JPS5849932A - Adjuster for illuminance distribution pattern - Google Patents

Adjuster for illuminance distribution pattern

Info

Publication number
JPS5849932A
JPS5849932A JP14779481A JP14779481A JPS5849932A JP S5849932 A JPS5849932 A JP S5849932A JP 14779481 A JP14779481 A JP 14779481A JP 14779481 A JP14779481 A JP 14779481A JP S5849932 A JPS5849932 A JP S5849932A
Authority
JP
Japan
Prior art keywords
light
slit member
illuminance distribution
slit
distribution pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14779481A
Other languages
Japanese (ja)
Other versions
JPH0223852B2 (en
Inventor
Takeshi Sugihara
杉原 壮
Akira Satomi
里見 昭
Kenji Imamura
賢二 今村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP14779481A priority Critical patent/JPS5849932A/en
Publication of JPS5849932A publication Critical patent/JPS5849932A/en
Publication of JPH0223852B2 publication Critical patent/JPH0223852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/54Lamp housings; Illuminating means
    • G03B27/542Lamp housings; Illuminating means for copying cameras, reflex exposure lighting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure Or Original Feeding In Electrophotography (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)

Abstract

PURPOSE:To adjust easily the illuminance distribution pattern of a belt-shaped illumination area, by making the arrayed pattern in the longitudinal direction of the first slit member different from that concerning the second slit member. CONSTITUTION:When slit members 1 and 2 are so overlapped that left edges of leftmost light transmitting parts 11 and 21 of slit members 1 and 2 are matched to each other, a width L3 of light transmitting areas 31 is decreased according as going toward the center in respect to arrayed patterns of light transmitting areas 31 and light shielding areas 32. When the second slit member is displaced slightly to the right relatively to the first slit member 1, the width of light transmitting areas 31 is increased according as going toward the center in respect to arrayed patterns of light transmitting areas 31 and light shielding areas 32. An illuminance distribution pattern formed on the rear face side of an adjuster is changed in accordance with the relative slide length of the second slit member 2 to the first slit member 1. Consequently, the illuminance distribution pattern of the illumination area is adjusted easily.

Description

【発明の詳細な説明】 本発明は、例えけIIv装WIKおける照明用光源と感
光体との関の光路中に配置され、光の照度分布パターン
を調整する照度分布パターンの調整器に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an illuminance distribution pattern adjuster that is arranged in an optical path between an illumination light source and a photoreceptor in, for example, a IIv device WIK, and adjusts the illuminance distribution pattern of light. be.

一般に複写装置にお−そけ、原−に対して再現性の高い
複写画像を得るために、感光体上にお轄る光の照度分布
を附−化することが必要であり、この要諦を速成するた
めKFi、原稿台上の細長い帯吠の照明ll#の長さ方
向における照度分布パターンを、第1図の特性曲線■に
示すように1当該照明領域における両端部分の照度が中
央部の照度に比して大きい、全体としてうねルをもった
波状とすることが必要とされる。このため例えば光源電
球として112図に示すようK11tの発光部Fを非発
光部Nを介して接絞して成る部分発光型の棒吠電球Bを
用いて端III発光部Fの長さが中央側発光111!、
 F C)長さよシ大きくなるものとし、両端におする
照度が中央よ)大きい照度分布パターンを得るようKし
ているが、棒吠電球Bの長さ方向に(3) おける発光特性、或いは反射−の反射特性が、実際上野
v!KFi単品毎に異なることからこれら単品を組合せ
たときには同一の構成であっても装−毎に原稿台上の翌
度分布パターンが微妙に異なったものとなり、このため
上Fの棒状電球Bを用いても原稿台上に理想的な照度分
布パターンを得ることF!極めて困−であル、照度分布
パターンの調整が必要となる。
Generally, when using a copying machine, in order to obtain a copy image with high reproducibility relative to the original, it is necessary to adjust the illuminance distribution of the light on the photoreceptor. In order to achieve rapid lighting, the illuminance distribution pattern in the length direction of the long and narrow strip of illumination #1 on the manuscript table is determined as shown in the characteristic curve (■) in Figure 1. It is necessary to have a wavy shape with undulations as a whole, which is large compared to the illuminance. For this reason, for example, as shown in Fig. 112, as a light source bulb, a partially emitting type rod bulb B, which is made by condensing the light emitting part F of K11t through a non-emitting part N, is used. Side emission 111! ,
F C) It is assumed that the illuminance is larger than the length, and the illuminance at both ends is larger than the center). The reflex characteristics of the reflex are actually Ueno v! Since each KFi item is different, when these individual items are combined, even if they have the same configuration, the next light distribution pattern on the document table will be slightly different depending on the installation. Even if you get an ideal illuminance distribution pattern on the document table, F! This is extremely difficult and requires adjustment of the illuminance distribution pattern.

