JPS53145475A - Position detector - Google Patents
Position detectorInfo
- Publication number
- JPS53145475A JPS53145475A JP6005277A JP6005277A JPS53145475A JP S53145475 A JPS53145475 A JP S53145475A JP 6005277 A JP6005277 A JP 6005277A JP 6005277 A JP6005277 A JP 6005277A JP S53145475 A JPS53145475 A JP S53145475A
- Authority
- JP
- Japan
- Prior art keywords
- position detector
- detecting
- base
- precison
- patterning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To control beam exposure and perform precison patterning by detecting base positions and also detecting the displacement of the posture of the base.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6005277A JPS53145475A (en) | 1977-05-24 | 1977-05-24 | Position detector |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6005277A JPS53145475A (en) | 1977-05-24 | 1977-05-24 | Position detector |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53145475A true JPS53145475A (en) | 1978-12-18 |
Family
ID=13130919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6005277A Pending JPS53145475A (en) | 1977-05-24 | 1977-05-24 | Position detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53145475A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5645025A (en) * | 1979-09-21 | 1981-04-24 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam lithography apparatus |
JP2001290281A (en) * | 2000-03-08 | 2001-10-19 | Leica Microsystems Lithography Gmbh | Method and device for constituting curved line drawing on photosensitive resist |
US7025498B2 (en) * | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
-
1977
- 1977-05-24 JP JP6005277A patent/JPS53145475A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5645025A (en) * | 1979-09-21 | 1981-04-24 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Electron beam lithography apparatus |
JP2001290281A (en) * | 2000-03-08 | 2001-10-19 | Leica Microsystems Lithography Gmbh | Method and device for constituting curved line drawing on photosensitive resist |
US7025498B2 (en) * | 2003-05-30 | 2006-04-11 | Asml Holding N.V. | System and method of measuring thermal expansion |
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