JPS5577141A - Etching method - Google Patents
Etching methodInfo
- Publication number
- JPS5577141A JPS5577141A JP15164078A JP15164078A JPS5577141A JP S5577141 A JPS5577141 A JP S5577141A JP 15164078 A JP15164078 A JP 15164078A JP 15164078 A JP15164078 A JP 15164078A JP S5577141 A JPS5577141 A JP S5577141A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- substrate
- central portion
- tank
- etching liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To make possible the formation of a precise pattern by means of a shielding body provided close to the substrated for even etching speed when a semiconductor substrate undergoes an etching liquid.
CONSTITUTION: An etching tank 3 filled with an etching liquid is arranged into a water tank 2 having water 2 stored to prevent the rise in the temperature of the etching liquid. A carrier 4 holding a plurality of semiconductor substrates leaving a clearance therebetween is submerged into the tank 3 and a specified etching is performed. In this process, adjusting plates 8 serving as a shielding body are inserted into the clearance between the substrates to uniformize the etching speed between the peripheral and central portion of the substrate. In other words, a hole with a diameter about 1/2 as large as the substrate is punched at the central portion of the adjusting plate so that the amount of the etching liquid 7 is properly increased toward the central portion of the substrate 5 to eliminate uneven etching speed. With such an arrangement, a better etching is possible even to yield any fine pattern.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15164078A JPS5577141A (en) | 1978-12-07 | 1978-12-07 | Etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15164078A JPS5577141A (en) | 1978-12-07 | 1978-12-07 | Etching method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5577141A true JPS5577141A (en) | 1980-06-10 |
JPS6346572B2 JPS6346572B2 (en) | 1988-09-16 |
Family
ID=15522967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15164078A Granted JPS5577141A (en) | 1978-12-07 | 1978-12-07 | Etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5577141A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4501636A (en) * | 1983-12-28 | 1985-02-26 | The United States Of America As Represented By The Secretary Of The Air Force | Apparatus for etching vertical junction solar cell wafers |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5056148A (en) * | 1973-09-14 | 1975-05-16 | ||
JPS5128760A (en) * | 1974-09-04 | 1976-03-11 | Hitachi Ltd | BANJOBUTSUNOETSUCHINGUSOCHI |
JPS5348459A (en) * | 1976-10-14 | 1978-05-01 | Mitsubishi Electric Corp | Production of semiconductor device |
-
1978
- 1978-12-07 JP JP15164078A patent/JPS5577141A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5056148A (en) * | 1973-09-14 | 1975-05-16 | ||
JPS5128760A (en) * | 1974-09-04 | 1976-03-11 | Hitachi Ltd | BANJOBUTSUNOETSUCHINGUSOCHI |
JPS5348459A (en) * | 1976-10-14 | 1978-05-01 | Mitsubishi Electric Corp | Production of semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4501636A (en) * | 1983-12-28 | 1985-02-26 | The United States Of America As Represented By The Secretary Of The Air Force | Apparatus for etching vertical junction solar cell wafers |
Also Published As
Publication number | Publication date |
---|---|
JPS6346572B2 (en) | 1988-09-16 |
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