humidity sensor according to the present invention can be obtained.

高周波電界内でこのイオンブレーティングを行うことに
より、基板IO及び下部電極12上に形成される酸化ア
ルミニウムの付着強度は極めて大尊く、また酸化アルミ
ニウムは耐熱、耐酸性、耐有4溶剤性に漬れているので
、縄温条件、酸及び有機溶剤蒸気の多い工場等の劣悪な
環境下での使用に充分耐えるものである。なお、先の実
施例では正電極2乙にアルミニウムを取付は酸化アルミ
ニウムのような金鴫酸化物をイオンブレーティングによ
り形成する場合金示したが、真空形成室中に導入する酸
素・アルゴン混合ガスに化オーで、アンモニアガス若し
くは窒素・水素混合ガスを導入すれば金属窒化物の皮膜
が基板上に形成され、この金属過化物も金属酸化物と同
様に、湿度センサとして好適な特性を示すものである。
By performing this ion blating in a high frequency electric field, the adhesion strength of the aluminum oxide formed on the substrate IO and the lower electrode 12 is extremely high, and aluminum oxide has excellent heat resistance, acid resistance, and solvent resistance. Therefore, it can withstand use in harsh environments such as factories with rope temperature conditions and a lot of acid and organic solvent vapor. In the previous example, aluminum was attached to the positive electrode 2B when gold oxide such as aluminum oxide was formed by ion blasting, but the oxygen/argon mixed gas introduced into the vacuum forming chamber was When ammonia gas or a mixed gas of nitrogen and hydrogen is introduced into a nitride film, a metal nitride film is formed on the substrate, and like metal oxides, this metal perride also exhibits properties suitable for use as a humidity sensor. It is.

また、アルミニウムに代えて、徽属試料としてはマグネ
シウムとしてもよい。更に、IE電極に取付ける物は金
稿板でなく、金属r*rヒ物または金属窒化物の板を敗
付けてイオンガンにより金属酸化物または金属窒化物の
イオンケ生1皮ぜしめて基板IOと下部11極lλ上に
金@酸化物または金属・ポ化物の皮膜を形成させること
もで^る。
Furthermore, instead of aluminum, magnesium may be used as the material sample. Furthermore, the object to be attached to the IE electrode is not a metal plate, but a metal r*r metal or metal nitride plate, and an ion gun of metal oxide or metal nitride is used to attach the metal oxide or metal nitride ion tube to the substrate IO and the lower part. It is also possible to form a film of gold@oxide or metal/podide on the 11-pole lλ.

本発明に係る容量式湿度センサによれば、第≠図に示す
ように湿度変化に対する応答が極めて迅速である。すな
わち、第を図は湿度センサの応%特性を示すものであっ
て、粗面化しない酸化アルミニウム皮膜を用いfc谷曖
湿度計と粗面化した酸化アルミニウム皮膜ケ用いた容置
湿度Fttを相対湿1更3j%の恒湿槽に置いて平衡状
態に達したものを相対湿度/7j%、rs%。
According to the capacitive humidity sensor according to the present invention, the response to humidity changes is extremely quick, as shown in FIG. In other words, Fig. 1 shows the humidity sensor's % characteristics, and compares the storage humidity Ftt using an FC Taniwa hygrometer using an aluminum oxide film that does not roughen the surface of the FC Taniwa hygrometer with an aluminum oxide film that uses a roughened aluminum oxide film. Relative humidity / 7j%, rs% when placed in a constant humidity tank with humidity of 1 to 3j% and reaching an equilibrium state.

