JPS5786030A - Method and apparatus for analysis of fluorescence x-rays - Google Patents

Method and apparatus for analysis of fluorescence x-rays

Info

Publication number
JPS5786030A
JPS5786030A JP16158480A JP16158480A JPS5786030A JP S5786030 A JPS5786030 A JP S5786030A JP 16158480 A JP16158480 A JP 16158480A JP 16158480 A JP16158480 A JP 16158480A JP S5786030 A JPS5786030 A JP S5786030A
Authority
JP
Japan
Prior art keywords
sample
fluorescence
ray
basing
rays
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16158480A
Other languages
Japanese (ja)
Inventor
Toshiaki Takagishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Priority to JP16158480A priority Critical patent/JPS5786030A/en
Publication of JPS5786030A publication Critical patent/JPS5786030A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To decrease measuring error of content of a prescribed element in sample, by correcting measured value by a fluorescence X-ray by the pressure of an air layer basing on a correction formula. CONSTITUTION:A sample accommodating receptacle 13 is placed on a window 12 formed in a sample stand 1 and the primary X-rays from an X-ray tube 21 is irradiated to a sample 16 in the receptacle 13 through an air layer 17 and a cell sheet 15. Fluorescence X-rays radiated from the sample 16 are detected as a voltage pulse by a detector 32 through an X-ray filter 31 and the value of a pulse waveheight in accordance with the concentration is counted by a counter 34 through a waveheight discriminator 33. Output from the counter 34 is expressed in terms of content of a prescribed element basing on calibration curve by an operation mechanism 41 and also, this conversion value is corrected by the output from an atmospheric pressure correction mechanism 50 and a temperature correction mechanism 60 basing on a correction formula using the atmospheric pressure and temperature as the variables and is outputted to a printing mechanism 44. Hereby, analysis of fluorescence X-ray is carried out accurately.
JP16158480A 1980-11-17 1980-11-17 Method and apparatus for analysis of fluorescence x-rays Pending JPS5786030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16158480A JPS5786030A (en) 1980-11-17 1980-11-17 Method and apparatus for analysis of fluorescence x-rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16158480A JPS5786030A (en) 1980-11-17 1980-11-17 Method and apparatus for analysis of fluorescence x-rays

Publications (1)

Publication Number Publication Date
JPS5786030A true JPS5786030A (en) 1982-05-28

Family

ID=15737897

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16158480A Pending JPS5786030A (en) 1980-11-17 1980-11-17 Method and apparatus for analysis of fluorescence x-rays

Country Status (1)

Country Link
JP (1) JPS5786030A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6061649A (en) * 1983-09-16 1985-04-09 Rigaku Denki Kogyo Kk Correction of x-ray fluorescence analysis
JPH02118440A (en) * 1988-10-28 1990-05-02 Shimadzu Corp X-ray analysis apparatus
JPH05119000A (en) * 1991-10-23 1993-05-14 Horiba Ltd Fluorescent x-ray analyzing device
CN102735705A (en) * 2011-03-16 2012-10-17 奥林巴斯Ndt公司 Portable xrf analyzer and xrf analysis method
JP2015219199A (en) * 2014-05-20 2015-12-07 株式会社堀場製作所 Analysis device and calibration method
RU2623689C2 (en) * 2012-11-29 2017-06-28 Хельмут Фишер Гмбх Институт Фюр Электроник Унд Месстекник Method and device for carrying out x-ray fluorescence analysis
WO2020066100A1 (en) * 2018-09-28 2020-04-02 株式会社島津製作所 X-ray fluorescence spectrometer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6061649A (en) * 1983-09-16 1985-04-09 Rigaku Denki Kogyo Kk Correction of x-ray fluorescence analysis
JPH02118440A (en) * 1988-10-28 1990-05-02 Shimadzu Corp X-ray analysis apparatus
JPH05119000A (en) * 1991-10-23 1993-05-14 Horiba Ltd Fluorescent x-ray analyzing device
CN102735705A (en) * 2011-03-16 2012-10-17 奥林巴斯Ndt公司 Portable xrf analyzer and xrf analysis method
RU2623689C2 (en) * 2012-11-29 2017-06-28 Хельмут Фишер Гмбх Институт Фюр Электроник Унд Месстекник Method and device for carrying out x-ray fluorescence analysis
JP2015219199A (en) * 2014-05-20 2015-12-07 株式会社堀場製作所 Analysis device and calibration method
WO2020066100A1 (en) * 2018-09-28 2020-04-02 株式会社島津製作所 X-ray fluorescence spectrometer

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