JPS58151549A - Electrostatic capacity type humidity sensitive element - Google Patents

Electrostatic capacity type humidity sensitive element

Info

Publication number
JPS58151549A
JPS58151549A JP57034786A JP3478682A JPS58151549A JP S58151549 A JPS58151549 A JP S58151549A JP 57034786 A JP57034786 A JP 57034786A JP 3478682 A JP3478682 A JP 3478682A JP S58151549 A JPS58151549 A JP S58151549A
Authority
JP
Japan
Prior art keywords
electrode
moisture
film
humidity
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57034786A
Other languages
Japanese (ja)
Other versions
JPH0153417B2 (en
Inventor
Yoshifumi Takahashi
良文 高橋
Setsuo Kotado
古田土 節夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Anritsu Corp
Original Assignee
Anritsu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anritsu Corp filed Critical Anritsu Corp
Priority to JP57034786A priority Critical patent/JPS58151549A/en
Publication of JPS58151549A publication Critical patent/JPS58151549A/en
Publication of JPH0153417B2 publication Critical patent/JPH0153417B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/22Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance
    • G01N27/223Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance for determining moisture content, e.g. humidity
    • G01N27/225Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating capacitance for determining moisture content, e.g. humidity by using hygroscopic materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)

Abstract

PURPOSE:To make a humidity sensitive element small-sized and also responsive in a high speed by decreasing floating capacity, by using only electrostatic capacity constituted by a humidity sensitive material placed between a diffusion layer and water permeable electrode for humidity detection. CONSTITUTION:A humidity sensitive element is constituted by providing a diffusion layer 2 on a part of a semiconductor substrate 1 and providing a insulation film 3 on the layer 2 and moreover, providing an ohmic electrode 4 on a part of said layer 2. This electrode is used for giving electric potential to the layer 2 from the outside. Next, a humidity sensitive film 5 is provided on the layer 2 through the film 3 and a water permeable electrode 6 and a take-out electrode 7 insulated from the substrate 1 through the film 3 and separated from the electrode 4 each other, are provided on the substrate 1 and then, electrostatic capacity is constituted. Accordingly, variation quantity of humidity in the outside atmosphere is detected as the variation quantity of dimensions of the electrostatic capacity brought out by the film 5 placed between both electrodes 4, 6.

Description

【発明の詳細な説明】 本発明は半導体基板上に多孔質感湿材を用いて構成され
、かつ大気中またはガス中の湿度を静電容量の変化分と
して検出する感湿素子に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a moisture sensing element that is constructed using a porous moisture material on a semiconductor substrate and detects humidity in the atmosphere or gas as a change in capacitance.

現在使用されている小形の湿度針のほとんどはた感湿素
子には大きく分けると二つのタイプがある。一つはfI
l&の変化によって抵抗成分が変化する現象を利用した
ものであり、この現象を示す材料としては電鱗質やセラ
ミ、りがある。もう一つは人/、0.に代表される多孔
質膜を用いた静電容量形のもので、多孔質膜に水分が吸
脱着することにより静電容量の値が変化する現象を利用
したものである。抵抗成分の変化を利用した感湿素子に
おいてはglvが高くなると抵抗値が小さくなるという
現象を示し2反対に湿度の低い領域においては非常に高
い抵抗値を示す。このため微量の湿度の検出には不向き
であり1通常湿度が10−100%の高い領域における
感湿素子として用いられている。一方静電容量の変化を
利用した素子としては8i基板を覆う酸化絶縁膜上に設
けられた櫛形状成極に多孔質A 1.α憤を挾んで構成
したものや、Al基板の表面を酸化し、その上を透水性
電極で覆ったものとがある。これらの静電容量形の感湿
素子は湿度の低い領域でも静電容量の変化量が大きく数
1)Pmc!:いう微量の水分をも検出できる。しかし
これらの静電容量形の感湿素子を用いて湿度を測定する
には測定回路からくる制約上ある値(例えば19F)以
上の容量値が必要である。しかし上記構造め感湿素子に
おいては単位面積当りの静電容量値が小さいので素子面
積を大きくする必要がある。またAJ基板表面を酸化し
て感湿材を構成した構造の感湿素子は感湿材の膜厚が1
oIIIm位と厚いため応答が遅いという欠点がある。
Most of the small humidity needles currently in use have two types of humidity sensing elements. One is fI
It utilizes the phenomenon in which the resistance component changes due to changes in l&, and materials that exhibit this phenomenon include electrolyte, ceramic, and glue. The other is people/,0. It is a capacitive type that uses a porous membrane, as typified by the above, and utilizes the phenomenon that the value of capacitance changes when moisture is adsorbed and desorbed by the porous membrane. A humidity sensing element that utilizes changes in resistance components exhibits a phenomenon in which the resistance value decreases as glv increases, and on the other hand, the resistance value becomes extremely high in areas of low humidity. For this reason, it is unsuitable for detecting minute amounts of humidity, and is usually used as a humidity sensing element in high humidity areas of 10-100%. On the other hand, as an element that utilizes changes in capacitance, porous A1 is used in the comb-shaped polarization provided on the oxide insulating film covering the 8i substrate. There are those constructed by sandwiching alpha oxide, and those constructed by oxidizing the surface of an Al substrate and covering it with a water-permeable electrode. These capacitance-type humidity sensing elements have a large amount of change in capacitance even in areas with low humidity; :Can detect even trace amounts of moisture. However, in order to measure humidity using these capacitive humidity sensing elements, a capacitance value of at least a certain value (for example, 19 F) is required due to restrictions imposed by the measuring circuit. However, in the moisture sensitive element having the above structure, the capacitance value per unit area is small, so it is necessary to increase the area of the element. In addition, in the case of a moisture-sensitive element having a structure in which the moisture-sensitive material is formed by oxidizing the surface of the AJ substrate, the film thickness of the moisture-sensitive material is 1.
It has the disadvantage that the response is slow because it is as thick as oIIIm.