このような事情から、例えば第3図に示すように、棒状
電球B及び反射鏡Mより成る照明用光源と原稿台Tとの
間に、第4図に示すw数の遮光板10を照明領域の長さ
方向に沿って並べ、その各々の光路内への突入深さSを
調整してその各々による透光量を規制することKより、
或いは開口幅が長き方向全体に戸って規制された透光用
スリットを有する透光量分布規制部材を用いて電球Bの
長さ方向における発光特性を自信することによって、原
稿台T上の照明領域における照度分布パターンを理想的
なもの又はこれに近似したものとするようにしている。
Under these circumstances, for example, as shown in FIG. 3, a light shielding plate 10 with the number of w shown in FIG. are arranged along the length direction, and the penetration depth S into the optical path of each is adjusted to regulate the amount of light transmitted by each.
Alternatively, by using a light transmission amount distribution regulating member having a light transmission slit whose aperture width is regulated over the entire length direction, the illumination on the document table T can be controlled with confidence in the light emitting characteristics in the length direction of the light bulb B. The illuminance distribution pattern in the area is made ideal or approximated.

特開昭58− 49932(2) しかしなからvI数の並光板1oを並設する手段におい
ては、すぺ1の遮光板10についてその各々の突入深さ
Sf調整しなければならないため、照度分布パターンの
調整に長一時間を必要とするし、また透光用スリットを
イイする透光量分布淡側部材を利用する手段においては
、そのスリットの形状により一軸的に照度分布パターン
の調整の態様が定まってしまうので、スリットの形状が
若干異なる規制部材を何枚も準備しなければならない上
これらの中から適合するものを選定するという面倒な手
間を必要とし、結局装置を組立てるとき、更Kl/−1
その後棒状電球を交換する度毎に開開分布パターンの調
整に係る煩瑣な作業を行なわなければならないこととな
る・ 本発明はこのような事情に基づいてなされたものであっ
て、細長い帯吠の照明領域の照度分布パターンの調整を
簡単に遂行することができ、従って例えばII寥装置に
用いた場合に、短時間で感光体上に均一な照度分布を得
ることのできる照度分布メ#X−+yv調整器を提供す
ることを目的とし、(5) その特鍛とするところは、透光部と逆光部とが長さ方向
に沿って交互に形成された第1のスリット部材と、この
第1のスリット部材に長さ方向に移動自在に重ね合わせ
た、透光部と遮光部とが長さ方向に沿って交互に形成さ
れた第2のスリン)部材とよりtLシ、前記第1のスリ
ット部材に係る透光部と遮光部との長さ方向における配
列パターンと、前記第2のスリン)部材に係る透光部と
逆光部との長さ方向における配列パターンとが・、互に
異゛□な る点にある。
JP-A-58-49932 (2) However, in the method of arranging vI number of parallel light-shielding plates 1o in parallel, the penetration depth Sf of each of the one light-shielding plates 10 must be adjusted, so that the illuminance distribution cannot be changed. It takes a long time to adjust the pattern, and in the case of using a member on the light side of the light transmission amount distribution, which is preferable with a slit for light transmission, it is difficult to adjust the illuminance distribution pattern uniaxially depending on the shape of the slit. As a result, it is necessary to prepare a number of regulating members with slightly different slit shapes, and the troublesome effort of selecting a suitable one from among them is required.In the end, when assembling the device, it is necessary to /-1
After that, each time the rod-shaped light bulb is replaced, a complicated work related to the adjustment of the open-open distribution pattern must be performed. The illuminance distribution method #X- can easily adjust the illuminance distribution pattern of the illumination area, and therefore can obtain a uniform illuminance distribution on the photoreceptor in a short time when used in a II device, for example. The purpose is to provide a +yv adjuster, and (5) its special features include a first slit member in which transparent parts and backlit parts are alternately formed along the length direction; A second slit member, which is movably superimposed on the first slit member and has light transmitting parts and light shielding parts alternately formed along the length direction; The arrangement pattern in the length direction of the light-transmitting part and the light-blocking part related to the slit member and the arrangement pattern in the length direction of the light-transmitting part and the backlight part related to the second slit member are different from each other. It is at the point where it becomes ゛□.

