JPS5784927A - Gas flow rate control apparatus - Google Patents
Gas flow rate control apparatusInfo
- Publication number
- JPS5784927A JPS5784927A JP16041280A JP16041280A JPS5784927A JP S5784927 A JPS5784927 A JP S5784927A JP 16041280 A JP16041280 A JP 16041280A JP 16041280 A JP16041280 A JP 16041280A JP S5784927 A JPS5784927 A JP S5784927A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- gas
- pressure
- check valve
- responsive member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Fluid-Driven Valves (AREA)
- Feeding And Controlling Fuel (AREA)
Abstract
PURPOSE: To improve the flexibility of control and to secure the operation of the apparatus by a method wherein a part of a gas to be controlled is taken out to be supplied under pressure to a pressure chamber by means of an electromagnetic pressure supply device and valves are controlled by a responsive member which varies its position by detecting the pressure in the pressure chamber.
CONSTITUTION: When a piston 6 moves upward, the pressures in a cylinder chamber 7 and a supply chamber 10 decrease so that a check valve 8 is opened and the gas in a pipe 12 is sucked into the cylinder chamber 7 and the sucking chamber 19 through a pipe 13. On the other hand, when the piston 6 moves downward, the check valve 8 is kept closed and a check valve 9 is opened so that the gas in the cylinder chamber 7 flows into the pressure chamber 20 through a communication hole 19. As a consequence, the responsive member 23 is pushed downward and a valve body 24 connected to the responsive member 23 leaves away from a valve sheet 27 so that the gas within an inlet passage 26 flows into an outlet passage 27.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16041280A JPS5853246B2 (en) | 1980-11-14 | 1980-11-14 | Gas flow control device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16041280A JPS5853246B2 (en) | 1980-11-14 | 1980-11-14 | Gas flow control device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5784927A true JPS5784927A (en) | 1982-05-27 |
JPS5853246B2 JPS5853246B2 (en) | 1983-11-28 |
Family
ID=15714370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16041280A Expired JPS5853246B2 (en) | 1980-11-14 | 1980-11-14 | Gas flow control device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5853246B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6557820B2 (en) * | 2001-05-22 | 2003-05-06 | Lockheed Martin Corporation | Two-stage valve suitable as high-flow high-pressure microvalve |
-
1980
- 1980-11-14 JP JP16041280A patent/JPS5853246B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6557820B2 (en) * | 2001-05-22 | 2003-05-06 | Lockheed Martin Corporation | Two-stage valve suitable as high-flow high-pressure microvalve |
Also Published As
Publication number | Publication date |
---|---|
JPS5853246B2 (en) | 1983-11-28 |
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