したがってこれらの感温素子は時代のニーズである小形
で高速応答性を有する感湿素子としては適さない。本発
明は上記の感湿素子における欠点を克服するために通常
の半導体技術を用いて構成した安価で小形。
Therefore, these temperature-sensitive elements are not suitable as small-sized moisture-sensitive elements having high-speed response, which is the need of the times. In order to overcome the drawbacks of the above-mentioned moisture sensing elements, the present invention is an inexpensive and small-sized moisture sensing element constructed using conventional semiconductor technology.

かつ高速応答性を有する感湿素子に関する。The present invention also relates to a moisture-sensitive element having high-speed response.

本発明の感湿素子は半導体基板上にオーミ、り電極が設
けられた拡散層と、この拡散層上に絶縁膜を介して設け
られた感湿材と、この感湿材を覆うように設けられた透
水性電極、前記透水性電極と接続されている取出電極よ
り構成される。
The moisture-sensitive element of the present invention includes a diffusion layer provided with an ohmic electrode on a semiconductor substrate, a moisture-sensitive material provided on the diffusion layer with an insulating film interposed therebetween, and a moisture-sensitive material provided to cover the moisture-sensitive material. The water-permeable electrode includes a water-permeable electrode, and an extraction electrode connected to the water-permeable electrode.

本発明の感湿素子の実施例を第1図、第2図柘示す。感
湿素子は半導体基板fll上の一部に拡散層(2)を設
け、拡散層上に絶縁1[+a+を設け、前記拡散層上の
一部にオーミック電極(4)を設ける。この電極は外部
から拡散層に電位を与えるために使用する。つぎに拡散
層上に絶縁膜を介して感湿膜(5)を設け、前記半導体
基板とは絶*mを介して、かおり、静電容量が構成され
ることになる。従って外部雰囲気中の湿度の変化分を前
記両電極(4) 、 fi+に挾まれた感湿膜(5)に
よってもたらされる静電容量の大きさの変化分として検
出することを特徴とする感湿素子である。通常感湿膜と
してはAIを陽極酸化した多孔質Ajs Oa膜が用い
られる。
Embodiments of the moisture-sensitive element of the present invention are shown in FIGS. 1 and 2. The moisture sensing element includes a diffusion layer (2) provided on a part of the semiconductor substrate fl1, an insulator 1[+a+] provided on the diffusion layer, and an ohmic electrode (4) provided on a part of the diffusion layer. This electrode is used to apply a potential to the diffusion layer from the outside. Next, a moisture sensitive film (5) is provided on the diffusion layer with an insulating film interposed therebetween, and a moisture sensitive film (5) is connected to the semiconductor substrate through an insulating film to form a scent and a capacitance. Therefore, the humidity sensing method is characterized in that a change in humidity in the external atmosphere is detected as a change in the capacitance provided by the humidity sensitive film (5) sandwiched between the electrodes (4) and fi+. It is element. A porous Ajs Oa film obtained by anodizing AI is usually used as the moisture sensitive film.