以下図面によって本発明の実施例について説明すると、
第5図は複写装置Kおける照明用光源と原稿台との間に
配置される照度分布パターンの調整器を示し、この照度
分布パターンの調整器は、−線が矩形波状に成形され六
Flのスリット部材lと、−縁が矩形波状に成形された
第2のスリット部材2とを、矩形波状の1が互に重なシ
合うように、長さ方向に移廖゛自在、例えば摺動自在に
重ね、第1のスリン)部材IK対する第2のスリット部
材2の指針を阻止する固定機構を設けて成る(6) ものである。前記第1のスリット部材lけ、第6図(イ
)K示すように長さ方向に沿って並ぶ切欠部と非切欠部
とを夫々透光部11と遮光部12として利用し、スリン
)部材lの長さ方向における透光部11の幅L1及び遮
光部120輻t1が一様に例えば5mとされ、前記第2
のスリット部材2は、第6図(ロ)に示すように長さ方
向に沿って並ぶ切欠部と非切欠部とを夫々透光部21と
遮光部22として利用し、スリット部材2の長さ方向に
おける透光部21の輻L2及び遮光部220幅L2が一
様に例えば5.5fiとされる。そして前記第1のスリ
ット部材I KFi、長さ方向に延びる長孔13を形成
すると共に、v!I数個の小孔14を長さ方向に等間隔
に並ぶよう形成し、前記第2のスリット部材2には、長
さ方向に延びる長孔23を形成すると共に、複数個の小
孔24を、前記第1のスリン)部材IKおけるづ゛孔1
4の間隔よりも若干率さな間隔をもって長さ方向に等間
隔に並ぶよう形成し、前記第1のスリット部材1の長孔
13と前記第2のスリット部材2の長孔23との(7) 重なり部、及び前記第1のスリット部材1の小孔14と
前記第2のスリット部拐2の小孔24とδ重な〕部にお
いて夫々ネジ上めすることによシ前記第1のスリット部
材1及び第2のスリット部材2を互に固定し得るようK
L(第5図では、小孔l7t1λ4を重ねていない状態
であっていまだ互に固定されていない状態を示す。)、
こうして2枚のスリット部材1.2の摺動を阻止する固
定機構を構成する。
Examples of the present invention will be described below with reference to the drawings.
FIG. 5 shows an illuminance distribution pattern adjuster disposed between an illumination light source and a document table in a copying machine K. The slit member 1 and the second slit member 2 whose edges are formed in a rectangular wave shape are movable in the length direction, for example, can be slid so that the rectangular wave shapes 1 overlap each other. (6) A fixing mechanism is provided to overlap the first slit member IK and prevent the pointer of the second slit member 2 from moving against the first slit member IK. As shown in FIG. 6(a)K, the first slit member 1 utilizes the cutout portion and the non-cutout portion that line up along the length direction as a light-transmitting portion 11 and a light-shielding portion 12, respectively, to form a slit member. The width L1 of the light transmitting part 11 and the radius t1 of the light shielding part 120 in the length direction of l are uniformly set to, for example, 5 m, and the second
As shown in FIG. 6(b), the slit member 2 utilizes a cutout and a non-cutout part lined up along the length as a light-transmitting part 21 and a light-shielding part 22, respectively, so that the length of the slit member 2 is The radius L2 of the light transmitting portion 21 and the width L2 of the light shielding portion 220 in the direction are uniformly set to, for example, 5.5 fi. Then, the first slit member IKFi is formed with a long hole 13 extending in the length direction, and v! Several small holes 14 are formed at equal intervals in the length direction, and the second slit member 2 is formed with a long hole 23 extending in the length direction, and a plurality of small holes 24 are formed in the second slit member 2. , the first hole 1 in the member IK
The long holes 13 of the first slit member 1 and the long holes 23 of the second slit member 2 (7 ) The first slit is screwed up at the overlapping part and the part where the small hole 14 of the first slit member 1 and the small hole 24 of the second slit member 2 overlap by δ. K so that the member 1 and the second slit member 2 can be fixed to each other.
L (FIG. 5 shows a state in which the small holes l7t1λ4 are not overlapped and are not yet fixed to each other.),
In this way, a fixing mechanism is constructed that prevents the two slit members 1.2 from sliding.

以上のような構成の照度分布パターンの調整器において
は、固定機構に係る前記ネジを緩めて第1のスリット部
材1に対して第2のスリット部材2を摺動せしめると、
これら2枚のスリット部材1.2により形成される各透
光領域31の輻L3と各遮光領域32の幅t3が変化し
、例えばスリット部材1.20重なり具合いを、第7図
(イ)に示すように双方のスリット部材1.2(第7図
(イ)及び第8図(イ)において、第2のスリット部材
2を斜線で表わす。)の最も左側に位置する透光部11
.21の左縁が揃うようにすると、前特間昭58− 4
9932(3) 1透光領域31と遮光領域32の配列パターンね。
In the illuminance distribution pattern adjuster configured as above, when the screw related to the fixing mechanism is loosened and the second slit member 2 is slid with respect to the first slit member 1,
The radius L3 of each light-transmitting area 31 formed by these two slit members 1.2 and the width t3 of each light-shielding area 32 change, and for example, the degree of overlapping of the slit members 1.20 is shown in FIG. 7(A). As shown, the light-transmitting part 11 located at the leftmost side of both slit members 1.2 (the second slit member 2 is indicated by diagonal lines in FIGS. 7(A) and 8(A))
.. If the left edges of 21 are aligned,
9932 (3) 1 Arrangement pattern of light-transmitting areas 31 and light-blocking areas 32.