7j係の各恒湿槽に置いた後のril QC計の指示と
時間の関係をプロットしたもので、曲#5!(−・−で
示さ几るもの)は粗面化しfC,酸化アルミニウム皮膜
を用いた容書式湿反計の場合、曲線(−■−で示される
もの)は粗面化しr(い酸化アルミニウム皮膜を用いた
容1式湿度計の場合が示され、粗面化し友ものけ/ 7
. j%1月1゜71係のいずれの場合も約<10秒で
略平衡1(達するが、粗面化しないものは図示で”4 
fcいが約5分かかる。これにより粗面化による応答の
改善が明瞭に承される。従来のアルミニウム板に酸化ア
ルミニウムを形成した公知湿度計として数詞の市販品に
つ缶同様に応答特性を測定したが、いずれも70分、符
しくけそれ以)、(i−要することがわかった。粗面化
による応答の改善は、粗面の片状結晶構造形成と関係が
あるようで、酸化皮膜より窒化物皮1漢の方が柱状結晶
を形成し易い。
This is a plot of the relationship between the RIL QC meter's readings and time after placing it in each humidity chamber in section 7j. Song #5! In the case of a moisture meter with aluminum oxide film, the curve (indicated by -■-) has a roughened surface and r (rough aluminum oxide film). The case of a 1-capacity hygrometer using
.. In all cases of J% January 1° 71 ratio, approximately equilibrium 1 (reaches) in about <10 seconds, but the case where the surface does not become rough is "4" as shown in the figure.
It takes about 5 minutes. This clearly shows the improvement in response due to surface roughening. The response characteristics of a conventional hygrometer with aluminum oxide formed on an aluminum plate were measured in the same way as a commercially available hygrometer. The improvement in response due to surface roughening seems to be related to the formation of a flaky crystal structure on the rough surface, and it is easier to form columnar crystals in a nitride film than in an oxide film.

本発明に係る製造法によれば、金桐化合物皮1漢(これ
は金属窒化物皮膜摸及び金属窒化物皮膜のいずれも含む
)は、基板にに極めて強固に形成されるので機械的強度
が充分得られ、6′i酷な使用に耐えるものである。殊
に、誘′屯体が有Φ高分子膜でrc<金叫化合物膜で形
成されているため、有機溶剤蒸気の充満している雰囲気
下でも感湿部の特性を損うことなく長期に旺って使用で
へ、経時変化も殆んど生じない利点がある。
According to the manufacturing method of the present invention, the metal tung compound coating (this includes both metal nitride coatings and metal nitride coatings) is extremely strongly formed on the substrate, so the mechanical strength is low. It is sufficiently durable and can withstand 6'i severe use. In particular, since the dielectric body is made of a Φ polymer film and a rc<gold compound film, it can be used for a long time without impairing the characteristics of the moisture sensitive part even in an atmosphere filled with organic solvent vapor. It has the advantage of being used sparingly and hardly changing over time.

また、耐熱姓も著しく改善されたため、電極へのハンダ
付は作業も容易にすることができ、また感湿部が過度に
吸湿した時はセンサ自体を加熱して乾燥させることが可
能である。
Additionally, the heat resistance has been significantly improved, making it easier to solder the electrodes, and when the moisture sensing part absorbs too much moisture, the sensor itself can be heated to dry it.

