JPS5320863A - Defect correcting method of photo masks and reticles - Google Patents

Defect correcting method of photo masks and reticles

Info

Publication number
JPS5320863A
JPS5320863A JP9483876A JP9483876A JPS5320863A JP S5320863 A JPS5320863 A JP S5320863A JP 9483876 A JP9483876 A JP 9483876A JP 9483876 A JP9483876 A JP 9483876A JP S5320863 A JPS5320863 A JP S5320863A
Authority
JP
Japan
Prior art keywords
reticles
correcting method
defect correcting
photo masks
dropout parts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9483876A
Other languages
Japanese (ja)
Inventor
Takamitsu Kamiyama
Shigeru Nishimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9483876A priority Critical patent/JPS5320863A/en
Publication of JPS5320863A publication Critical patent/JPS5320863A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To additively forming images at dropout parts in a self-alignment manner and perofrm correction by coating a photographic emulsion to the regions including the dropout parts and performing exposing and developing treatment from the back.
COPYRIGHT: (C)1978,JPO&Japio
JP9483876A 1976-08-11 1976-08-11 Defect correcting method of photo masks and reticles Pending JPS5320863A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9483876A JPS5320863A (en) 1976-08-11 1976-08-11 Defect correcting method of photo masks and reticles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9483876A JPS5320863A (en) 1976-08-11 1976-08-11 Defect correcting method of photo masks and reticles

Publications (1)

Publication Number Publication Date
JPS5320863A true JPS5320863A (en) 1978-02-25

Family

ID=14121174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9483876A Pending JPS5320863A (en) 1976-08-11 1976-08-11 Defect correcting method of photo masks and reticles

Country Status (1)

Country Link
JP (1) JPS5320863A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57165832A (en) * 1981-03-16 1982-10-13 Monosoraa Inc Thin film
JPS6046556A (en) * 1983-08-24 1985-03-13 Hoya Corp Manufacture of photomask
JPS60245135A (en) * 1984-05-18 1985-12-04 Matsushita Electric Ind Co Ltd Correcting method for photomask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57165832A (en) * 1981-03-16 1982-10-13 Monosoraa Inc Thin film
JPS6046556A (en) * 1983-08-24 1985-03-13 Hoya Corp Manufacture of photomask
JPS60245135A (en) * 1984-05-18 1985-12-04 Matsushita Electric Ind Co Ltd Correcting method for photomask

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