第7WJ(ロ)にP7として示すよらに、透光領域31
の−L3が中央部に近づく稈小さく万るようKfiシ、
l!j整器の前面@(m7図(イ)におけるllLr#
の表面側)に光沖を1〈ことKより調整器の後面側(第
7図(イ)Kおける新面の裏1’i#) Kおける照度
分布パターンFill’!7図(ハ)KI7として示す
ように、中央部の光透過率が低下した状態とがる・そし
てスリット部材1.20重なシ具合いを第8図(イ)K
示すように、第2のスリット部材2を第7図(イ)K示
した位置から;奸1シプキのスリット部材1に対して図
中右方向に若干変位せしめると、前記透光領域31と遮
光菅域32の配列パターンは、第8図(ロ)KP8とし
て示すように、透光領域31のllが中央部に近づく程
大きくなるようKなシ、−(記照度分布パターンは、第
8図(ハ)KI8として示すように、中央部の光透過率
が高くなった状態となる。即ち、第1のスリット部材I
Kおける透光部11の輻Ll及び遮光菖12の輻t1と
、#2のスリット部材2K(9) おける透光部21の幅L2及び遮光紅22の@12とが
若干異なるため、2枚のスリット部材1.2を重ね合わ
せたときに形成される透光領域31の幅L3、換言する
と透光領域31の面積力(長さ方向に沿って順次に大き
くなって再び小さくなるという状態を繰返すこととなる
ため、調整器の後面側に形成、される照度分布)ぐター
ンは、透光領域31の幅L3の大きさの変化に対応した
、うねりをもった状態となシ、第2のスリット部材2を
第1のスリット部材1に対して摺動せしめると、その波
形を維持したまま摺動距離に応じて前記うねり力!移動
するようになる。この照度分布ノぐターンに係ろうね如
け、振動数の若干異なる2つの波を重ね合わせたときに
起こるうなり現象による4ものであり、今この現象を模
式的に説明すると、第1のスリット部材1の一縁の形状
を(1)式で表わされる正弦波yl、第2のスリット部
材2の一縁の形状を(2)式で表わされる正弦波y2と
仮定すると、両者の合敵波73 t’! (8)式で表
わされる。
As shown as P7 in the 7th WJ (b), the light-transmitting area 31
Kfishi so that the -L3 becomes smaller in the culm as it approaches the center.
l! jFront side of adjuster @(llLr# in m7 diagram (a)
1〈The rear side of the regulator from K (Figure 7 (A) 1'i# on the back of the new surface in K) Illuminance distribution pattern at K Fill'! As shown in Figure 7 (c) KI7, the light transmittance in the central part is reduced and the slit member overlaps by 1.20 mm as shown in Figure 8 (a) K.
As shown, when the second slit member 2 is slightly displaced from the position shown in FIG. The arrangement pattern of the tube areas 32 is as shown in FIG. (c) As shown by KI8, the light transmittance of the central part becomes high. That is, the first slit member I
The width L2 of the light-transmitting part 21 and the width @12 of the light-shielding red 22 in #2 slit member 2K (9) are slightly different from the width L1 of the light-transmitting part 11 and the light-shielding irises 12 in #2. The width L3 of the transparent region 31 formed when the slit members 1.2 of As the repetition is repeated, the illuminance distribution formed on the rear side of the adjuster has an undulating state corresponding to the change in the width L3 of the light-transmitting area 31. When the slit member 2 is slid with respect to the first slit member 1, the swell force increases according to the sliding distance while maintaining the waveform. Begins to move. This illuminance distribution nog turn is caused by the beat phenomenon that occurs when two waves with slightly different frequencies are superimposed, and to explain this phenomenon schematically, the first slit Assuming that the shape of one edge of member 1 is a sine wave yl expressed by equation (1) and the shape of one edge of second slit member 2 is a sine wave y2 expressed by equation (2), the combined wave of both 73 t'! It is expressed by equation (8).

y 1 = A cos (61X)        
    (1)(10) であり、スリ7)部材O11方向に延びる軸をy軸、ス
リ7)部材の長さ方向に延びる軸をX軸とした。
y 1 = A cos (61X)
(1) and (10), the axis extending in the direction of the pickpocket 7) member O11 was taken as the y-axis, and the axis extending in the length direction of the pickpocket 7) member was taken as the x-axis.

