JPS55145170A - Arc-breaking method of direct current electric discharge unit and its circuit - Google Patents

Arc-breaking method of direct current electric discharge unit and its circuit

Info

Publication number
JPS55145170A
JPS55145170A JP5284279A JP5284279A JPS55145170A JP S55145170 A JPS55145170 A JP S55145170A JP 5284279 A JP5284279 A JP 5284279A JP 5284279 A JP5284279 A JP 5284279A JP S55145170 A JPS55145170 A JP S55145170A
Authority
JP
Japan
Prior art keywords
load
switching element
arc
parallel
main feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5284279A
Other languages
Japanese (ja)
Inventor
Noboru Kuriyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP5284279A priority Critical patent/JPS55145170A/en
Publication of JPS55145170A publication Critical patent/JPS55145170A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Control Of Voltage And Current In General (AREA)

Abstract

PURPOSE:To break the current flowing between a DC power source and a load by connecting the DC power source to the load by a main feeding line having a switching element and a bypass resistance, and by on-off congrolling the switching element in accordance with voltage change so as to detect rapidly arcing. CONSTITUTION:A DC power supply PS is connected to a load S such as sputtering means etc. by a main feed line consisting of a steady resistance RS and an on-off controlled switching element Q, and by a bypass resistance RB which is connected in parallel to the main feed line. The switching element Q is controlled by a control circuit CC following the voltage of a voltage-dividing circuit formed by the parallel resistances R1, R2 connected to the load S in parallel. Hereby the arc is broken by stopping the main feed in shifting from glow discharge to arc discharge, and the glow discharge restarts after complete elimination of thermion emission point in the load. As a result, arcing is restrained at a minimum.
JP5284279A 1979-04-28 1979-04-28 Arc-breaking method of direct current electric discharge unit and its circuit Pending JPS55145170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5284279A JPS55145170A (en) 1979-04-28 1979-04-28 Arc-breaking method of direct current electric discharge unit and its circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5284279A JPS55145170A (en) 1979-04-28 1979-04-28 Arc-breaking method of direct current electric discharge unit and its circuit

Publications (1)

Publication Number Publication Date
JPS55145170A true JPS55145170A (en) 1980-11-12

Family

ID=12926090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5284279A Pending JPS55145170A (en) 1979-04-28 1979-04-28 Arc-breaking method of direct current electric discharge unit and its circuit

Country Status (1)

Country Link
JP (1) JPS55145170A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6130665A (en) * 1984-07-20 1986-02-12 Anelva Corp Sputtering device
JPH01301856A (en) * 1988-05-30 1989-12-06 Shimadzu Corp Sputtering device
WO1994014183A1 (en) * 1992-12-17 1994-06-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for carrying out stable low pressure discharge processes
JPH07310178A (en) * 1994-04-19 1995-11-28 Leybold Ag Substrate coating device
WO2003103348A1 (en) * 2002-05-31 2003-12-11 芝浦メカトロニクス株式会社 Discharging power source, sputtering power source, and sputtering device
JP2006237009A (en) * 2005-02-24 2006-09-07 En Technology Inc Arc energy control circuit for plasma power supply device
US8033246B2 (en) 2005-05-06 2011-10-11 Huettinger Elektronik Gmbh + Co. Kg Arc suppression

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218599A (en) * 1975-08-01 1977-02-12 Jeol Ltd Power source device for charged beam system
JPS5285798A (en) * 1976-01-09 1977-07-16 Tokuda Seisakusho Spattering power source device
JPS5419151A (en) * 1977-07-13 1979-02-13 Mitsubishi Electric Corp Multishunt constant voltage device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5218599A (en) * 1975-08-01 1977-02-12 Jeol Ltd Power source device for charged beam system
JPS5285798A (en) * 1976-01-09 1977-07-16 Tokuda Seisakusho Spattering power source device
JPS5419151A (en) * 1977-07-13 1979-02-13 Mitsubishi Electric Corp Multishunt constant voltage device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6130665A (en) * 1984-07-20 1986-02-12 Anelva Corp Sputtering device
JPH0114312B2 (en) * 1984-07-20 1989-03-10 Nichiden Aneruba Kk
JPH01301856A (en) * 1988-05-30 1989-12-06 Shimadzu Corp Sputtering device
WO1994014183A1 (en) * 1992-12-17 1994-06-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for carrying out stable low pressure discharge processes
JPH07310178A (en) * 1994-04-19 1995-11-28 Leybold Ag Substrate coating device
WO2003103348A1 (en) * 2002-05-31 2003-12-11 芝浦メカトロニクス株式会社 Discharging power source, sputtering power source, and sputtering device
US7695599B2 (en) 2002-05-31 2010-04-13 Shibaura Mechatronics Corporation Discharging power source, sputtering power source, and sputtering device
JP2006237009A (en) * 2005-02-24 2006-09-07 En Technology Inc Arc energy control circuit for plasma power supply device
JP4597886B2 (en) * 2005-02-24 2010-12-15 イーエヌ テクノロジー インコーポレイテッド Arc energy control circuit for plasma power supply
US8033246B2 (en) 2005-05-06 2011-10-11 Huettinger Elektronik Gmbh + Co. Kg Arc suppression

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