JPS55164075A - Removal of silver from plastic base material - Google Patents
Removal of silver from plastic base materialInfo
- Publication number
- JPS55164075A JPS55164075A JP7092379A JP7092379A JPS55164075A JP S55164075 A JPS55164075 A JP S55164075A JP 7092379 A JP7092379 A JP 7092379A JP 7092379 A JP7092379 A JP 7092379A JP S55164075 A JPS55164075 A JP S55164075A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- plastic base
- silver
- removal
- plastic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/30—Acidic compositions for etching other metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE:To permit the removal of silver from the plastic base material without damaging the surface of the plastic material and also generating harmful gases by treating a silver film adhered to the plastic base material with a solution containing an ammonium salt and H2O2. CONSTITUTION:In a process of removing the silver film adhered to the plastic base material in cases where a conductive film is incomplete, the plastic base material is dipped in the solution containing an ammonium salt and H2O2 for treatment in order to easily remove the silver without the use of hexavalent chromium or a cyanide as in the conventional cases and also without generating any harmful gas. The plastic base material thus separated can be reused as such.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7092379A JPS55164075A (en) | 1979-06-06 | 1979-06-06 | Removal of silver from plastic base material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7092379A JPS55164075A (en) | 1979-06-06 | 1979-06-06 | Removal of silver from plastic base material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55164075A true JPS55164075A (en) | 1980-12-20 |
JPS5641703B2 JPS5641703B2 (en) | 1981-09-30 |
Family
ID=13445502
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7092379A Granted JPS55164075A (en) | 1979-06-06 | 1979-06-06 | Removal of silver from plastic base material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55164075A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008534789A (en) * | 2005-04-06 | 2008-08-28 | インクテック シーオー リミテッド | Etching composition |
WO2020080178A1 (en) * | 2018-10-17 | 2020-04-23 | 株式会社Adeka | Etching liquid composition and etching method |
-
1979
- 1979-06-06 JP JP7092379A patent/JPS55164075A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008534789A (en) * | 2005-04-06 | 2008-08-28 | インクテック シーオー リミテッド | Etching composition |
JP4756069B2 (en) * | 2005-04-06 | 2011-08-24 | インクテック シーオー リミテッド | Etching composition |
WO2020080178A1 (en) * | 2018-10-17 | 2020-04-23 | 株式会社Adeka | Etching liquid composition and etching method |
Also Published As
Publication number | Publication date |
---|---|
JPS5641703B2 (en) | 1981-09-30 |
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