JPS55137523A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS55137523A
JPS55137523A JP4619779A JP4619779A JPS55137523A JP S55137523 A JPS55137523 A JP S55137523A JP 4619779 A JP4619779 A JP 4619779A JP 4619779 A JP4619779 A JP 4619779A JP S55137523 A JPS55137523 A JP S55137523A
Authority
JP
Japan
Prior art keywords
polymer
thioacridones
sensitize
specified
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4619779A
Other languages
Japanese (ja)
Inventor
Takateru Asano
Chiaki Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Original Assignee
Fuji Yakuhin Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK filed Critical Fuji Yakuhin Kogyo KK
Priority to JP4619779A priority Critical patent/JPS55137523A/en
Publication of JPS55137523A publication Critical patent/JPS55137523A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To produce a photosensitive composition forming a tough film by adding a specified xanthene dye to an azide polymer together with specified thioacridones as desired to sensitize the polymer up to the visible region.
CONSTITUTION: 1W15% of a xanthene dye represented by formula I or II (where each of R1WR8 is H or halogen, each of R1' and R2" is H, CH3 or C2H5 and M is H, K or Na) is added to an azide polymer to sensitize the polymer up to the visible region. By further adding 3W7% of thioacridones represented by formula III (where R is H, 1W4C alkyl, 1W4C alkoxy or aryl and R' is the same as R or Cl) the sensitivity of the polymer is increased, and the photosetting is facilitated. The resulting composition is suitable for a PS plate sensitive to wavelengths of 488nm and 514.5nm of argon ion laser, and it can be exposed efficiently with a little energy.
COPYRIGHT: (C)1980,JPO&Japio
JP4619779A 1979-04-16 1979-04-16 Photosensitive composition Pending JPS55137523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4619779A JPS55137523A (en) 1979-04-16 1979-04-16 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4619779A JPS55137523A (en) 1979-04-16 1979-04-16 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS55137523A true JPS55137523A (en) 1980-10-27

Family

ID=12740340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4619779A Pending JPS55137523A (en) 1979-04-16 1979-04-16 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS55137523A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027849A (en) * 1992-03-23 2000-02-22 Imation Corp. Ablative imageable element

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057426A (en) * 1973-09-14 1975-05-19
JPS52103201A (en) * 1976-02-25 1977-08-30 Okamoto Kagaku Kogyo Kk Photoosensitive composition
JPS52151025A (en) * 1976-06-10 1977-12-15 Hoechst Co American Method of recording image with laser beam

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5057426A (en) * 1973-09-14 1975-05-19
JPS52103201A (en) * 1976-02-25 1977-08-30 Okamoto Kagaku Kogyo Kk Photoosensitive composition
JPS52151025A (en) * 1976-06-10 1977-12-15 Hoechst Co American Method of recording image with laser beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6027849A (en) * 1992-03-23 2000-02-22 Imation Corp. Ablative imageable element

Similar Documents

Publication Publication Date Title
US4162162A (en) Derivatives of aryl ketones and p-dialkyl-aminoarylaldehydes as visible sensitizers of photopolymerizable compositions
JPS56164338A (en) Dry image forming material
JPS54151024A (en) Photopolymerizable composition
ITMI962438A1 (en) BORATE COINIZIATORS FOR PHOTOPOLYMERIZATION
JPS5681852A (en) Spectral sensitizer for photoconductive substance and photoconductive composition containing it
JPS55118030A (en) Photopolymerizable composition
ITMI962439A1 (en) STABLE BORATES WITH ACIDS FOR PHOTOPOLYMERIZATION
JPS55598A (en) Silver halide color photographic material
IE36853L (en) Phenyl-indolyl-phthalides.
JPS5461164A (en) 2-arylnaphtho1,8-bcfuran-5-ones, compositions and materials containing them
JPS55137523A (en) Photosensitive composition
GB1286885A (en) Process for preparing fluorane compounds
JPS5724941A (en) Color photographic sensitive material
JPH0269471A (en) Spiropyran compound and production thereof
JPS5746980A (en) Thiopyrylium compound and photoconductive composition containing the same
JPS5480118A (en) Silver halide photosensitive material
JPS5639541A (en) Color photographic material
JPS5456833A (en) Color photographic material
JPS55161233A (en) Photographic oxonol dye
JPS5570834A (en) Silver halide photographic emulsion for helium-neon laser light exposure
JPS5448537A (en) Color photographic material
GB1528565A (en) Coupling compounds and their use in silver halide photographic light-sensitive materials
JPS5251932A (en) Color sensitized silver halide photographic light sensitive material
JPS5760327A (en) Image forming material
JPS56164343A (en) Color photographic sensitive silver halide material