1μF1本発明に係る容置式湿度センサ及びその製造法
につき、好適な実施例ケ挙げて説明したが、本発明はこ
の実施例に限定されるものでなく、発明の精神の範囲内
で多くの改良変更をなし得るものである。
1μF1 Although the container type humidity sensor and the manufacturing method thereof according to the present invention have been described by citing preferred embodiments, the present invention is not limited to these embodiments, and many improvements can be made within the spirit of the invention. Changes can be made.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る容量式湿度センサの平面図、第2
図は第1図に示す本発明に係る容量式湿度センサのU−
U線1所面図、第3図は本発明に係る製造法を実施する
定めの装置の概略構成図、第弘図は本発明に係る粗面化
金属化合物!漢ケ1史用した゛容置式湿度センサ(曲線
−・−で示される)と粗面化しない金属化合*J膜を部
用した容量式湿度センサ(曲線−■−で示される)の応
答特性図、45図及び第を図は粗面化しない及び粗面化
した酸化アルミニウム皮膜の断面を示す走査型電子顕微
鏡写真である。 10・・・基  板   /λ・・・下部電極/≠・・
・金禰化合物l漢 /A・・・粗  面/r・・・上部
電極   20・・・真空形成室22・・・負電極  
  、24t°°°コイ ル、2J・・・正電極   
 Jr・・°イオンガン30・・・高周波電源  32
・パイオンガン電源3≠・・・管 体   3t・・・
弁  体3g・・・真空ポンプ  参〇・・・管体≠2
・・・弁 体 Fl(3,I FIG、2 FIG4 −96− FIG、5
FIG. 1 is a plan view of a capacitive humidity sensor according to the present invention, and FIG.
The figure shows the capacitive humidity sensor according to the present invention shown in FIG.
A top view of U-line 1, FIG. 3 is a schematic diagram of the equipment for carrying out the manufacturing method according to the present invention, and FIG. 3 is a diagram showing the roughened metal compound according to the present invention. Response characteristics of a capacitive humidity sensor (indicated by a curve -・-) used in the history of Kankei 1 and a capacitive humidity sensor using a metal compound*J film that does not roughen the surface (indicated by a curve -■-) Figures 45 and 45 are scanning electron micrographs showing cross sections of unroughened and roughened aluminum oxide films. 10...Substrate /λ...Lower electrode/≠...
・Kinne compound 1/A... Rough surface/r... Upper electrode 20... Vacuum forming chamber 22... Negative electrode
, 24t°°° coil, 2J...positive electrode
Jr...°Ion gun 30...High frequency power supply 32
・Pion gun power supply 3≠...Pipe body 3t...
Valve body 3g...Vacuum pump 3...Pipe body≠2
... Valve body Fl (3, I FIG, 2 FIG4 -96- FIG, 5

Claims (8)

【特許請求の範囲】[Claims] (1)  非導電性基板上に電極全対向配置し、前記電
極上に湿気に活性な金属化合物膜を独立して形成し、こ
の金属化合物[を機械的処理により粗面とし、前記粗面
上に湿気透過性の金属皮gを形成してなる容重式湿度セ
ンサ。
(1) Electrodes are arranged to face each other on a non-conductive substrate, a moisture-active metal compound film is independently formed on the electrodes, this metal compound is made into a rough surface by mechanical treatment, and the surface of the rough surface is A capacitive humidity sensor formed by forming a moisture-permeable metal skin g.
(2)  非導電性基板は、サファイヤ板またはガラス
板である特許請求の範囲第1項記載の容曾式湿度センサ
(2) The hydraulic humidity sensor according to claim 1, wherein the non-conductive substrate is a sapphire plate or a glass plate.
(3)金属化合物板は、金嬉酸化物模または金属窒化物
膜である特許請求の範囲第1項または第2項記載の容量
式湿度センサ。
(3) The capacitive humidity sensor according to claim 1 or 2, wherein the metal compound plate is a gold happy oxide model or a metal nitride film.
(4)  機械的処理がプラズマエツチングでアル%許
楕求の範囲第7項乃至第3項のいずれかに記載の容曖式
湿反セン+j。
(4) The wet-irradiation process according to any one of items 7 to 3, wherein the mechanical treatment is plasma etching and the range of aluminum % tolerance.
(5)電極は櫛形に形成され、各櫛歯が相互に接触する
ことなく噛み合うよう対向配置される特許請求の範囲第
1項乃至第q頃のいずれかに記載の容着式湿度センサ
(5) The adhesive type humidity sensor according to any one of claims 1 to q, wherein the electrodes are formed in a comb shape and are arranged to face each other so that the comb teeth mesh with each other without contacting each other.
(6)非導電性基板トにN4W1.を対向配置したもの
を真空形成室中の高圧電極に支持して高電圧を印加し、
真空形成室内の不純気体ケ高真空にすることにより除去
し、外部より所定の気体を導入し、真空形成室内に高周
波電界を形成した後、前記真空形成室中に配置した金属
板若しくは金属化合物板をイオンガンよりのイオンによ
りスパッタして金属イオン若しくは金属化合物イオンを
生成せしめ、金属イオンは導入した気体により金属化合
物イオンとなし、前記非導電性基板−ヒJ−電極上とに
金属化合物皮膜を独立して形成後、引続へ前記高電圧の
印加を高めて前記金属化合物膜HAをプラズマエツチン
グせしめて相開化し、前記粗面Hに湿気透過性の金稿皮
膜全形成することを特徴とする容曖式湿1(センサの製
造法。
(6) N4W1. are placed facing each other and supported on high-voltage electrodes in a vacuum forming chamber, and a high voltage is applied.
Impurity gases in the vacuum forming chamber are removed by creating a high vacuum, a predetermined gas is introduced from the outside, a high frequency electric field is formed in the vacuum forming chamber, and then a metal plate or metal compound plate is placed in the vacuum forming chamber. is sputtered with ions from an ion gun to generate metal ions or metal compound ions, and the metal ions are converted into metal compound ions by the introduced gas, thereby forming an independent metal compound film on the non-conductive substrate and the electrode. After the formation, the application of the high voltage is subsequently increased to plasma-etch the metal compound film HA to phase open it, thereby forming a moisture-permeable metal film entirely on the rough surface H. Fukushiki Humidity 1 (Sensor manufacturing method.
(7)金鵡板はアルミニウムまたはマグネシウムであり
、金属化合物板はアルミニウム筐たはマグネシウムの酸
化物または窒化物である特許請求の範囲第を項記載の1
81!欲法。
(7) The metal compound plate is aluminum or magnesium, and the metal compound plate is an aluminum casing or magnesium oxide or nitride.
81! Desire law.
(8)真空形成室中に導入される気体は、酸素及びアル
ゴンの混合気体またはアンモニアガス若しくけ窒素及び
水素の混合気体である特許請求の範囲第6項または第7
項記載の製造法。
(8) The gas introduced into the vacuum forming chamber is a mixed gas of oxygen and argon, ammonia gas, or a mixed gas of nitrogen and hydrogen.
Manufacturing method described in section.
JP56194421A 1981-12-04 1981-12-04 Capacity type moisture sensor and method of producing same Pending JPS5896722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56194421A JPS5896722A (en) 1981-12-04 1981-12-04 Capacity type moisture sensor and method of producing same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56194421A JPS5896722A (en) 1981-12-04 1981-12-04 Capacity type moisture sensor and method of producing same