本発明による感湿素子の製造方法を第3図に示す。まず
n fpJ形8i基板+11の表面に熱酸化8i0* 
l[(8)を堆積する((ア)の状態)。次にホトエツ
チング技術で熱酸化8i0.i[)こ窓をあけ、Si基
板(1(に拡散を行ないp (n)拡散層(瀞を形成す
る((イ)の状ml)っ次に熱酸化F3rへ膜(8)を
除去しゲート酸化5iol膜(3)をSi基板(1)上
に堆積する((り)の状II)。次に拡散層(1)が残
るようにMをエツチングする((1)の状It)。
A method for manufacturing a moisture sensitive element according to the present invention is shown in FIG. First, the surface of the nfpJ type 8i substrate +11 is thermally oxidized 8i0*.
l[(8) is deposited (state (a)). Next, thermal oxidation 8i0. i[) Open a window, diffuse into the Si substrate (1), form a diffusion layer (p (n) (see ml in (A)), and then remove the film (8) onto the thermally oxidized F3r. A gate oxide 5iol film (3) is deposited on the Si substrate (1) (shape II in (ri)). Next, M is etched so that the diffusion layer (1) remains (shape It in (1)).

次にCV D Siα膜を全面に堆積しホトエツチング
技術を用いて2つの電極t41 、 (′11を覆うよ
うに8i0゜膜をエツチングし8iα膜(鴫、−を構成
する((オ)の状It)。次にゲート酸化81α膜(8
)の一部ζζホトエツチング技術で窓をあけMを全面に
蒸着し陽極酸化法を用いてA/、 O,を形成する。欠
番こホトエツチング技術を用いて拡散層(2)上にゲー
ト酸化5iOfi膜(3)を介して感湿膜(国を残し、
それ以外のkl、Oaを除去する((力)の状態)0こ
の工程が終ると拡散層上のMオーミック電極(4)を覆
う一部のSt(%膜、また感湿膜(5)と取出電極(7
)の間の5iOj膜、取出電極(7)の!!A湿嗅(5
)側の一部の8iα膜をホトエツチングする((キ)の
状態)。次に全面にレジストを塗布し。
Next, a CVD Siα film is deposited on the entire surface, and the 8i0° film is etched using a photoetching technique to cover the two electrodes t41 and ('11) to form an 8iα film ((o) shape It ).Next, gate oxide 81α film (8
), a window is opened using a photo-etching technique, M is vapor deposited on the entire surface, and A/, O, are formed using an anodic oxidation method. Leave the moisture sensitive film (country) through the gate oxidized 5iOfi film (3) on the diffusion layer (2) using the photo-etching technique.
The remaining kl and Oa are removed (state of (force)) 0 After this step, some of the St (% film) covering the M ohmic electrode (4) on the diffusion layer, and the moisture sensitive film (5) are removed. Take-out electrode (7
) of the extraction electrode (7)! ! A wet smell (5
Photoetch a part of the 8iα film on the ) side (state of (g)). Next, apply resist to the entire surface.

用いてS湿嘆(5)を覆うように透水性電極(6)を形
成する。次に前工糧の取出電極(7)と透水性電極(6
)の一部が完全lこ導通状轢になるように電解メッキ法
を用いて魁薄膜を厚くする。最後にダイシン2技次に本
発明の実施例における感湿素子の動作原理を第1図およ
び第2図を用いて説明する。まず透水性電極(句と半導
体基板(1)上に形成された拡散層上のオーミックM電
極(4の2つの電極に電圧を加えておく。今大気中ある
いはガス中の水分が透水性電極に接触すると水分はこの
膜を透過して1、α感湿膜(5)に入り込む。水分はイ
オンを含んでいるので電解質として働き、感湿膜(5)
の誘電率を変える。この変化によってもたらされた静電
容量の変化を検出すれば湿度の変化を測定することがで
きる。
A water-permeable electrode (6) is formed to cover the S-well (5). Next, the extraction electrode (7) and the water permeable electrode (6)
) The thin film is thickened using electrolytic plating so that a part of the area becomes completely conductive. Finally, Daishin 2 Technique Next, the operating principle of the moisture sensing element in the embodiment of the present invention will be explained using FIGS. 1 and 2. First, voltage is applied to the two electrodes of the ohmic M electrode (4) on the diffusion layer formed on the water-permeable electrode (1) and the semiconductor substrate (1).Now, moisture in the atmosphere or gas is applied to the water-permeable electrode. Upon contact, moisture passes through this membrane and enters the α moisture-sensitive membrane (5).Since the moisture contains ions, it acts as an electrolyte, and the moisture-sensitive membrane (5)
change the dielectric constant of Changes in humidity can be measured by detecting changes in capacitance caused by this change.

