JPS5551705A - Production of nitridosulfate - Google Patents

Production of nitridosulfate

Info

Publication number
JPS5551705A
JPS5551705A JP12121978A JP12121978A JPS5551705A JP S5551705 A JPS5551705 A JP S5551705A JP 12121978 A JP12121978 A JP 12121978A JP 12121978 A JP12121978 A JP 12121978A JP S5551705 A JPS5551705 A JP S5551705A
Authority
JP
Japan
Prior art keywords
sulfite
nitridosulfate
soln
salt
mixed gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12121978A
Other languages
Japanese (ja)
Inventor
Yukio Ito
Etsuro Masuda
Yoshiro Yasumoto
Hiroshi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP12121978A priority Critical patent/JPS5551705A/en
Publication of JPS5551705A publication Critical patent/JPS5551705A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/087—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms
    • C01B21/093—Compounds containing nitrogen and non-metals and optionally metals containing one or more hydrogen atoms containing also one or more sulfur atoms
    • C01B21/0935—Imidodisulfonic acid; Nitrilotrisulfonic acid; Salts thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/082—Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/086—Compounds containing nitrogen and non-metals and optionally metals containing one or more sulfur atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

PURPOSE: To produce a nitridosulfate in a high yield without by-producing a nitrate by directly absorption-reacting NO2 or NO2-NO mixed gas with an aq. sulfite soln. of pH about 6.
CONSTITUTION: NO2 or excess NO2-NO mixed gas is absorption-reacted with an aq. soln. of a sulfite of pH5W8, esp. about 6, i.e., an acidic sulfite such as NaHSO3 mixed with a little neutral sulfite. The reaction temp. is 10W80, pref. 20W60°C. The resulting nitrido-sulfate includes (NaSO3)3N, (KSO3).2H2O and (NH4SO3)3N. In case the NH4 salt or K salt is obtd. as solid, in order to prevent hydrolysis thereof it is desirable to adjust the pH value of the liquid after the reaction to 10 or above.
COPYRIGHT: (C)1980,JPO&Japio
JP12121978A 1978-10-03 1978-10-03 Production of nitridosulfate Pending JPS5551705A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12121978A JPS5551705A (en) 1978-10-03 1978-10-03 Production of nitridosulfate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12121978A JPS5551705A (en) 1978-10-03 1978-10-03 Production of nitridosulfate

Publications (1)

Publication Number Publication Date
JPS5551705A true JPS5551705A (en) 1980-04-15

Family

ID=14805828

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12121978A Pending JPS5551705A (en) 1978-10-03 1978-10-03 Production of nitridosulfate

Country Status (1)

Country Link
JP (1) JPS5551705A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0039481A1 (en) * 1980-05-05 1981-11-11 Hoechst Aktiengesellschaft Process for producing triammonium nitrilotrisulfate
US5329734A (en) * 1993-04-30 1994-07-19 Motorola, Inc. Polishing pads used to chemical-mechanical polish a semiconductor substrate
US5441598A (en) * 1993-12-16 1995-08-15 Motorola, Inc. Polishing pad for chemical-mechanical polishing of a semiconductor substrate
US6439989B1 (en) 1992-08-19 2002-08-27 Rodel Holdings Inc. Polymeric polishing pad having continuously regenerated work surface

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527382A (en) * 1975-06-03 1977-01-20 Mitsui Petrochem Ind Ltd Treatment process for exhaust gases containing nitrogen oxides

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527382A (en) * 1975-06-03 1977-01-20 Mitsui Petrochem Ind Ltd Treatment process for exhaust gases containing nitrogen oxides

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0039481A1 (en) * 1980-05-05 1981-11-11 Hoechst Aktiengesellschaft Process for producing triammonium nitrilotrisulfate
US6439989B1 (en) 1992-08-19 2002-08-27 Rodel Holdings Inc. Polymeric polishing pad having continuously regenerated work surface
US5329734A (en) * 1993-04-30 1994-07-19 Motorola, Inc. Polishing pads used to chemical-mechanical polish a semiconductor substrate
US5441598A (en) * 1993-12-16 1995-08-15 Motorola, Inc. Polishing pad for chemical-mechanical polishing of a semiconductor substrate
US5628862A (en) * 1993-12-16 1997-05-13 Motorola, Inc. Polishing pad for chemical-mechanical polishing of a semiconductor substrate

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