JPS55127553A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS55127553A JPS55127553A JP3637079A JP3637079A JPS55127553A JP S55127553 A JPS55127553 A JP S55127553A JP 3637079 A JP3637079 A JP 3637079A JP 3637079 A JP3637079 A JP 3637079A JP S55127553 A JPS55127553 A JP S55127553A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- mixture
- phenol
- alkylphenol
- soluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To enhance the sensitization property of an o-quinone diazide type photodecomposable photosensitive composition by mixing alkali-soluble cocondensed novolak resin of a mixture of alkylphenol with a high MW and (methyl-substituted) phenol in a specified molar ratio into the composition.
CONSTITUTION: 50W100mol% of formaldehyde is added to a mixture of one or more kinds of alkylphenols represented by formula I (where R is 3W12C alkyl or phenyl) and (methyl-substituted) phenol or a mixture thereof in an alkylphenol to other phenol molar ratio of 1:9W9:1, and they are condensed in the presence of acid catalyst. One or more kinds of the resulting alkali-soluble cocondensed novolak resins are added to a photodecomposable photosensitive composition containing an o-quinone diazide compound represented by formula II or III, and an Al plate or the like is covered with a photosensitive layer formed, thus obtaining a photosensitive composition having high resistance to an aqueous alkali solution at its unexposed portion, superior sensitization property and high long-term shelf stability and suitable for use as a printing material such as a PS plate, a photomask, etc.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3637079A JPS55127553A (en) | 1979-03-27 | 1979-03-27 | Photosensitive composition |
DE19803009873 DE3009873A1 (en) | 1979-03-16 | 1980-03-14 | PHOTO SENSITIVE DIMENSIONS |
US06/130,372 US4308368A (en) | 1979-03-16 | 1980-03-14 | Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3637079A JPS55127553A (en) | 1979-03-27 | 1979-03-27 | Photosensitive composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55127553A true JPS55127553A (en) | 1980-10-02 |
Family
ID=12467942
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3637079A Pending JPS55127553A (en) | 1979-03-16 | 1979-03-27 | Photosensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55127553A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61130947A (en) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | Positive type resist composition |
JPH0296164A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
US5407780A (en) * | 1989-12-27 | 1995-04-18 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde |
US7112397B2 (en) | 2003-01-07 | 2006-09-26 | Okamoto Chemical Industry Co., Ltd. | Image forming composition and photosensitive lithographic plate using same |
JP2017090486A (en) * | 2015-11-02 | 2017-05-25 | 旭化成株式会社 | Photosensitive resin composition and method for manufacturing cured relief pattern |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4924361A (en) * | 1972-06-27 | 1974-03-04 | ||
GB1367830A (en) * | 1972-05-23 | 1974-09-25 | Hunt Chem Corp Philip A | Processes and materials for making photoresists |
JPS54116218A (en) * | 1978-03-02 | 1979-09-10 | Oji Paper Co | Photosensitive composition |
-
1979
- 1979-03-27 JP JP3637079A patent/JPS55127553A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1367830A (en) * | 1972-05-23 | 1974-09-25 | Hunt Chem Corp Philip A | Processes and materials for making photoresists |
JPS4924361A (en) * | 1972-06-27 | 1974-03-04 | ||
JPS54116218A (en) * | 1978-03-02 | 1979-09-10 | Oji Paper Co | Photosensitive composition |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61130947A (en) * | 1984-11-30 | 1986-06-18 | Japan Synthetic Rubber Co Ltd | Positive type resist composition |
JPH04260B2 (en) * | 1984-11-30 | 1992-01-06 | Japan Synthetic Rubber Co Ltd | |
JPH0296164A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
US5407780A (en) * | 1989-12-27 | 1995-04-18 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition comprising an alkali-soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde |
US7112397B2 (en) | 2003-01-07 | 2006-09-26 | Okamoto Chemical Industry Co., Ltd. | Image forming composition and photosensitive lithographic plate using same |
JP2017090486A (en) * | 2015-11-02 | 2017-05-25 | 旭化成株式会社 | Photosensitive resin composition and method for manufacturing cured relief pattern |
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