次に本発明による感湿素子を用いて構成した1賓検出装
置の一実施例について第4図を用いて説明する。まず本
発明による静電容量値が変化する感湿素子と抵抗器0に
よって積分回路を構成する。
Next, an embodiment of the one-guest detection device constructed using the humidity sensing element according to the present invention will be described with reference to FIG. First, an integrating circuit is constructed by the humidity sensing element whose capacitance value changes according to the present invention and resistor 0.

次に装置内に別の比較用積分回路α湯を設ける。この二
つの回路tこは、パルス発生回路口で発生させ矩形パル
ス信号を加えておき、2つの回路の差信号を差動増幅器
α◆を用いて検出する。今水分が透水性電極(旬を通過
して感湿素子内ζこ入って来ると感湿素子の静電容量を
変化させ差動増幅器Iの出力の差信号を変化させる。こ
の差信号の変化の量大値を検出し湿度に対応させれば湿
度測定をすることができる。上記差信号の最大値を保持
するには最大値保持回路四は前記パルス信号の周期に同
期させたリセットパルス回路αeで動作させる。このよ
うな回路を用いれば湿度の変化を検出するこ吉ができる
。また前記の回路を用いれば断続的に湿度測定を行なう
ことができ、電池などの有限微小電力でも動作させるこ
とができる。
Next, another integral circuit α for comparison is provided in the apparatus. These two circuits generate a rectangular pulse signal at the entrance of the pulse generating circuit and add a rectangular pulse signal thereto, and detect the difference signal between the two circuits using a differential amplifier α◆. When moisture passes through the permeable electrode and enters the humidity sensing element, it changes the capacitance of the humidity sensing element and changes the difference signal output from the differential amplifier I.Changes in this difference signal. Humidity measurement can be carried out by detecting a large value of the amount and making it correspond to the humidity.To hold the maximum value of the difference signal, the maximum value holding circuit 4 is a reset pulse circuit synchronized with the cycle of the pulse signal. Operate at αe.Using such a circuit, it is possible to detect changes in humidity.Also, using the circuit described above, it is possible to measure humidity intermittently, and it can also be operated with a finite micro-power such as a battery. be able to.

以上図面に従って本発明の感湿素子の原理と実施例につ
いて説明を行なった。本発明の感湿素子は拡散層と透水
性電極に挾まれた感湿材によって構成される静電容量だ
けを湿度検出に使用し、取出電極部によってもたらされ
る浮遊容量が小さくなる構造としたので高感度の感湿素
子を作ることができる。また、プレーナー形の素子なの
で半導体基板上においてM配線だけで他の回路と接続で
きる。例えば測定回路と感湿素子を同一基板上に設けM
配線で接続することが容易にできる。このため検出部と
測定回路部を同一基板上に設ければ一体化された集積化
センサとすることができる。
The principle and embodiments of the moisture sensitive element of the present invention have been explained above according to the drawings. The moisture-sensitive element of the present invention uses only the capacitance formed by the moisture-sensitive material sandwiched between the diffusion layer and the water-permeable electrode for humidity detection, and has a structure in which the stray capacitance caused by the lead-out electrode portion is reduced. Highly sensitive moisture sensing elements can be made. Furthermore, since it is a planar type element, it can be connected to other circuits on a semiconductor substrate using only M wiring. For example, a measurement circuit and a humidity sensing element are installed on the same board.
Can be easily connected by wiring. Therefore, by providing the detection section and the measurement circuit section on the same substrate, an integrated sensor can be obtained.

