JPS57152166A - Manufacture of schottky barrier gate field effect transistor - Google Patents
Manufacture of schottky barrier gate field effect transistorInfo
- Publication number
- JPS57152166A JPS57152166A JP3698381A JP3698381A JPS57152166A JP S57152166 A JPS57152166 A JP S57152166A JP 3698381 A JP3698381 A JP 3698381A JP 3698381 A JP3698381 A JP 3698381A JP S57152166 A JPS57152166 A JP S57152166A
- Authority
- JP
- Japan
- Prior art keywords
- film
- source
- alloys
- manufacture
- field effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000004888 barrier function Effects 0.000 title 1
- 230000005669 field effect Effects 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 abstract 3
- 239000000956 alloy Substances 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 abstract 2
- 102000004129 N-Type Calcium Channels Human genes 0.000 abstract 1
- 108090000699 N-Type Calcium Channels Proteins 0.000 abstract 1
- 238000000137 annealing Methods 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000005468 ion implantation Methods 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE:To form a gate electrode and N<+> region of source and drain by subjecting ion implantation making use of the self-alignment process as well as to reduce the gate resistance by a method of manufacturing the GaAs MESFET. CONSTITUTION:The first metallic film 41 contaiing a metal such as Nb, Ta, Mo, W and the like or the alloys thereof or the other alloys containing 20atm% or less of metal such as Ti, Cr, Zr and the like in addition to the said metals and alloys is formed on an N type channel layer 12 formed on a high resistant GaAs substrate 11 and the second metallic film 42 is formed on the said film 41 into the size larger than that of the film 41 and the ion 43 of the donor impurities is implanted in the source and drain regions 44 and 45. Then the surface is coated with a protecting film 46 for annealing to activate the implanted ion forming the N<+> regions 13 and 14. The surface protecting film is further removed to form the source and drain electrode 16 and 17.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3698381A JPS57152166A (en) | 1981-03-13 | 1981-03-13 | Manufacture of schottky barrier gate field effect transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3698381A JPS57152166A (en) | 1981-03-13 | 1981-03-13 | Manufacture of schottky barrier gate field effect transistor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57152166A true JPS57152166A (en) | 1982-09-20 |
JPH0235462B2 JPH0235462B2 (en) | 1990-08-10 |
Family
ID=12484979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3698381A Granted JPS57152166A (en) | 1981-03-13 | 1981-03-13 | Manufacture of schottky barrier gate field effect transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57152166A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5861693A (en) * | 1981-10-09 | 1983-04-12 | Kokusai Denshin Denwa Co Ltd <Kdd> | Distribution feedback type semiconductor laser |
JPS59171164A (en) * | 1983-03-18 | 1984-09-27 | Oki Electric Ind Co Ltd | Manufacture of semiconductor element |
JPS6022378A (en) * | 1983-07-18 | 1985-02-04 | Nippon Telegr & Teleph Corp <Ntt> | Field-effect transistor and manufacture thereof |
JPS6068662A (en) * | 1983-09-26 | 1985-04-19 | Toshiba Corp | Semiconductor device and manufacture thereof |
JPS60145673A (en) * | 1984-01-09 | 1985-08-01 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS6143481A (en) * | 1984-08-08 | 1986-03-03 | Oki Electric Ind Co Ltd | Manufacture of schottky gate field effect transistor |
JPS6155966A (en) * | 1984-08-27 | 1986-03-20 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS61216484A (en) * | 1985-03-22 | 1986-09-26 | Mitsubishi Electric Corp | Manufacture of field effect transistor |
JPS6298780A (en) * | 1985-10-21 | 1987-05-08 | アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド | Manufacture of self-aligning gaas digital integrated circuit |
JPS647570A (en) * | 1987-01-12 | 1989-01-11 | Int Standard Electric Corp | Manufacture of self-aligning field effect transistor |
JPH01198079A (en) * | 1988-02-02 | 1989-08-09 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JP2013191655A (en) * | 2012-03-13 | 2013-09-26 | Nippon Telegr & Teleph Corp <Ntt> | Heterojunction bipolar transistor and manufacturing method of the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5012985A (en) * | 1973-06-01 | 1975-02-10 | ||
JPS5197984A (en) * | 1975-02-26 | 1976-08-28 | Shotsutoki baria geetodenkaikokatoranjisuta oyobi sonoseizohoho | |
JPS57128071A (en) * | 1981-01-30 | 1982-08-09 | Fujitsu Ltd | Field-effect type semiconductor device and manufacture thereof |
-
1981
- 1981-03-13 JP JP3698381A patent/JPS57152166A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5012985A (en) * | 1973-06-01 | 1975-02-10 | ||
JPS5197984A (en) * | 1975-02-26 | 1976-08-28 | Shotsutoki baria geetodenkaikokatoranjisuta oyobi sonoseizohoho | |
JPS57128071A (en) * | 1981-01-30 | 1982-08-09 | Fujitsu Ltd | Field-effect type semiconductor device and manufacture thereof |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5861693A (en) * | 1981-10-09 | 1983-04-12 | Kokusai Denshin Denwa Co Ltd <Kdd> | Distribution feedback type semiconductor laser |
JPS59171164A (en) * | 1983-03-18 | 1984-09-27 | Oki Electric Ind Co Ltd | Manufacture of semiconductor element |
JPS6022378A (en) * | 1983-07-18 | 1985-02-04 | Nippon Telegr & Teleph Corp <Ntt> | Field-effect transistor and manufacture thereof |
JPS6068662A (en) * | 1983-09-26 | 1985-04-19 | Toshiba Corp | Semiconductor device and manufacture thereof |
JPS60145673A (en) * | 1984-01-09 | 1985-08-01 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPS6143481A (en) * | 1984-08-08 | 1986-03-03 | Oki Electric Ind Co Ltd | Manufacture of schottky gate field effect transistor |
JPS6155966A (en) * | 1984-08-27 | 1986-03-20 | Oki Electric Ind Co Ltd | Manufacture of semiconductor device |
JPS61216484A (en) * | 1985-03-22 | 1986-09-26 | Mitsubishi Electric Corp | Manufacture of field effect transistor |
JPS6298780A (en) * | 1985-10-21 | 1987-05-08 | アイテイ−テイ−・インダストリ−ズ・インコ−ポレ−テツド | Manufacture of self-aligning gaas digital integrated circuit |
JP2624656B2 (en) * | 1985-10-21 | 1997-06-25 | アイティーティー・インダストリーズ・インコーポレーテッド | Method of manufacturing GaAs field effect transistor |
JPS647570A (en) * | 1987-01-12 | 1989-01-11 | Int Standard Electric Corp | Manufacture of self-aligning field effect transistor |
JPH01198079A (en) * | 1988-02-02 | 1989-08-09 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JP2013191655A (en) * | 2012-03-13 | 2013-09-26 | Nippon Telegr & Teleph Corp <Ntt> | Heterojunction bipolar transistor and manufacturing method of the same |
Also Published As
Publication number | Publication date |
---|---|
JPH0235462B2 (en) | 1990-08-10 |
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