尚ムは定数、aは2つの正弦波y1、y2の角速度の差
、φ#−12つの正弦波yl、y2の位相の変位の大き
さを示す。
Here, m is a constant, a is the difference in angular velocity between the two sine waves y1 and y2, and φ#-1 represents the magnitude of the phase displacement of the two sine waves yl and y2.

この合成波y3Fi、上記2つの波yl−by2の周と
きには、つな多現象が生じて緩かな波になシ、このモデ
ルにおいては、2枚のスリット部材1.2を重ね合わせ
ることによシ透光領域310幅L3、即ち透光領域31
0面積が長さ方向に沿って順次に変化すると共に1面積
の最も大きい透光領域同士の間隔(上記の式ではうなシ
の周期に相当する。)が−となり、2つの波の重なり具
合δ −を変えることによってその波形を変えることなく位相
が変移していくこととなる。
During the circumference of this composite wave y3Fi and the above two waves yl-by2, a multi-connection phenomenon occurs and the wave becomes a gentle wave.In this model, by overlapping two slit members 1.2, Light-transmitting area 310 width L3, that is, light-transmitting area 31
As the 0 area changes sequentially along the length direction, the interval between the largest transparent areas of 1 area (corresponding to the period of the eel in the above equation) becomes -, and the degree of overlap of the two waves δ By changing -, the phase will shift without changing the waveform.

(11) 而して上述の実tIA例に係る照度分布パターンの調整
器においては、透光領域31が長さ方向に沿ってその幅
L3が彫次に変化した状態で配列されるものであるため
、細長い帯状の光路中に配置することによシ、照明領域
において緩がなうね〕をもっ九波吠の照度分布パターン
を得ることができると共に、第2のスリット部材2を第
1のスリット部材IK対して摺動させることによって、
当該照度分布パターンを、うねりをもった波状の一!ま
微小に変化させることができ、従って、例えば第9図に
示すように%Il写装置NKおける棒状電球l及び反射
鈍vよ〕成る照明用光源と原稿台〒との関に上記の調整
器100を配置して・スリット部材1.2を長さ方向に
相対的に移動せしめて両者の重なシ具合twR整するこ
とKよ勺原稿台i上の照明領域に理想状態又はこれに近
似した照度分布パターンを得ることができる。即ち前述
したように光源電球として棒状電球を用いた場合には、
原稿台上の照明領域における照度分布パターンは両端部
が中央部よシも高くなった形状となるがこのパター特開
昭58− 49932(4) ンを理想吠lIiたはこれに近似したものとするために
#i、中央部の谷を若干高くして両端部の山を若干低く
したシ、或いは中央部の谷を更に若干低くして両端部の
山を更に若干高くする等パターンを微小に1lIIする
必要があシ、上記構成の調整器によれば、このようなパ
ターンの微小調整を容易に行なうことができ、結局原稿
台上の照明領域の照度分布パターンの調整を簡単に行な
うことができて煙時間で感光体上に均一な照度分布を得
ることができる。そして上述のように第1のスリット部
材IK対する第2のスリット部材20摺動を阻止する固
定機構を設けているため、第1のスリット部材1と#!
2のスリット部材2とを調整後の位M(この鋳では長孔
13.23或いは小孔14.24が重なシ合う位置)K
お−て互に固定することができる◎しかも第1のスリッ
ト部材IK係る小孔140間隔と第2のスリット部材2
に係る小孔240間隔とを互に若干異なるようにして−
るため、各スリット部材1.2を重ね合わせて微小Km
動させることKよシ、各スリット部材1.2の長さく1
3) 方向に配列された小孔14.24が順次に重なり合うこ
ととなるから(各スリット部材1.2の左縁を揃えた状
態から第2のスリット部材2を右方向に移動させると、
先づ左側から1番目の小孔14.24が重なり合い、さ
らに右方向に移動させると左側から2番目の小孔14.
24が重なシ合い、このようにして小孔14.24が順
次に重なり合ってゆく)、2枚のスリット部材1.20
位曹関係を微小に変えながら、調整後に重なり合った小
孔14.24にネジを挿入することKよシ2枚のスリト
部材1.2を互に確実に固定することができる。
(11) Therefore, in the illuminance distribution pattern adjuster according to the above-mentioned actual tIA example, the light-transmitting regions 31 are arranged in such a manner that the width L3 varies in the lengthwise direction. Therefore, by arranging the second slit member 2 in a long and narrow strip-shaped optical path, it is possible to obtain a nine-wave illuminance distribution pattern with gentle ridges in the illumination area. By sliding it against the slit member IK,
The illuminance distribution pattern is wavy! For example, as shown in FIG. 100 and move the slit member 1.2 relatively in the length direction to adjust the overlap between them. An illuminance distribution pattern can be obtained. That is, when a rod-shaped light bulb is used as the light source bulb as mentioned above,
The illuminance distribution pattern in the illumination area on the document table has a shape in which both ends are higher than the center, but this pattern is considered to be ideal or an approximation thereof. #i To make the pattern slightly higher, the valley in the center is made slightly higher and the peaks at both ends are made slightly lower, or the valley in the center is made slightly lower and the peaks at both ends are made slightly higher. However, with the adjuster having the above configuration, it is possible to easily make such fine adjustments to the pattern, and as a result, it is possible to easily adjust the illuminance distribution pattern of the illumination area on the document table. It is possible to obtain a uniform illuminance distribution on the photoreceptor in the smoke time. As described above, since the fixing mechanism for preventing the second slit member 20 from sliding with respect to the first slit member IK is provided, the first slit member 1 and #!
After adjusting the slit member 2 of 2, the position M (in this casting, the position where the long hole 13.23 or the small hole 14.24 overlap) K
◎In addition, the first slit member IK has a small hole 140 interval and the second slit member 2
The intervals between the small holes 240 are made slightly different from each other.
In order to
The length of each slit member 1.2 is 1.
3) Since the small holes 14.24 arranged in the direction will overlap one after another (if the second slit member 2 is moved to the right from the state where the left edges of each slit member 1.2 are aligned,
First, the first small hole 14.24 from the left overlaps, and when moved further to the right, the second small hole 14.24 from the left overlaps.
24 are overlapped, and in this way the small holes 14.24 are successively overlapped), the two slit members 1.20
The two slit members 1.2 can be reliably fixed to each other by inserting screws into the overlapping small holes 14.24 after adjustment while slightly changing the positional relationship.

