JPS5320767A - X-ray mask supporting underlayer and its production - Google Patents

X-ray mask supporting underlayer and its production

Info

Publication number
JPS5320767A
JPS5320767A JP9448676A JP9448676A JPS5320767A JP S5320767 A JPS5320767 A JP S5320767A JP 9448676 A JP9448676 A JP 9448676A JP 9448676 A JP9448676 A JP 9448676A JP S5320767 A JPS5320767 A JP S5320767A
Authority
JP
Japan
Prior art keywords
production
ray mask
mask supporting
supporting underlayer
underlayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9448676A
Other languages
Japanese (ja)
Other versions
JPS5324785B2 (en
Inventor
Hideo Yoshihara
Toshiki Kadota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9448676A priority Critical patent/JPS5320767A/en
Publication of JPS5320767A publication Critical patent/JPS5320767A/en
Publication of JPS5324785B2 publication Critical patent/JPS5324785B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To lower substrate temperature at the growing, increase forming speed, expedite the production of an X-ray mask supporting underlayer and increase productivity by forming a SiC film in plasma.
COPYRIGHT: (C)1978,JPO&Japio
JP9448676A 1976-08-10 1976-08-10 X-ray mask supporting underlayer and its production Granted JPS5320767A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9448676A JPS5320767A (en) 1976-08-10 1976-08-10 X-ray mask supporting underlayer and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9448676A JPS5320767A (en) 1976-08-10 1976-08-10 X-ray mask supporting underlayer and its production

Publications (2)

Publication Number Publication Date
JPS5320767A true JPS5320767A (en) 1978-02-25
JPS5324785B2 JPS5324785B2 (en) 1978-07-22

Family

ID=14111603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9448676A Granted JPS5320767A (en) 1976-08-10 1976-08-10 X-ray mask supporting underlayer and its production

Country Status (1)

Country Link
JP (1) JPS5320767A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530891A (en) * 1981-03-17 1985-07-23 Hoya Electronics Co., Ltd. Photo-mask blank for use in lithography including a modified chromium compound
US5082695A (en) * 1988-03-08 1992-01-21 501 Fujitsu Limited Method of fabricating an x-ray exposure mask
JPH0473765A (en) * 1990-07-16 1992-03-09 Toshiba Corp X-ray transmission film and its manufacture
US5178977A (en) * 1989-01-18 1993-01-12 Fujitsu Limited Manufacturing method of an X-ray exposure mask
US5848120A (en) * 1996-09-06 1998-12-08 Hoya Corporation X-ray mask blank, X-ray mask and pattern transfer method
US7703578B2 (en) 2004-04-28 2010-04-27 Mitsubishi Denki Kabushiki Kaisha Elevator apparatus

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5811250Y2 (en) * 1979-09-17 1983-03-02 欣志 藤本 Chiyawan
JPS5725678U (en) * 1980-07-21 1982-02-10
JPS62169675U (en) * 1986-04-18 1987-10-28
JPS62174476U (en) * 1986-04-23 1987-11-06
SG43949A1 (en) 1987-09-30 1997-11-14 Canon Kk X-ray mask support and process for preparation thereof
JPH0389669U (en) * 1989-12-27 1991-09-12

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4530891A (en) * 1981-03-17 1985-07-23 Hoya Electronics Co., Ltd. Photo-mask blank for use in lithography including a modified chromium compound
US5082695A (en) * 1988-03-08 1992-01-21 501 Fujitsu Limited Method of fabricating an x-ray exposure mask
US5178977A (en) * 1989-01-18 1993-01-12 Fujitsu Limited Manufacturing method of an X-ray exposure mask
JPH0473765A (en) * 1990-07-16 1992-03-09 Toshiba Corp X-ray transmission film and its manufacture
US5848120A (en) * 1996-09-06 1998-12-08 Hoya Corporation X-ray mask blank, X-ray mask and pattern transfer method
US7703578B2 (en) 2004-04-28 2010-04-27 Mitsubishi Denki Kabushiki Kaisha Elevator apparatus
JP4732342B2 (en) * 2004-04-28 2011-07-27 三菱電機株式会社 Elevator equipment

Also Published As

Publication number Publication date
JPS5324785B2 (en) 1978-07-22

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