Publications (1)

Publication Number Publication Date
JPS5896722A true JPS5896722A (en) 1983-06-08

Family

ID=16324319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56194421A Pending JPS5896722A (en) 1981-12-04 1981-12-04 Capacity type moisture sensor and method of producing same

Country Status (1)

Country Link
JP (1) JPS5896722A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6395347A (en) * 1986-10-09 1988-04-26 Nok Corp Moisture sensor
JP2003028824A (en) * 2001-07-16 2003-01-29 Denso Corp Capacitive humidity sensor
WO2019188904A1 (en) * 2018-03-30 2019-10-03 住友化学株式会社 Sensor and production method for same
JP2021004802A (en) * 2019-06-26 2021-01-14 ルビコン株式会社 Humidity sensor and manufacturing method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5687852A (en) * 1979-12-19 1981-07-16 Matsushita Electric Ind Co Ltd Semiconductor detecting device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5687852A (en) * 1979-12-19 1981-07-16 Matsushita Electric Ind Co Ltd Semiconductor detecting device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6395347A (en) * 1986-10-09 1988-04-26 Nok Corp Moisture sensor
JP2003028824A (en) * 2001-07-16 2003-01-29 Denso Corp Capacitive humidity sensor
JP4501320B2 (en) * 2001-07-16 2010-07-14 株式会社デンソー Capacitive humidity sensor
WO2019188904A1 (en) * 2018-03-30 2019-10-03 住友化学株式会社 Sensor and production method for same
TWI790368B (en) * 2018-03-30 2023-01-21 日商住友化學股份有限公司 Sensor and its manufacturing method
US11892423B2 (en) 2018-03-30 2024-02-06 Sumitomo Chemical Company, Limited Sensor and production method for same
JP2021004802A (en) * 2019-06-26 2021-01-14 ルビコン株式会社 Humidity sensor and manufacturing method thereof

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