JPS545666A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS545666A
JPS545666A JP7086377A JP7086377A JPS545666A JP S545666 A JPS545666 A JP S545666A JP 7086377 A JP7086377 A JP 7086377A JP 7086377 A JP7086377 A JP 7086377A JP S545666 A JPS545666 A JP S545666A
Authority
JP
Japan
Prior art keywords
electron beam
exposure device
beam exposure
lens
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7086377A
Other languages
Japanese (ja)
Other versions
JPS603774B2 (en
Inventor
Hiroshi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP52070863A priority Critical patent/JPS603774B2/en
Publication of JPS545666A publication Critical patent/JPS545666A/en
Publication of JPS603774B2 publication Critical patent/JPS603774B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To increase the exposure performance by making the electron current pass through the first focus of the lens and form the image at the second slit located at the position which passes through the second focus and then setting the distance between the first slit and the lens longer than the distance between the lens and the second slit.
COPYRIGHT: (C)1979,JPO&Japio
JP52070863A 1977-06-15 1977-06-15 Electron beam exposure equipment Expired JPS603774B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52070863A JPS603774B2 (en) 1977-06-15 1977-06-15 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52070863A JPS603774B2 (en) 1977-06-15 1977-06-15 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS545666A true JPS545666A (en) 1979-01-17
JPS603774B2 JPS603774B2 (en) 1985-01-30

Family

ID=13443814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52070863A Expired JPS603774B2 (en) 1977-06-15 1977-06-15 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS603774B2 (en)

Also Published As

Publication number Publication date
JPS603774B2 (en) 1985-01-30

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