JPS5320767A - X-ray mask supporting underlayer and its production - Google Patents
X-ray mask supporting underlayer and its productionInfo
- Publication number
- JPS5320767A JPS5320767A JP9448676A JP9448676A JPS5320767A JP S5320767 A JPS5320767 A JP S5320767A JP 9448676 A JP9448676 A JP 9448676A JP 9448676 A JP9448676 A JP 9448676A JP S5320767 A JPS5320767 A JP S5320767A
- Authority
- JP
- Japan
- Prior art keywords
- production
- ray mask
- mask supporting
- supporting underlayer
- underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To lower substrate temperature at the growing, increase forming speed, expedite the production of an X-ray mask supporting underlayer and increase productivity by forming a SiC film in plasma.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9448676A JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9448676A JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5320767A true JPS5320767A (en) | 1978-02-25 |
JPS5324785B2 JPS5324785B2 (en) | 1978-07-22 |
Family
ID=14111603
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9448676A Granted JPS5320767A (en) | 1976-08-10 | 1976-08-10 | X-ray mask supporting underlayer and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5320767A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4530891A (en) * | 1981-03-17 | 1985-07-23 | Hoya Electronics Co., Ltd. | Photo-mask blank for use in lithography including a modified chromium compound |
US5082695A (en) * | 1988-03-08 | 1992-01-21 | 501 Fujitsu Limited | Method of fabricating an x-ray exposure mask |
JPH0473765A (en) * | 1990-07-16 | 1992-03-09 | Toshiba Corp | X-ray transmission film and its manufacture |
US5178977A (en) * | 1989-01-18 | 1993-01-12 | Fujitsu Limited | Manufacturing method of an X-ray exposure mask |
US5848120A (en) * | 1996-09-06 | 1998-12-08 | Hoya Corporation | X-ray mask blank, X-ray mask and pattern transfer method |
US7703578B2 (en) | 2004-04-28 | 2010-04-27 | Mitsubishi Denki Kabushiki Kaisha | Elevator apparatus |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5811250Y2 (en) * | 1979-09-17 | 1983-03-02 | 欣志 藤本 | Chiyawan |
JPS5725678U (en) * | 1980-07-21 | 1982-02-10 | ||
JPS62169675U (en) * | 1986-04-18 | 1987-10-28 | ||
JPS62174476U (en) * | 1986-04-23 | 1987-11-06 | ||
SG43949A1 (en) | 1987-09-30 | 1997-11-14 | Canon Kk | X-ray mask support and process for preparation thereof |
JPH0389669U (en) * | 1989-12-27 | 1991-09-12 |
-
1976
- 1976-08-10 JP JP9448676A patent/JPS5320767A/en active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4530891A (en) * | 1981-03-17 | 1985-07-23 | Hoya Electronics Co., Ltd. | Photo-mask blank for use in lithography including a modified chromium compound |
US5082695A (en) * | 1988-03-08 | 1992-01-21 | 501 Fujitsu Limited | Method of fabricating an x-ray exposure mask |
US5178977A (en) * | 1989-01-18 | 1993-01-12 | Fujitsu Limited | Manufacturing method of an X-ray exposure mask |
JPH0473765A (en) * | 1990-07-16 | 1992-03-09 | Toshiba Corp | X-ray transmission film and its manufacture |
US5848120A (en) * | 1996-09-06 | 1998-12-08 | Hoya Corporation | X-ray mask blank, X-ray mask and pattern transfer method |
US7703578B2 (en) | 2004-04-28 | 2010-04-27 | Mitsubishi Denki Kabushiki Kaisha | Elevator apparatus |
JP4732342B2 (en) * | 2004-04-28 | 2011-07-27 | 三菱電機株式会社 | Elevator equipment |
Also Published As
Publication number | Publication date |
---|---|
JPS5324785B2 (en) | 1978-07-22 |
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