JPS5698827A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS5698827A
JPS5698827A JP77980A JP77980A JPS5698827A JP S5698827 A JPS5698827 A JP S5698827A JP 77980 A JP77980 A JP 77980A JP 77980 A JP77980 A JP 77980A JP S5698827 A JPS5698827 A JP S5698827A
Authority
JP
Japan
Prior art keywords
electron beam
electrode
electron
dimension
aligned
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP77980A
Other languages
Japanese (ja)
Inventor
Katsutoshi Kubota
Mamoru Kondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP779A external-priority patent/JPS54106349A/en
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Publication of JPS5698827A publication Critical patent/JPS5698827A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To intend to increase the exposure velocity by using a cool cathode electron beam generating device which can control the generation and the stop of the electron beam easily with the aid of an applied voltage and further generating a numerous electron beam from its device simultaneously. CONSTITUTION:An electron generating part 1 is set by arranging electrodes 3 and 5 through an insulating film 5 and aligned in one dimension or two dimension by separating between the elements 2. When approximately 10V of voltage is applied between a positive electrode 3 and an electrode 4, a tunnel current flows. At this time, when the surface of the electrode 3 is maintained in vacuum, a part of electrons having higher energy flies out into the vacuum through the electrode 3 and generates the electron beam in the B1 direction shown by an arrow. This beam can be easily generated or stopped and the electron having an arranged form is obtained. Since the electron beam is aligned numerously and generated simultaneously, the exposure velocity can be increased. When the arranging pattern of the electron beam is contracted and projected with a lens, the contracted pattern can be exposured and is effective to an economical production of IC.
JP77980A 1979-01-04 1980-01-08 Electron beam exposure device Pending JPS5698827A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP779A JPS54106349A (en) 1977-12-30 1979-01-04 Buttonhole lock stitch machine

Publications (1)

Publication Number Publication Date
JPS5698827A true JPS5698827A (en) 1981-08-08

Family

ID=11462398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP77980A Pending JPS5698827A (en) 1979-01-04 1980-01-08 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS5698827A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61193346A (en) * 1985-02-14 1986-08-27 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Electron beam apparatus having semiconductor electron emitting body
JPS63950A (en) * 1986-06-19 1988-01-05 Canon Inc Electron emitting device
JPS6340242A (en) * 1986-08-05 1988-02-20 Canon Inc Charged particle generator
JPS63269520A (en) * 1987-04-28 1988-11-07 Canon Inc Electron beam lithography equipment
JPS63269521A (en) * 1987-04-28 1988-11-07 Canon Inc Electron beam lithography equipment
EP0394698A2 (en) * 1989-03-30 1990-10-31 Canon Kabushiki Kaisha Electron beam lithography machine and image display apparatus
EP0780879A3 (en) * 1995-12-21 1998-01-07 Nec Corporation Electron beam exposure apparatus
CN103299390A (en) * 2010-10-25 2013-09-11 弗劳恩霍弗实用研究促进协会 Device for producing an electron beam

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5091274A (en) * 1973-12-12 1975-07-21
JPS518874A (en) * 1974-07-10 1976-01-24 Hitachi Ltd
JPS5116754A (en) * 1974-08-01 1976-02-10 Tore Eng Co Ltd Bod seibunganjuhaisuino shorihoho

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5091274A (en) * 1973-12-12 1975-07-21
JPS518874A (en) * 1974-07-10 1976-01-24 Hitachi Ltd
JPS5116754A (en) * 1974-08-01 1976-02-10 Tore Eng Co Ltd Bod seibunganjuhaisuino shorihoho

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61193346A (en) * 1985-02-14 1986-08-27 エヌ・ベ−・フイリツプス・フル−イランペンフアブリケン Electron beam apparatus having semiconductor electron emitting body
JPS63950A (en) * 1986-06-19 1988-01-05 Canon Inc Electron emitting device
JPS6340242A (en) * 1986-08-05 1988-02-20 Canon Inc Charged particle generator
JPS63269520A (en) * 1987-04-28 1988-11-07 Canon Inc Electron beam lithography equipment
JPS63269521A (en) * 1987-04-28 1988-11-07 Canon Inc Electron beam lithography equipment
EP0394698A2 (en) * 1989-03-30 1990-10-31 Canon Kabushiki Kaisha Electron beam lithography machine and image display apparatus
US5569974A (en) * 1989-03-30 1996-10-29 Canon Kabushiki Kaisha Electron-emitting device and electron beam lithograph machine and image display apparatus making use of it
EP0780879A3 (en) * 1995-12-21 1998-01-07 Nec Corporation Electron beam exposure apparatus
CN103299390A (en) * 2010-10-25 2013-09-11 弗劳恩霍弗实用研究促进协会 Device for producing an electron beam

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