JPS57152129A - Developing method of resist - Google Patents

Developing method of resist

Info

Publication number
JPS57152129A
JPS57152129A JP3700981A JP3700981A JPS57152129A JP S57152129 A JPS57152129 A JP S57152129A JP 3700981 A JP3700981 A JP 3700981A JP 3700981 A JP3700981 A JP 3700981A JP S57152129 A JPS57152129 A JP S57152129A
Authority
JP
Japan
Prior art keywords
developing solution
under
saturated
vapor
box
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3700981A
Other languages
Japanese (ja)
Inventor
Akira Shirakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP3700981A priority Critical patent/JPS57152129A/en
Publication of JPS57152129A publication Critical patent/JPS57152129A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To achieve stable development of resist by a spray method by spraying a developing solution under the state in which the spraying space is saturated with vapor of the developing solution. CONSTITUTION:A spraying space is enclosed with a box 6 in order to make development under the atmosphere which is saturated with vapor of a developing solution by enveloping the developing solution in vaporing vessels 7 and 8 connected wit the box. A baseplate 2 having an exposed resist film 3 is mounted on a mounting table 1, and then the space inside the box 6 is saturated with vapor of the developing solution. The developing solution is mistily sprayed from a developing-solution spray gun 4 with the mounting table rotated at high speed. Under this atmosphere, the decline of temperature due to evaporation of the developing solution is very small because it is the spray under the saturating state, and also variation of composition of the developing solution due to vaporization is null. So, the development is carried out stably.
JP3700981A 1981-03-13 1981-03-13 Developing method of resist Pending JPS57152129A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3700981A JPS57152129A (en) 1981-03-13 1981-03-13 Developing method of resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3700981A JPS57152129A (en) 1981-03-13 1981-03-13 Developing method of resist

Publications (1)

Publication Number Publication Date
JPS57152129A true JPS57152129A (en) 1982-09-20

Family

ID=12485683

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3700981A Pending JPS57152129A (en) 1981-03-13 1981-03-13 Developing method of resist

Country Status (1)

Country Link
JP (1) JPS57152129A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123232A (en) * 1982-12-28 1984-07-17 Toshiba Corp Spray developing method
JPS6275634A (en) * 1985-09-27 1987-04-07 ノキア（ドィチュラント）ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング Forming method for black color matrix layer
JPS6452232U (en) * 1987-09-29 1989-03-31
JPH01238664A (en) * 1988-03-18 1989-09-22 Toppan Printing Co Ltd Constant-temperature constant-humidity spot chamber
JPH08138990A (en) * 1994-11-02 1996-05-31 Furontetsuku:Kk Method and apparatus for developing of resist
WO2004086470A1 (en) * 2003-03-25 2004-10-07 Nikon Corporation Exposure system and device production method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9810996B2 (en) 2006-05-09 2017-11-07 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US10345710B2 (en) 2004-01-20 2019-07-09 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus and measuring device for a projection lens

Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123232A (en) * 1982-12-28 1984-07-17 Toshiba Corp Spray developing method
JPS6361770B2 (en) * 1982-12-28 1988-11-30
JPS6275634A (en) * 1985-09-27 1987-04-07 ノキア（ドィチュラント）ゲゼルシャフト　ミット　ベシュレンクテル　ハフツング Forming method for black color matrix layer
US4889781A (en) * 1985-09-27 1989-12-26 Nokia Graetz Process and apparatus for producing a black matrix layer
JPS6452232U (en) * 1987-09-29 1989-03-31
JPH0452989Y2 (en) * 1987-09-29 1992-12-14
JPH01238664A (en) * 1988-03-18 1989-09-22 Toppan Printing Co Ltd Constant-temperature constant-humidity spot chamber
JPH08138990A (en) * 1994-11-02 1996-05-31 Furontetsuku:Kk Method and apparatus for developing of resist
US8804095B2 (en) 2003-03-25 2014-08-12 Nikon Corporation Exposure apparatus and device fabrication method
US7471371B2 (en) 2003-03-25 2008-12-30 Nikon Corporation Exposure apparatus and device fabrication method
JP2009158977A (en) * 2003-03-25 2009-07-16 Nikon Corp Exposure apparatus and device fabrication method
JP2011044736A (en) * 2003-03-25 2011-03-03 Nikon Corp Exposure apparatus, and device manufacturing method
US7916272B2 (en) 2003-03-25 2011-03-29 Nikon Corporation Exposure apparatus and device fabrication method
US8018570B2 (en) 2003-03-25 2011-09-13 Nikon Corporation Exposure apparatus and device fabrication method
JP2012080148A (en) * 2003-03-25 2012-04-19 Nikon Corp Exposure apparatus, and device manufacturing method
US8558987B2 (en) 2003-03-25 2013-10-15 Nikon Corporation Exposure apparatus and device fabrication method
JP2014030061A (en) * 2003-03-25 2014-02-13 Nikon Corp Exposure apparatus, and device manufacturing method
WO2004086470A1 (en) * 2003-03-25 2004-10-07 Nikon Corporation Exposure system and device production method
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10345710B2 (en) 2004-01-20 2019-07-09 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus and measuring device for a projection lens
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9810996B2 (en) 2006-05-09 2017-11-07 Carl Zeiss Smt Gmbh Optical imaging device with thermal attenuation
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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