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National Institute of Advanced Industrial Science and Technology AIST
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Agency of Industrial Science and Technology
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Application filed by Agency of Industrial Science and TechnologyfiledCriticalAgency of Industrial Science and Technology
Priority to JP4499877ApriorityCriticalpatent/JPS53129975A/en
Publication of JPS53129975ApublicationCriticalpatent/JPS53129975A/en
Publication of JPS548072B2publicationCriticalpatent/JPS548072B2/ja
PURPOSE: To obtain an electron beam exposure apparatus which is capable of performing half-tone exposure and is varying sanning speeds and yet is easy to handle and is inexpensive.