JPS5675576A - Plasma surface treating apparatus - Google Patents

Plasma surface treating apparatus

Info

Publication number
JPS5675576A
JPS5675576A JP15205979A JP15205979A JPS5675576A JP S5675576 A JPS5675576 A JP S5675576A JP 15205979 A JP15205979 A JP 15205979A JP 15205979 A JP15205979 A JP 15205979A JP S5675576 A JPS5675576 A JP S5675576A
Authority
JP
Japan
Prior art keywords
vessel
plasma
ions
treated
treating apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15205979A
Other languages
Japanese (ja)
Inventor
Takeshi Yasui
Masahiko Hirose
Masahiko Yotsuyanagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP15205979A priority Critical patent/JPS5675576A/en
Publication of JPS5675576A publication Critical patent/JPS5675576A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To perform treatment efficiently by providing a shielding vessel between the inside wall of a tightly closed vessel and the material to be treated in the case of performing the surface treatment of said material by the use of plasma or ions in the tightly closed vessel.
CONSTITUTION: A shielding vessel 16 is provided between the inside wall of a tightly closed vessel 5 and the material 17 to be treated in a plasma surface treating apparatus which performs the surface treatment of the material 17 by using plasma or ions in the vessel 5. The vessel 16 is a cylindrical vessel having a plurality of holes, and the material 17 is contained therein. This prevents the polymerized matter formed by the oils etc. having stuck or adsorbed on or in the material 17 from adhering on the vessel 5; in addition, the diffusion of plasma or ions is suppressed and therefore the material 17 is treated with good efficiency.
COPYRIGHT: (C)1981,JPO&Japio
JP15205979A 1979-11-26 1979-11-26 Plasma surface treating apparatus Pending JPS5675576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15205979A JPS5675576A (en) 1979-11-26 1979-11-26 Plasma surface treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15205979A JPS5675576A (en) 1979-11-26 1979-11-26 Plasma surface treating apparatus

Publications (1)

Publication Number Publication Date
JPS5675576A true JPS5675576A (en) 1981-06-22

Family

ID=15532148

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15205979A Pending JPS5675576A (en) 1979-11-26 1979-11-26 Plasma surface treating apparatus

Country Status (1)

Country Link
JP (1) JPS5675576A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129872U (en) * 1983-02-19 1984-08-31 日本真空技術株式会社 plasma etching equipment
JPS63280422A (en) * 1987-05-12 1988-11-17 Hitachi Ltd Microwave plasma processor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59129872U (en) * 1983-02-19 1984-08-31 日本真空技術株式会社 plasma etching equipment
JPS63280422A (en) * 1987-05-12 1988-11-17 Hitachi Ltd Microwave plasma processor
JPH0525386B2 (en) * 1987-05-12 1993-04-12 Hitachi Seisakusho Kk

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