ここで上述の構成の照度分布パターンの調整器を1mv
装冒における照明用光源の光路中に配置する場合におい
て、照明用光源と原稿台との闇に設ける場合の具体例に
おける好適な数値例を挙げると、第1のスリット部材I
K係る透光部11の輻L1と遮光部12の輻t1を各々
5飄、第2のスリット部材2に係る透光部21の輻L2
と遮光部22F)幅t2を各々5.5mとし、セルフォ
ックレンズ等の投影光学器と感光体上との関に設ける場
合(14) の具体例における好適な数値例を挙けると、讐I@10
スリット部材IK係る透光w611の輻Llと遮光11
12の輻t1を各々3■とし、第2のスリッ)部材2に
係る透光部21の輻L2と遮光1!S22の輻t2を各
々3.1−とする。
Here, the illuminance distribution pattern adjuster with the above configuration is set to 1mV.
To give an example of a preferable numerical value in a specific example where the light source for illumination is placed in the optical path of the light source for illumination in the document table and the light source for illumination is placed in the darkness between the light source for illumination and the document table, the first slit member I
The radius L1 of the transparent part 11 and the radius t1 of the light shielding part 12 are 5 degrees each, and the radius L2 of the transparent part 21 related to the second slit member 2 is 5 degrees.
To give a preferable numerical example in the specific example of (14), when the width t2 is 5.5 m each and the width t2 is 5.5 m, and the width t2 is set between the projection optical device such as a SELFOC lens and the photoreceptor, @10
Radius Ll of light transmission w611 and light shielding 11 related to slit member IK
The radius t1 of 12 is each 3■, and the radius L2 of the transparent part 21 related to the second slit member 2 and the light shielding 1! Let the radius t2 of S22 be 3.1-.

以上本発明の一実施例及び具体的構成例について述べた
が、前記第1のスリット部材l及び第2のスリット部材
2については、 (イ)スリット部材の一級を矩形波状に成形する代bK
、三角波状、或−は正弦波状に成形して透光部と遮光部
を形成する構成、 1口)スリット部材の各透光部の幅を一定としない構成
、或いはスリット部材の各遮光部の幅を一定としな一構
成、 (ハ)スリット部材の一縁を切欠する代シに中央部を長
さ方向に沿って間隔を置−て透設することKよ)透光部
と遮光部を形成する構成、としてもよいがいずれの場合
においても第1のスリット部材1における透光部11と
遮光部12との長さ方向に沿つぇ配列パターンと、第2
のスリ(15) ット部材2における透光部21と遮光部22との長さ方
向に沿った配列パターンとが互に若干員なることが必要
であシ、シれによってこれらスリット部材1.2を重ね
合わせたときに調整11にお叶る透光領域310面積が
長さ方向に沿って順次に変化した状態となる。
Although one embodiment and a specific configuration example of the present invention have been described above, regarding the first slit member l and the second slit member 2, (a) the allowance bK for forming the first grade of the slit member into a rectangular wave shape;
, a configuration in which the light-transmitting part and the light-shielding part are formed by shaping into a triangular wave shape or a sine wave shape; One configuration with a constant width; (c) One edge of the slit member is cut out, and the central part is transparent at intervals along the length direction.K) A transparent part and a light blocking part are provided. However, in either case, the first slit member 1 has an array pattern along the length of the light-transmitting part 11 and the light-blocking part 12, and a second slit member 1.
Slit (15) It is necessary that the arrangement pattern along the length of the light-transmitting part 21 and the light-shielding part 22 in the slit member 2 be slightly different from each other. 2 are overlapped, the area of the light-transmitting region 310 that satisfies Adjustment 11 changes sequentially along the length direction.