また2本発明の感湿素子は感湿材の厚さを02趨変まで
薄くでき、このため感湿素子を従来のものより非常ζこ
小形化することができ、しかも高速応答の感湿素子を作
ることができる。さらに半導体製作技術を用いて製作す
るため再現性がよく、安価な感湿素子を作ることができ
る。以上のように本発明は工業的価値の大きいものであ
る。
In addition, in the moisture sensing element of the present invention, the thickness of the moisture sensing material can be made as thin as 0.2 mm, so the moisture sensing element can be made much smaller than conventional ones, and it can also provide a high-speed response moisture sensing element. can be made. Furthermore, since it is manufactured using semiconductor manufacturing technology, it is possible to manufacture an inexpensive moisture-sensitive element with good reproducibility. As described above, the present invention has great industrial value.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の実施例における構成の正面図。 第2図は第1図のX−X断面図、第3図は本発明による
感湿素子の製造方法の一実施例を示す説明図、第4図は
本発明による感湿素子を使用した湿度検出装置の一実施
例を示す回路図である。 1・・・・・・半導体基板、2・・・・・・拡散層、3
・・・・・・絶縁膜、4・・・・・・オーミック電極、
5・・・・・・感湿材、6・・・19.透水性電極、7
・・・・・・取出電極、8・・・・・・熱酸化#6i(
l JjlE 、 9 ・・・・・・CV D SsO
* @ 、 103.9.= CV D 8i0* 膜
。 11・・・・・・抵抗器、12・・・・・・比較用積分
回路、!3−・・用パルス発生回路、14・・・・・・
差動増@器、 15・・・・・・最大値保持回路、16
・・・・・・リセットパルス回路代理人 弁理士 小泡
■太部 第 1 図 第 2 図
FIG. 1 is a front view of a configuration in an embodiment of the present invention. FIG. 2 is a sectional view taken along the line XX in FIG. 1, FIG. 3 is an explanatory diagram showing an example of the method for manufacturing a humidity sensing element according to the present invention, and FIG. 4 is a humidity sensor using the humidity sensing element according to the present invention. FIG. 2 is a circuit diagram showing an example of a detection device. 1... Semiconductor substrate, 2... Diffusion layer, 3
...Insulating film, 4...Ohmic electrode,
5...Moisture sensitive material, 6...19. Water permeable electrode, 7
...Extracting electrode, 8...Thermal oxidation #6i (
l JjlE, 9...CV D SsO
*@, 103.9. = CV D 8i0* membrane. 11...Resistor, 12...Comparison integration circuit,! 3- Pulse generation circuit for..., 14...
Differential multiplier, 15...Maximum value holding circuit, 16
・・・・・・Reset pulse circuit agent Patent attorney Kobu ■Tabe Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] 半導体基板(1)と;蚊半導体基板上の一部に設けられ
た拡散層(劾と;該拡散層上の一部に設けられたオーミ
ック電極(瘤と:#拡散層を覆って前記半導体基板土掻
と設けられた絶縁膜+81と;該拡散層上に前記絶縁膜
を介して設けられた感湿材(2)と;諌オーミック電極
が設けられた拡散層との間で咳絶縁膜および該感湿材と
を挾さんで静電容量を形成するように該感湿材を覆って
設けられた透水性電41: f8)と;該絶縁膜の上に
設けられ、かつ透水性電極と接続されている積出電極(
7)とからなる静電賽量形感湛素子。
Semiconductor substrate (1): A diffusion layer provided on a part of the semiconductor substrate (1); Ohmic electrode (nodule) provided on a part of the diffusion layer; A cough insulating film and a water-permeable electrode 41 (f8) provided covering the moisture-sensitive material so as to sandwich the moisture-sensitive material to form a capacitance; and a water-permeable electrode provided on the insulating film; Connected unloading electrode (
7) An electrostatic sensing element consisting of.
JP57034786A 1982-03-04 1982-03-04 Electrostatic capacity type humidity sensitive element Granted JPS58151549A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57034786A JPS58151549A (en) 1982-03-04 1982-03-04 Electrostatic capacity type humidity sensitive element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57034786A JPS58151549A (en) 1982-03-04 1982-03-04 Electrostatic capacity type humidity sensitive element

Publications (2)

Publication Number Publication Date
JPS58151549A true JPS58151549A (en) 1983-09-08
JPH0153417B2 JPH0153417B2 (en) 1989-11-14

Family

ID=12423952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57034786A Granted JPS58151549A (en) 1982-03-04 1982-03-04 Electrostatic capacity type humidity sensitive element

Country Status (1)

Country Link
JP (1) JPS58151549A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134944A (en) * 1986-11-27 1988-06-07 Anarogu Debaisezu Kk Humidity detecter
US6647782B2 (en) * 2001-07-16 2003-11-18 Denso Corporation Capacitive humidity sensor
JP2013057616A (en) * 2011-09-09 2013-03-28 Azbil Corp Environment sensor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63134944A (en) * 1986-11-27 1988-06-07 Anarogu Debaisezu Kk Humidity detecter
US6647782B2 (en) * 2001-07-16 2003-11-18 Denso Corporation Capacitive humidity sensor
JP2013057616A (en) * 2011-09-09 2013-03-28 Azbil Corp Environment sensor

Also Published As

Publication number Publication date
JPH0153417B2 (en) 1989-11-14

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