JPS5845502U - wide angle reflector - Google Patents
wide angle reflectorInfo
- Publication number
- JPS5845502U JPS5845502U JP14103581U JP14103581U JPS5845502U JP S5845502 U JPS5845502 U JP S5845502U JP 14103581 U JP14103581 U JP 14103581U JP 14103581 U JP14103581 U JP 14103581U JP S5845502 U JPS5845502 U JP S5845502U
- Authority
- JP
- Japan
- Prior art keywords
- angle
- sub
- reflecting surface
- wide
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は反射素子の再帰原理説明図、第２図は再帰反射
を示す曲線グラフ、第３図、第４図は公知例の反射器を
それぞれ水平方向に横断した断面図、第５図は公知例の
反射説明図、第６図は本考案実施例の反射説明図、第７
図は本考案実施例反射器の斜視図、第８図は第７図の水
平方向横断面図、第９図は他実施例反射器の斜面図、第
１０図は第９図の要部を二段に水平方向に断面して示し
た説明断面図である。
Ｘは主光軸、Ｙ−Ｙ’は副光軸、１１．１１′は反射器
本体、１２．１２’は主反射面、１３゜１３’、１４．
１４’は副反射面、１２ａ、１３ａ。
１４ａは反射素子。Fig. 1 is an explanatory diagram of the principle of retroreflection of a reflective element, Fig. 2 is a curve graph showing retroreflection, Figs. 3 and 4 are horizontal cross-sectional views of a known reflector, and Fig. 5 is a diagram illustrating the principle of retroreflection. FIG. 6 is a reflection explanatory diagram of a known example, and FIG. 7 is a reflection explanatory diagram of an embodiment of the present invention.
The figure is a perspective view of a reflector according to an embodiment of the present invention, FIG. 8 is a horizontal cross-sectional view of FIG. 7, FIG. 9 is an oblique view of another embodiment of the reflector, and FIG. FIG. 2 is an explanatory sectional view showing a horizontal section in two stages. X is the main optical axis, Y-Y' is the sub optical axis, 11.11' is the reflector body, 12.12' is the main reflection surface, 13° 13', 14.
14' is a sub-reflection surface, 12a, 13a. 14a is a reflective element.
Claims (5)
ービックコーナによる反射素子が集合的に配列されるよ
うに成型された反射器において、正面主光軸をもつ主反
射面と、主反射面に対し対向的に６０′以上の傾斜角α
を有する二面以上の副反射面とから成り、該副反射面に
反射素子によって形成される副光軸は副反射面に対して
αとは逆方向のある傾斜角βを有することを特徴とする
広角反射器。(1) In a reflector molded with transparent glass or synthetic resin, etc., so that reflective elements with a large number of cubic corners are collectively arranged on the back surface, there is a main reflecting surface with a front main optical axis, and a main reflecting surface. An inclination angle α of 60′ or more opposite to
and two or more sub-reflecting surfaces having the following characteristics, and a sub-optical axis formed by a reflective element on the sub-reflecting surface has a certain inclination angle β in a direction opposite to α with respect to the sub-reflecting surface. wide angle reflector.
隣接させた実用新案登録請求の範囲第（１）項記載の広
角反射器。(2) The wide-angle reflector according to claim (1), which has a pair of sub-reflecting surfaces adjacent to each other on both sides of a main reflecting surface.
接させた交点を、主反射面の中心線の上方又は下方に位
置させるように設けたことを特徴とする広角反射器。(3) A wide-angle reflector characterized in that two sub-reflecting surfaces are provided adjacent to each other and the intersection of the adjacent sub-reflecting surfaces is located above or below the center line of the main reflecting surface.
請求の範囲第（１）項〜同第（３）項記載の広角反射器
。(4) A wide-angle reflector according to claims (1) to (3) of the utility model registration, in which the angle of inclination β is 0°<β<60°.
〜９０°であり、両側反射面のなす角度α′は５８°〜
０°の範囲内にして、主反射面の巾以内において広角反
射を得る゛ことを特徴とする実用新案登録請求の範囲第
（３）項記載の広角反射器。(5) The angle α between the main reflecting surface and both side reflectors is 61° to 90°, and the angle α′ between both reflecting surfaces is 58° to 90°.
The wide-angle reflector according to claim 3, which is a registered utility model, is characterized in that wide-angle reflection is obtained within the width of the main reflecting surface within the range of 0°.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14103581U JPS5845502U (en) | 1981-09-21 | 1981-09-21 | wide angle reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14103581U JPS5845502U (en) | 1981-09-21 | 1981-09-21 | wide angle reflector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5845502U true JPS5845502U (en) | 1983-03-26 |
Family
ID=29934168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14103581U Pending JPS5845502U (en) | 1981-09-21 | 1981-09-21 | wide angle reflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5845502U (en) |
Cited By (9)
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|---|---|---|---|---|
| WO2007001017A1 (en) * | 2005-06-28 | 2007-01-04 | Nikon Corporation | Reflective member, optical member, interferometer system, stage device, exposure device, and device manufacturing method |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US9310696B2 (en) | 2005-05-12 | 2016-04-12 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
| US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
| US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
-
1981
- 1981-09-21 JP JP14103581U patent/JPS5845502U/en active Pending
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9885959B2 (en) | 2003-04-09 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator |
| US9678437B2 (en) | 2003-04-09 | 2017-06-13 | Nikon Corporation | Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction |
| US9423698B2 (en) | 2003-10-28 | 2016-08-23 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9760014B2 (en) | 2003-10-28 | 2017-09-12 | Nikon Corporation | Illumination optical apparatus and projection exposure apparatus |
| US9885872B2 (en) | 2003-11-20 | 2018-02-06 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light |
| US10281632B2 (en) | 2003-11-20 | 2019-05-07 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction |
| US20130271945A1 (en) | 2004-02-06 | 2013-10-17 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10241417B2 (en) | 2004-02-06 | 2019-03-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10234770B2 (en) | 2004-02-06 | 2019-03-19 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US10007194B2 (en) | 2004-02-06 | 2018-06-26 | Nikon Corporation | Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| US9429851B2 (en) | 2005-05-12 | 2016-08-30 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9891539B2 (en) | 2005-05-12 | 2018-02-13 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9310696B2 (en) | 2005-05-12 | 2016-04-12 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| US9360763B2 (en) | 2005-05-12 | 2016-06-07 | Nikon Corporation | Projection optical system, exposure apparatus, and exposure method |
| JP5024043B2 (en) * | 2005-06-28 | 2012-09-12 | 株式会社ニコン | Measuring system |
| JP2012147028A (en) * | 2005-06-28 | 2012-08-02 | Nikon Corp | Measurement device, measurement method and stage device |
| WO2007001017A1 (en) * | 2005-06-28 | 2007-01-04 | Nikon Corporation | Reflective member, optical member, interferometer system, stage device, exposure device, and device manufacturing method |
| US8693006B2 (en) | 2005-06-28 | 2014-04-08 | Nikon Corporation | Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method |
| US10101666B2 (en) | 2007-10-12 | 2018-10-16 | Nikon Corporation | Illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9857599B2 (en) | 2007-10-24 | 2018-01-02 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9341954B2 (en) | 2007-10-24 | 2016-05-17 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9678332B2 (en) | 2007-11-06 | 2017-06-13 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
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