(ニ)前記第1のスリット部材1と第2のスリット部材
2とは摺動自在に重なシ合う代わシK。
(d) The first slit member 1 and the second slit member 2 are slidably overlapped.

互に空間を介して移動自在に重なシ合う構成であっても
よい。
They may be configured to overlap each other so as to be movable through space.

(ホ)第1のスリット部材IK対する第2のスリット部
材2の移動を阻止する固定tlitllKお−ては、第
1のスリット部材1に、第2のスリット部材2の縁を挟
止する挟止部材を設ける構成等多種多様の構成とするこ
とができる。
(e) A fixed tlitllK that prevents movement of the second slit member 2 with respect to the first slit member IK, a clamp that clamps the edge of the second slit member 2 on the first slit member 1. Various configurations such as configurations in which members are provided can be adopted.

以上のように本発明は、透光部と遮光部とが長さ方向に
沿って交互に形成された第1のスリット部材と、この第
1のスリット部材に長さ方向に移動自在に重ね合わせた
、透光部と遮光部とが長さ方向に沿って交互に形成され
た第2のスリン>部材とよ口0、前記第1のスリット部
材に係る透光部と遮光部との長さ方向における配列パタ
ーンと、前記112のスリット部材に係る透光部と遮光
部との長さ方向における配列パターンとが11f−3K
員、力゛ろものであるから、細長い帯状の照明領域の照
度分布パターンの調整を簡単に遂行することができ、従
って例えばII寥装wK用いた場合に、短時間で感光体
上に均一な照度分布を得ることのできる照度分布パター
ンの調整器を提供することができる。
As described above, the present invention includes a first slit member in which light-transmitting parts and light-blocking parts are formed alternately along the length direction, and a first slit member in which the light-transmitting parts and the light-blocking parts are movably superimposed on the first slit member in the length direction. In addition, a second slit in which light-transmitting parts and light-shielding parts are alternately formed along the length direction, the length of the light-transmitting part and the light-shielding part according to the first slit member. The arrangement pattern in the direction and the arrangement pattern in the length direction of the light-transmitting part and the light-shielding part related to the 112 slit members are 11f-3K.
Since the illuminance distribution pattern of a long and narrow strip-shaped illumination area can be easily adjusted, it is possible to easily achieve a uniform illuminance distribution pattern on the photoreceptor in a short time when using a II camera. It is possible to provide an illuminance distribution pattern adjuster that can obtain an illuminance distribution.

