JPS57109244A - Ion source - Google Patents

Ion source

Info

Publication number
JPS57109244A
JPS57109244A JP55183837A JP18383780A JPS57109244A JP S57109244 A JPS57109244 A JP S57109244A JP 55183837 A JP55183837 A JP 55183837A JP 18383780 A JP18383780 A JP 18383780A JP S57109244 A JPS57109244 A JP S57109244A
Authority
JP
Japan
Prior art keywords
electrode
voltage
repeller
applied voltage
ionic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55183837A
Other languages
Japanese (ja)
Inventor
Hiroshi Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP55183837A priority Critical patent/JPS57109244A/en
Publication of JPS57109244A publication Critical patent/JPS57109244A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/16—Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To increase the ionic current, and enhance the sensitivity of an ionic source by applying to a repeller electrode, a voltage which is larger than the applied voltage of an electrode with an ionic outlet and has the same polairy as the former applied voltage. CONSTITUTION:An ion source is constituted of an emitter 1, an electrode 2, a repeller electrode 4, a lens electrode 5 and an earth electrode 6. Electrons existing in sample molecules are drawn and eliminated simultaneously due to the potential difference between an emitter voltage VE and a voltage Vo of the repeller electode , and are sent with increasing speed in the direction toward an ion outlet 3. Thus produced ions are focused on the earth electrode 6 through a lens voltage VL. Following that, the ions focused are sent into a mass spectrometer, and are subjected to mass spectrometry. The applied voltage of the repeller electrode 4 is made to be larger than the applied voltage Vo of the electrode 2, and to have the same polarity as the voltage Vo.
JP55183837A 1980-12-26 1980-12-26 Ion source Pending JPS57109244A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55183837A JPS57109244A (en) 1980-12-26 1980-12-26 Ion source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55183837A JPS57109244A (en) 1980-12-26 1980-12-26 Ion source

Publications (1)

Publication Number Publication Date
JPS57109244A true JPS57109244A (en) 1982-07-07

Family

ID=16142701

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55183837A Pending JPS57109244A (en) 1980-12-26 1980-12-26 Ion source

Country Status (1)

Country Link
JP (1) JPS57109244A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5466941A (en) * 1994-07-27 1995-11-14 Kim; Seong I. Negative ion sputtering beam source
US5521389A (en) * 1995-03-21 1996-05-28 Kim; Seong I. Solid state cesium ion gun

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5466941A (en) * 1994-07-27 1995-11-14 Kim; Seong I. Negative ion sputtering beam source
US5521389A (en) * 1995-03-21 1996-05-28 Kim; Seong I. Solid state cesium ion gun

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