JPS5745927A - Vacuum leakage detector for dry etching vacuum container - Google Patents

Vacuum leakage detector for dry etching vacuum container

Info

Publication number
JPS5745927A
JPS5745927A JP12156480A JP12156480A JPS5745927A JP S5745927 A JPS5745927 A JP S5745927A JP 12156480 A JP12156480 A JP 12156480A JP 12156480 A JP12156480 A JP 12156480A JP S5745927 A JPS5745927 A JP S5745927A
Authority
JP
Japan
Prior art keywords
container
electrode
vacuum
plasma
window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12156480A
Other languages
Japanese (ja)
Inventor
Minoru Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12156480A priority Critical patent/JPS5745927A/en
Publication of JPS5745927A publication Critical patent/JPS5745927A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To accurately and simply detect the vacuum leakage of a container by providing a window for passing a light to a vacuum container used for dry etching and a photodetector faced with the window and detecting the plasma light of N2 or O2 produced when its airtightness becomes improper. CONSTITUTION:Opposite electrode 2 to become one electrode for generating a plasma is arranged in a vacuum container 1 forming a plasma etching device in such a manner that the potential of the electrode 2 is set to the same potential of the container 1. A water-cooled electrode 3 is arranged via a dielectric unit 4 for shielding from the container 1 oppositely to the electrode 2, a wafer 7 for a semiconductor device is placed as a member to be etched thereon, is energized by a high frequency power source, and the internal gas is converted to the plasma. In this configuration, a window 8 is opened at one side wall of the container 1, and a photodetector 10, e.g., a photodiode or the like is mounted via a filter 9 passing the characteristic wavelength of N2, O2 thereat. In this manner, the plasma light of N2, O2 always produced when the airtightness of the container 1 becomes improper is selectively detected, thereby effectively detecting the leakage.
JP12156480A 1980-09-02 1980-09-02 Vacuum leakage detector for dry etching vacuum container Pending JPS5745927A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12156480A JPS5745927A (en) 1980-09-02 1980-09-02 Vacuum leakage detector for dry etching vacuum container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12156480A JPS5745927A (en) 1980-09-02 1980-09-02 Vacuum leakage detector for dry etching vacuum container

Publications (1)

Publication Number Publication Date
JPS5745927A true JPS5745927A (en) 1982-03-16

Family

ID=14814347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12156480A Pending JPS5745927A (en) 1980-09-02 1980-09-02 Vacuum leakage detector for dry etching vacuum container

Country Status (1)

Country Link
JP (1) JPS5745927A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4512283A (en) * 1982-02-01 1985-04-23 Texas Instruments Incorporated Plasma reactor sidewall shield
JPS62231801A (en) * 1986-03-15 1987-10-12 ヴエルナ−・ヤコブ Bearing device for driven wheel of automobile
JPH0640458U (en) * 1992-10-30 1994-05-31 エヌティエヌ株式会社 Split type rolling bearing device
EP0807952A2 (en) * 1996-05-13 1997-11-19 Applied Materials, Inc. Plasma reactor with heated source of a polymer-hardening precursor material
US8220423B2 (en) 2006-09-04 2012-07-17 Ntn Corporation Roller bearing, camshaft support structure, and internal combustion engine

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4512283A (en) * 1982-02-01 1985-04-23 Texas Instruments Incorporated Plasma reactor sidewall shield
JPS62231801A (en) * 1986-03-15 1987-10-12 ヴエルナ−・ヤコブ Bearing device for driven wheel of automobile
US6036877A (en) * 1991-06-27 2000-03-14 Applied Materials, Inc. Plasma reactor with heated source of a polymer-hardening precursor material
JPH0640458U (en) * 1992-10-30 1994-05-31 エヌティエヌ株式会社 Split type rolling bearing device
EP0807952A2 (en) * 1996-05-13 1997-11-19 Applied Materials, Inc. Plasma reactor with heated source of a polymer-hardening precursor material
EP0807952A3 (en) * 1996-05-13 1998-01-14 Applied Materials, Inc. Plasma reactor with heated source of a polymer-hardening precursor material
US6218312B1 (en) 1996-05-13 2001-04-17 Applied Materials Inc. Plasma reactor with heated source of a polymer-hardening precursor material
US8220423B2 (en) 2006-09-04 2012-07-17 Ntn Corporation Roller bearing, camshaft support structure, and internal combustion engine

Similar Documents

Publication Publication Date Title
US4245154A (en) Apparatus for treatment with gas plasma
KR850008559A (en) Etching Monitoring Method and Apparatus
US4902631A (en) Monitoring the fabrication of semiconductor devices by photon induced electron emission
JPS5745927A (en) Vacuum leakage detector for dry etching vacuum container
JPS56105480A (en) Plasma etching method
JPS5747874A (en) Detection of end point of dry etching reaction
US2947876A (en) Pinhole detecting unit
JPS60241227A (en) Microwave plasma device
JPS5619624A (en) Detection of etching end point in plasma processor
JPS5563830A (en) End point detection method and its apparatus
JPS5647569A (en) Plasma etching method
JPS56130473A (en) Dry etching apparatus
JPS5792510A (en) Etching of silicon nitride film
JPS6417428A (en) Plasma device
JPS59170272A (en) Dry treating device
JPH0261140B2 (en)
JPS54155054A (en) Detector
JPS5726438A (en) Etching measuring apparatus
JPS61133387A (en) Etching device
JPS648625A (en) Detection of end point of gas etching
JPH05326457A (en) Terminal detector for plasma etching equipment due to detection of components of exhaust gas
JPS60218846A (en) Dry etching apparatus
JPS5396791A (en) Semiconductor radiation detector
JPS5436777A (en) Gas detector
JPS5680186A (en) Laser device