尚本発明に係る照度分布パターンの調整IIIけ、複寥
装蓋に用−ることに限定されるものでtin<、ファク
シミリにおける照明系に組込む等積々の用途に供するこ
とができる。
Note that the illuminance distribution pattern adjustment according to the present invention is limited to use in multiple-pack lids, and can be used in a wide variety of applications, such as being incorporated into a lighting system in a facsimile machine.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はII寥装置の原稿台上における照度分布パター
ンの理想状態の一例を示す特性曲線図、第2図F1@写
装置に使用される棒状電球の一例を示す説明図、第3図
Fi擲写装置における照度分布パターンの従来調整方法
を説明する説明図、第4図(17) は第3図において用いられた遮光板を示す平面図、第5
図は本発明に係る照度分布パターンの調整器の一実施例
を示す平面図、第6図(イ)及び(tI)は、夫々第5
図に示した調整器における第1のスリット部材及び第2
のスリット部材を示す平面図、第7図(イ)及び(ν)
並びK(ハ)は、夫々第1のスリット部材と第2のスリ
ン)部材の重なり具合いの一例を示す説明図及び透光領
域と遮光領域の配列パターンを示す説明図並びに照度分
布パターンを示す特性曲線図、第8図(イ)′及び(0
)並びK(ハ)は、夫々第1のスリット部材と第2のス
リット部材の重なり具合いの他の例を示す説明図及び透
光領域と遮光領域の配列パターンを示す説明図並びに照
度分布パターンを示す特性曲線図、第9図は本発明に係
る照度分布パターンの調整器を複写装置に用いた場合の
一例を示す説明図である。 l・・・第1のスリット部材 2・・・第2のスリット部材 11.21・・・透光部   】2.22・・・遮光部
(18) 13.23・・・長孔    14.24・・・小孔3
1・・・透光領域    32・・・遮光領域100・
・・照度分布パターンの調整器ト・・棒状電球    
 M・・・反射鏡丁・・・原稿台 第1囚 凍FII古よのfat向距離 第2図 第3図 第4図 第5図 第6Dコ (イ) 午6図(0) 匂ξ7図 (イ) デフ図([7) 采7図 (ハ) 第8fD  (イ) 第8図(0) 4屯8図(ハ)
Figure 1 is a characteristic curve diagram showing an example of an ideal state of the illumination distribution pattern on the document table of the II camera, Figure 2 is an explanatory diagram showing an example of a rod-shaped light bulb used in the F1 copying device, and Figure 3 Figure 4 (17) is a plan view showing the light shielding plate used in Figure 3;
The figure is a plan view showing one embodiment of the illuminance distribution pattern adjuster according to the present invention, and FIGS.
The first slit member and the second slit member in the regulator shown in the figure.
A plan view showing the slit member of FIG. 7 (A) and (ν)
Arrangement K (c) is an explanatory diagram showing an example of the overlapping condition of the first slit member and the second slit member, an explanatory diagram showing the arrangement pattern of the light-transmitting area and the light-blocking area, and a characteristic showing the illuminance distribution pattern. Curve diagram, Figure 8 (a)' and (0
) and K(c) are an explanatory diagram showing another example of the overlapping condition of the first slit member and the second slit member, an explanatory diagram showing the arrangement pattern of the light-transmitting area and the light-blocking area, and an illuminance distribution pattern. The characteristic curve diagram shown in FIG. 9 is an explanatory diagram showing an example of a case where the illuminance distribution pattern adjuster according to the present invention is used in a copying machine. l...First slit member 2...Second slit member 11.21...Transparent part]2.22...Light shielding part (18) 13.23...Long hole 14.24 ...Small hole 3
1... Light-transmitting area 32... Light-blocking area 100.
・Adjuster for illuminance distribution pattern ・Rod-shaped light bulb
M...Reflector plate...Manuscript stand 1st refrigerated FII old fat direction distance Fig. 2 Fig. 3 Fig. 4 Fig. 5 Fig. 6D Co (a) Fig. 6 (0) Fig. ξ7 (A) Differential diagram ([7) Figure 7 (C) 8th fD (A) Figure 8 (0) Figure 4 8 (C)

Claims (1)

【特許請求の範囲】 1ン透光部と遮光部とが長さ方向に沿りて交互に形成さ
れた第1のスリット部材と、この第1のスリット部材に
長さ方向に移動自在に重ね合わせた、透光部と遮光部と
が長さ方向に沿って交互に形成された第2のスリット部
材とよシ成り、前記第1のスリット部材に係°る透光部
と遮光部との長さ方向におする配列パターンと、前記第
2のスリット部材に係る透光部と遮光部との長さ方向に
おする配列パターンとが互に異なることを特徴とする照
度分布パターンの調整器― 2)前記Illのスリット部材は、透光部の輻Ll及び
遮光部の幅t1が夫々一定であル、前記第2のスリン)
部材は、透光部の幅L2及び遮光部の輻t2が夫々一定
であシ、透光部の@LlとL2とが互KJlなるか若し
くけ遮光部の輻t1とt2とが互に異なることを特徴と
する特許請求の範囲第1項記載の照度分布パターンの調
整器。 (2)
[Claims] A first slit member in which transparent parts and light shielding parts are alternately formed along the length direction, and a first slit member that is movably overlapped in the length direction. The second slit member has light transmitting parts and light shielding parts formed alternately along the length direction, and the light transmitting parts and light shielding parts related to the first slit member An illuminance distribution pattern adjuster characterized in that an arrangement pattern in the length direction and an arrangement pattern in the length direction of the light-transmitting parts and light-shielding parts of the second slit member are different from each other. - 2) In the slit member Ill, the radius Ll of the light-transmitting part and the width t1 of the light-shielding part are constant, and the second slit member)
The width L2 of the light-transmitting part and the radius t2 of the light-shielding part are constant, and the width L1 and L2 of the light-transmitting part are the same, or the radius t1 and t2 of the light-shielding part are mutually constant. The illuminance distribution pattern adjuster according to claim 1, wherein the illuminance distribution pattern adjuster is different. (2)
JP14779481A 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern Granted JPS5849932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14779481A JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14779481A JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Publications (2)

Publication Number Publication Date
JPS5849932A true JPS5849932A (en) 1983-03-24
JPH0223852B2 JPH0223852B2 (en) 1990-05-25

Family

ID=15438352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14779481A Granted JPS5849932A (en) 1981-09-21 1981-09-21 Adjuster for illuminance distribution pattern

Country Status (1)

Country Link
JP (1) JPS5849932A (en)

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